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公开(公告)号：US20160195823A1
公开(公告)日：2016-07-07
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela KRUIJT-STEGEMAN , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
Abstract translation: 公开了一种压印光刻设备，其包括布置成保持压印模板的压印模板保持器和被配置为测量压印模板的尺寸和/或形状的变化的多个位置传感器，其中位置传感器与 印记模板 还公开了一种光刻方法，其包括使用压印模板将图案印刷到基板上，以及在将图案压印到基板上的同时测量压印模板的尺寸和/或形状的变化。
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公开(公告)号：US10216101B2
公开(公告)日：2019-02-26
申请号：US15525626
申请日：2015-11-04
Applicant: ASML Netherlands B.V.
Inventor： Han-Kwang Nienhuys , Sjoerd Nicolaas Lambertus Donders , Gosse Charles De Vries , Michael Jozef Mathijs Renkens , Erik Roelof Loopstra
Abstract: A reflector (2) comprising a plate (4) supported by a substrate (8), wherein the plate has a reflective surface (5) and is secured to the substrate by adhesive free bonding, and wherein a cooling channel array (10) is provided in the reflector. The channels (16) of the cooling channel array may be formed from open channels in a surface of the substrate, the open channels being closed by the plate to create the channels.
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公开(公告)号：US10168621B2
公开(公告)日：2019-01-01
申请号：US15523938
申请日：2015-11-10
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Dekkers , Han-Kwang Nienhuys , Michael Jozef Mathijs Renkens
Abstract: An adjustable diffraction grating includes: an optical element and a distortion mechanism. The optical element has an optical surface to receive an input radiation beam. The optical element is provided with a plurality of closed channels below the optical surface, above each closed channel the optical surface being formed from a membrane of material. The distortion mechanism includes one or more actuators that are operable to distort the membranes over the closed channels so as to control the shape of the optical surface and to form a periodic structure on the optical surface which acts as a diffraction grating such that the input radiation beam is diffracted from the optical element to form a plurality of angularly separated sub-beams.
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4.发明申请公开(公告)号：US20150241795A1
公开(公告)日：2015-08-27
申请号：US14430507
申请日：2013-09-12
Applicant: ASML NETHERLANDS B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
Abstract translation: 一种用于校准具有第一方向的标记阵列的编码器刻度的方法，包括相对于第一编码器型传感器，第二编码器型传感器和第三编码器型传感器沿第一方向移动编码器刻度，其中 第一编码器型传感器和第二编码器型传感器在第一方向上相对于彼此以第一距离固定间隔，其中第二编码器型传感器和第三编码器型传感器在第一方向上固定间隔开 在相对于彼此的第二距离处。
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公开(公告)号：US12147162B2
公开(公告)日：2024-11-19
申请号：US18124350
申请日：2023-03-21
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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Patent Agency Ranking
公开(公告)号：US10890851B2
公开(公告)日：2021-01-12
申请号：US15828523
申请日：2017-12-01
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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公开(公告)号：US10712678B2
公开(公告)日：2020-07-14
申请号：US15046284
申请日：2016-02-17
Applicant: ASML NETHERLANDS B.V.
Inventor： Yvonne Wendela Kruijt-Stegeman , Andre Bernardus Jeunink , Arie Jeffrey Den Boef , Vadim Yevgenyevich Banine , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Johan Frederik Dijksman , Carolus Johannes Catharina Schoormans , Adrianus Hendrik Koevoets , Catharinus De Schiffart , Sander Frederik Wuister
IPC: B29C43/58 , G03F9/00 , B82Y10/00 , B82Y40/00 , G03F7/00 , G03F7/20 , B29C43/02 , B29C59/02 , B29C59/16
Abstract: An imprint lithography apparatus is disclosed that includes an imprint template holder arranged to hold an imprint template, and a plurality of position sensors configured to measure change of the size and/or shape of the imprint template, wherein the position sensors are mechanically isolated from the imprint template. Also disclosed is a lithography method that includes using an imprint template to imprint a pattern onto a substrate, and measuring changes of the size and/or shape of the imprint template while imprinting the pattern onto the substrate.
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公开(公告)号：US09952513B2
公开(公告)日：2018-04-24
申请号：US15129360
申请日：2015-03-30
Applicant: ASML Netherlands B.V.
Inventor： Andrey Alexandrovich Nikipelov , Johannes Antonius Gerardus Akkermans , Leonardus Adrianus Gerardus Grimminck , Erik Roelof Loopstra , Michael Jozef Mathijs Renkens , Adrian Toma , Han-Kwang Nienhuys
CPC classification number: G03F7/70025 , G03F7/70008 , H01F6/04 , H01F7/0273 , H01F7/0278 , H01S3/0903 , H05H7/04 , H05H2007/041
Abstract: An undulator for a free electron laser includes a pipe for an electron beam and one or more periodic magnetic structures extending axially along the pipe. Each periodic magnetic structure includes a plurality of magnets and a plurality of passive ferromagnetic elements, the plurality of magnets being arranged alternately with the plurality of passive ferromagnetic elements in a line extending in an axial direction. Each of the plurality of magnets is spatially separated from the pipe, and each of the passive ferromagnetic elements extends radially from an adjacent magnet towards the pipe. A spacer element may be provided between the magnets and the pipe to provide radiation shielding for the magnets and/or cooling for the pipe.
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公开(公告)号：US09606458B2
公开(公告)日：2017-03-28
申请号：US14430507
申请日：2013-09-12
Applicant: ASML Netherlands B.V.
Inventor： Jeroen Dekkers , Andre Bernardus Jeunink , Erik Roelof Loopstra , Engelbertus Antonius Fransiscus Van Der Pasch , Michael Jozef Mathijs Renkens , Carolus Johannes Catharina Schoormans , Peter Hoekstra
CPC classification number: G03F7/70775 , G01D5/2449 , G01D5/34707 , G01D18/00 , G01D18/008 , G03F7/70516
Abstract: A method for calibrating an encoder scale having an array of marks in a first direction, includes moving the encoder scale in the first direction relative to a first encoder-type sensor, a second encoder-type sensor and a third encoder-type sensor, wherein the first encoder-type sensor and the second encoder-type sensor are fixedly spaced in the first direction at a first distance relative to each other, wherein the second encoder-type sensor and the third encoder-type sensor are fixedly spaced in the first direction at a second distance relative to each other.
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公开(公告)号：US11635696B2
公开(公告)日：2023-04-25
申请号：US17120506
申请日：2020-12-14
Applicant: ASML NETHERLANDS B.V.
Inventor： Catharinus De Schiffart , Michael Jozef Mathijs Renkens , Gerard Van Schothorst , Andre Bernardus Jeunink , Gregor Edward Van Baars , Sander Frederik Wuister , Yvonne Wendela Kruijt-Stegeman , Norbert Erwin Therenzo Jansen , Toon Hardeman , George Arie Jan De Fockert , Johan Frederik Dijksman
Abstract: An imprint lithography apparatus having a first frame to be mounted on a floor, a second frame mounted on the first frame via a kinematic coupling, an alignment sensor mounted on the second frame, to align an imprint lithography template arrangement with a target portion of a substrate, and a position sensor to measure a position of the imprint lithography template arrangement and/or a substrate stage relative to the second frame.
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