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1.发明申请公开(公告)号：US20150301514A1
公开(公告)日：2015-10-22
申请号：US14755758
申请日：2015-06-30
发明人： Roie VOLKOVICH , Eran AMIT , Nuriel AMIR , Michael E. ADEL
IPC分类号： G05B19/048 , H01L21/66
CPC分类号： G05B19/048 , G03F7/0002 , G03F7/70625 , G05B2219/33285 , H01L22/12 , H01L22/20
摘要： Methods and metrology tool modules embodying the methods are provided. Methods comprise measuring characteristics of intermediate features such as guiding lines in a directed self-assembly (DSA) process, deriving exposure parameters from the measured characteristics; and adjusting production parameters for producing consecutive target features according to the derived exposure parameters. The methods and modules enhance the accuracy of the DSA-produced structures and related measurements.
摘要翻译： 提供了体现方法的方法和计量工具模块。 方法包括测量中间特征的特征，例如在定向自组装（DSA）过程中的引导线，从测量的特征导出曝光参数; 并根据导出的曝光参数调整生产连续目标特征的生产参数。 这些方法和模块提高了DSA生产的结构和相关测量的准确性。
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公开(公告)号：US20190088514A1
公开(公告)日：2019-03-21
申请号：US15751514
申请日：2017-12-11
发明人： Roie VOLKOVICH , Michael ADEL , Liran YERUSHALMI , Eitan HERZEL , Mengmeng YE , Eran AMIT
摘要： Metrology methods and modules are provided, which comprise carrying out recipe setup procedure(s) and/or metrology measurement(s) using zonal analysis with respect to respective setup parameter(s) and/or metrology metric(s). The zonal analysis comprises relating to spatially variable values of the setup parameter(s) and/or metrology metric(s) across one or more wafers in one or more lots. Wafer zones may be discrete or spatially continuous, and be used to weight one or more parameter(s) and/or metric(s) during any of the stages of the respective setup and measurement processes.
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公开(公告)号：US20190086200A1
公开(公告)日：2019-03-21
申请号：US15750972
申请日：2017-12-06
发明人： Eran AMIT
摘要： Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine learning algorithm application to measurements and/or simulations of metrology measurements of metrology targets are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements.
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公开(公告)号：US20160018819A1
公开(公告)日：2016-01-21
申请号：US14867834
申请日：2015-09-28
发明人： Roie VOLKOVICH , Eran AMIT , Raviv YOHANAN
IPC分类号： G05B19/418
CPC分类号： G05B19/41875 , G03F7/0002 , G03F7/70625 , G05B2219/32368 , G05B2219/37224
摘要： Methods and respective modules are provided, configured to identify registration errors of DSA lines with respect to guiding lines in a produced structure, by comparing a measured signature of the structure with simulated signatures corresponding to simulated structures having varying simulated characteristics, and characterizing the produced structure according to the comparison. The characterization may be carried out using electromagnetic characterization of a geometric model or in a model-free manner by analyzing model-based results. Thus, for the first time, positioning and dimensional errors of DSA lines may be measured.
摘要翻译： 提供方法和各个模块，其被配置为通过将结构的测量签名与对应于具有变化的模拟特征的模拟结构的模拟签名进行比较来识别DSA线相对于所产生的结构中的引导线的登记误差，以及表征所产生的结构 根据比较。 可以使用几何模型的电磁表征或通过分析基于模型的结果以无模型的方式进行表征。 因此，可以首次测量DSA线的定位和尺寸误差。
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5.发明申请POLARIZATION MEASUREMENTS OF METROLOGY TARGETS AND CORRESPONDING TARGET DESIGNS 审中-公开计量目标和相应目标设计的极化度量公开(公告)号：US20160178351A1
公开(公告)日：2016-06-23
申请号：US14949444
申请日：2015-11-23
发明人： Eran AMIT , Barry LOEVSKY , Andrew HILL , Amnon MANASSEN , Nuriel AMIR , Vladimir LEVINSKI , Roie VOLKOVICH
CPC分类号： G01B11/06 , G01B11/272 , G01B2210/56 , G01B2290/70 , G01N21/9501 , G01N21/956 , G01N2021/8848 , G06F17/5072 , G06F17/5081 , H01L22/30
摘要： Targets, target elements and target design method are provided, which comprise designing a target structure to have a high contrast above a specific contrast threshold to its background in polarized light while having a low contrast below the specific contrast threshold to its background in non-polarized light. The targets may have details at device feature scale and be compatible with device design rules yet maintain optical contrast when measured with polarized illumination and thus be used effectively as metrology targets. Design variants and respective measurement optical systems are likewise provided.
摘要翻译： 提供了目标，目标元素和目标设计方法，其包括将目标结构设计为具有高于特定对比度阈值的高对比度至其偏振光背景，同时具有低于特定对比度阈值至其非极化背景下的特定对比度阈值的低对比度 光。 目标可能在设备特征尺度上具有细节，并且与设备设计规则兼容，并且当用偏振照明测量时保持光学对比度，并且因此被有效地用作计量目标。 同样提供了设计变型和相应的测量光学系统。
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公开(公告)号：US20150177135A1
公开(公告)日：2015-06-25
申请号：US14621026
申请日：2015-02-12
发明人： Eran AMIT , Raviv YOHANAN
CPC分类号： G01N21/4785 , G01N21/47 , G01N21/9501 , G01N2201/02 , G01N2201/12 , G03F7/70633 , G03F7/70683
摘要： Metrology targets, design files, and design and production methods thereof are provided. The targets comprise two or more parallel periodic structures at respective layers, wherein a predetermined offset is introduced between the periodic structures, for example, opposite offsets at different parts of a target. Quality metrics are designed to estimate the unintentional overlay from measurements of a same metrology parameter by two or more alternative measurement algorithms. Target parameters are configured to enable both imaging and scatterometry measurements and enhance the metrology measurements by the use of both methods on the same targets. Imaging and scatterometry target parts may share elements or have common element dimensions. Imaging and scatterometry target parts may be combined into a single target area or may be integrated into a hybrid target using a specified geometric arrangement.
