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1.发明授权
公开(公告)号：US5925887A
公开(公告)日：1999-07-20
申请号：US942698
申请日：1997-09-30
申请人： Fumio Sakai , Kazuhito Outsuka , Yuichi Yamada , Kazuhiro Takahashi , Yasuo Hasegawa , Hideki Nogawa , Shinji Utamura
发明人： Fumio Sakai , Kazuhito Outsuka , Yuichi Yamada , Kazuhiro Takahashi , Yasuo Hasegawa , Hideki Nogawa , Shinji Utamura
IPC分类号： G03F7/20 , G03F7/207 , H01L21/027 , G01N21/86
CPC分类号： G03F7/70558 , G03F7/70133 , G03F7/70241 , G03F7/706
摘要： A projection exposure apparatus including a projection optical system for projecting a pattern of a reticle onto a substrate, an optical characteristic detecting device for detecting a change in optical characteristic of the projection optical system, which change may result from the projection of the reticle pattern onto the substrate through the projection optical system, and a light detecting device for detecting at least one of (i) an intensity distribution of light from the reticle pattern, at a position adjacent to the reticle or adjacent to an imaging plane on which the reticle is to be imaged, and (ii) an intensity distribution of the light from the reticle pattern, at a position adjacent to a pupil plane of the projection optical system, wherein the optical characteristic detecting device is arranged to detect the amount of change in optical characteristic in accordance with the intensity distribution detected by the light detecting device.
摘要翻译： 一种投影曝光装置，包括用于将掩模版图案投射到基板上的投影光学系统，用于检测投影光学系统的光学特性变化的光学特性检测装置，该变化可能由于将标线图案投影到 通过投影光学系统的基板，以及光检测装置，用于检测（i）来自标线图案的光的强度分布中的至少一个，在与该掩模版相邻的位置或与该掩模版在其上的成像平面相邻的位置 以及（ii）在与投影光学系统的光瞳平面相邻的位置处的来自光罩图案的光的强度分布，其中光学特性检测装置被设置为检测光学特性的变化量 根据由光检测装置检测的强度分布。
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2.发明授权公开(公告)号：US08564758B2
公开(公告)日：2013-10-22
申请号：US12397625
申请日：2009-03-04
CPC分类号： G03B27/42 , G03B27/32 , G03F7/70258 , G03F7/706
摘要： The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
摘要翻译： 本发明提供了一种曝光装置，其包括地图获取单元，其被配置为获得表示通过分割投影光学系统的光瞳平面而获得的多个区域中产生的每个光学特性的波动的饱和度的光瞳像差图， 在以单位光量照射多个区域的情况下，分配获取单元被配置为在以任意照明模式照亮任意掩模版的图案时获得形成在投影光学系统的光瞳面上的光强度分布，以及 计算单元，被配置为基于获得的光瞳像差图和所获得的光强度分布来计算在任意照明模式下照亮任意掩模版的图案时在投影光学系统中产生的每个光学特性的波动的饱和度值 。
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3.发明申请EXPOSURE APPARATUS, EXPOSURE METHOD, CALCULATION METHOD, AND DEVICE FABRICATION METHOD 有权曝光装置，曝光方法，计算方法和装置制造方法公开(公告)号：US20090225293A1
公开(公告)日：2009-09-10
申请号：US12397625
申请日：2009-03-04
CPC分类号： G03B27/42 , G03B27/32 , G03F7/70258 , G03F7/706
摘要： The present invention provides an exposure apparatus including a map obtaining unit configured to obtain a pupil aberration map representing saturation values of fluctuations in each of optical characteristics generated in a plurality of regions, which are obtained by dividing a pupil plane of a projection optical system, upon irradiating the plurality of regions with a unit amount of light, a distribution obtaining unit configured to obtain a light intensity distribution formed on the pupil plane of the projection optical system upon illuminating a pattern of an arbitrary reticle in an arbitrary illumination mode, and a calculation unit configured to calculate a saturation value of a fluctuation in each of the optical characteristics generated in the projection optical system upon illuminating the pattern of the arbitrary reticle in the arbitrary illumination mode, based on the obtained pupil aberration map and the obtained light intensity distribution.
