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公开(公告)号：US09328417B2
公开(公告)日：2016-05-03
申请号：US12609319
申请日：2009-10-30
申请人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
发明人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
IPC分类号： C23C16/458 , C23C16/44 , C23C16/455
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates includes a reaction chamber and an input plenum for receiving source material from gas source containers and delivering a flow of source material into the reaction chamber uniformly distributed across a substrate support width. An output plenum connected between the reaction chamber and a vacuum pump uniformly removes an outflow of material from the reaction chamber across the substrate support width. The input plenum is configured to expand a volume of the source material and deliver the source material to the substrate support area with uniform source material flow distribution across the substrate support width. The output plenum is configured to remove the outflow material across the entire substrate support width and to compress the volume of outflow material prior to the outflow material exiting the output plenum. The resulting source material flow over substrates supported in the substrate support area is uniformly distributed across the substrate support width and unidirectional with a uniform flow velocity. The configuration of the reaction chamber assembly reduces pump down times.
摘要翻译： 适用于在固体基底上形成薄膜沉积层的反应室组件包括反应室和用于从气体源容器接收源材料并且将源材料流输送到均匀分布在基板支撑宽度上的反应室中的输入增压室。 连接在反应室和真空泵之间的输出增压室均匀地去除了跨过基板支撑宽度的材料从反应室流出。 输入增压室被配置为扩大源材料的体积并且将源材料输送到衬底支撑区域，并且在衬底支撑宽度上具有均匀的源材料流分布。 输出增压室构造成在整个衬底支撑宽度上移除流出物料，并在流出物料离开输出增压室之前压缩流出物料的体积。 所产生的源材料流过支撑在基板支撑区域中的基板上，均匀分布在基板支撑宽度上并具有均匀的流动速度的单向。 反应室组件的结构减少了抽空时间。
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公开(公告)号：US09175388B2
公开(公告)日：2015-11-03
申请号：US12609308
申请日：2009-10-30
申请人： Roger R. Coutu , Jill S. Becker , Douwe J. Monsma
发明人： Roger R. Coutu , Jill S. Becker , Douwe J. Monsma
IPC分类号： C23C16/00 , C23C16/44 , C23C16/455
CPC分类号： C23C16/45525 , C23C16/4401 , C23C16/4407 , C23C16/4412 , C23C16/45504 , C23C16/45582
摘要： A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfaces of the outer wall assembly and forming thin film layers thereon. The removable liner encloses a reaction chamber and includes substrate support trays or the like for supporting substrates being coated. Thin film layers are formed onto internal surfaces of the removable liner instead of onto surfaces of the outer wall assembly. The removable liner may be disposable or may comprise stainless steel, which can be removed when contaminated, cleaned by abrasive blasting such as bead blasting, and replaced. Two removable liners can be used to periodically swap removable liners and clean one of the liners while the other is in service with minimal disruption to production coating schedules. Other removable cleanable elements such as input and output plenums, door liners and conduits comprising stainless steel can be periodically removed and cleaned by abrasive blasting.
摘要翻译： 用于薄膜沉积工艺等的反应室组件包括用于封闭外部容积的外壁组件和通过外部孔安装到外部容积中的可移除衬套，用于防止前体或反应物与外部的内表面接触 壁组装和在其上形成薄膜层。 可拆卸的衬垫包围反应室，并且包括用于支撑被涂覆的衬底的衬底支撑托盘等。 薄膜层形成在可拆卸内衬的内表面上，而不是形成在外壁组件的表面上。 可移除衬垫可以是一次性的，或者可以包括不锈钢，其可以在被污染时被去除，通过诸如珠粒喷砂的喷砂处理来清洁并被更换。 两个可拆卸的衬垫可用于周期性地切换可拆卸的衬垫，并清洁其中一个衬垫，而另一个可以使用，而对生产涂层计划的影响最小。 其他可移除的可清洁元件，例如输入和输出增压室，门衬套和包括不锈钢的管道可以通过喷砂周期性地去除和清洁。
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公开(公告)号：US20100183825A1
公开(公告)日：2010-07-22
申请号：US12647821
申请日：2009-12-28
申请人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
发明人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
IPC分类号： C23C16/455
CPC分类号： C23C16/45536 , C23C16/4404 , C23C16/4412 , C23C16/45504 , C23C16/45544 , C23C16/45555 , C23C16/45582 , C23C16/458 , C23C16/4583
摘要： An improved gas deposition chamber includes a hollow gas deposition volume formed with a volume expanding top portion and a substantially constant volume cylindrical middle portion. The hollow gas deposition volume may include a volume reducing lower portion. An aerodynamically shaped substrate support chuck is disposed inside gas deposition chamber with a substrate support surface positioned in the constant volume cylindrical middle portion. The volume expanding top portion reduces gas flow velocity between gas input ports and the substrate support surface. The aerodynamic shape of the substrate support chuck reduces drag and helps to promote laminar flow over the substrate support surface. The volume reducing lower portion helps to increase gas flow velocity after the gas has past the substrate support surface. The improved gas deposition chamber is configurable to 200 mm diameter semiconductor wafers using ALD and or PALD coating cycles. An improved coating method includes expanding process gases inside the deposition chamber prior to the process gas reaching surfaces of a substrate being coated. The method further includes compressing the process gases inside the deposition chamber after the process gas has flowed past surfaces of the substrate being coated.