摘要翻译： 提供了计量目标，设计文件及其设计和制作方法。 目标在各个层上包括两个或更多个平行的周期性结构，其中在周期性结构之间引入预定的偏移，例如在目标的不同部分处的相反的偏移。 质量度量被设计为通过两个或多个替代测量算法来测量相同度量参数的无意重叠。 目标参数被配置为启用成像和散射测量，并通过在同一目标上使用这两种方法来增强计量测量。 成像和散射目标部分可以共享元素或具有公共元素维度。 成像和散射目标部分可以组合到单个目标区域中，或者可以使用指定的几何排列集成到混合目标中。
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公开(公告)号：US20220107175A1
公开(公告)日：2022-04-07
申请号：US17554454
申请日：2021-12-17
发明人： Eran AMIT
摘要： Metrology methods and targets are provided, that expand metrological procedures beyond current technologies into multi-layered targets, quasi-periodic targets and device-like targets, without having to introduce offsets along the critical direction of the device design. Machine learning algorithm application to measurements and/or simulations of metrology measurements of metrology targets are disclosed for deriving metrology data such as overlays from multi-layered target and corresponding configurations of targets are provided to enable such measurements. Quasi-periodic targets which are based on device patterns are shown to improve the similarity between target and device designs. Offsets are introduced only in non-critical direction and/or sensitivity is calibrated to enable, together with the solutions for multi-layer measurements and quasi-periodic target measurements, direct device optical metrology measurements.
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公开(公告)号：US20160179017A1
公开(公告)日：2016-06-23
申请号：US15057723
申请日：2016-03-01
发明人： Raviv YOHANAN , Eran AMIT , Mark GHINOVKER , Tal ITZKOVICH , Nuriel AMIR
摘要： Imaging metrology targets and methods are provided, which combine one-dimensional (1D) elements designed to provide 1D imaging metrology signals along at least two measurement directions and two-dimensional (2D) elements designed to provide at least one 2D imaging metrology overlay signal. The target area of the 1D elements may enclose the 2D elements or the target areas of the 1D and 2D elements may be partially or fully congruent. The compound targets are small, possible multilayered, and may be designed to be process compatible (e.g., by segmentation of the elements, interspaces between elements and element backgrounds) and possibly be produced in die. 2D elements may be designed to periodic to provide additional one dimensional metrology signals.
摘要翻译： 提供成像测量目标和方法，其组合一维（1D）元件，其被设计用于沿着至少两个测量方向提供1D成像测量信号，以及设计成提供至少一个2D成像测量覆盖信号的二维（2D）元件。 1D元件的目标区域可以包围2D元素，或者1D和2D元素的目标区域可以是部分或完全一致的。 复合靶是小的，可能的多层，并且可以被设计为与工艺相容（例如，通过元件的分割，元件和元件背景之间的间隙）并且可能在裸片中产生。 2D元件可被设计成周期性地提供额外的一维计量信号。
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9.发明申请METHOD AND APPARATUS FOR DIRECT SELF ASSEMBLY IN TARGET DESIGN AND PRODUCTION 审中-公开目标设计和生产中直接自组装的方法和装置公开(公告)号：US20150242558A1
公开(公告)日：2015-08-27
申请号：US14710201
申请日：2015-05-12
发明人： Eran AMIT , Raviv YOHANAN , Tal ITZKOVICH , Nuriel AMIR , Roie VOLKOVICH , Dongsub CHOI
IPC分类号： G06F17/50 , H01L21/311 , H01L21/3105
CPC分类号： G06F17/5072 , G01N21/93 , G01N21/956 , G03F7/0002 , H01L21/3105 , H01L21/31058 , H01L21/31138 , Y10T428/24802
摘要： Target designs methods and targets are provided, in which at least some of the differentiation between target elements and their background is carried out by segmenting either of them. Directed self-assembly (DSA) processes are used to generate fine segmentation, and various characteristics of the polymer lines and their guiding lines are used to differentiate target elements from their background. Target designs and design principles are disclosed in relation to the DSA process, as well as optimization of the DSA process to yield high metrology measurement accuracy in face of production inaccuracies. Furthermore, designs and methods are provided for enhancing and using ordered regions of a DSA-produced polymer surface as target elements and as hard masks for production processes. The targets and methods may be configured to enable metrology measurements using polarized light to distinguish target elements or DSA features.
摘要翻译： 提供了目标设计方法和目标，其中目标元素与其背景之间的至少一些区分通过分割它们之一进行。 定向自组装（DSA）过程用于生成细分，聚合物线及其引导线的各种特征用于区分目标元素与其背景。 关于DSA过程披露了目标设计和设计原理，以及在生产不准确的情况下优化DSA过程以产生高计量测量精度。 此外，提供了用于增强和使用DSA生产的聚合物表面的有序区域作为目标元素的设计和方法，以及用于生产过程的硬掩模。 目标和方法可以被配置为使得能够使用偏振光进行度量测量来区分目标元素或DSA特征。
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