公开(公告)号：US11686688B2

公开(公告)日：2023-06-27

申请号：US17131841

申请日：2020-12-23

申请人： CANON KABUSHIKI KAISHA

发明人： Kosuke Asano ,  Hideki Ina

IPC分类号： G01N21/95 ,  G01N21/956 ,  G01N21/88

CPC分类号： G01N21/9501 ,  G01N21/956 ,  G01N2021/888

摘要： An inspection apparatus inspecting a wafer on which a plurality of patterns are formed by a plurality of exposure shots, the inspection apparatus comprising: acquisition unit configured to acquire first information representing a positional relation between an inspection mark included in a pattern formed by a first exposure shot and an inspection mark included in a pattern formed by a second exposure shot, and second information representing a positional relation between the inspection mark included in the pattern formed by the second exposure shot and an inspection mark included in a pattern formed by a third exposure shot; and derivation unit configured to derive a linear component of an error caused by a reticle, and a linear component of an error caused by a position of a wafer, on the basis of the first information and the second information.

公开(公告)号：US11332409B2

公开(公告)日：2022-05-17

申请号：US16694383

申请日：2019-11-25

申请人： CANON KABUSHIKI KAISHA

发明人： Yoshihisa Kawamura ,  Hideki Ina ,  Ryo Yoshida ,  Yukinobu Suzuki ,  Koji Hara ,  Yoshiyuki Nakagawa

IPC分类号： H01L27/146 ,  C04B35/584

摘要： A curved surface constituting a convex surface or a concave surface of each of a plurality of lenses includes at least a silicon nitride layer and another silicon nitride layer. An interlayer having a composition different from a composition of the silicon nitride layer and a composition of the other silicon nitride layer is arranged between the silicon nitride layer and the other silicon nitride layer, and a thickness of the interlayer is less than a thickness of the silicon nitride layer and a thickness of the other silicon nitride layer.

公开(公告)号：US20200172443A1

公开(公告)日：2020-06-04

申请号：US16694383

申请日：2019-11-25

申请人： CANON KABUSHIKI KAISHA

发明人： Yoshihisa Kawamura ,  Hideki Ina ,  Ryo Yoshida ,  Yukinobu Suzuki ,  Koji Hara ,  Yoshiyuki Nakagawa

IPC分类号： C04B35/584 ,  H01L27/146

摘要： A curved surface constituting a convex surface or a concave surface of each of a plurality of lenses includes at least a silicon nitride layer and another silicon nitride layer. An interlayer having a composition different from a composition of the silicon nitride layer and a composition of the other silicon nitride layer is arranged between the silicon nitride layer and the other silicon nitride layer, and a thickness of the interlayer is less than a thickness of the silicon nitride layer and a thickness of the other silicon nitride layer.

公开(公告)号：US20150364291A1

公开(公告)日：2015-12-17

申请号：US14736831

申请日：2015-06-11

申请人： CANON KABUSHIKI KAISHA

发明人： Shigeki Ogawa ,  Hideki Ina ,  Satoru Oishi

IPC分类号： H01J37/20 ,  H01J37/244 ,  H01J37/317

CPC分类号： H01J37/304 ,  H01J37/244 ,  H01J37/3045 ,  H01J37/3174 ,  H01J37/3177 ,  H01J2237/20 ,  H01J2237/30433

摘要： The present invention provides a lithography apparatus which forms a pattern by sequentially irradiating a first region and a second region on a substrate with a beam, the apparatus including a beam detector configured to detect the beam, and a processor configured to obtain position information of the second region by giving a weight to first position information of the second region based on an output from the beam detector before irradiation of the first region with the beam, and giving a weight to second position information of the second region based on an output from the beam detector after the irradiation.

