公开(公告)号：US07459701B2

公开(公告)日：2008-12-02

申请号：US11147465

申请日：2005-06-08

申请人： Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Frederik Hoogkamp ,  Albert Johannes Maria Jansen ,  Jan-Jaap Kuit ,  Peter Schaap ,  Joep Janssen ,  Hubrecht Bastiaan Jasperse ,  Arjan Martin Van Der Wel

发明人： Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Frederik Hoogkamp ,  Albert Johannes Maria Jansen ,  Jan-Jaap Kuit ,  Peter Schaap ,  Joep Janssen ,  Hubrecht Bastiaan Jasperse ,  Arjan Martin Van Der Wel

IPC分类号： A61N5/00

CPC分类号： G03F7/707

摘要： A stage apparatus for displacing an object having a substantially flat surface is described. The apparatus includes an object table for supporting the object and a positioning device for displacing the object table in a first direction. The apparatus further includes a clamping device for clamping the object to the object table by a first clamping force, the first clamping force being controlled by an electronic control unit based upon a state of the object.

摘要翻译： 描述了用于移位具有基本平坦表面的物体的平台装置。 该装置包括用于支撑物体的物体台和用于沿着第一方向移动物体台的定位装置。 该装置还包括用于通过第一夹持力将物体夹持到物体台的夹紧装置，第一夹紧力由电子控制单元基于物体的状态控制。

公开(公告)号：US07884919B2

公开(公告)日：2011-02-08

申请号：US11350278

申请日：2006-02-09

申请人： Peter Hempenius ,  Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Youssef Karel Maria De Vos

发明人： Peter Hempenius ,  Marcel Koenraad Marie Baggen ,  Dirk-Jan Bijvoet ,  Sjoerd Nicolaas Lambertus Donders ,  Youssef Karel Maria De Vos

IPC分类号： G03B27/42

CPC分类号： G03F7/707

摘要： A device manufacturing method includes transferring a pattern from a patterning device onto a substrate. The method includes bringing the patterning device and the support together, and applying a substantially stationary force between the patterning device and the support to hold the patterning device. The patterning device is now excited by a substantially dynamic force to enable a micro slipping thereof. Then, the patterning device is aligned, and the pattern is transferred from the patterning device onto the substrate. The patterning device may be excited with an alternating acceleration. When the patterning device is excited, the patterning device is allowed to settle with respect to the support, thereby improving a friction therebetween to reduce a risk of slipping or local slipping of the patterning device.

摘要翻译： 一种器件制造方法包括将图案从图案形成装置转移到衬底上。 该方法包括将图案形成装置和支撑件组合在一起，并且在图案形成装置和支撑件之间施加基本上静止的力以保持图案形成装置。 图案形成装置现在被基本上动态的力激发以使其能够滑动。 然后，图案形成装置对准，并且图案从图案形成装置转移到基板上。 图案形成装置可以用交替的加速度激发。 当图案形成装置被激发时，允许图案形成装置相对于支撑件沉降，从而改善它们之间的摩擦，以减少图案形成装置的滑动或局部滑动的风险。

公开(公告)号：US07486384B2

公开(公告)日：2009-02-03

申请号：US10813687

申请日：2004-03-31

申请人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Patrick Johannes Cornelus Hendrik Smulders ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

发明人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Johannes Van Meer ,  Patrick Johannes Cornelus Hendrik Smulders ,  Franciscus Andreas Cornelis Johannes Spanjers ,  Johannes Petrus Martinus Bernardus Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

IPC分类号： G03B27/58 ,  G03B27/62

CPC分类号： G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

摘要： The present invention relates to a lithographic projection apparatus with a supporting structure to support and move an object, like a substrate. The supporting structure may be a robot having a robotic arm with a support frame for supporting, e.g. the substrate. The support frame includes a clamping structure having one or more clamps for holding the substrate during movement. The robot arm comprises one or more compliant parts. The clamp may be a Johnson-Raybeck effect type clamp with an oxidized upper surface. For better de-clamping, a RF AC decaying de-clamping voltage may be provided to the clamp. The apparatus may be cleaned with one single substrate only.

