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33 条记录 (耗时 0.025 秒)

    Mounting method
    3.
    发明授权
    Mounting method 失效
    安装方法

    公开(公告)号：US5687947A

    公开(公告)日：1997-11-18

    申请号：US422932

    申请日：1995-04-17

    申请人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    发明人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma ,  Hiroshi Chiba ,  Shinkichi Ohkawa

    IPC分类号： G03F7/20 ,  G12B5/00 ,  F16M13/00

    CPC分类号： G03F7/707 ,  G03F7/70841 ,  G03F7/70858 ,  G03F7/70866 ,  G03F7/70883 ,  G12B5/00

    摘要： A method of supporting or mounting a precision instrument for supporting a mask and a wafer in a vacuum container is disclosed. The method is particularly applicable to an SOR X-ray exposure apparatus wherein the mask and the wafer are disposed in a desired level of the reduced pressure, and exposure energy such as X-rays contained in synchrotron radiation is projected onto the wafer through the mask to print the pattern of the mask onto the wafer. In x-y-z coordinates with the x direction being vertical, the precision instrument is hung at at least two points which are spaced in the x direction, to the inside wall of the vacuum container. At one of the supporting points, the precision instrument is given latitude of x, y and z direction movement, and at the other supporting point, the precision instrument is fixed or is given latitude only in the x direction. By this arrangement, when the vacuum container deforms by the difference between the internal and external pressures, the precision instrument can be supported correctly.

    摘要翻译： 公开了一种在真空容器中支撑或安装用于支撑掩模和晶片的精密仪器的方法。 该方法特别适用于SOR X射线曝光装置，其中掩模和晶片被设置在期望的减压水平，并且包含在同步加速器辐射中的诸如X射线的曝光能量通过掩模投射到晶片上 以将掩模的图案打印到晶片上。 在x方向垂直的x-y-z坐标系中，将精密仪器挂在至少两个x方向间隔的点上，与真空容器的内壁相连。 在其中一个支撑点上，精密仪器具有x，y和z方向运动的纬度，而在另一个支撑点，精密仪器是固定的，或仅在x方向上被赋予纬度。 通过这种布置，当真空容器因内部和外部压力之间的差异而变形时，可以正确地支撑精密仪器。

    X-ray exposure system
    4.
    发明授权
    X-ray exposure system 失效
    X射线曝光系统

    公开(公告)号：US5128975A

    公开(公告)日：1992-07-07

    申请号：US641332

    申请日：1991-01-15

    申请人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma

    发明人： Kazunori Iwamoto ,  Shunichi Uzawa ,  Takao Kariya ,  Ryuichi Ebinuma

    IPC分类号： G03F9/00 ,  G03F7/20 ,  H01L21/027 ,  H01L21/30

    CPC分类号： G03F7/707 ,  G03F7/708

    摘要： An X-ray exposure system for exposing a semiconductor wafer to a mask with X-rays contained in synchrotron radiation, is disclosed. In this system, the mask and the wafer are held on a main frame so that their surfaces extend substantially parallel to a vertical axis. The main frame suspends from a supporting frame through a plurality of air mounts, each being vertically displaceable. The supporting frame is placed on the same reference surface as that of an SOR ring that produces synchrotron radiation. By using these air mounts, any tilt of the mask and the wafer relative to the irradiation region of the synchrotron radiation, as well as the position of the mask and the wafer in the vertical direction, with respect to the irradiation region, can be controlled and maintained constant. Thus, accurate pattern printing is ensured.