摘要翻译： 本发明提供了一种光刻设备，其通过用光束依次照射衬底上的第一区域和第二区域来形成图案，该设备包括被配置为检测光束的光束检测器，以及处理器，其被配置为获得位置信息 基于来自所述光束检测器的所述第一区域的光束的输出，对所述第二区域的第一位置信息赋予权重，并且基于来自所述第二区域的输出给予所述第二区域的第二位置信息的权重， 光束检测器照射后。

公开(公告)号：US20150331331A1

公开(公告)日：2015-11-19

申请号：US14710882

申请日：2015-05-13

申请人： CANON KABUSHIKI KAISHA

发明人： Koichi Sentoku ,  Wataru Yamaguchi ,  Toshihiko Nishida ,  Hideki Ina

IPC分类号： G03F7/20 ,  G01B11/14

CPC分类号： G01B11/14 ,  G03F7/20 ,  G03F7/70191 ,  G03F9/7088

摘要： Provided is a detection apparatus that detects a mark with a periodic structure and includes an illumination optical system configured to irradiate light on the mark; a light receiving optical system configured to receive a diffracted light from the mark when a relative position between the illumination optical system and the mark is changed in the measurement direction; and a photodetector configured to detect the diffracted light from the light receiving optical system. Here, a numerical aperture of the light receiving optical system in the measurement direction is larger than a numerical aperture of the light receiving optical system in the non-measurement direction in the plane on which the mark is formed.

摘要翻译： 提供一种检测装置，其检测具有周期性结构的标记，并且包括被配置为将光照射在标记上的照明光学系统; 光接收光学系统，被配置为当所述照明光学系统和所述标记之间的相对位置在所述测量方向上改变时，从所述标记接收衍射光; 以及被配置为检测来自光接收光学系统的衍射光的光电检测器。 这里，受光光学系统在测量方向的数值孔径大于在其上形成有标记的平面中的非测量方向的光接收光学系统的数值孔径。

公开(公告)号：US20140322654A1

公开(公告)日：2014-10-30

申请号：US14263725

申请日：2014-04-28

申请人： CANON KABUSHIKI KAISHA

发明人： Koichi Sentoku ,  Hideki Ina

IPC分类号： G03F7/20 ,  H01J37/317

CPC分类号： G03F7/2037 ,  H01J37/3174 ,  H01J2237/202 ,  H01J2237/20292 ,  H01J2237/30438

摘要： A lithography apparatus for substrate patterning, includes a substrate stage having a reference mark, an optical system irradiating the substrate with the charged particle beam, a first measurement device measuring a position of an alignment mark formed on the substrate, a second measurement device having an optical axis apart from an axis of the optical system by a distance shorter than that of the first measurement device, and measuring a position of the reference mark, a processor obtaining a base line of the first measurement device based on positions of the reference mark respectively measured by the first and second measurement device and a base line of the second measurement device, the position of the reference mark being measured by the second measurement device based on an optical signal obtained via the reference mark with the stage moved.

摘要翻译： 一种用于衬底图案化的光刻设备，包括具有参考标记的衬底台，用带电粒子束照射衬底的光学系统，测量形成在衬底上的对准标记的位置的第一测量装置，具有 光轴离开光学系统的轴距离比第一测量装置的距离短，并且测量参考标记的位置，处理器基于参考标记的位置获得第一测量装置的基线 由第一测量装置和第二测量装置测量的第二测量装置的基线，基准标记的位置由第二测量装置基于通过参考标记获得的光信号被移动。

公开(公告)号：US20140320836A1

公开(公告)日：2014-10-30

申请号：US14263684

申请日：2014-04-28

申请人： CANON KABUSHIKI KAISHA

发明人： Wataru Yamaguchi ,  Koichi Sentoku ,  Satoru Oishi ,  Toshihiko Nishida ,  Go Tsuchiya ,  Hideki Ina

IPC分类号： G03F7/20

CPC分类号： G03F7/70133

摘要： An apparatus includes an optical system configured to irradiate a surface of a substrate with a beam, a control unit configured to control a position of the irradiation of the beam, and a first measurement unit and a second measurement unit each configured to measure a position of a mark formed on the substrate. The second measurement unit is placed at a position closer to an optical axis of the optical system than the first measurement unit is. Based on a position measurement value measured by the first measurement unit and position measurement values measured at different timings by the second measurement unit, the control unit controls the position of the beam irradiated to the substrate. The position measurement values measured at the different timings are values obtained from the same mark or values obtained from two marks adjacent to a common shot area.

