Abstract:
A semiconductor is formed on an ETSOI layer, the thin Si layer of an ETSOI substrate, with enhanced channel stress. Embodiments include semiconductor devices having dual stress liners on the back surface of the ETSOI layer. An embodiment includes forming an ETSOI substrate comprising an extra thin layer of Si on a backside substrate with an insulating layer, e.g., a BOX, there between, forming a semiconductor device on the Si surface, removing the backside substrate, as by CMP and the insulting layer, as by wet etching, and forming a stress liner on the backside of the remaining Si layer opposite the semiconductor device. The use of stress liners on the backside of the ETSOI layer enhances channel stress without modifying ETSOI semiconductor process flow.
Abstract:
A method of fabricating a semiconductor device with back side conductive plugs is provided here. The method begins by forming a gate structure overlying a semiconductor-on-insulator (SOI) substrate. The SOI substrate has a support layer, an insulating layer overlying the support layer, an active semiconductor region overlying the insulating layer, and an isolation region outboard of the active semiconductor region. A first section of the gate structure is formed overlying the isolation region and a second section of the gate structure is formed overlying the active semiconductor region. The method continues by forming source/drain regions in the active semiconductor region, and thereafter removing the support layer from the SOI substrate. Next, the method forms conductive plugs for the gate structure and the source/drain regions, where each of the conductive plugs passes through the insulating layer.
Abstract:
A method of fabricating a semiconductor device with back side conductive plugs is provided here. The method begins by forming a gate structure overlying a semiconductor-on-insulator (SOI) substrate. The SOI substrate has a support layer, an insulating layer overlying the support layer, an active semiconductor region overlying the insulating layer, and an isolation region outboard of the active semiconductor region. A first section of the gate structure is formed overlying the isolation region and a second section of the gate structure is formed overlying the active semiconductor region. The method continues by forming source/drain regions in the active semiconductor region, and thereafter removing the support layer from the SOI substrate. Next, the method forms conductive plugs for the gate structure and the source/drain regions, where each of the conductive plugs passes through the insulating layer.
Abstract:
A robot system includes a primary robot frame including a computerized control module providing control commands for the robot system, the primary robot frame including an outer perimeter. The robot system further includes a plurality of submodules, each submodule capable of being selectively docked with the primary robot frame, the submodules each providing different functionality to the robot system. The submodules, when docked with the primary robot frame, fit within the outer perimeter, enabling the robot system to operate in a closed mode, wherein all movement of the robot system is based upon the outer perimeter.
Abstract:
Provided herein are glucagon superfamily peptides conjugated with NHR ligands that are capable of acting at a nuclear hormone receptor. Also provided herein are pharmaceutical compositions and kits of the conjugates of the invention. Further provided herein are methods of treating a disease, e.g., a metabolic disorder, such as diabetes and obesity, comprising administering the conjugates of the invention.
Abstract:
The application provides a method for partitioning a watermark image with western language characters, comprising: partitioning a western language characters image along rows and columns to form a plurality of character image blocks; identifying valid character image blocks from the formed character image blocks; counting sizes of the valid character image blocks to determine if the image corresponds to a document with a large font size or a document with a small font size; dividing words in the image into a plurality of groups, wherein each divided group in the document with large font size has different numbers of words from that with small font size; and dividing equally the divided word groups into multiple portions corresponding to watermark image blocks. The application further provides a device for partitioning a watermark image with western language characters. The operability of watermark embedding process can be ensured through the above technical solution.
Abstract:
Glucagon analogs are disclosed that exhibit both glucagon antagonist and GLP-1 agonist activity. In one embodiment, the glucagon antagonist/GLP-1 agonist comprises a modified amino acid sequence of native glucagon, in which the first one to five N-terminal amino acids of native glucagon is deleted and in which the alpha helix is stabilized.
Abstract:
Methods and structures are described for determining contact resistivities and Schottky barrier heights for conductors deposited on semiconductor wafers that can be combined with combinatorial processing, allowing thereby numerous processing conditions and materials to be tested concurrently. Methods for using multi-ring as well as single-ring CTLM structures to cancel parasitic resistance are also described, as well as structures and processes for inline monitoring of properties.
Abstract:
The present application provides a screen method for intaglio printing, comprising: dividing multiple classes of regions according to a brightness range; and generating screen dots with various screen patterns for the grouped classes of regions. The present application also provides a screen device for intaglio printing, comprising: a dividing module configured to group multiple classes of regions according to the brightness range; and a generating module configured to generate screen dots with various screen patterns for the grouped classes of regions. Since multiple kinds of screen patterns are applied in the technical solutions in present application, the problem, i.e., water ripple will occur in the prior art, may be addressed, so as to improve the quality of printing.
Abstract:
A process for carrying out at least two unit operations in series, the process comprising the step of: (a) directing a feed stream into an integrated assembly which comprises a first microchannel unit operation upon at least one chemical of the feed stream to generate a distributed output stream that exits the first microchannel unit operation in a first set of discrete microchannels isolating flow through the discrete microchannels; and (b) directing the distributed output stream of the first microchannel unit operation into a second microchannel unit operation as a distributed input stream, to continue isolating flow between the first set of discrete microchannels, and conducting at least one operation upon at least one chemical of the input stream to generate a product stream that exits the second microchannel unit operation, where the first microchannel unit operation and the second unit operation share a housing.