METHOD OF FABRICATING SEE-THROUGH THIN FILM SOLAR CELL

    公开(公告)号:US20210135041A1

    公开(公告)日:2021-05-06

    申请号:US17067766

    申请日:2020-10-12

    Abstract: Provided is a method of fabricating a see-through thin film solar cell, the method including preparing a substrate including a molybdenum (Mo) layer on one surface, forming see-through patterns by selectively removing at least parts of the Mo layer, sequentially depositing a chalcogenide absorber layer, a buffer layer, and a transparent electrode layer on the substrate and the Mo layer including the see-through patterns, and forming a see-through array according to a shape of the see-through patterns by removing the chalcogenide absorber layer, the buffer layer, and the transparent electrode layer deposited on the see-through patterns, by irradiating a laser beam from under the substrate toward the transparent electrode layer.

    FLEXIBLE ELECTRODES AND PREPARATION METHOD THEREOF, AND FLEXIBLE DYE-SENSITIZED SOLAR CELLS USING THE SAME
    4.
    发明申请
    FLEXIBLE ELECTRODES AND PREPARATION METHOD THEREOF, AND FLEXIBLE DYE-SENSITIZED SOLAR CELLS USING THE SAME 审中-公开
    柔性电极及其制备方法,以及使用其的柔性透明的太阳能电池

    公开(公告)号:US20150302997A1

    公开(公告)日:2015-10-22

    申请号:US14789234

    申请日:2015-07-01

    Abstract: The present invention relates to a flexible photoelectrode and a manufacturing method thereof, and a dye-sensitized solar cell using the same. More particularly, the present invention relates to a flexible photoelectrode capable of forming a semiconductor electrode with excellent photoelectric conversion efficiency on a plastic substrate at low temperatures in a simple and stable manner, in which it is prepared by forming a nanocrystalline metal oxide layer calcined at high temperature on a high temperature resistant substrate, and transferring it to a flexible transparent substrate by a transfer method using an HF solution, and a flexible dye-sensitized solar cell comprising the same.

    Abstract translation: 柔性光电极及其制造方法技术领域本发明涉及柔性光电极及其制造方法以及使用其的染料敏化太阳能电池。 更具体地说,本发明涉及能够以简单且稳定的方式在低温下在塑料基板上形成具有优异的光电转换效率的半导体电极的柔性光电极,其中通过形成在 耐高温基板的高温,通过使用HF溶液的转印方法将其转印到柔性透明基板上,以及含有该溶液的柔性染料敏化太阳能电池。

    METHOD FOR MANUFACTURING THIN FILM SOLAR CELL AND MODULE STRUCTURE OF THIN FILM SOLAR CELL
    6.
    发明申请
    METHOD FOR MANUFACTURING THIN FILM SOLAR CELL AND MODULE STRUCTURE OF THIN FILM SOLAR CELL 有权
    制造薄膜太阳能电池的方法和薄膜太阳能电池的模块结构

    公开(公告)号:US20160126376A1

    公开(公告)日:2016-05-05

    申请号:US14803843

    申请日:2015-07-20

    Abstract: A method for manufacturing a thin film solar cell includes: depositing a transparent first rear electrode on a first surface of a transparent substrate; depositing a second rear electrode having a high-conductive metal on the first rear electrode; performing a first laser scribing process to separate a double layer of the first and second rear electrodes; depositing a light absorption layer having selenium (Se) or sulfur (S) on the second rear electrode; performing a second laser scribing process by inputting a laser to a second surface of the transparent substrate to separate the light absorption layer; depositing a transparent electrode on the light absorption layer; and performing a third laser scribing process by inputting a laser to the second surface to separate the transparent electrode. Accordingly, patterning may be performed in a substrate-incident laser manner to improve price, productivity and precision of the patterning process.

