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63 条记录 (耗时 0.024 秒)

    Mounting method
    1.
    发明授权
    Mounting method 失效
    安装方法

    公开(公告)号：US5687947A

    公开(公告)日：1997-11-18

    申请号：US422932

    申请日：1995-04-17

    申请人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    发明人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    IPC分类号： G03F7/20 ,  G12B5/00 ,  F16M13/00

    CPC分类号： G03F7/707 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70883 ,  G12B5/00

    摘要： A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

    摘要翻译： 公开了一种在真空容器中支撑或安装用于支撑掩模和晶片的精密仪器的方法。 该方法特别适用于SOR X射线曝光装置，其中掩模和晶片被设置在期望的减压水平，并且包含在同步加速器辐射中的诸如X射线的曝光能量通过掩模投射到晶片上 以将掩模的图案打印到晶片上。 在x方向垂直的x-y-z坐标系中，将精密仪器挂在至少两个x方向间隔的点上，与真空容器的内壁相连。 在其中一个支撑点上，精密仪器具有x，y和z方向运动的纬度，而在另一个支撑点，精密仪器是固定的，或仅在x方向上被赋予纬度。 通过这种布置，当真空容器因内部和外部压力之间的差异而变形时，可以正确地支撑精密仪器。

    X-ray exposure system
    3.
    发明授权
    X-ray exposure system 失效
    X射线曝光系统

    公开(公告)号：US5128975A

    公开(公告)日：1992-07-07

    申请号：US641332

    申请日：1991-01-15

    申请人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma

    发明人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/707 ,  G03F7/708

    摘要： An X-ray exposure system for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask and the wafer are held on a main frame so that their surfaces extend substantially parallel to a vertical axis. The main frame suspends from a supporting frame through a plurality of air mounts, each being vertically displaceable. The supporting frame is placed on the same reference surface as that of an SOR ring that produces synchrotron radiation. By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation, as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.

    摘要翻译： 公开了一种用于将半导体晶片暴露于具有同步加速器辐射中所含的X射线的掩模的X射线曝光系统。 在该系统中，掩模和晶片被保持在主框架上，使得其表面基本上平行于垂直轴线延伸。 主框架通过多个空气支架从支撑框架悬挂，每个空气支架可垂直移动。 支撑框架放置在与产生同步加速器辐射的SOR环相同的参考表面上。 通过使用这些空气支架，可以控制掩模和晶片相对于照射区域相对于同步加速器辐射的照射区域的任何倾斜以及掩模和晶片在垂直方向上的位置。 并保持不变。 因此，确保了精确的图案印刷。

    Substrate conveying apparatus
    5.
    发明授权
    Substrate conveying apparatus 失效
    基板输送装置

    公开(公告)号：US5277539A

    公开(公告)日：1994-01-11

    申请号：US58791

    申请日：1993-05-10

    申请人： Shin Matsui ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Shunichi Uzawa

    发明人： Shin Matsui ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  H01L21/677 ,  H01L21/68 ,  B65G47/24

    CPC分类号： G03F7/70691 ,  H01L21/67766 ,  H01L21/67778 ,  H01L21/68

    摘要： A substrate conveying apparatus usable with a semiconductor manufacturing apparatus wherein a pattern of a mask is transferred onto a semiconductor wafer by exposing the semiconductor wafer to synchrotron orbital radiation or other exposure energy through a mask. The conveying apparatus transfers the semiconductor wafer to and from a wafer chuck while the surface thereof extends vertically, and/or transfers the wafer to and from a wafer cassette which contains a plurality of wafers horizontally. The apparatus includes a conveying hand having a gimbal mechanism for supporting the semiconductor wafer to assure the semiconductor wafer transfer to and from the wafer chuck while the wafer is vertical. When the semiconductor wafer is transferred to and from a wafer cassette, the apparatus is provided with a correcting mechanism for correcting the attitude of the conveying hand to prevent the semiconductor wafer from contacting the wafer cassette.

    摘要翻译： 一种可用于半导体制造装置的基板输送装置，其中通过将半导体晶片暴露于同步加速器轨道辐射或通过掩模的其他曝光能量将掩模的图案转印到半导体晶片上。 输送装置将晶片卡盘的表面向垂直方向延伸和/或从晶片卡盘传送半导体晶片，和/或将晶片从包含多个晶片的晶片盒水平地传送到晶片盒。 该装置包括具有用于支撑半导体晶片的万向架机构的传送手，以确保半导体晶片在晶片垂直时传送到晶片卡盘。 当将半导体晶片转移到晶片盒或从晶片盒转移时，该装置设置有校正机构，用于校正传送手的姿态以防止半导体晶片接触晶片盒。

    Temperature controlling device for mask and wafer holders
    7.
    发明授权
    Temperature controlling device for mask and wafer holders 失效
    面罩和晶圆座的温度控制装置

