公开(公告)号：US20080031511A1

公开(公告)日：2008-02-07

申请号：US11869217

申请日：2007-10-09

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chips formed on a substrate; selecting a pattern which is suitable for calculating position gap between an inspection image of a subject chip and reference image stored in memory from an image of a firstly imaged chip among said sequentially imaged plural chips formed on the substrate; computing position gap between an inspection image of a chip obtained by the sequential imaging and reference image stored in a memory by using a positional information of a pattern image included in the inspection image and a reference pattern image included in the reference image which are both corresponding to the pattern selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image and extracting a difference as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 从形成在所述基板上的所述顺序成像的多个芯片中，选择适合于计算被检体图像的检查图像与存储在存储器中的参考图像之间的位置间隔的图案， 通过使用包括在检查图像中的图案图像的位置信息和包括在参考图像中的参考图案图像来计算通过顺序成像获得的芯片的检查图像和存储在存储器中的参考图像之间的位置间隙， 到选择时选择的图案; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 并且将对准的检查图像与参考图像进行比较，并提取差异作为缺陷候选。

公开(公告)号：US06973208B2

公开(公告)日：2005-12-06

申请号：US09861084

申请日：2001-05-18

申请人： Masayuki Kuwabara

发明人： Masayuki Kuwabara

IPC分类号： G03F7/20 ,  G06T7/00 ,  G06K9/00

CPC分类号： G03F7/70508 ,  G03F7/70616 ,  G06T7/0002 ,  G06T7/001 ,  G06T2207/30148

摘要： Disclosed are a method and apparatus for inspection by pattern comparison enabling cell-cell comparison by software processing even when the array pitch R of the cells is not a whole multiple of the pixel pitch P, wherein provision is made of an imaging device for capturing an image of patterns having a plurality of basic patterns repeating at a predetermined pitch and generating pixel data, a memory for storing the image data, and an image processor unit for successively comparing corresponding pixel data of the basic patterns based on the pixel data, the image processor unit setting a first whole number by which the length of the predetermined pitch multiplied by the first whole number becomes a whole multiple of the pixel pitch when the predetermined pitch is expressed by a resolution of at least a predetermined resolution pitch smaller than the pixel pitch and successively comparing the corresponding pixel data of basic patterns said first whole number of pattern away.

摘要翻译： 公开了一种用于通过图案比较进行检查的方法和装置，即使当单元的阵列间距R不是像素间距P的整数倍时，通过软件处理实现细胞单元比较，其中提供用于捕获 具有以预定间距重复的多个基本图案并生成像素数据的图案的图像，用于存储图像数据的存储器和用于基于像素数据连续地比较基本图案的对应像素数据的图像处理器单元，图像 处理器单元设置第一整数，当预定音调由至少比像素间距小的预定分辨率间距的分辨率表示时，预定音高乘以第一整数的长度变为像素间距的整数倍 并连续地将所述第一整数图案的基本图案的相应像素数据进行比较。

公开(公告)号：US5240335A

公开(公告)日：1993-08-31

申请号：US825484

申请日：1992-01-24

申请人： Masahiro Itoh ,  Masayuki Kuwabara

发明人： Masahiro Itoh ,  Masayuki Kuwabara

IPC分类号： B41M5/382 ,  B41J3/32 ,  B41M3/16 ,  G03G9/08 ,  G03G15/16 ,  G03G15/22 ,  G09B21/02

CPC分类号： B41J3/32 ,  B41M3/16 ,  G03G15/04045 ,  G03G15/221 ,  G09B21/02

摘要： A braille printing apparatus utilizes non-impact printing technology to provide high-speed, high-volume production of printed braille materials. The document carrying the information to be printed in braille is scanned and read under the control of a computer. The computer outputs the object information in the form of control signals. In accordance with these control signals, a write head projects a beam of light to form a latent image on the charged surface of a rotating drum. Toner is used to develop the image and transfer it to paper, where it is fused. A coarse-grain toner is used, and is applied in a sufficient quantities thereby produce printed braille materials.

