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公开(公告)号：US06203965B1
公开(公告)日：2001-03-20
申请号：US09552211
申请日：2000-04-19
申请人： James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
发明人： James F. Cameron , James Michael Mori , George W. Orsula , James W. Thackeray , Wu-Song Huang , Ronald A. DellaGuardia , Kuang-Jung Chen , Hiroshi Ito , Wayne M. Moreau
IPC分类号： G03F7004
CPC分类号： G03F7/0045 , Y10S430/114 , Y10S430/115 , Y10S430/122
摘要： The invention provides new photoresist compositions that contain a resin binder and a blend of photoacid generators. Photoacid generator blends of the invention produce photoacids that differ in acid strength and/or size. A specific composition comprises a terpolymer having units of hydroxystyrene, styrene and t-butyl acrylate with the photoacid generators di-(4-tbutylphenyl)iodonium camphorsulfonate and di-(4-t-butylphenyl)iodonium o-trifluoromethylbenzene sulfonate.
摘要翻译： 本发明提供了含有树脂粘合剂和光致酸发生剂的混合物的新的光致抗蚀剂组合物。 本发明的光酸发生剂共混物产生酸强度和/或尺寸不同的光酸。 特定组合物包含具有羟基苯乙烯，苯乙烯和丙烯酸叔丁酯与光酸产生剂二（4-叔丁基苯基）鏻樟脑磺酸盐和邻 - 三氟甲基苯磺酸二（4-叔丁基苯基）碘的单元的三元共聚物。
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2.发明授权Photo acid generator compounds, photo resists, and method for improving bias 失效照片酸发生剂化合物，光致抗蚀剂和改善偏压的方法
公开(公告)号：US6074800A
公开(公告)日：2000-06-13
申请号：US64955
申请日：1998-04-23
申请人： Gregory Breyta , Phillip J. Brock , Daniel J. Dawson , Ronald A. DellaGuardia , Charlotte R. DeWan , Andrew R. Eckert , Hiroshi Ito , Premlatha Jagannathan , Leo L. Linehan , Kathleen H. Martinek , Wayne M. Moreau , Randolph J. Smith
发明人： Gregory Breyta , Phillip J. Brock , Daniel J. Dawson , Ronald A. DellaGuardia , Charlotte R. DeWan , Andrew R. Eckert , Hiroshi Ito , Premlatha Jagannathan , Leo L. Linehan , Kathleen H. Martinek , Wayne M. Moreau , Randolph J. Smith
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , Y10S430/115
摘要： Several mid UV photo acid generators (PAGs), a chemically amplified photo resist (CAMP), and method for improving nested to isolated line bias are provided. Similarly, photo speed may also be improved. Unlike conventional mid UV PAGs, the present invention's PAG compounds, resist composition, and method do not require a mid UV sensitizer. Specifically, PAGs are provided that bear a chromophore capable of receiving mid UV radiation, particularly I-line, and that are suitable for use in a chemically amplified photo resist having a photo speed of 500 mJ/cm.sup.2 or less, but preferrably 200 mJ/cm.sup.2 or less. For example, the PAGs can be a sulfonium or iodonium salt, such as anthryl, butyl, methyl sulfonium triflate and bis(4-t-butylphenyl)iodonium 9,10-dimethoxyanthracene sulfonate. The chromophore forming a part of the PAGs can be selected from polyaromatic hydrocarbons, for example, chrysenes, pyrenes, fluoranthenes, anthrones, benzophenones, thioxanthones, anthracenes, and phenanthrenes, but preferably anthracenes.
