摘要:
A semiconductor device includes cylindrical capacitors each including corresponding cylindrical electrodes. Each cylindrical electrode includes hemispherical silicon grains. The hemispherical silicon grains protruding from an upper region of the cylindrical electrode have a large size, and the hemispherical silicon grains protruding from a lower region of the cylindrical electrode have a small size or the lower region of the cylindrical electrode has no hemispherical silicon grains.
摘要:
A semiconductor device includes cylindrical capacitors each including corresponding cylindrical electrodes. Each cylindrical electrode includes hemispherical silicon grains. The hemispherical silicon grains protruding from an upper region of the cylindrical electrode have a large size, and the hemispherical silicon grains protruding from a lower region of the cylindrical electrode have a small size or the lower region of the cylindrical electrode has no hemispherical silicon grains.
摘要:
A semiconductor device comprises a memory cell region, a peripheral circuit region and a boundary region. In the memory cell region, a concave lower electrode and a foundation layer have a same uppermost surface positioned in a height of H above the plane-A. In the boundary region, one concave lower conductive region and a foundation layer have a same uppermost surface positioned in a height of H above the plane-A.
摘要:
A method for manufacturing a capacitor includes depositing an interlayer insulating film on or above a plug connected to a switching element, forming a hole in the interlayer insulating film such that the opening portion of the hole is surrounded by an overhang structure and that the plug is exposed in the bottom of the hole, removing the overhang structure, forming a lower electrode on the inner surface of the deep hole, forming a dielectric on the lower electrode, and forming an upper electrode on the dielectric. The above steps prevent the formation of a gap in the capacitor, since the overhang structure as a cause of the gap is removed. The coverage by the dielectric is also prevented from being poor.
摘要:
The semiconductor device according to the present invention comprises: a memory cell region formed on a semiconductor substrate; peripheral circuit regions formed at the periphery of the memory cell region; embedded wiring lines formed embedded in trench portions formed in the semiconductor substrate; and upper wiring lines formed in a layer above the memory cell region and the peripheral circuit regions, and peripheral circuits in the peripheral circuit regions are connected to the upper wiring lines by way of the embedded wiring lines.
摘要:
According to one embodiment, a voice mail apparatus includes a first determining module which determines whether a dual tone multi frequency (DTMF) signal for identifying a processing request of the voice message is contained in a received signal by detecting and comparing a first parameter of a transmission signal from the mail box and the first parameter of the received signal to the mail box, a second determining module which determines whether the DTMF signal is contained in the received signal by detecting and comparing a second parameter of the transmission signal from the mail box and the second parameter of the received signal to the mail box, and a controller which controls execution/stop of processing of the voice message based on a determination result by the second determining module.
摘要:
The present invention provides a semiconductor device manufacturing method of a semiconductor device having a contact plug, in which a contact hole formed by a surface portion of a high-concentration N-type diffusion layer formed on a semiconductor silicon substrate surface and an interlayer insulating film is implanted with indium ions at an energy ranging from 30 to 120 keV and an implantation amount ranging from 1.0×1013/cm2 to 5.0×1014/cm2 to grow an indium-containing layer on the surface portion of the high-concentration N-type diffusion layer at the bottom of the contact hole.
摘要:
A process for producing 1-aminoanthraquinones represented by formula (C) ##STR1## wherein R.sup.1 and R.sup.2, independently from each other, denote one type selected from a hydrogen atom, an alkyl group having 1 to 4 carbon atoms and a halogen atom,which comprises converting 5-nitro-1,4,4a,9a-tetrahydroanthraquinones represented by formula (A) ##STR2## wherein R.sup.1 and R.sup.2 are as defined above, into 1-hydroxylaminoanthraquinones represented by formula (B) ##STR3## wherein R.sup.1 and R.sup.2 are as defined above, in the presence of a basic compound, and electrolytically reducing the resulting 1-hydroxylaminoanthraquinones in the presence of a basic compound.
摘要:
According to the first aspect of the present invention, a drain electrode and a pixel electrode are electrically connected to each other on a protective film formed on a semiconductor active layer, and thereby it is possible to easily connect the drain electrode and the pixel electrode to each other and to improve a yield.
摘要:
One embodiment of the present invention is a thin film transistor having a substrate, a gate electrode formed on the substrate, a gate insulating film, a semiconductor layer formed on the gate insulating film, a protective film formed on the semiconductor layer and the gate insulating film and having first and second opening sections which are separately and directly formed on the semiconductor layer, a source electrode formed on the protective film and electrically connected to the semiconductor layer at the first opening section of the protective film, and a drain electrode formed on the protective film and electrically connected to the semiconductor layer at the second opening section of the protective film.