摘要翻译： 盲文打印设备利用非冲击打印技术提供高速，大批量生产印刷盲文材料。 携带打印在盲文中的信息的文件在计算机的控制下被扫描和读取。 计算机以控制信号的形式输出对象信息。 根据这些控制信号，写入头投影光束以在旋转鼓的带电表面上形成潜像。 碳粉用于开发图像并将其转印到纸上，在那里融合。 使用粗粒调色剂，并且以足够的量施加，从而产生印刷的盲文材料。

公开(公告)号：US20120076396A1

公开(公告)日：2012-03-29

申请号：US13312460

申请日：2011-12-06

申请人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method and apparatus are provided for sequentially imaging plural chips formed on a substrate to be inspected to and obtaining inspection images and reference images, calculating a position gap between the inspection images and the reference images using a recipe created in advance by using another substrate of the same kind or type as the substrate, the recipe including information for determining which pattern sections are to be selected and discarded, aligning the inspection images and the reference images using information of the position gap from the calculating step, and comparing the inspection images with the reference images aligned by the aligning step and extracting a defect candidate.

摘要翻译： 提供了一种图案检查方法和装置，用于将形成在要检查的基板上的多个芯片顺序地成像并获得检查图像和参考图像，使用预先通过使用另一个来创建的食谱来计算检查图像与参考图像之间的位置间隙 与基板相同种类或类型的基板，所述配方包括用于确定要选择和丢弃哪些图案部分的信息，使用来自计算步骤的位置间隙的信息对准检查图像和参考图像，并且将检查 具有通过对准步骤对齐的参考图像并提取缺陷候选的图像。

公开(公告)号：US5760460A

公开(公告)日：1998-06-02

申请号：US48249

申请日：1993-04-19

申请人： Masayoshi Koike ,  Masayuki Kuwabara

发明人： Masayoshi Koike ,  Masayuki Kuwabara

IPC分类号： B41J2/45 ,  H01L27/15 ,  H01L33/08 ,  H01L33/12 ,  H01L33/30 ,  H01L33/40 ,  H01L33/44 ,  H01L29/06 ,  H01L23/58

CPC分类号： B41J2/45 ,  H01L27/153

摘要： An array of light-emitting diodes each having a junction between a region of a first conductivity type and a region of a second conductivity type. The array fabrication process offers the elimination of wafer breakage is eliminated and an array with stable optical output power.

摘要翻译： 每个发光二极管的阵列具有第一导电类型的区域和第二导电类型的区域之间的接合点。 阵列制造工艺提供了消除晶片断裂的消除和具有稳定的光输出功率的阵列。

公开(公告)号：US08090187B2

公开(公告)日：2012-01-03

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US07248732B2

公开(公告)日：2007-07-24

申请号：US10691904

申请日：2003-10-22

申请人： Masayuki Kuwabara

发明人： Masayuki Kuwabara

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspection method and apparatus, wherein the target area is limited to a line part, having a simplified configuration and capable of detecting a killer defect as a defect candidate and considerably reducing the number of non-killer defects to be detected as defect candidates, have been disclosed. The present invention relates to a pattern inspection method and apparatus for judging non-matching parts to be defects by making a comparison between the same patterns having a line part in which a line extending in the longitudinal or transverse direction appears repetitively at a fixed pitch, wherein an average level of gray level data is calculated for each pixel columns in the direction in which the line extends, a type of the area of each pixel columns is classified into groups, a threshold value is determined for each area according to the statistical processing result of the type and the difference data of each pixel column, and the difference data is judged based on the threshold value.