摘要翻译： 提供了几个中等紫外光酸产生剂（PAG），化学放大光抗蚀剂（CAMP）和改进嵌套到隔离线偏压的方法。 类似地，也可以提高照相速度。 与传统的中等紫外线PAG不同，本发明的PAG化合物，抗蚀剂组合物和方法不需要中等紫外线敏化剂。 具体地说，提供了能够承受中等紫外线辐射，特别是I线的发色团的PAG，并且适合用于光速为500mJ / cm 2以下但优选为200mJ / cm 2的化学放大型光致抗蚀剂的PAG， cm2以下。 例如，PAG可以是锍或碘鎓盐，例如蒽基，丁基，甲基锍三氟甲磺酸酯和双（4-叔丁基苯基）碘9,10-二甲氧基蒽磺酸盐。 形成PAG的一部分的发色团可以选自多芳族烃，例如氯仿，芘，荧蒽，蒽，二苯甲酮，噻吨酮，蒽和菲，但优选为蒽。
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3.发明申请Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome or Sensitive Substrates 有权使用混合基材来增强铬或敏感基材上的图案化抗蚀剂型材公开(公告)号：US20080227030A1
公开(公告)日：2008-09-18
申请号：US10597904
申请日：2004-02-11
CPC分类号： G03F7/0045 , G03F1/78 , G03F7/0392 , G03F7/40 , Y10S430/143
摘要： Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
摘要翻译： 通过使用包括室温固体碱和液体低蒸气压基料的基础添加剂的组合，可获得即使在困难的基材上也具有良好基础性能的抗蚀剂组合物。 该组合物在通常用于掩模制造的金属基材如含铬层上特别有用。
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公开(公告)号：US06420088B1
公开(公告)日：2002-07-16
申请号：US09602967
申请日：2000-06-23
申请人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
IPC分类号： G03C1825
CPC分类号： C08G77/20 , C08G77/38 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
摘要翻译： 特征在于存在具有侧生发色团部分的含SiO聚合物的抗反射组合物是光刻工艺中有用的抗反射涂层/硬掩模组合物。 这些组合物提供突出的光学，机械和蚀刻选择性，同时适用于使用旋涂应用技术。 所述组合物在用于在基材上，尤其是金属或半导体层上配置下层材料层的光刻工艺中特别有用。
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公开(公告)号：US06821718B2
公开(公告)日：2004-11-23
申请号：US10657168
申请日：2003-09-09
申请人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
IPC分类号： G03C500
CPC分类号： G03F7/0757 , G03F7/0045 , Y10S430/106
摘要： A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
摘要翻译： 负性抗蚀剂组合物，其包含：（a）具有选自稠合脂族部分，稠环稠合芳族部分和杂环稠合芳族化合物的侧链稠合部分和与交联剂反应的位点的含硅聚合物，（b） 酸敏感性交联剂，和（c）辐射敏感性酸发生剂。 抗蚀剂组合物用于在基材中形成图案化的材料层。
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公开(公告)号：US6043003A
公开(公告)日：2000-03-28
申请号：US356309
申请日：1999-07-16
申请人： James J. Bucchignano , Wu-Song Huang , Ahmad D. Katnani , Kim Y. Lee , Wayne M. Moreau , Karen E. Petrillo
发明人： James J. Bucchignano , Wu-Song Huang , Ahmad D. Katnani , Kim Y. Lee , Wayne M. Moreau , Karen E. Petrillo
IPC分类号： H01L21/027 , G03F7/004 , G03F7/039 , G03F7/30
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/143
摘要： The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
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7.发明授权E-beam application to mask making using new improved KRS resist system 失效电子束应用于使用新的改进的KRS抗蚀剂系统进行掩模制作
公开(公告)号：US6037097A
公开(公告)日：2000-03-14
申请号：US14432
申请日：1998-01-27
申请人： James J. Bucchignano , Wu-Song Huang , Ahmad D. Katnani , Kim Y. Lee , Wayne M. Moreau , Karen E. Petrillo
发明人： James J. Bucchignano , Wu-Song Huang , Ahmad D. Katnani , Kim Y. Lee , Wayne M. Moreau , Karen E. Petrillo
IPC分类号： H01L21/027 , G03F7/004 , G03F7/039
CPC分类号： G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/11 , Y10S430/111 , Y10S430/143
摘要： The present invention relates to chemically amplified resists and resist systems wherein some of the polar functional groups of the aqueous base soluble polymer or copolymers are protected with a cyclic aliphatic ketal protecting group such as methoxycyclohexanyl. The resists and the resist systems of the present invention containing the new protecting group have improved shelf-life and vacuum stability as compared to the prior art resists. Thus, the resists of the present invention are highly useful in e-beam lithographic applications.
