公开(公告)号：US20220389196A1

公开(公告)日：2022-12-08

申请号：US17825140

申请日：2022-05-26

Applicant: Konica Minolta, Inc.

Inventor： Takeshi KOJIMA ,  Masashi MAMINO ,  Yuuki NAGAI ,  Yo NAKAJIMA

IPC: C08K13/04

Abstract: Provided is a resin composition for injection molding including a polyolefin resin, containing: at least one selected from the group consisting of aluminum hydroxide, magnesium hydroxide and a phosphorus compound in an amount of 10 to 60 mass %; a NOR-type hindered amine compound in an amount of 0.05 to 5 mass %; and a fibrous filler having an aspect ratio of 10 or more in an amount of 1 to 20 mass %, respectively, relative to the total amount of the resin composition, wherein a phosphorous content is 5 mass % or less relative to the total amount of the resin composition.

公开(公告)号：US20160194539A1

公开(公告)日：2016-07-07

申请号：US14911224

申请日：2014-07-25

Applicant: KONICA MINOLTA, INC.

Inventor： Yuuki NAGAI ,  Akihiro MAEZAWA ,  Chie INUI ,  Natsumi HIRAYAMA

IPC: C09K3/14 ,  C09G1/02

CPC classification number: C09K3/1409 ,  C09G1/02 ,  C09K3/1463

Abstract: A polishing material comprising a polishing material particle including cerium, wherein, the polishing material particle is a secondary particle obtained by baking a primary particle which is a polishing material precursor particle; the primary particle is a sphere shape; an average particle size of the primary particle is within a range of 100 to 1000 nm; and an average particle size of the secondary particle is within a range of 300 to 10000 nm.

Abstract translation: 1.一种研磨材料，其特征在于，具备包括铈的研磨材料粒子，其中，所述研磨材料粒子是通过焙烧作为研磨材料前体粒子的一次粒子得到的二次粒子， 初级粒子是球形; 初级粒子的平均粒径在100〜1000nm的范围内; 二次粒子的平均粒径在300〜10000nm的范围内。

公开(公告)号：US20150306788A1

公开(公告)日：2015-10-29

申请号：US14379060

申请日：2013-02-14

Applicant: KONICA MINOLTA, INC.

Inventor： Yuuki NAGAI ,  Akihiro MAEZAWA ,  Atsushi TAKAHASHI

IPC: B28D5/00 ,  B24B57/00

CPC classification number: B28D5/007 ,  B01D21/02 ,  B01D2221/14 ,  B24B57/00 ,  C02F11/14 ,  C02F2103/12 ,  Y02P70/179

Abstract: Technique to provide an abrasive regeneration method which, from a used abrasive, can recover an abrasive by an efficient method and can thereafter obtain a high-purity regenerated abrasive by a simple method. This abrasive regeneration method uses an abrasive comprising at least one type of abrasive selected from diamond, boron nitride, silicon carbide, alumina, alumina zirconia, zirconium oxide and cerium oxide. The abrasive regeneration involves a slurry recovery step (A) for recovering an abrasive slurry discharged from a polishing machine, a separation and concentration step (B) for adding an alkaline earth metal salt as an inorganic salt to the recovered abrasive slurry to aggregate the abrasive, and separating and concentrating the abrasive from a mother liquor, an abrasive recovery step (C) for recovering the separated and concentrated abrasive, and a second concentration step (D) for filter-treating the concentrated abrasive.

Abstract translation: 提供一种研磨再生方法，其从使用的研磨剂中可以通过有效的方法回收磨料，然后可以通过简单的方法获得高纯度再生磨料。 该磨料再生方法使用包含选自金刚石，氮化硼，碳化硅，氧化铝，氧化铝氧化锆，氧化锆和氧化铈中的至少一种类型的磨料的磨料。 研磨再生包括用于回收从抛光机排出的磨料浆料的浆料回收步骤（A），用于将回收的磨料浆料中的碱土金属盐作为无机盐添加到分离和浓缩步骤（B）中以将磨料 ，以及从母液中分离和浓缩研磨剂，用于回收分离和浓缩研磨剂的研磨回收步骤（C）和用于过滤处理浓缩磨料的第二浓缩步骤（D）。

公开(公告)号：US20160376468A1

公开(公告)日：2016-12-29

申请号：US15189833

申请日：2016-06-22

Applicant: KONICA MINOLTA, INC.