摘要翻译： 改进的气体沉积室包括形成有体积扩大顶部和基本上恒定体积的圆柱形中间部分的中空气体沉积容积。 中空气体沉积体积可以包括减小体积的下部。 空气动力学形状的基板支撑卡盘设置在气体沉积室内，基板支撑表面位于恒定体积圆柱形中间部分中。 体积扩大的顶部部分减少气体输入端口和基板支撑表面之间的气体流速。 衬底支撑卡盘的空气动力学形状减小了阻力并且有助于促进衬底支撑表面上的层流。 体积减小的下部有助于在气体经过衬底支撑表面之后增加气体流速。 改进的气体沉积室可配置为使用ALD和/或PALD涂层循环的200mm直径的半导体晶片。 改进的涂覆方法包括在处理气体到达被涂覆的基底的表面之前扩展沉积室内的工艺气体。 该方法还包括在处理气体已经流过被涂覆的基底的表面之后压缩沉积室内的处理气体。
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公开(公告)号：US20100166955A1
公开(公告)日：2010-07-01
申请号：US12609319
申请日：2009-10-30
申请人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
发明人： Jill S. Becker , Roger R. Coutu , Douwe J. Monsma
IPC分类号： C23C16/458
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A reaction chamber assembly suitable for forming thin film deposition layers onto solid substrates includes a reaction chamber and an input plenum for receiving source material from gas source containers and delivering a flow of source material into the reaction chamber uniformly distributed across a substrate support width. An output plenum connected between the reaction chamber and a vacuum pump uniformly removes an outflow of material from the reaction chamber across the substrate support width. The input plenum is configured to expand a volume of the source material and deliver the source material to the substrate support area with uniform source material flow distribution across the substrate support width. The output plenum is configured to remove the outflow material across the entire substrate support width and to compress the volume of outflow material prior to the outflow material exiting the output plenum. The resulting source material flow over substrates supported in the substrate support area is uniformly distributed across the substrate support width and unidirectional with a uniform flow velocity. The configuration of the reaction chamber assembly reduces pump down times.
摘要翻译： 适用于在固体基底上形成薄膜沉积层的反应室组件包括反应室和用于从气体源容器接收源材料并且将源材料流输送到均匀分布在基板支撑宽度上的反应室中的输入增压室。 连接在反应室和真空泵之间的输出增压室均匀地去除了跨过基板支撑宽度的材料从反应室流出。 输入增压室被配置为扩大源材料的体积并且将源材料输送到衬底支撑区域，并且在衬底支撑宽度上具有均匀的源材料流分布。 输出增压室构造成在整个衬底支撑宽度上移除流出物料，并在流出物料离开输出增压室之前压缩流出物料的体积。 所产生的源材料流过支撑在基板支撑区域中的基板上，均匀分布在基板支撑宽度上并具有均匀的流动速度的单向。 反应室组件的结构减少了抽空时间。
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公开(公告)号：US20100247763A1
公开(公告)日：2010-09-30
申请号：US12609308
申请日：2009-10-30
申请人： Roger R. Coutu , Jill S. Becker , Douwe J. Monsma
发明人： Roger R. Coutu , Jill S. Becker , Douwe J. Monsma
CPC分类号： C23C16/45525 , C23C16/4401 , C23C16/4407 , C23C16/4412 , C23C16/45504 , C23C16/45582
摘要： A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfaces of the outer wall assembly and forming thin film layers thereon. The removable liner encloses a reaction chamber and includes substrate support trays or the like for supporting substrates being coated. Thin film layers are formed onto internal surfaces of the removable liner instead of onto surfaces of the outer wall assembly. The removable liner may be disposable or may comprise stainless steel, which can be removed when contaminated, cleaned by abrasive blasting such as bead blasting, and replaced. Two removable liners can be used to periodically swap removable liners and clean one of the liners while the other is in service with minimal disruption to production coating schedules. Other removable cleanable elements such as input and output plenums, door liners and conduits comprising stainless steel can be periodically removed and cleaned by abrasive blasting.