    Abstract translation: 一种制造薄膜太阳能电池的方法包括:在透明基板的第一表面上沉积透明的第一后电极; 在所述第一后电极上沉积具有高导电金属的第二后电极; 执行第一激光划线工艺以分离第一和第二后电极的双层; 在第二后电极上沉积具有硒(Se)或硫(S)的光吸收层; 通过将激光输入到所述透明基板的第二表面以分离所述光吸收层来执行第二激光划线处理; 在所述光吸收层上沉积透明电极; 以及通过将激光输入到所述第二表面以分离所述透明电极来执行第三激光划线处理。 因此,可以以基板入射激光的方式进行图案化,以提高图案化处理的价格,生产率和精度。

    PLASMONIC NANO-COLOR COATING LAYER AND METHOD FOR FABRICATING THE SAME
    7.
    发明申请
    PLASMONIC NANO-COLOR COATING LAYER AND METHOD FOR FABRICATING THE SAME 有权
    等离子体纳米颜料涂层及其制造方法

    公开(公告)号:US20150116856A1

    公开(公告)日:2015-04-30

    申请号:US14219506

    申请日:2014-03-19

    Abstract: A plasmonic nano-color coating layer includes a composite layer including a plurality of metal particle layers and a plurality of matrix layers and having a periodic multilayer structure in which the metal particle layers and the matrix layers are alternately arranged, a dielectric buffer layer located below the composite layer, and a mirror layer located below the dielectric buffer layer, wherein the color of the plasmonic nano-color coating layer is determined based on a nominal thickness of the metal particle layer and a separation between the metal particle layers.

    Abstract translation: 等离子体激光纳米彩色涂层包括复合层,该复合层包括多个金属颗粒层和多个矩阵层,并且具有周期性多层结构,其中金属颗粒层和矩阵层交替布置,介质缓冲层位于下面 复合层和位于介质缓冲层下面的镜层,其中基于金属颗粒层的标称厚度和金属颗粒层之间的间隔来确定等离子体激元纳米彩色涂层的颜色。

    METHOD FOR FABRICATING NANOANTENNA ARRAY, NANOANTENNA ARRAY CHIP AND STRUCTURE FOR LITHOGRAPHY
    10.
    发明申请
    METHOD FOR FABRICATING NANOANTENNA ARRAY, NANOANTENNA ARRAY CHIP AND STRUCTURE FOR LITHOGRAPHY 有权
    用于制作纳米诺纳纳阵列的方法,纳米级阵列芯片和结构图

    公开(公告)号:US20150146180A1

    公开(公告)日:2015-05-28

    申请号:US14253522

    申请日:2014-04-15

    Abstract: A method for fabricating a nanoantenna array may include forming a resist layer on a substrate, forming a focusing layer having a dielectric microstructure array on the resist layer, diffusing light one-dimensionally in a specific direction by using a linear diffuser, forming an anisotropic pattern on the resist layer by illuminating the light diffused by the linear diffuser on the focusing layer and the resist layer, depositing a material suitable for a plasmonic resonance onto the substrate and the resist layer on which the pattern is formed, and forming a nanoantenna array on the substrate by removing the resist layer and the material deposited on the resist layer. A light diffusing angle by the linear diffuser and a size of the dielectric microstructure are determined based on an aspect ratio of the pattern to be formed.

    Abstract translation: 制造纳米天线阵列的方法可以包括在基板上形成抗蚀剂层,在抗蚀剂层上形成具有电介质微结构阵列的聚焦层,通过使用线性漫射器在特定方向上一维地漫射光,形成各向异性图案 在抗蚀剂层上通过在聚焦层和抗蚀剂层上照射由线性扩散器扩散的光,将适合于等离子体激元谐振的材料沉积到衬底上并形成图案的抗蚀剂层上,并形成纳米天线阵列 通过去除抗蚀剂层和沉积在抗蚀剂层上的材料来形成衬底。 基于要形成的图案的纵横比来确定通过线性漫射器的光散射角和电介质微结构的尺寸。

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