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公开(公告)号：US20220390832A1
公开(公告)日：2022-12-08
申请号：US17776728
申请日：2020-11-18
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Janardan NATH , Christopher John MASON , Duan-Fu Stephen HSU , Todd R. DOWNEY , Tian GANG
Abstract: A method for source mask optimization or mask only optimization used to image a pattern onto a substrate. The method includes determining a non-uniform illumination intensity profile for illumination; and determining one or more adjustments for the pattern based on the non-uniform illumination intensity profile until a determination that features patterned onto a substrate substantially match a target design. The non-uniform illumination intensity profile may be determined based on an illumination optical system and projection optics of a lithographic apparatus. In some embodiments, the lithographic apparatus includes a slit, and the non-uniform illumination profile is a through slit non-uniform illumination intensity profile. Determining the one or more adjustments for the pattern may include performing optical proximity correction, for example.
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公开(公告)号：US20200073262A1
公开(公告)日：2020-03-05
申请号：US16610103
申请日：2018-05-01
Applicant: ASML HOLDING N.V. , ASML NETHERLANDS B.V.
Inventor： Matthew LIPSON , Christopher John MASON , Damoon SOHRABIBABAHEIDARY , Jimmy Matheus Wilhelmus VAN DE WINKEL , Bert Dirk SCHOLTEN
Abstract: A method of dislodging contamination from a part of an apparatus used in a patterning process, the method including: providing a cleaning substrate into contact with the part of the apparatus while the part is attached to the apparatus, the cleaning substrate comprising a material configured to chemically react with the contamination; and dislodging contamination on the part of the apparatus by chemical reaction between the material and the contamination.
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公开(公告)号：US20210132509A1
公开(公告)日：2021-05-06
申请号：US17049707
申请日：2019-04-03
Applicant: ASML Netherlands B.V. , ASML Holding N.V.
Inventor： Simon Reinald HUISMAN , Tamer Mohamed Tawfik Ahmed Mohamed ELAZHARY , Yuxiang LIN , Vu Quang TRAN , Sebastianus Adrianus GOORDEN , Justin Lloyd KREUZER , Christopher John MASON , Igor Matheus Petronella AARTS , Krishanu SHOME , Irit TZEMAH
Abstract: An alignment sensor apparatus includes an illumination system, a first optical system, a second optical system, a detector system, and a processor. The illumination system is configured to transmit an illumination beam along an illumination path. The first optical system is configured to transmit the illumination beam toward a diffraction target on a substrate. The second optical system includes a first polarizing optic configured to separate and transmit an irradiance distribution. The detector system is configured to measure a center of gravity of the diffraction target based on the irradiance distribution outputted from a first polarization branch and a second polarization branch. The processor is configured to measure a shift in the center of gravity of the diffraction target caused by an asymmetry variation in the diffraction target and determine a sensor response function of the alignment sensor apparatus based on the center of gravity shift.
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Patent Agency Ranking
公开(公告)号：US20230008474A1
公开(公告)日：2023-01-12
申请号：US17773004
申请日：2020-10-05
Applicant: ASML Holding N.V. , ASML Netherlands B.V.
Inventor： Victor Antonio PEREZ-FALCON , Marcus Adrianus VAN DE KERKHOF , Daniel Leslie HALL , Christopher John MASON , Arthur Winfried Eduardus MINNAERT , Johannes Hubertus Josephina MOORS , Samir A. NAYFEH
Abstract: Embodiments herein describe methods, devices, and systems for reducing an electric field at a clamp-reticle interface using an enhanced electrostatic clamp. In particular, the electrostatic clamp includes a clamp body, an electrode layer disposed on a top surface of the clamp body, and a plurality of burls that project from a bottom surface of the clamp body, wherein the electrode layer comprises a plurality of cutouts at predetermined locations that vertically correspond to locations of the plurality of burls at the bottom surface of the clamp body.
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公开(公告)号：US20210053177A1
公开(公告)日：2021-02-25
申请号：US16963576
申请日：2019-01-24
Applicant: ASML NETHERLANDS B.V. , ASML HOLDING N.V.
Inventor： Bert Dirk SCHOLTEN , Satish ACHANTA , Aydar AKCHURIN , Pavlo ANTONOV , Coen Hubertus Matheus BALTIS , Jeroen BOUWKNEGT , Ann-Sophie m. FARLE , Christopher John MASON , Ralph Nicholas PALERMO , Thomas POIESZ , Yuri Johannes Gabriel VAN DE VIJVER , Jimmy Matheus Wilhelmus VAN DE WINKEL
IPC: B24B27/033 , B24B1/04 , B24B7/07 , B24B7/22 , G03F7/20 , H01L21/304
Abstract: A treatment tool for reconditioning the top surfaces of a plurality of projections of a substrate support in a lithographic tool. The treatment tool includes a reconditioning surface which is rough relative to smoothed top surfaces of the projections and which reconditioning surface has material harder than that of the material of the top surfaces of the projections. A reconditioning method involves causing an interaction between the reconditioning surface of the treatment tool and the top surfaces of the projections of the substrate support, so as to leave these top surfaces rougher than they were prior to the interaction.
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公开(公告)号：US20210405539A1
公开(公告)日：2021-12-30
申请号：US17291086
申请日：2019-10-22
Applicant: ASML Holding N.V.
Inventor： Mehmet Ali AKBAS , Tammo UITTERDIJK , Christopher John MASON , Matthew LIPSON , David Hart PETERSON , Michael PERRY , Peter HELMUS , Jerry Jianguo DENG , Damoon SOHRABIBABAHEIDARY
IPC: G03F7/20 , H01L21/687
Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.
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公开(公告)号：US20220134480A1
公开(公告)日：2022-05-05
申请号：US17431538
申请日：2020-02-03
Applicant: ASML Holding N.V.
Inventor： Damoon SOHRABIBABAHEIDARY , Christopher John MASON , Peter HELMUS , Mehmet Ali AKBAS , Bensely ALBERT , Benjamin David DAWSON
IPC: B23K26/352 , G03F7/20 , B23K26/06
Abstract: Methods, computer program products, and apparatuses for reducing sticking during a lithography process are disclosed. An exemplary method of reducing sticking of an object to a modified surface that is used to support the object in a lithography process can include controlling a light source to deliver light to a native surface thereby causing ablation of at least a portion of the native surface to increase the roughness of the native surface thereby forming the modified surface. The increased roughness reduces the ability of the object to stick to the modified surface.
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公开(公告)号：US20240369947A1
公开(公告)日：2024-11-07
申请号：US18773176
申请日：2024-07-15
Applicant: ASML Holding N.V.
Inventor： Mehmet Ali AKBAS , Tammo UITTERDIJK , Christopher John MASON , Matthew LIPSON , David Hart PETERSON , Michael PERRY , Peter HELMUS , Jerry Jianguo DENG , Damoon SOHRABIBABAHEIDARY
IPC: G03F7/00 , H01L21/687
Abstract: A method for reducing sticking of an object to a surface used in a lithography process includes receiving, at a control computer, instructions for a tool configured to modify the surface and forming, in a deterministic manner based on the instructions received at the control computer, a modified surface having a furrow and a ridge, wherein the ridge reduces the sticking by reducing a contact surface area of the modified surface. Another apparatus includes a modified surface that includes furrows and ridges forming a reduced contact surface area to reduce a sticking of an object to the modified surface, the ridges having an elastic property that causes the reduced contact surface area to increase when the plurality of ridges is elastically deformed.
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