    公开(公告)号：US5577552A

    公开(公告)日：1996-11-26

    申请号：US412101

    申请日：1995-03-28

    申请人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    发明人： Ryuichi Ebinuma ,  Takao Kariya ,  Nobutoshi Mizusawa ,  Koji Uda ,  Eiji Sakamoto ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G05D23/19 ,  H05K7/20 ,  F28D15/00

    CPC分类号： H05K7/20281 ,  G03F7/707 ,  G03F7/70875 ,  G05D23/1919

    摘要： A temperature controlling device suitably usable in a semiconductor microcircuit manufacturing exposure apparatus exposes a semiconductor wafer to a mask to print a pattern of the mask on the wafer. The device includes a constant-temperature liquid medium supplying system for controlling temperature of a liquid at high precision, a distributing system for distributing the supplied liquid medium into plural flow passages, to supply the liquid medium to plural subjects of control such as, for example, a mask stage, a wafer stage and the like. The device further includes a plurality of temperature controls each being provided in corresponding one of the flow passages, for correction of any variance in temperature of the distributed liquid medium, resulting from pressure loss energies in the respective flow passages. Thus, temperatures of plural subjects of control can be controlled efficiently and with a simple structure.

    摘要翻译： 可适用于半导体微电路制造曝光装置的温度控制装置将半导体晶片暴露于掩模，以将掩模的图案印刷在晶片上。 该装置包括用于高精度地控制液体的温度的恒温液体介质供给系统，用于将供应的液体介质分配到多个流动通道中的分配系统，以将液体介质供应到多个控制对象，例如 ，掩模台，晶片台等。 该装置还包括多个温度控制装置，每个温度控制装置设置在对应的一个流动通道中，用于校正由相应流动通道中的压力损失能量产生的分配液体介质的温度变化。 因此，能够以简单的结构有效地控制多个控制对象的温度。

    Exposure apparatus
    8.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5161176A

    公开(公告)日：1992-11-03

    申请号：US802705

    申请日：1991-12-06

    申请人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

    发明人： Ryuichi Ebinuma ,  Kunitaka Ozawa ,  Takao Kariya ,  Shunichi Uzawa ,  Noriyuki Nose

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/70066

    摘要： An exposure apparatus includes a light source for exposing a wafer through a mask; a light blocking device being movable and effective to block light from the light source to limit an exposure zone; a positional deviation detecting system for detecting positional deviation between the mask and the wafer; and a drive control system for moving the light blocking device to execute position control therefor, on the basis of a detection signal from the positional deviation detecting system.

    摘要翻译： 曝光装置包括用于通过掩模曝光晶片的光源; 遮光装置可移动并且有效地阻挡来自光源的光以限制曝光区域; 用于检测掩模和晶片之间的位置偏差的位置偏差检测系统; 以及驱动控制系统，用于基于来自位置偏差检测系统的检测信号移动遮光装置以执行其位置控制。

    Exposure apparatus
    9.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US5390227A

    公开(公告)日：1995-02-14

    申请号：US062151

    申请日：1993-05-17

    申请人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Takao Kariya ,  Isamu Shimoda ,  Shunichi Uzawa

    发明人： Nobutoshi Mizusawa ,  Ryuichi Ebinuma ,  Takao Kariya ,  Isamu Shimoda ,  Shunichi Uzawa

    IPC分类号： G03F7/20 ,  G21K5/00

    CPC分类号： G03F7/70066 ,  G03F7/702 ,  G03F7/70858 ,  G03F7/70875

    摘要： An exposure apparatus for exposing a semiconductor wafer to a semiconductor device pattern formed in a mask. The exposure energy is, for example, X-rays contains in synchrotron orbit radiation. A blade for limiting the area irradiated with the exposure energy on a mask or wafer is integrally movable in an alignment detecting unit for detecting the alignment mark. Four of such blades are provided to provide a square exposure area. The blades are movable independently by the associated alignment detecting units. Each of the blades is finely movable relative to the associated alignment detecting unit. The shape or size or the like of the blade is determined in consideration of the position of the blade in the direction of the exposure energy irradiation, and the maximum and minimum exposure view angle. The blade is cooled. The exposure area can be changed highly accurately and efficiently with a simple structure.

    摘要翻译： 一种用于将半导体晶片暴露于形成在掩模中的半导体器件图案的曝光装置。 曝光能量例如是X射线含有同步加速器轨道辐射。 用于将在曝光能量上照射的面积限制在掩模或晶片上的刀片可在用于检测对准标记的对准检测单元中一体地移动。 提供四个这样的刀片以提供方形曝光区域。 叶片可通过相关联的对准检测单元独立地移动。 每个叶片相对于相关联的对准检测单元精细地移动。 考虑到叶片在曝光能量照射方向上的位置以及最大和最小曝光视角来确定叶片的形状或尺寸等。 刀片冷却。 曝光区域可以用简单的结构高精度高效地进行改变。