公开(公告)号：US20140121292A1

公开(公告)日：2014-05-01

申请号：US14139971

申请日：2013-12-24

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Kyouhei SAKITA ,  Hiroyuki YONEZAWA

IPC: C08F22/10

CPC classification number: C09D4/00 ,  C08F2220/1833

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising at least one kind of polymerizable monomer selected from the following compounds and a photopolymerization initiator;

Abstract translation: 提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。 公开了一种用于印痕的可固化组合物，其包含选自以下化合物和光聚合引发剂中的至少一种可聚合单体;

公开(公告)号：US20210060913A1

公开(公告)日：2021-03-04

申请号：US17094971

申请日：2020-11-11

Applicant: FUJIFILM Corporation

Inventor： Aki NAKAMICHI ,  Hiroyuki YONEZAWA

IPC: B32B27/30 ,  B32B7/12 ,  B32B23/08

Abstract: An antifogging laminate includes a coating layer on a water absorbent film, in which a water absorption rate of the water absorbent film is 1% or more and 50% or less, and the coating layer contains a water absorbent resin and inorganic oxide particles.

公开(公告)号：US20240139686A1

公开(公告)日：2024-05-02

申请号：US18395615

申请日：2023-12-24

Applicant: FUJIFILM Corporation

Inventor： Hiroyuki YONEZAWA

IPC: B01D67/00 ,  B01D69/02 ,  B01L3/00 ,  G03F7/00 ,  G03F7/038 ,  G03F7/039 ,  G03F7/40

CPC classification number: B01D67/0034 ,  B01D69/02 ,  B01L3/502753 ,  G03F7/0382 ,  G03F7/0385 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/40 ,  G03F7/70008 ,  B01D2325/0283 ,  B01D2325/04 ,  B01L2300/0681

Abstract: An object of the present invention is to provide a resin membrane filter having excellent separation accuracy and excellent toughness, and a manufacturing method of the resin membrane filter.
The resin membrane filter of the present invention includes a first main surface, a second main surface, and a plurality of through-holes, in which, in the through-hole, in a case where an average area of an opening portion at a position A which is located at a distance of 10% of a thickness of the resin membrane filter from the first main surface is denoted as Sva and an average area of an opening portion at a position B which is located at a distance of 90% of the thickness of the resin membrane filter from the first main surface is denoted as Svb, 0.8≤Sva/Svb≤1.25, a number ratio Ra of through-holes in which an area of the opening portion at the position A is more than 1.25 times Sva is 3.0% or less, and a number ratio Rb of through-holes in which an area of the opening portion at the position B is more than 1.25 times Svb is 3.0% or less.

公开(公告)号：US20150014894A1

公开(公告)日：2015-01-15

申请号：US14504583

申请日：2014-10-02

Applicant: FUJIFILM Corporation

Inventor： Kunihiko KODAMA ,  Kyouhei SAKITA ,  Hiroyuki YONEZAWA

IPC: C08F222/20 ,  C08F222/24 ,  B29C59/00 ,  G03F7/004 ,  B05D5/00 ,  C08F222/14 ,  C08F220/18

CPC classification number: C08F222/20 ,  B05D5/00 ,  B29C59/005 ,  B29K2033/04 ,  B29K2105/0085 ,  B82Y10/00 ,  B82Y40/00 ,  C08F2/48 ,  C08F220/18 ,  C08F222/14 ,  C08F222/24 ,  C09D4/00 ,  G03F7/0002 ,  G03F7/004

Abstract: Provided is a curable composition for imprints having good patternability and dry etching resistance. Disclosed is a curable composition for imprints comprising a polymerizable monomer (Ax) having a substituent having an aromatic group and having a molecular weight of 100 or more, and a photopolymerization initiator.

Abstract translation: 提供了具有良好的图案性和耐干蚀刻性的用于印痕的可固化组合物。 公开了一种用于印痕的可固化组合物，其包含具有芳基且具有100以上分子量的取代基的可聚合单体（Ax）和光聚合引发剂。

公开(公告)号：US20240149197A1

公开(公告)日：2024-05-09

申请号：US18395613

申请日：2023-12-24

Applicant: FUJIFILM Corporation

Inventor： Hiroyuki YONEZAWA

IPC: B01D39/16 ,  G03F7/038 ,  G03F7/039 ,  G03F7/32 ,  G03F7/34

CPC classification number: B01D39/1692 ,  G03F7/038 ,  G03F7/039 ,  G03F7/322 ,  G03F7/34 ,  B01D2239/10 ,  B01D2239/1291

Abstract: An object of the present invention is to provide a resin membrane filter having excellent separation accuracy, toughness, and filtration speed, and a manufacturing method of the resin membrane filter.
The resin membrane filter of the present invention includes a first main surface, a second main surface, and a plurality of through-holes, in which the resin membrane filter is a single membrane, in the through-hole, in a case where an average area of an opening portion at a position A which is located at a distance of 10% of a thickness of the resin membrane filter from the first main surface is denoted as Sva and an average area of an opening portion at a position B which is located at a distance of 90% of the thickness of the resin membrane filter from the first main surface is denoted as Svb, Sva/Svb

公开(公告)号：US20210032496A1

公开(公告)日：2021-02-04

申请号：US17069139

申请日：2020-10-13

Applicant: FUJIFILM Corporation

Inventor： Hiroyuki YONEZAWA ,  Aki Nakamichi ,  Takuya Kitamura ,  Yusuke Hatanaka

IPC: C09D183/02 ,  C09D139/06 ,  C09D7/61 ,  C09D7/40 ,  C09D7/20 ,  C09D5/00 ,  F21S45/00 ,  G02B1/18 ,  B32B27/36 ,  B32B27/30

Abstract: A coating agent includes a hydrolyzate of a compound represented by General Formula (1), silica particles, a high boiling point solvent having a boiling point of 120° C. or higher, and a resin having a pyrrolidone group in a side chain. In General Formula (1), R1, R2, R3, and R4 each independently represent a monovalent organic group having 1 to 6 carbon atoms. n represents an integer of 1 to 20,

公开(公告)号：US20170115564A1

公开(公告)日：2017-04-27

申请号：US15399741

申请日：2017-01-06

Applicant: FUJIFILM CORPORATION

Inventor： Hiroyuki YONEZAWA ,  Kyouhei SAKITA

IPC: G03F7/031 ,  G03F7/40 ,  G03F7/38 ,  G03F7/32 ,  G03F7/16 ,  G03F7/20

CPC classification number: G03F7/031 ,  C08F2/48 ,  C08F222/1006 ,  C08F222/16 ,  C08F222/385 ,  G02F1/133345 ,  G03F7/027 ,  G03F7/0755 ,  G03F7/162 ,  G03F7/168 ,  G03F7/2002 ,  G03F7/322 ,  G03F7/38 ,  G03F7/40 ,  G06F3/041 ,  G06F3/0412 ,  G06F2203/04103 ,  H01L51/50 ,  H05B33/22

Abstract: An object is to provide a photosensitive composition capable of obtaining a cured film having excellent reliability even when being heated at a low temperature and patterning by photolithography.A photosensitive composition of the present invention includes a polymerizable monomer having three or more (meth)acryloyl groups and one or more carboxy groups in a molecule as Component A, a polymerizable monomer having three or more (meth)acryloyl groups and not having a carboxy group in a molecule as Component B, a photopolymerization initiator as Component C, a solvent as Component D, a blocked isocyanate compound as Component N, and a polymerization inhibitor as Component K, in which a content of Component A is 10% to 50% by mass with respect to a total content of Component A and Component B.