中科微点-全球专利检索

  1. Login
  2. Sign Up

Search Results

46 records (took 0.043 seconds)

    193NM Laser And Inspection System
    6.
    发明申请
    193NM Laser And Inspection System 有权
    193NM激光和检测系统

    公开(公告)号：US20150155680A1

    公开(公告)日：2015-06-04

    申请号：US14586646

    申请日：2014-12-30

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Chuang ,  J. Joseph Armstrong ,  Vladimir Dribinski ,  Yujun Deng ,  John Fielden

    IPC: H01S3/108

    CPC classification number: H01S3/1083 ,  G01N21/84 ,  G01N21/9501 ,  G01N21/956 ,  G01N2021/95676 ,  G02F1/3534 ,  G02F1/3536 ,  G02F1/39 ,  G02F2001/3507 ,  G02F2201/16 ,  H01S3/0078 ,  H01S3/0092 ,  H01S3/0602 ,  H01S3/067

    Abstract: A laser for generating an output wavelength of approximately 193.4 nm includes a fundamental laser, an optical parametric generator, a fourth harmonic generator, and a frequency mixing module. The optical parametric generator, which is coupled to the fundamental laser, can generate a down-converted signal. The fourth harmonic generator, which may be coupled to the optical parametric generator or the fundamental laser, can generate a fourth harmonic. The frequency mixing module, which is coupled to the optical parametric generator and the fourth harmonic generator, can generate a laser output at a frequency equal to a sum of the fourth harmonic and twice a frequency of the down-converted signal.

    Abstract translation: 用于产生约193.4nm的输出波长的激光器包括基本激光器，光参量发生器，第四谐波发生器和混频模块。 耦合到基本激光器的光学参数发生器可以产生下变频信号。 可以耦合到光学参数发生器或基本激光器的第四谐波发生器可以产生四次谐波。 耦合到光参量发生器和第四谐波发生器的混频模块可产生频率等于下变频信号频率的四次谐波和两倍的频率的激光输出。

    Alleviation Of Laser-Induced Damage In Optical Materials By Suppression Of Transient Color Centers Formation And Control Of Phonon Population
    8.
    发明申请
    Alleviation Of Laser-Induced Damage In Optical Materials By Suppression Of Transient Color Centers Formation And Control Of Phonon Population 有权
    通过抑制瞬态色心形成和控制声子的光子材料激光诱导的损伤

    公开(公告)号：US20140198818A1

    公开(公告)日：2014-07-17

    申请号：US14213835

    申请日：2014-03-14

    Applicant: KLA-Tencor Corporation

    Inventor： Vladimir Dribinski ,  Yung-Ho Chuang

    IPC: H01S3/091

    CPC classification number: H01S3/10 ,  G02F1/3525 ,  H01S3/005 ,  H01S3/091

    Abstract: Laser-induced damage in an optical material can be mitigated by creating conditions at which light absorption is minimized. Specifically, electrons populating defect energy levels of a band gap in an optical material can be promoted to the conduction band—a process commonly referred to as bleaching. Such bleaching can be accomplished using a predetermined wavelength that ensures minimum energy deposition into the material, ideally promoting electron to just inside the conduction band. In some cases phonon (i.e. thermal) excitation can also be used to achieve higher depopulation rates. In one embodiment, a bleaching light beam having a wavelength longer than that of the laser beam can be combined with the laser beam to depopulate the defect energy levels in the band gap. The bleaching light beam can be propagated in the same direction or intersect the laser beam.

    Abstract translation: 可以通过产生光吸收最小化的条件来减轻光学材料中的激光诱导的损伤。 具体地说，填充光学材料中的带隙的缺陷能级的电子能够促进通常被称为漂白的传导带。 这样的漂白可以使用确保最小能量沉积到材料中的预定波长来实现，理想地促进电子刚好在导带内部。 在某些情况下，也可以使用声子（即热）激发来实现更高的人口流动率。 在一个实施例中，具有比激光束长的波长的波长的漂白光束可以与激光束组合以对带隙中的缺陷能级进行衰减。 漂白光束可以沿相同方向传播或与激光束相交。

    183 nm CW laser and inspection system
    9.
    发明授权
    183 nm CW laser and inspection system 有权

    公开(公告)号：US10429719B2

    公开(公告)日：2019-10-01

    申请号：US16205032

    申请日：2018-11-29

    Applicant: KLA-Tencor Corporation

    Inventor： Yung-Ho Alex Chuang ,  Xiaoxu Lu ,  Baigang Zhang ,  John Fielden ,  Vladimir Dribinski

    IPC: G02F1/35 ,  G02F1/355

    Abstract: An inspection system/method in which first optics direct continuous wave (CW) light at 181-185 nm to an inspected article, and second optics redirect image information affected by the article to detectors. A laser assembly generates the CW light by generating fourth harmonic light from first fundamental CW light having a first wavelength between 1 and 1.1 μm, generating fifth harmonic light by mixing the fourth harmonic light with the first fundamental CW light, and mixing the fifth harmonic light with second light having a second wavelength between 1.26 and 1.82 μm. An external cavity mixes the first light and the fourth harmonic light using a first nonlinear crystal. The CW light is generated using a second cavity that passes circulated second fundamental or signal CW light through a second nonlinear crystal, and directing the fifth harmonic light through the second nonlinear crystal.

Patent Agency Ranking