公开(公告)号：US20140326879A1

公开(公告)日：2014-11-06

申请号：US14334837

申请日：2014-07-18

Applicant: Hitachi High-Technologies Corporation

Inventor： Muneyuki FUKUDA ,  Naomasa SUZUKI ,  Tomoyasu SHOJO ,  Noritsugu TAKAHASHI

IPC: H01J37/28

CPC classification number: H01J37/28 ,  G01N23/225 ,  H01J37/145 ,  H01J2237/21 ,  H01J2237/28

Abstract: A lower pole piece of an electromagnetic superposition type objective lens is divided into an upper magnetic path and a lower magnetic path. A voltage nearly equal to a retarding voltage is applied to the lower magnetic path. An objective lens capable of acquiring an image with a higher resolution and a higher contrast than a conventional image is provided. An electromagnetic superposition type objective lens includes a magnetic path that encloses a coil, a cylindrical or conical booster magnetic path that surrounds an electron beam, a control magnetic path that is interposed between the coil and sample, an accelerating electric field control unit that accelerates the electron beam using a booster power supply, a decelerating electric field control unit that decelerates the electron beam using a stage power supply, and a suppression unit that suppresses electric discharge of the sample using a control magnetic path power supply.

Abstract translation: 电磁叠加型物镜的下极片分为上磁路和下磁路。 几乎等于延迟电压的电压被施加到下磁路。 提供了能够获得具有比常规图像更高分辨率和更高对比度的图像的物镜。 电磁叠加型物镜包括包围线圈的磁路，围绕电子束的圆柱形或锥形增强器磁路，介于线圈和样品之间的控制磁路，加速电场控制单元，其加速 使用升压电源的电子束，使用级电源减速电子束的减速电场控制部，以及抑制使用控制磁路电源对样品进行放电的抑制部。

公开(公告)号：US20140197313A1

公开(公告)日：2014-07-17

申请号：US14215209

申请日：2014-03-17

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Noritsugu TAKAHASHI ,  Muneyuki FUKUDA ,  Manabu YANO ,  Hirohiko KITSUKI ,  Kazunari ASAO ,  Tomoyasu SHOJO

IPC: H01J37/28 ,  H01J37/10

CPC classification number: H01J37/28 ,  H01J37/10 ,  H01J37/145 ,  H01J37/21 ,  H01J2237/2817

Abstract: A charged-particle-beam device is characterized in having a control value for an aligner coil (29) being determined by: a coil current and an electrode applied-voltage at a control value for objectives (30, 31), which is an electromagnetic-field superposition lens; a control value for image-shift coils (27, 28); and the acceleration voltage of the charged-particle-beam. By doing this, it has become possible to avoid image disturbances that occur on images to be displayed at boundaries between charged areas and non-charged areas, and provide a charged-particle-beam device that obtains clear images without any unevenness in brightness.

Abstract translation: 带电粒子束装置的特征在于具有对准线圈（29）的控制值，通过以下方式确定：线圈电流和用于物镜（30,31）的控制值的电极施加电压，其为电磁 场叠加透镜; 用于图像转换线圈（27,28）的控制值; 和带电粒子束的加速电压。 通过这样做，可以避免在充电区域和非充电区域之间的边界处显示图像上出现的图像干扰，并且提供获得清晰图像而没有任何亮度不均匀的带电粒子束装置。

公开(公告)号：US20170316915A1

公开(公告)日：2017-11-02

申请号：US15487561

申请日：2017-04-14

Applicant: Hitachi High-Technologies Corporation

Inventor： Nobuhiro OKAI ,  Natsuki TSUNO ,  Naomasa SUZUKI ,  Tomoyasu SHOJO

IPC: H01J37/244 ,  H01J37/14 ,  H01J37/20 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/14 ,  H01J37/20 ,  H01J37/28 ,  H01J2237/10 ,  H01J2237/2448 ,  H01J2237/2449 ,  H01J2237/24495 ,  H01J2237/2809

Abstract: Provided is a charged particle beam apparatus which includes a charged particle source, a sample table on which a sample is placed, a charged particle beam optical system that includes an objective lens and emits a charged particle beam emitted from the charged particle source onto the sample, a plurality of detectors which detect secondary particles emitted from the sample when being irradiated with the charged particle beam, and a rotation member which magnetically, electrically, or mechanically changes a detected azimuth angle of the secondary particles emitted from the sample.

公开(公告)号：US20170053777A1

公开(公告)日：2017-02-23

申请号：US15306977

申请日：2015-04-24

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Tomoyasu SHOJO ,  Hajime KAWANO ,  Yasunari SOHDA

IPC: H01J37/12 ,  H01J37/28 ,  H01J37/147 ,  H01J37/09

CPC classification number: H01J37/12 ,  H01J37/09 ,  H01J37/10 ,  H01J37/147 ,  H01J37/153 ,  H01J37/28 ,  H01J2237/103 ,  H01J2237/21 ,  H01J2237/24592 ,  H01J2237/28 ,  H01J2237/2809 ,  H01J2237/2814 ,  H01J2237/2817

Abstract: In the present invention, a charged particle beam device has a charged particle source (1), a first condenser lens (4) arranged downstream from the charged particle source (1), an aperture (5) arranged downstream from the first condenser lens (4), and a second condenser lens (6) arranged downstream from the aperture (5), wherein, when a sample (12) is to be irradiated at a second charged particle beam amount which is greater than a first charged particle beam amount, the first and second condenser lenses are controlled such that a charged particle beam is formed downstream from the aperture (5), and such that the focal point of the second condenser lens does not vary between the first charged particle beam amount and the second charged particle beam amount.

Abstract translation: 在本发明中，带电粒子束装置具有带电粒子源（1），布置在带电粒子源（1）下游的第一聚光透镜（4），设置在第一聚光透镜 以及布置在所述孔（5）的下游的第二聚光透镜（6），其中当要以大于第一带电粒子束量的第二带电粒子束量照射样品（12）时， 控制第一和第二聚光透镜，使得带电粒子束形成在孔（5）的下游，并且使得第二聚光透镜的焦点在第一带电粒子束量和第二带电粒子之间不变化 光束量。