Inventor： Chie INUI ,  Akihiro MAEZAWA ,  Yuuki NAGAI ,  Natsumi HIRAYAMA

IPC: C09G1/02

CPC classification number: C09G1/02 ,  B24B57/02 ,  Y02P70/605

Abstract: A method for preparing a recycled abrasive slurry includes: polishing a material to be polished, which includes silicon as a main component, with an abrasive slurry including a plurality of kinds of additives added for different purposes; and preparing a recycled abrasive slurry from a collected abrasive slurry collected after the polishing, wherein the recycled abrasive slurry is prepared through: step 1 of removing, from the collected abrasive slurry, at least an additive B capable of decreasing a polishing rate among the plurality of additives, and step 2 of replenishing at least an additive A capable of increasing a polishing rate among the plurality of additives, to the abrasive slurry from which an additive has been removed, which has been prepared in step 1.

Abstract translation: 一种制备再循环磨料浆料的方法包括：用包含硅作为主要成分的抛光材料，研磨含有多种添加剂的磨料浆料，用于不同目的; 以及从抛光后收集的收集的磨料浆料制备回收的磨料浆料，其中通过以下步骤制备回收的磨料浆料：步骤1，从收集的磨料浆料中除去至少一种能够降低多个磨料浆料中的抛光速率的添加剂B 的添加剂，以及步骤2，其至少补充了能够将多种添加剂中的抛光速率提高到在步骤1中制备的已除去添加剂的研磨浆料的添加剂A.

公开(公告)号：US20210317292A1

公开(公告)日：2021-10-14

申请号：US17201473

申请日：2021-03-15

Applicant: Konica Minolta, Inc.

Inventor： Yo NAKAJIMA ,  Yuuki NAGAI ,  Masashi MAMINO ,  Takeshi KOJIMA

IPC: C08L23/12 ,  C08L23/06

Abstract: Provided is a thermoplastic resin composition containing a thermoplastic resin A, a hard filler B and a compatibilizer C, wherein the hard filler B contains a hard filler B1 having an average particle diameter in the range of 0.7 to 40 μm and a hard filler B2 having an average particle diameter in the range of 0.01 to 0.5 μm, the compatibilizer C at least adheres to a surface of the hard filler B1, and a ratio WB1/WB2 is 1.5 or more, when WB1 and WB2 are adhesion masses of the compatibilizer C adhered to the surfaces of the hard filler B1 and the hard filler B2, respectively, and WB1 and WB2 each are measured per unit cross-sectional area.

公开(公告)号：US20180056483A1

公开(公告)日：2018-03-01

申请号：US15556910

申请日：2016-03-09

Applicant: Konica Minolta, Inc.

Inventor： Chie INUI ,  Akihiro MAEZAWA ,  Yuuki NAGAI ,  Natsumi HIRAYAMA

IPC: B24B57/00 ,  B24B37/34

CPC classification number: B24B57/00 ,  B24B37/02 ,  B24B37/24 ,  B24B37/34 ,  B24B57/02

Abstract: A method for collecting an abrasive from an abrasive slurry which has been used for polishing an object including silicon as a main component includes: (i) adding a solvent to the abrasive slurry; (ii) dissolving particles of the polished object among components of the polished object contained in the abrasive slurry; and (iii) filtering the abrasive slurry to collect the abrasive, in which the steps (i) to (iii) are carried out without a pH adjuster to remove components of the polished object to collect the abrasive.

公开(公告)号：US20230151197A1

公开(公告)日：2023-05-18

申请号：US18052721

申请日：2022-11-04

Applicant: KONICA MINOLTA, INC.

