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1.发明申请FLUID HANDLING STRUCTURE, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTUIRNG METHOD 审中-公开流体处理结构，平面设备和设备制造方法公开(公告)号：US20100060868A1
公开(公告)日：2010-03-11
申请号：US12550481
申请日：2009-08-31
申请人： Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
发明人： Gheorghe Tanasa , Nicolaas Ten Kate , Johannes Petrus Martinus Bernardus Vermeulen , Danny Maria Hubertus Philips , Maikel Adrianus Cornelis Schepers , Laurentius Johannes Adrianus Van Bokhoven
CPC分类号： G03F7/70341 , Y10T137/87169
摘要： A fluid handling structure is disclosed which is designed for all wet immersion lithography. The fluid handling structure has a first opening to provide fluid to a space between a final element of a projection system and a substrate and/or substrate table, a barrier to resist the flow of liquid out of the space between the fluid handling structure and the substrate, and a second opening, which opens into an area radially outwardly of the space, to provide a flow of fluid from the fluid handling structure onto a top surface of the substrate and/or substrate table radially outwardly of the space. A controller may be provided such that flow of fluid towards a center of the substrate table is greater than the flow of fluid in a direction away from the center of the substrate table.
摘要翻译： 公开了一种流体处理结构，其被设计用于所有湿式浸渍光刻。 流体处理结构具有第一开口以将流体提供到投影系统的最终元件与基板和/或基板台之间的空间，阻挡液体流出流体处理结构和流体处理结构之间的空间的屏障 基板和第二开口，该第二开口通向该空间的径向外侧的区域，以将流体从流体处理结构提供到该空间的径向向外的基板和/或基板台的顶表面上。 可以设置控制器，使得朝向衬底台的中心的流体流大于离开衬底台的中心的方向的流体流动。
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公开(公告)号：US08730448B2
公开(公告)日：2014-05-20
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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公开(公告)号：US20120229783A1
公开(公告)日：2012-09-13
申请号：US13409752
申请日：2012-03-01
申请人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
发明人： Han-Kwang Nienhuys , Martinus Agnes Willem Cuijpers , Nicolaas Ten Kate , Leon Martin Levasier , Jan Bernard Plechelmus Van Schoot , Yuri Johannes Gabriël Van De Vijver , Oleg Viacheslavovich Voznyi , Franciscus Johannes Joseph Janssen , Danny Maria Hubertus Philips , Marcio Alexandre Cano Miranda , Oleksiy Galaktionov , Manish Ranjan , Albert Pieter Rijpma , Kursat Bal , Laurentius Johannes Adrianus Van Bokhoven , Roger Wilhelmus Antonius Henricus Schmitz , Alain Louis Claude Leroux
IPC分类号： G03B27/52
CPC分类号： G03F7/70933 , G03F7/70875 , G03F7/70891
摘要： A lithographic apparatus includes a substrate table constructed to hold a substrate, a projection system configured to project a patterned radiation beam through an opening and onto a target portion of the substrate, and a conduit having an outlet in the opening. The conduit is configured to deliver gas to the opening. The lithographic apparatus further includes a cooling apparatus controlled by a control system. The cooling apparatus is configured to cool the gas such that gas which travels from the opening to the substrate has a predetermined temperature when the gas is incident upon the substrate.
摘要翻译： 光刻设备包括被构造成保持基板的基板台，配置成将图案化的辐射束投射通过开口并到达基板的目标部分的投影系统，以及在开口中具有出口的导管。 导管构造成将气体输送到开口。 光刻设备还包括由控制系统控制的冷却装置。 冷却装置构造成冷却气体，使得当气体入射到基板上时，从开口行进到基板的气体具有预定温度。
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公开(公告)号：US09625828B2
公开(公告)日：2017-04-18
申请号：US13022319
申请日：2011-02-07
申请人： Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate
发明人： Michel Riepen , Erik Henricus Egidius Catharina Eummelen , Sandra Van Der Graaf , Rogier Hendrikus Magdalena Cortie , Takeshi Kaneko , Nina Vladimirovna Dziomkina , Laurentius Johannes Adrianus Van Bokhoven , Fabrizio Evangelista , David Bessems , Cornelius Maria Rops , Adrianus Marinus Verdonck , Nicolaas Ten Kate
IPC分类号： G03F7/20
CPC分类号： G03F7/70341
摘要： A fluid handling structure for a lithographic apparatus, the fluid handling structure successively having, at a boundary from a space configured to comprise immersion fluid to a region external to the fluid handling structure: an extractor having at least one opening arranged in a first line that, in use, is directed towards a substrate and/or a table; and a liquid manipulator on a surface that, in use, faces the substrate and/or table to reduce the chance of droplets on the surface from coalescing.
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公开(公告)号：US08553206B2
公开(公告)日：2013-10-08
申请号：US12881878
申请日：2010-09-14
申请人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
发明人： Raymond Wilhelmus Louis Lafarre , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
CPC分类号： G03F7/70758 , G03F7/70341
摘要： A lithographic apparatus, including a substrate table configured to hold a substrate; a positioner configured to position the substrate table relative to a projection system, the positioner including a short stroke module configured to perform fine positioning movements, on which the substrate table is held and which is supported on a long stroke module configured to perform coarse positioning movements; and a coverplate configured to at least partly cover a top surface of the short stroke module; wherein the coverplate is mounted to the long stroke module.