    摘要翻译： 公开了一种用于将半导体晶片暴露于具有同步加速器辐射中所含的X射线的掩模的X射线曝光系统。 在该系统中，掩模和晶片被保持在主框架上，使得其表面基本上平行于垂直轴线延伸。 主框架通过多个空气支架从支撑框架悬挂，每个空气支架可垂直移动。 支撑框架放置在与产生同步加速器辐射的SOR环相同的参考表面上。 通过使用这些空气支架，可以控制掩模和晶片相对于照射区域相对于同步加速器辐射的照射区域的任何倾斜以及掩模和晶片在垂直方向上的位置。 并保持不变。 因此，确保了精确的图案印刷。

    Substrate holding device and exposing apparatus using the same
    7.
    发明授权
    Substrate holding device and exposing apparatus using the same 失效
    基板保持装置和使用其的曝光装置

    公开(公告)号：US5883932A

    公开(公告)日：1999-03-16

    申请号：US464225

    申请日：1995-06-05

    申请人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    发明人： Yuji Chiba ,  Nobutoshi Mizusawa ,  Kazunori Iwamoto ,  Yutaka Tanaka ,  Shinichi Hara ,  Mitsuji Marumo ,  Shin Matsui ,  Hiroshi Kurosawa

    IPC分类号： B23Q3/08 ,  G03F7/20 ,  G03F9/00 ,  H01L21/027 ,  H01L21/30 ,  H01L21/683 ,  H01J37/20

    CPC分类号： G03F7/707 ,  H01L21/6838 ,  H01J2237/20 ,  H01J2237/3175 ,  Y10T279/11

    摘要： A substrate holding apparatus in which first and second vacuum clamping devices each have a holding surface for holding a portion of a substrate, a first driving device for rotating the first vacuum clamping device relative to the second vacuum clamping device, and a second driving device for reciprocally moving the first vacuum clamping device between a position in which it protrudes by a predetermined amount from the holding surface of the second vacuum clamping device and a position in which it does not protrude from that holding surface. Also disclosed is a substrate holding device in which a vacuum clamping device creates a vacuum clamp force on the holding surface thereof, a cylindrical delivering member surrounds at least a portion of the holding surface and is reciprocally movable between a position in which it protrudes by a predetermined amount from the holding surface and a position in which it does not protrude from the holding surface, and a driving device for moving the delivering member.

    摘要翻译： 一种基板保持装置，其中第一和第二真空夹紧装置各自具有用于保持基板的一部分的保持表面，用于使第一真空夹紧装置相对于第二真空夹紧装置旋转的第一驱动装置，以及用于 在第一真空夹紧装置从第二真空夹紧装置的保持表面突出预定量的位置和不从该保持表面突出的位置之间往复移动第一真空夹紧装置。 还公开了一种基板保持装置，其中真空夹持装置在其保持表面上产生真空夹紧力，圆柱形输送构件围绕保持表面的至少一部分，并且可在其突出位置之间往复运动 从保持表面预定量和不从保持表面突出的位置，以及用于移动输送构件的驱动装置。

    Exposure apparatus
    8.
    发明授权
    Exposure apparatus 失效
    曝光装置

    公开(公告)号：US6133982A

    公开(公告)日：2000-10-17

    申请号：US968726

    申请日：1997-11-12

    申请人： Mitsuru Inoue ,  Ryuichi Ebinuma ,  Kazunori Iwamoto ,  Hideki Nogawa

    发明人： Mitsuru Inoue ,  Ryuichi Ebinuma ,  Kazunori Iwamoto ,  Hideki Nogawa

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/52

    CPC分类号： G03F7/70691 ,  G03F7/70358 ,  G03F7/70833 ,  G03F7/709

    摘要： An exposure apparatus having an optical stand for supporting a projecting optical system and a reticle stage, and a base frame have a plurality of struts for supporting the optical stand via dampers. The plurality of struts of the base frame are joined at their upper ends to increase the rigidity of the base frame, thereby reducing vibration caused by acceleration and deceleration of the reticle stage.