摘要翻译： 用于薄膜沉积工艺等的反应室组件包括用于封闭外部容积的外壁组件和通过外部孔安装到外部容积中的可移除衬套，用于防止前体或反应物与外部的内表面接触 壁组装和在其上形成薄膜层。 可拆卸的衬垫包围反应室，并且包括用于支撑被涂覆的衬底的衬底支撑托盘等。 薄膜层形成在可拆卸内衬的内表面上，而不是形成在外壁组件的表面上。 可移除衬垫可以是一次性的，或者可以包括不锈钢，其可以在被污染时被去除，通过诸如珠粒喷砂的喷砂处理来清洁并被更换。 两个可拆卸的衬垫可用于周期性地切换可拆卸的衬垫，并清洁其中一个衬垫，而另一个可以使用，而对生产涂层计划的影响最小。 其他可移除的可清洁元件，例如输入和输出增压室，门衬套和包括不锈钢的管道可以通过喷砂周期性地去除和清洁。
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公开(公告)号：US20120064245A1
公开(公告)日：2012-03-15
申请号：US13203602
申请日：2010-02-26
IPC分类号： C23C16/455
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A gas deposition system (1000) configured as a dual-chamber “tower” includes a frame (1140) for supporting two reaction chamber assemblies (3000), one vertically above the other. Each chamber assembly (3000) includes an outer wall assembly surrounding a hollow chamber (3070) sized to receive a single generation 4.5 (GEN 4.5) glass plate substrate through a load port. The substrate is disposed horizontally inside the hollow chamber (3070) and the chamber assembly (3000) includes removable and cleanable triangular shaped input (3150) and output (3250) plenums disposed external to the hollow chamber (3070) and configured to produce substantially horizontally directed laminar gas flow over a top surface of the substrate. Each chamber includes a cleanable and removable chamber liner assembly (6000) disposed inside the hollow chamber (3070) to contain precursor gases therein thereby preventing contamination of chamber outer walls (3010, 3020, 3030, 3040).
摘要翻译： 构造为双室“塔”的气体沉积系统（1000）包括用于支撑两个反应室组件（3000）的框架（1140），一个垂直地在另一个上方。 每个室组件（3000）包括围绕中空室（3070）的外壁组件，该中空室（3070）的尺寸适于通过负载端口接收单一的4.5（GEN 4.5）玻璃板基板。 基板被水平地设置在中空室（3070）内，并且室组件（3000）包括设置在中空室（3070）外部的可移除和可清洁的三角形输入（3150）和输出（3250）增压室，并且构造成基本上水平地 定向层流气体流过衬底的顶表面。 每个室包括设置在中空室（3070）内部的可清洁且可移除的室衬套组件（6000），以在其中容纳前体气体，从而防止室外壁（3010,3020,3030,3040）的污染。
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公开(公告)号：US09777371B2
公开(公告)日：2017-10-03
申请号：US13203602
申请日：2010-02-26
IPC分类号： C23C16/455 , C23C16/44
CPC分类号： C23C16/4401 , C23C16/45504 , C23C16/45546 , C23C16/45582
摘要： A gas deposition system (1000) configured as a dual-chamber “tower” includes a frame (1140) for supporting two reaction chamber assemblies (3000), one vertically above the other. Each chamber assembly (3000) includes an outer wall assembly surrounding a hollow chamber (3070) sized to receive a single generation 4.5 (GEN 4.5) glass plate substrate through a load port. The substrate is disposed horizontally inside the hollow chamber (3070) and the chamber assembly (3000) includes removable and cleanable triangular shaped input (3150) and output (3250) plenums disposed external to the hollow chamber (3070) and configured to produce substantially horizontally directed laminar gas flow over a top surface of the substrate. Each chamber includes a cleanable and removable chamber liner assembly (6000) disposed inside the hollow chamber (3070) to contain precursor gases therein thereby preventing contamination of chamber outer walls (3010, 3020, 3030, 3040).