摘要翻译： 一种光刻设备，包括被配置为保持基板的基板台; 定位器，其被配置为相对于投影系统定位所述基板台，所述定位器包括被配置为执行精细定位运动的短行程模块，所述基准台被保持在所述定位运动上，并且所述定位器被支撑在构造成执行粗略定位运动的长行程模块 ; 以及盖板，其构造成至少部分地覆盖所述短行程模块的顶表面; 其中所述盖板安装到所述长冲程模块。
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公开(公告)号：US20110149258A1
公开(公告)日：2011-06-23
申请号：US12969656
申请日：2010-12-16
申请人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
发明人： Jeroen Gerard Gosen , Albert Johannes Maria Jansen , Nicolaas Ten Kate , Marco Koert Stavenga , Koen Steffens , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns , Koen Cuypers
IPC分类号： G03B27/52
CPC分类号： G03F7/70341 , G03F7/7085
摘要： An immersion lithographic apparatus is disclosed that includes a table having a surface and a sensor, or a target for a sensor, or both, the sensor and/or target having a first area which is lyophobic to immersion liquid and a second area which is lyophilic to immersion liquid, and a liquid displacement device configured to displace liquid on the sensor and/or target, the liquid displacement device comprising a gas outlet opening configured to direct a gas flow toward the first and second areas, wherein a property of a part of the gas flow directed to the first area is different to a property of a part of the gas flow directed to the second area.
摘要翻译： 公开了一种浸没式光刻设备，其包括具有表面和传感器的表，或用于传感器的目标或两者，所述传感器和/或目标具有与浸没液体疏液的第一区域和亲液的第二区域 液体置换装置，其构造成将传感器和/或目标物上的液体置换，所述液体置换装置包括气体出口开口，所述气体出口开口构造成将气流引向所述第一和第二区域，其中， 被引导到第一区域的气流不同于指向第二区域的一部分气流的特性。
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公开(公告)号：US20110069289A1
公开(公告)日：2011-03-24
申请号：US12886438
申请日：2010-09-20
申请人： Raymond Wilhelmus Louis LAFARRE , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
发明人： Raymond Wilhelmus Louis LAFARRE , Nicolaas Ten Kate , Laurentius Johannes Adrianus Van Bokhoven , Henricus Jozef Castelijns
IPC分类号： G03B27/52
CPC分类号： G03B27/52 , G03F7/70341
摘要： An immersion lithographic apparatus, including: first and second objects which are spaced apart with a gap therebetween and on whose top surfaces immersion liquid is provided; and a gutter positioned under the gap and configured to collect any immersion liquid which passes through the gap, wherein an advancing contact angle of immersion liquid with surfaces of the first and second objects defining the gap is less than 30°.
摘要翻译： 一种浸没式光刻设备，包括：第一和第二物体间隔开，并且其顶表面设置浸液; 以及位于所述间隙下方并且构造成收集通过所述间隙的任何浸没液体的沟槽，其中浸没液体与限定所述间隙的所述第一和第二物体的表面的前进接触角小于30°。
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8.发明授权Fluid supply system, a lithographic apparatus, a method of varying fluid flow rate and a device manufacturing method 有权流体供应系统，光刻设备，改变流体流速的方法和装置制造方法公开(公告)号：US08848164B2
公开(公告)日：2014-09-30
申请号：US13149251
申请日：2011-05-31
CPC分类号： G03F7/70341
摘要： A fluid supply system for a lithographic apparatus includes a first fluid flow path for fluid between a fluid source and a first component and a drain fluid flow path for fluid flow from a junction in the first fluid flow path to a drain component. A controller is provided to vary a fluid flow rate to the first component from the fluid source by regulating flow of fluid through the drain fluid flow path.
摘要翻译： 用于光刻设备的流体供应系统包括用于流体源和第一部件之间的流体的第一流体流动路径和用于流体从第一流体流动路径中的结点流向排出部件的排出流体流动路径。 提供控制器以通过调节通过排放流体流动路径的流体的流动来改变来自流体源的第一部件的流体流量。
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公开(公告)号：US20100283981A1
公开(公告)日：2010-11-11
申请号：US12775045
申请日：2010-05-06
申请人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
发明人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
IPC分类号： G03B27/58
CPC分类号： G03F7/70716 , G03F7/70341
摘要： In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
摘要翻译： 在全湿式浸没式光刻设备中，允许浸没液体从衬底台的边缘流出。 在曝光期间，浸没液体与衬底台一起移动。 浸没液体的运动可能导致干扰和/或脱湿。 提出了可以减少这种干扰和/或去湿的衬底台的几何形状。 考虑衬底台的横截面边缘轮廓和/或衬底台的平面形状。
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公开(公告)号：US08405819B2
公开(公告)日：2013-03-26
申请号：US12775045
申请日：2010-05-06
申请人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
发明人： Laurentius Johannes Adrianus Van Bokhoven , Nicolaas Ten Kate , Raymond Wilhelmus Louis Lafarre , Henricus Jozef Castelijns , Petrus Martinus Gerardus Johannes Arts
CPC分类号： G03F7/70716 , G03F7/70341
摘要： In an all-wet immersion lithographic apparatus, the immersion liquid is allowed to flow off an edge of the substrate table. The immersion liquid is moved with the substrate table during exposure. The motion of the immersion liquid may result in a disturbance and/or de-wetting. A geometry of the substrate table is proposed that may reduce such a disturbance and/or de-wetting. The cross-sectional edge profile of the substrate table and/or the plan shape of the substrate table are considered.
摘要翻译： 在全湿式浸没式光刻设备中，允许浸没液体从衬底台的边缘流出。 在曝光期间，浸没液体与衬底台一起移动。 浸没液体的运动可能导致干扰和/或脱湿。 提出了可以减少这种干扰和/或去湿的衬底台的几何形状。 考虑衬底台的横截面边缘轮廓和/或衬底台的平面形状。
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