    摘要翻译： 具有用于支撑投影光学系统和标线片台的光学支架的曝光装置和具有用于通过阻尼器支撑光学支架的多个支柱的基座框架。 底架的多个支柱在其上端连接以增加基架的刚性，从而减少由于标线片台的加速和减速引起的振动。

    Exposure apparatus and device manufacturing method using the same
    9.
    发明授权
    Exposure apparatus and device manufacturing method using the same 失效
    曝光装置及其制造方法

    公开(公告)号：US5933215A

    公开(公告)日：1999-08-03

    申请号：US867355

    申请日：1997-06-02

    申请人： Mitsuru Inoue ,  Ryuichi Ebinuma ,  Kazunori Iwamoto ,  Eiji Osanai ,  Hiroaki Takeishi

    发明人： Mitsuru Inoue ,  Ryuichi Ebinuma ,  Kazunori Iwamoto ,  Eiji Osanai ,  Hiroaki Takeishi

    IPC分类号： G03F7/20 ,  H01L21/027 ,  G03B27/42 ,  G03B27/58 ,  G03B27/62

    CPC分类号： G03F7/70358 ,  G03F7/70716 ,  G03F7/70725 ,  G03F7/70833 ,  G03F7/709

    摘要： A scanning exposure apparatus wherein a portion of a pattern of an original is projected onto a substrate through a projection optical system and the original and substrate are scanningly moved relative to the projection optical system, whereby the pattern of the original is transferred onto the substrate. The apparatus includes an original stage for holding the original, a base for supporting the original stage, and a supporting device for supporting the base at three positions, through a damper device and a pillar device. The three positions define an approximately isosceles triangle, and the scan direction is parallel to a straight line that connects a point of intersection of isosceles sides of the triangle and a gravity center thereof.

    摘要翻译： 一种扫描曝光装置，其中通过投影光学系统将原稿的图案的一部分投影到基板上，并且原稿和基板相对于投影光学系统扫描地移动，由此将原稿的图案转印到基板上。 该装置包括用于保持原稿的原稿台，用于支撑原稿台的基座和用于通过阻尼器装置和支柱装置在三个位置支撑基座的支撑装置。 三个位置限定大致等腰三角形，并且扫描方向平行于连接三角形的等腰面的交点与其重心的直线。

    Wafer table and exposure apparatus with the same
    10.
    发明授权
    Wafer table and exposure apparatus with the same 失效
    晶圆台和曝光装置相同

    公开(公告)号：US5231291A

    公开(公告)日：1993-07-27

    申请号：US821888

    申请日：1992-01-17

    申请人： Mitsuaki Amemiya ,  Eiji Sakamoto ,  Koji Uda ,  Kunitaka Ozawa ,  Kazunori Iwamoto ,  Shunichi Uzawa ,  Mitsuji Marumo

    发明人： Mitsuaki Amemiya ,  Eiji Sakamoto ,  Koji Uda ,  Kunitaka Ozawa ,  Kazunori Iwamoto ,  Shunichi Uzawa ,  Mitsuji Marumo

    IPC分类号： G03F7/20 ,  H01L21/00 ,  H01L21/687

    CPC分类号： H01L21/67109 ,  G03F7/2041 ,  G03F7/707 ,  G03F7/70866 ,  G03F7/70875

    摘要： A wafer table includes a wafer holding surface for holding a wafer by attraction; a flow passageway through which a temperature adjusting medium flows to remove any heat in the wafer table; a temperature measuring system for measuring the temperature of the wafer held by the wafer holding surface; a temperature adjusting system disposed between the wafer holding surface and the flow passageway; a temperature setting system for setting a temperature related to the wafer held by the wafer holding surface; a flow rate controlling system for controlling the flow rate of the temperature adjusting medium to be circulated through the flow passageway; and a temperature controlling system for controlling the operation of the temperature adjusting system related to heat, on the basis of a value set by the temperature setting system and a value measured by the temperature measuring system.

    摘要翻译： 晶片台包括用于通过吸引保持晶片的晶片保持表面; 流动通道，温度调节介质通过该通道流动以去除晶片台中的任何热量; 用于测量由晶片保持表面保持的晶片的温度的温度测量系统; 设置在晶片保持表面和流动通道之间的温度调节系统; 用于设定与晶片保持面保持的晶片有关的温度的温度设定系统; 流量控制系统，用于控制温度调节介质流过所述流动通道的流量; 以及温度控制系统，用于基于由温度设定系统设定的值和由温度测量系统测量的值来控制与热量相关的温度调节系统的操作。