摘要翻译： 本发明提供了一种曝光装置，其包括地图获取单元，其被配置为获得表示通过分割投影光学系统的光瞳平面而获得的多个区域中产生的每个光学特性的波动的饱和度的光瞳像差图， 在以单位光量照射多个区域的情况下，分配获取单元被配置为在以任意照明模式照亮任意掩模版的图案时获得形成在投影光学系统的光瞳面上的光强度分布，以及 计算单元，被配置为基于获得的光瞳像差图和所获得的光强度分布来计算在任意照明模式下照亮任意掩模版的图案时在投影光学系统中产生的每个光学特性的波动的饱和度值 。
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公开(公告)号：US5968318A
公开(公告)日：1999-10-19
申请号：US94829
申请日：1998-06-15
申请人： Yasuo Hasegawa , Kenji Inoue
发明人： Yasuo Hasegawa , Kenji Inoue
CPC分类号： D21F3/0227 , D21F3/0236 , Y10S162/901
摘要： A shoe press belt for the shoe press of a paper making machine includes first and second resin layers and a base layer. Resin is coated and cured on the polished surface of a cylindrical mandrel to form the first resin layer endlessly. An inner layer of the base layer is formed by spirally winding a relatively narrower belt shaped mesh with warp threads running in the major direction of the belt and weft threads running perpendicular thereto, with the weft threads against the outer surface of the first resin layer, and without overlapping the end edges of the belt-shaped mesh. An outer layer of the base layer is formed by inserting the mandrel, with the first resin layer and the belt-shaped mesh layer applied, into a tubular mesh, and pulling the ends of the tubular mesh apart, so as to reduce its diameter and press it radially against the belt-shaped mesh layer. A second resin layer is then applied over the base layer and impregnates the base layer down to the outer surface of the first resin layer, so that the base layer is included within the second resin layer when the second resin layer is cured.
摘要翻译： 用于造纸机的靴式压榨机的靴形压榨带包括第一和第二树脂层和基底层。 树脂在圆柱形心轴的抛光表面上被涂覆和固化，从而形成第一树脂层。 基层的内层通过螺旋卷绕相对较窄的带状网，通过沿着主带方向延伸的经线和垂直于其的纬纱螺旋卷绕，纬纱相对于第一树脂层的外表面， 并且不重叠带状网的端边缘。 基层的外层通过将第一树脂层和带状网层施加到管状网中并将管状网的端部分开来将芯棒插入，从而减小其直径和 将其径向按压在带状网格层上。 然后将第二树脂层施加在基层上，并将基底层浸渍到第一树脂层的外表面，使得当第二树脂层固化时，基层包含在第二树脂层内。
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公开(公告)号：US08562497B2
公开(公告)日：2013-10-22
申请号：US12532734
申请日：2008-02-26
申请人： Akira Tanizaki , Akira Takase , Yukio Kawasaki , Shiro Murai , Kinya Nakamura , Fumihiro Kamikonya , Yasuo Hasegawa
发明人： Akira Tanizaki , Akira Takase , Yukio Kawasaki , Shiro Murai , Kinya Nakamura , Fumihiro Kamikonya , Yasuo Hasegawa
CPC分类号： B23Q1/015 , B23Q11/0891 , Y10T29/50 , Y10T409/30392 , Y10T409/304088 , Y10T409/308288 , Y10T409/309576 , Y10T409/309912 , Y10T483/115 , Y10T483/1795
摘要： A machine tool including a base frame, a workpiece table, a machining unit, and a connection portion is disclosed. The base frame has a machining area. The base frame includes two left and right side frames and a connection frame connecting the two side frames. The workpiece table is arranged on the base frame in the machining area. The machining unit is arranged on an upper portion of the base frame and includes a spindle device. A connection portion connects the machining unit and the base frame in a detachable manner.
摘要翻译： 公开了一种包括基架，工件台，加工单元和连接部的机床。 底座有一个加工区域。 底架包括两个左右侧框架和连接两个侧框架的连接框架。 工件台位于加工区域的基架上。 加工单元布置在基架的上部并且包括主轴装置。 连接部分以可拆卸的方式连接加工单元和基架。
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公开(公告)号：US08035804B2
公开(公告)日：2011-10-11
申请号：US12098637
申请日：2008-04-07
申请人： Tadashi Arai , Yasuo Hasegawa
发明人： Tadashi Arai , Yasuo Hasegawa
CPC分类号： G03B27/54 , G03F7/70941
摘要： A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction.