摘要翻译： 本发明涉及具有支撑结构以支撑和移动物体（如基底）的光刻投影装置。 支撑结构可以是具有机器人臂的机器人，其具有支撑框架的支撑框架，例如。 底物。 支撑框架包括具有用于在移动期间保持基板的一个或多个夹具的夹持结构。 机器人手臂包括一个或多个柔顺部件。 夹具可以是具有氧化的上表面的Johnson-Raybeck效应型夹具。 为了更好地去夹紧，可以向夹具提供RF AC衰减的去钳位电压。 该装置可以仅用一个单一的衬底清洁。

公开(公告)号：US20080297758A1

公开(公告)日：2008-12-04

申请号：US12213930

申请日：2008-06-26

申请人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Van Meer ,  Patrick Johannes Cornelus Smulders ,  Franciscus Andreas Cornelis Spanjers ,  Johannes Petrus Martinus Ber Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

发明人： Patricius Aloysius Jacobus Tinnemans ,  Edwin Johan Buis ,  Sjoerd Nicolaas Lambertus Donders ,  Jan Van Elp ,  Jan Frederik Hoogkamp ,  Aschwin Lodewijk Hendricus Van Meer ,  Patrick Johannes Cornelus Smulders ,  Franciscus Andreas Cornelis Spanjers ,  Johannes Petrus Martinus Ber Vermeulen ,  Raimond Visser ,  Henricus Gerardus Tegenbosch ,  Johannes Charles Adrianus Van Den Berg ,  Henricus Johannes Adrianus Van De Sande ,  Thijs Vervoort

IPC分类号： G03B27/58

CPC分类号： G03F7/70741 ,  B25J13/089 ,  G03F7/7075 ,  G03F7/70925 ,  H01L21/6833 ,  H02N13/00

摘要： The invention relates to a transfer apparatus for transferring an object (W). the transfer apparatus comprises a gripper (15) for at least one of gripping the object (W) at a first position and then releasing the object (W) at a second position proximate to a receiver (20) and releasing the object (W) at a first position after gripping the object at a second position proximate to the receiver (20). The transfer apparatus is further provided with a measurement device (22) arranged to measure the relative position of the gripper (15) with respect to the receiver (20) in at least one dimension. Further, a relative position error is defined with respect to a desired relative position based on the relative position measured. The relative position of the gripper (15) and the receiver (20) are adjusted for minimizing the relative position error in the second position.

摘要翻译： 本发明涉及一种用于传送物体（W）的传送装置。 传送装置包括用于在第一位置处夹持物体（W）的至少一个然后在靠近接收器（20）的第二位置处释放物体（W）的至少一个并且释放物体（W）的夹持器（15） 在靠近接收器（20）的第二位置处夹持物体之后的第一位置。 传送装置还设置有测量装置（22），该测量装置设置成在至少一个维度上测量夹具（15）相对于接收器（20）的相对位置。 此外，基于测量的相对位置，相对于期望的相对位置来定义相对位置误差。 调整夹持器（15）和接收器（20）的相对位置以最小化第二位置中的相对位置误差。

公开(公告)号：US20230251579A1

公开(公告)日：2023-08-10

申请号：US18299534

申请日：2023-04-12

申请人： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

发明人： Raymond Wilhelmus Louis Lafarre ,  Sjoerd Nicolaas Lambertus Donders ,  Nicolaas Ten Kate ,  Nina Vladimirovna Dziomkina ,  Yogesh Pramod Karade ,  Elisabeth Corinne Rodenburg

IPC分类号： G03F7/00 ,  B23K26/354 ,  B23K26/342 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  B05D3/06 ,  B05D5/00 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/06

CPC分类号： G03F7/70341 ,  B23K26/354 ,  B23K26/342 ,  G03F7/70416 ,  G03F7/707 ,  G03F7/70708 ,  B22F10/00 ,  B22F10/20 ,  B23Q3/18 ,  G03F7/20 ,  G03F7/70716 ,  B05D3/06 ,  B05D5/00 ,  G03F7/70733 ,  B33Y10/00 ,  B33Y80/00 ,  B22F7/062 ,  G03F7/708 ,  B22F10/25

摘要： A substrate holder for a lithographic apparatus has a main body having a thin-film stack provided on a surface thereof. The thin-film stack forms an electronic or electric component such as an electrode, a sensor, a heater, a transistor or a logic device, and has a top isolation layer. A plurality of burls to support a substrate are formed on the thin-film stack or in apertures of the thin-film stack.