Inventor： Yo NAKAJIMA ,  Masashi MAMINO ,  Takeshi KOJIMA ,  Yuuki NAGAI

IPC: C08L23/12 ,  C08L79/02

CPC classification number: C08L23/12 ,  C08L79/02 ,  C08L2201/22 ,  C08L2666/72 ,  C08K2003/026

Abstract: Provided is a halogen-free resin composition including a polyolefin resin, containing a phosphorus compound in an amount of 0.05 to 2.5 mass % as a phosphorus content; a NOR-type hindered amine in an amount of 0.05 to 5 mass %; and an inorganic filler in an amount of 3 to 50 mass %, respectively, with respect to the total amount of the resin composition, wherein a DTA (Differential Thermal Analysis) curve obtained by differential thermal analysis of the inorganic filler has an endothermic portion in a temperature range of 180 to 500° C.; and in the inorganic filler, a ratio value of a number of particles having a maximum diameter of 300 μm or more to a number of particles having a maximum diameter of 100 μm or more is ⅕ or less, or there are no particles having a maximum diameter of 100 μm or more.

公开(公告)号：US20180339399A1

公开(公告)日：2018-11-29

申请号：US15775128

申请日：2016-12-01

Applicant: Konica Minolta, Inc.

Inventor： Chie INUI ,  Akihiro MAEZAWA ,  Yuuki NAGAI ,  Natsumi HIRAYAMA

IPC: B24B57/02

Abstract: An object of the present invention is to provide an abrasive slurry regeneration method capable of efficiently regenerating an abrasive slurry having a high polishing rate. The abrasive slurry regeneration method is an abrasive slurry regeneration method for polishing a polishing target containing silicon oxide as a main component using an abrasive slurry containing abrasive particles and a plurality of kinds of additives and then regenerating a collected abrasive slurry, characterized by including a regeneration step of collecting an additive having a molecular weight of 500 or more and an additive adsorbed by the abrasive particles among additives contained in the collected abrasive slurry together with the abrasive particles while an abrasive concentration (% by mass) is maintained within a range of 0.2 to 3000% with respect to an abrasive concentration (% by mass) of an unused abrasive slurry when being used for polishing a polishing target.

公开(公告)号：US20160194538A1

公开(公告)日：2016-07-07

申请号：US14910986

申请日：2014-07-28

Applicant: KONICA MINOLTA, INC.

Inventor： Keisuke MIZOGUCHI ,  Akihiro MAEZAWA ,  Natsuki ITO ,  Atsushi TAKAHASHI ,  Hideaki WAKAMATSU ,  Yuuki NAGAI ,  Chie INUI

IPC: C09K3/14 ,  B24C11/00 ,  C09G1/02

CPC classification number: C09K3/1409 ,  B24C11/00 ,  C01F17/0043 ,  C01P2004/03 ,  C01P2004/32 ,  C01P2004/52 ,  C01P2004/54 ,  C01P2004/61 ,  C01P2004/62 ,  C01P2004/64 ,  C09G1/02 ,  C09K3/1463

Abstract: Disclosed are polishing material particles which have polishing performance suitable for precision polishing and also have a high polishing speed and high monodispersibility; a polishing material containing the polishing material particles; and a polishing processing method using the polishing material. The polishing material particles are spherical particles having an average aspect ratio of 1.00 to 1.15, wherein the particle diameter (D50 (nm)) of the polishing material particles as determined from a particle diameter cumulative distribution curve falls within the range from 50 to 1500 nm. The average content of cerium or the total content of cerium and at least one element selected from lanthanum (La), praseodymium (Pr), neodymium (Nd), samarium (Sm) and europium (Eu) in the polishing material particles is 81 mol % or more relative to the total content of all of rare earth elements that constitute the polishing material particles.

Abstract translation: 公开了具有适合于精密抛光的抛光性能并且还具有高抛光速度和高单分散性的抛光材料颗粒; 包含抛光材料颗粒的抛光材料; 以及使用研磨材料的研磨处理方法。 抛光材料颗粒是平均纵横比为1.00至1.15的球形颗粒，其中由粒径累积分布曲线确定的抛光材料颗粒的粒径（D50（nm））落在50至1500nm的范围内 。 在研磨材料颗粒中，铈的平均含量或铈和至少一种选自镧（La），镨（Pr），钕（Nd），钐（Sm）和铕（Eu）的元素的含量为81mol 相对于构成抛光材料颗粒的所有稀土元素的总含量为％以上。