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公开(公告)号：US20120141676A1
公开(公告)日：2012-06-07
申请号：US13273417
申请日：2011-10-14
申请人： Michael J. Sershen , Ganesh M. Sundaram , Roger R. Coutu , Jill Svenja Becker , Mark J. Dalberth
发明人： Michael J. Sershen , Ganesh M. Sundaram , Roger R. Coutu , Jill Svenja Becker , Mark J. Dalberth
IPC分类号： C23C16/455 , C23C16/458
CPC分类号： C23C16/45574 , C23C16/4412 , C23C16/453 , C23C16/45544 , C23C16/45551 , C23C16/45557 , C23C16/4584 , C23C16/545
摘要： An ALD coating system (100) includes a fixed gas manifold (710, 1300) disposed over a moving substrate with a coating surface of the substrate facing precursor orifice plate (930). A gas control system (1400) delivers gas or vapor precursors and inert gas into the fixed gas manifold which directs input gases onto a coating surface of the moving substrate. The gas control system includes a blower (1485) interfaced with the gas manifold which draws gas through the gas manifold to remove unused precursors, inert gas and reaction byproduct from the coating surface. The gas manifold is configured segregate precursor gases at the coating surface to prevent the mixing of dissimilar precursors. The gas manifold may also segregate unused precursor gases in the exhaust system so that the unused precursors can be recovered and reused.
摘要翻译： ALD涂覆系统（100）包括设置在移动的基板上的固定气体歧管（710,1300），其具有面向前体孔板（930）的基板的涂层表面。 气体控制系统（1400）将气体或蒸汽前体和惰性气体输送到将输入气体引导到移动基板的涂层表面上的固定气体歧管中。 气体控制系统包括与气体歧管接口的鼓风机（1485），其将气体抽吸通过气体歧管以从涂层表面去除未使用的前体，惰性气体和反应副产物。 气体歧管配置在涂层表面处分离前体气体，以防混合不同的前体。 气体歧管还可以在排气系统中分离未使用的前体气体，使得未使用的前体可以回收和再利用。
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公开(公告)号：US5984267A
公开(公告)日：1999-11-16
申请号：US921059
申请日：1997-08-29
申请人： Roger R. Coutu
发明人： Roger R. Coutu
摘要： A device for isolating and containing gas reactive materials includes a novel valve arrangement that is actuatable in conjunction with the movement of a pre-loaded metal diaphragm. The pre-loaded diaphragm force is sufficient to form a fluid tight seal when the device is disconnected from a gas supply line thereby sealing the interior of the device from the surrounding environment.
摘要翻译： 用于隔离和容纳气体反应性材料的装置包括可与预加载金属隔膜的运动结合起动的新型阀装置。 当装置与气体供应管线分离时，预加载的隔膜力足以形成流体密封，从而将装置的内部与周围环境密封。
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公开(公告)号：US5738335A
公开(公告)日：1998-04-14
申请号：US711525
申请日：1996-09-10
申请人： Roger R. Coutu
发明人： Roger R. Coutu
摘要： A device for isolating and containing gas reactive materials includes a novel valve arrangement that is actuatable in conjunction with the movement of a pre-loaded metal diaphragm. The valve is situated in a housing having an inlet and an outlet fitting, a seat for the diaphragm and a metal tube in contact with the diaphragm to provide fluid communication between the housing and the gas supply to that the pre-loaded diaphragm is opened upon the connection of the gas supply to allow gas flow to the gas reactive material disposed within the housing. The pre-loaded diaphragm force is sufficient to form a fluid tight seal when the device is disconnected from a gas supply line therby sealing the interior of the device from the surrounding enviroment.
摘要翻译： 用于隔离和容纳气体反应性材料的装置包括可与预加载的金属隔膜的运动结合起动的新型阀装置。 阀门位于具有入口和出口配件的壳体中，用于隔膜的座和与隔膜接触的金属管，以在壳体和气体供应之间提供流体连通，使得预加载隔膜被打开 气体供应的连接以允许气体流动到设置在壳体内的气体反应性材料。 当装置与气体供应管线断开连接时，预先加载的隔膜力足以形成流体密封，从而将装置的内部与周围环境密封。
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