摘要翻译： 公开了一种曝光基板的扫描曝光装置。 该装置包括被配置为照亮原件的照明区域的照明系统，被配置为将原稿的图案投影到基板上的投影光学系统，以及被配置为屏蔽来自突起的火炬光的火炬产生部件 光学系统到基板，并且通过剩余部分的耀斑光。 止动件的开口具有与照明区域的形状不同的形状，并且止动件的孔径包括其平行于基板的扫描方向的第一方向上的尺寸根据与基板的扫描方向的距离而变化的部分， 所述孔在垂直于所述第一方向的第二方向上。
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公开(公告)号：US20080259307A1
公开(公告)日：2008-10-23
申请号：US12098637
申请日：2008-04-07
申请人： Tadashi Arai , Yasuo Hasegawa
发明人： Tadashi Arai , Yasuo Hasegawa
IPC分类号： G03B27/54
CPC分类号： G03B27/54 , G03F7/70941
摘要： A scanning exposure apparatus which exposes a substrate is disclosed. The apparatus comprises an illumination system configured to illuminate an illumination region of an original, a projection optical system configured to project a pattern of the original onto the substrate, and a stop configured to shield a flare generating component of flare light which travels from the projection optical system to the substrate, and to pass the remaining component of the flare light. An aperture of the stop has a shape different from a shape of the illumination region, and the aperture of the stop includes a portion whose dimension in a first direction parallel to a scanning direction of the substrate changes in accordance with a distance from the center of the aperture in a second direction perpendicular to the first direction.
摘要翻译： 公开了一种曝光基板的扫描曝光装置。 该装置包括被配置为照亮原件的照明区域的照明系统，被配置为将原稿的图案投影到基板上的投影光学系统，以及被配置为屏蔽来自突起的火炬光的火炬产生部件 光学系统到基板，并且通过剩余部分的耀斑光。 止动件的开口具有与照明区域的形状不同的形状，并且止动件的孔径包括其平行于基板的扫描方向的第一方向上的尺寸根据与基板的扫描方向的距离而变化的部分， 所述孔在垂直于所述第一方向的第二方向上。
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公开(公告)号：US07145632B2
公开(公告)日：2006-12-05
申请号：US11232987
申请日：2005-09-23
申请人： Shinichi Hara , Eiji Sakamoto , Yoshinori Miwa , Yasuo Hasegawa , Yoshiki Kino
发明人： Shinichi Hara , Eiji Sakamoto , Yoshinori Miwa , Yasuo Hasegawa , Yoshiki Kino
IPC分类号： G03B27/42
CPC分类号： G03F7/70891 , G03B27/52
摘要： A cooling apparatus arranged in a vacuum or reduced pressure atmosphere for use with an optical element having an illuminated area onto which light is irradiated concave part includes a temperature variation mechanism that changes a temperature of part of the cooling apparatus in a non-contact manner.
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公开(公告)号：US5140220A
公开(公告)日：1992-08-18
申请号：US240416
申请日：1988-09-01
申请人： Yasuo Hasegawa
发明人： Yasuo Hasegawa
CPC分类号： F21V3/00 , F21V17/04 , F21V5/00 , H01L33/54 , F21Y2101/00 , H01L33/58 , Y10S362/80
摘要： An improved light emitting diode housing member comprises a transparent housing that can extend over the light emitting surface of the LED and can position a plurality of granular optical particles, such as calcium fluoride, over the source of light to provide a diffusion of the emitted light, thereby increasing its viewing angle.
摘要翻译： 改进的发光二极管外壳构件包括可在LED的发光表面上延伸的透明外壳，并且可以在光源上定位多个颗粒状光学颗粒（例如氟化钙），以提供发射光的扩散 ，从而增加其视角。
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公开(公告)号：US4814948A
公开(公告)日：1989-03-21
申请号：US69295
申请日：1987-07-02
申请人： Yasuo Hasegawa
发明人： Yasuo Hasegawa
CPC分类号： G09F9/305 , G02B6/4298 , G02B6/3644
摘要： A mounting mechanism is provided for the light-discharging-end portion of an optical fiber onto an optical display panel wherein the fiber end is disposed within a threaded body that is inserted through the display panel and held in place by a nut. Alternatively, the nut can be formed of transparent light-diffusing material and configured to completely enclose the end of the thread body that projects out beyond the display panel to diffuse the light emanating therefrom.
摘要翻译： 在光学显示面板上设置用于光纤的光放电端部的安装机构，其中光纤端设置在螺纹体内，该螺纹体插入显示面板并通过螺母保持就位。 或者，螺母可以由透明光扩散材料形成，并被构造成完全包围突出到显示面板之外的螺纹体的端部以扩散从其发出的光。
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