摘要翻译： 一种装置包括配置成用光束照射基板的表面的光学系统，被配置为控制光束的照射位置的控制单元，以及第一测量单元和第二测量单元，每个测量单元和第二测量单元被配置成测量位置 形成在基板上的标记。 第二测量单元被放置在比第一测量单元更靠近光学系统的光轴的位置。 基于由第一测量单元测量的位置测量值和由第二测量单元在不同定时测量的位置测量值，控制单元控制照射到基板的光束的位置。 在不同定时测量的位置测量值是从与公共射击区域相邻的两个标记获得的相同标记或值获得的值。

公开(公告)号：US20130171570A1

公开(公告)日：2013-07-04

申请号：US13721540

申请日：2012-12-20

申请人： CANON KABUSHIKI KAISHA

发明人： Koichi Sentoku ,  Hideki Ina ,  Wataru Yamaguchi ,  Nobushige Korenaga

IPC分类号： G21K5/08 ,  G03F7/20

CPC分类号： G21K5/08 ,  G03F7/20 ,  H01J37/20 ,  H01J37/3045 ,  H01J2237/20292

摘要： The present invention provides a drawing apparatus including a stage having a reference mark, and configured to hold a substrate and to be moved, a charged particle optical system, a first measuring device having an optical axis spaced apart from an axis of the charged particle optical system by a first distance and configured to measure a position of an alignment mark formed on the substrate, a second measuring device having an optical axis spaced apart from the axis of the charged particle optical system by a second distance and configured to measure a position of the reference mark, and a processor configured to obtain a baseline of the first measuring device based on positions of the reference mark respectively measured by the first measuring device and the second measuring device.

摘要翻译： 本发明提供了一种绘图装置，包括具有参考标记的台，并且被配置为保持基板并被移动，带电粒子光学系统，具有与带电粒子光轴的轴线间隔开的光轴的第一测量装置 系统，第一距离并且被配置为测量形成在基板上的对准标记的位置，第二测量装置，其具有与带电粒子光学系统的轴线间隔开第二距离的光轴，并且被配置为测量位置 参考标记，以及被配置为基于分别由第一测量装置和第二测量装置测量的参考标记的位置来获得第一测量装置的基线的处理器。

公开(公告)号：US20130107279A1

公开(公告)日：2013-05-02

申请号：US13648356

申请日：2012-10-10

申请人： CANON KABUSHIKI KAISHA

发明人： Wataru Yamaguchi ,  Hideki Ina

IPC分类号： G02B21/06 ,  B01J19/12 ,  G01B11/14

CPC分类号： G03F9/7069 ,  G02B21/08 ,  H01J37/09 ,  H01J37/22 ,  H01J37/26

摘要： The present invention provides an apparatus including an aperture stop including a first aperture configured to define an illumination condition for illuminating an illumination surface to a first condition, and a second aperture configured to define the illumination condition to a second condition, and fixed on a pupil plane of an illumination optical system, a light shielding plate, and a driving unit configured to positions the light shielding plate such that a shielding region shields a second path extending from a light source to the illumination surface through the second aperture, when setting the illumination condition to the first condition, and positions the light shielding plate such that the shielding region shields a first path extending from the light source to the illumination surface through the first aperture, when setting the illumination condition to the second condition.

摘要翻译： 本发明提供了一种装置，其包括孔径光阑，其包括被配置为将照明表面照射到第一状态的照明条件的第一孔和被配置为将照明条件限定到第二状态并且固定在瞳孔上的第二孔 照明光学系统的平面，遮光板和驱动单元，其被配置为将遮光板定位成使得屏蔽区域在设置照明时屏蔽从光源延伸到照明表面的第二路径 并且将遮光板定位成使得当将照明条件设定为第二状态时，屏蔽区域将通过第一孔径从光源延伸到照明表面的第一路径屏蔽。

公开(公告)号：US11543755B2

公开(公告)日：2023-01-03

申请号：US17206563

申请日：2021-03-19

申请人： CANON KABUSHIKI KAISHA

发明人： Takehiro Toyoda ,  Hiroaki Kobayashi ,  Hideki Ina ,  Kosuke Asano ,  Kouki Miyano

IPC分类号： G03F7/20

摘要： A method of manufacturing a semiconductor device by using an exposure apparatus having a reticle stage and a projection optical system includes a first period in which substrates are exposed by using a first reticle arranged on the reticle stage, a second period in which substrates are exposed by using a second reticle arranged on the reticle stage, and a third period which is between the first and second periods. The method includes changing, in at least part of the third period, the first reticle arranged on the reticle stage to the second reticle, and performing control, in the first and second periods, to adjust temperature distribution of an optical element of the projection optical system so as to reduce change in aberration of the projection optical system. The third period is shorter than the first period.