公开(公告)号：US09632425B2

公开(公告)日：2017-04-25

申请号：US11984825

申请日：2007-11-21

申请人： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Czop McCafferty

发明人： Martinus Hendrikus Antonius Leenders ,  Sjoerd Nicolaas Lambertus Donders ,  Harry Sewell ,  Louis John Markoya ,  Marcus Martinus Petrus Adrianus Vermeulen ,  Diane Czop McCafferty

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： A new way of drying and/or wetting a surface, such as a top surface of a substrate, which is useful in immersion lithography. The surface is placed under a single phase extractor and a priming liquid is delivered between the single phase extractor and the surface. The single phase extractor is only activated after the priming liquid has been provided between the single phase extractor and the surface. Priming liquid is delivered to the single phase extractor during the whole of the drying and/or wetting process.

公开(公告)号：US09541843B2

公开(公告)日：2017-01-10

申请号：US13306532

申请日：2011-11-29

申请人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Joost Jeroen Ottens ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

发明人： Joeri Lof ,  Erik Theodorus Maria Bijlaart ,  Roelof Aeilko Siebrand Ritsema ,  Frank Van Schaik ,  Timotheus Franciscus Sengers ,  Klaus Simon ,  Joannes Theodoor De Smit ,  Arie Jeffrey Maria Den Boef ,  Hans Butler ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Marcus Adrianus Van De Kerkhof ,  Aleksey Yurievich Kolesnychenko ,  Mark Kroon ,  Joost Jeroen Ottens ,  Erik Roelof Loopstra ,  Hendricus Johannes Maria Meijer ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens ,  Alexander Straaijer ,  Bob Streefkerk ,  Helmar Van Santen

IPC分类号： G03B27/52 ,  G03F7/20

CPC分类号： G03F7/70141 ,  G03F7/70341 ,  G03F7/7085 ,  G03F7/70883

摘要： A lithographic projection apparatus and device manufacturing method is disclosed in which a space between a projection system and an object on a substrate table, is at least partly filled with a liquid. A sensor is positioned to be illuminated by a beam of radiation once it has passed through the liquid. An edge seal member may be provided to at least partly surround an edge of the sensor and to provide a primary surface facing the projection system substantially co-planar with a primary surface of the sensor.

摘要翻译： 公开了一种光刻投影装置和装置制造方法，其中投影系统和基板上的物体之间的空间至少部分地被填充液体。 一旦传感器通过液体，传感器被定位成被辐射束照射。 可以设置边缘密封构件以至少部分地围绕传感器的边缘并且提供面向基本上与传感器的主表面平行的投影系统的主表面。

公开(公告)号：US09229335B2

公开(公告)日：2016-01-05

申请号：US13361443

申请日：2012-01-30

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US09146478B2

公开(公告)日：2015-09-29

申请号：US13240946

申请日：2011-09-22

申请人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

发明人： Bob Streefkerk ,  Sjoerd Nicolaas Lambertus Donders ,  Roelof Frederik De Graaf ,  Christiaan Alexander Hoogendam ,  Martinus Hendrikus Antonius Leenders ,  Jeroen Johannes Sophia Maria Mertens ,  Michel Riepen

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70341

摘要： An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.

公开(公告)号：US09104117B2

公开(公告)日：2015-08-11

申请号：US13685410

申请日：2012-11-26

申请人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens

发明人： Bob Streefkerk ,  Johannes Jacobus Matheus Baselmans ,  Sjoerd Nicolaas Lambertus Donders ,  Christiaan Alexander Hoogendam ,  Jeroen Johannes Sophia Maria Mertens ,  Johannes Catharinus Hubertus Mulkens

IPC分类号： G03F7/20 ,  G03F9/00

CPC分类号： G03F7/70341 ,  G03F7/70866 ,  G03F9/7026 ,  G03F9/7034

摘要： In immersion lithography after exposure of a substrate is complete, a detector is used to detect any residual liquid remaining on the substrate and/or substrate table.

摘要翻译： 浸没式光刻在基材曝光完成后，检测器用于检测残留在基片和/或基片台上的任何残留液体。