摘要翻译： 一种图案检查方法和装置，其中目标区域被限制在线部分，具有简化的配置并且能够检测凶手缺陷作为缺陷候选，并且显着地减少作为缺陷候选的被检测的非杀手缺陷的数量， 已被披露。 本发明涉及一种图案检查方法和装置，用于通过在具有在纵向或横向上延伸的线以固定间距显示的线部分的相同图案之间进行比较来判断不匹配部分为缺陷， 其中针对每个像素列在线延伸的方向上计算灰度级数据的平均水平，每个像素列的区域的类型被分成组，根据统计处理确定每个区域的阈值 每个像素列的类型和差异数据的结果，并且基于阈值来判断差异数据。

公开(公告)号：US06980686B2

公开(公告)日：2005-12-27

申请号：US10067572

申请日：2002-02-04

申请人： Masayuki Kuwabara

发明人： Masayuki Kuwabara

IPC分类号： G01N21/956 ,  G06T1/00 ,  G06T7/00 ,  H01L21/027 ,  H01L21/66 ,  G06K9/00

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： A pattern inspection method and a pattern inspection apparatus, which are able to detect a killer defect as a defect candidate and also reduce considerably the number of non-killer defects detected as a defect candidate, have been disclosed, wherein a differential image of two patterns to be compared is calculated, with the polarities included, and after the absolute value of the differential image is compared with a first threshold value to detect the part as a defect candidate, the polarities of the differential image of the part of the defect candidate are inspected and the part of one of the polarities is judged as a defect candidate.

摘要翻译： 已经公开了一种图案检查方法和图案检查装置，其能够检测作为缺陷候选的凶手缺陷，并且还显着减少作为缺陷候选物检测到的非杀手缺陷的数量，其中两个图案的差分图像 计算出要被比较的极性，并且在将差分图像的绝对值与第一阈值进行比较以检测作为缺陷候选的部分之后，缺陷候选部分的差分图像的极性为 被检查，其中一个极性的部分被判断为缺陷候选。

公开(公告)号：US06650769B1

公开(公告)日：2003-11-18

申请号：US09379171

申请日：1999-08-23

申请人： Masayuki Kuwabara

发明人： Masayuki Kuwabara

IPC分类号： G06K900

CPC分类号： G01N21/9501

摘要： A review station comprising a wafer chuck capable of turning by at least 270 degrees, and an X-Y stage that moves over a distance one-half the diameter of a semiconductor wafer. Each of four regions obtained by dividing the surface of the semiconductor wafer 1 into four areas are successively observed using a stationary microscope 2 by turning the wafer chuck depending upon the coordinates of defective positions of the wafer to review the defects on the whole surface of the wafer.

摘要翻译： 包括能够转动至少270度的晶片卡盘的检查台和移动半导体晶片的直径的一半的X-Y台。 通过使用固定式显微镜2将半导体晶片1的表面分割成四个区域而获得的四个区域中的每个区域依赖于晶片的不良位置的坐标来转动晶片卡盘，以检查晶片卡盘的整个表面上的缺陷 晶圆。

公开(公告)号：US06580502B1

公开(公告)日：2003-06-17

申请号：US09570587

申请日：2000-05-12

申请人： Masayuki Kuwabara

发明人： Masayuki Kuwabara

IPC分类号： G01N2100

CPC分类号： G02B21/0064 ,  G01N21/9501 ,  G01N21/95607 ,  G02B21/0016 ,  G02B21/0028

摘要： An appearance inspection method, and an-apparatus therefor, capable of acquiring high quality in-focus images throughout the entire zone of an inspection object, by acquiring simultaneously two images on different focal planes by.using two TDI cameras (23, 24) having a sensitivity in a respective wavelength band (&lgr;1,&lgr;2), slicing the images in accordance with a region division that is defined in advance, and comparing the images. According to another aspect of this invention, the images are acquired by a confocal microscope constituted by disposing two corresponding pin-holes (37, 38), on the illumination side of a microscope and its light reception side, and one TDI camera (40).

摘要翻译： 一种外观检查方法及其装置，其能够通过使用两个TDI照相机（23,24）同时通过在两个不同的焦平面上同时拍摄两幅图像来获得在检查对象的整个区域内的高质量的对焦图像。 在相应波长带（lambd1，lambd2）中的灵敏度，根据预先定义的区域划分对图像进行切片，并比较图像。 根据本发明的另一方面，通过在显微镜及其光接收侧的照明侧设置两个相应的针孔（37,38）和一个TDI照相机（40）构成的共焦显微镜来获取图像， 。