摘要翻译： 本发明涉及化学放大抗蚀剂和抗蚀剂体系，其中水性基团可溶性聚合物或共聚物的一些极性官能团用环状脂族缩酮保护基如甲氧基环己基保护。 与现有技术的抗蚀剂相比，含有新保护基的本发明的抗蚀剂和抗蚀剂体系具有改善的保质期和真空稳定性。 因此，本发明的抗蚀剂在电子束光刻应用中非常有用。
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公开(公告)号：US06653045B2
公开(公告)日：2003-11-25
申请号：US09785609
申请日：2001-02-16
申请人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , Wu-Song Huang , Ranee W. Kwong , Robert N. Lang , Qinghuang Lin , Wayne M. Moreau
IPC分类号： G03F7004
CPC分类号： G03F7/0757 , G03F7/0045 , Y10S430/106
摘要： A negative resist composition, comprising: (a) silicon-containing polymer with pendant fused moieties selected from the group consisting of fused aliphatic moieties, homocyclic fused aromatic moieties, and heterocyclic fused aromatic and sites for reaction with a crosslinking agent, (b) an acid-sensitive crosslinking agent, and (c) a radiation-sensitive acid generator is provided. The resist composition is used to form a patterned material layer in a substrate.
摘要翻译： 负性抗蚀剂组合物，其包含：（a）具有选自稠合脂族部分，稠环稠合芳族部分和杂环稠合芳族化合物的侧链稠合部分和与交联剂反应的位点的含硅聚合物，（b） 酸敏感性交联剂，和（c）辐射敏感性酸发生剂。 抗蚀剂组合物用于在基材中形成图案化的材料层。
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公开(公告)号：US06503692B2
公开(公告)日：2003-01-07
申请号：US10165582
申请日：2002-06-07
申请人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
发明人： Marie Angelopoulos , Ari Aviram , C. Richard Guarnieri , Wu-Song Huang , Ranee Kwong , Wayne M. Moreau
IPC分类号： G03F700
CPC分类号： C08G77/20 , C08G77/38 , G03F7/0757 , G03F7/091 , Y10S430/151
摘要： Antireflective compositions characterized by the presence of an SiO-containing polymer having pendant chromophore moieties are useful antireflective coating/hardmask compositions in lithographic processes. These compositions provide outstanding optical, mechanical and etch selectivity properties while being applicable using spin-on application techniques. The compositions are especially useful in lithographic processes used to configure underlying material layers on a substrate, especially metal or semiconductor layers.
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10.发明授权Use of mixed bases to enhance patterned resist profiles on chrome or sensitive substrates 有权使用混合的底物来增强镀铬或敏感衬底上的抗蚀剂图案公开(公告)号：US07960095B2
公开(公告)日：2011-06-14
申请号：US10597904
申请日：2004-02-11
CPC分类号： G03F7/0045 , G03F1/78 , G03F7/0392 , G03F7/40 , Y10S430/143
摘要： Resist compositions having good footing properties even on difficult substrates are obtained by using a combination of base additives including a room temperature solid base, and a liquid low vapor pressure base. The compositions are especially useful on metal substrates such as chromium-containing layers commonly used in mask-making.
摘要翻译： 通过使用包括室温固体碱和液体低蒸气压基料的基础添加剂的组合，可获得即使在困难的基材上也具有良好基础性能的抗蚀剂组合物。 该组合物在通常用于掩模制造的金属基材如含铬层上特别有用。
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