PLAYBACK APPARATUS FOR PERFORMING APPLICATION- SYNCHRONIZED PLAYBACK
    2.
    发明申请
    PLAYBACK APPARATUS FOR PERFORMING APPLICATION- SYNCHRONIZED PLAYBACK 失效
    用于执行应用同步回放的播放设备

    公开(公告)号:US20100014580A1

    公开(公告)日:2010-01-21

    申请号:US12569952

    申请日:2009-09-30

    IPC分类号: H04N11/04 G06F9/455

    摘要: An integrated circuit stores a module that executes applications that play digital streams. When the module is executed, the integrated circuit generates package information by merging files recorded on a first recording medium and a second recording medium, in accordance with merge management information, detects a plurality of playable titles from the package information, and selects one of the detected titles as a current title. The integrated circuit executes the application associated with the current title, and the executed application makes a request to update the generated package information by specifying new merge management information. The integrated circuit changes a file referenced from the newly specified merge management information to read-only before updating the package information, and at a point at which digital stream playback stops due to a current title change, the integrated circuit generates new package information by combining files recorded on the first and second recording media, in accordance with the newly specified merge management information.

    摘要翻译: 集成电路存储执行播放数字流的应用的模块。 当模块被执行时,集成电路根据合并管理信息合并记录在第一记录介质和第二记录介质上的文件来生成包信息,从包信息中检测多个可播放标题,并选择 检测到标题为当前标题。 集成电路执行与当前标题相关联的应用,并且所执行的应用通过指定新的合并管理信息来请求更新生成的包信息。 集成电路在更新包信息之前将从新指定的合并管理信息引用的文件改变为只读,并且在数字流重放由于当前标题改变而停止的点处,集成电路通过组合生成新的包信息 根据新指定的合并管理信息记录在第一和第二记录介质上的文件。

    INTEGRATED CIRCUIT OR USE IN PLAYBACK APPARATUS
    3.
    发明申请
    INTEGRATED CIRCUIT OR USE IN PLAYBACK APPARATUS 有权
    集成电路或用于播放设备

    公开(公告)号:US20090202228A1

    公开(公告)日:2009-08-13

    申请号:US12426539

    申请日:2009-04-20

    IPC分类号: H04N7/26

    摘要: An integrated circuit includes a storage that stores a module that has a function of a virtual machine for executing an application recorded on a recording medium. The integrated circuit also includes a central processing unit that executes the module to cause the virtual machine to function and a decoder, that is distinct from the central processing unit, that decodes a video stream and an audio stream that are included in digital streams stored on a recording media. When the central processing unit executes the module, a package manager manages status information of the digital streams. If at least one of the digital streams is in an enable status, the decoder decodes the digital stream. When the decoder decodes the digital stream, the package manager changes the status information of another digital stream to an enable status or a disable status according to a request from the application.

    摘要翻译: 集成电路包括存储具有用于执行记录在记录介质上的应用的虚拟机的功能的模块的存储器。 集成电路还包括执行模块以使虚拟机起作用的中央处理单元和与中央处理单元不同的解码器,其解码存储在数字流中的视频流和音频流 录音媒体。 当中央处理单元执行模块时,包管理器管理数字流的状态信息。 如果数字流中的至少一个处于使能状态,则解码器对数字流进行解码。 当解码器解码数字流时,包管理器根据应用的请求将另一数字流的状态信息改变为使能状态或禁用状态。

    SUBSTRATE CARRYING DEVICE, SUBSTRATE CARRYING METHOD, AND EXPOSURE DEVICE
    4.
    发明申请
    SUBSTRATE CARRYING DEVICE, SUBSTRATE CARRYING METHOD, AND EXPOSURE DEVICE 审中-公开
    基板承载装置,基板执行方法和曝光装置

    公开(公告)号:US20110188022A1

    公开(公告)日:2011-08-04

    申请号:US13039034

    申请日:2011-03-02

    申请人: Keiichi TANAKA

    发明人: Keiichi TANAKA

    IPC分类号: G03B27/58

    摘要: The present invention relates to a substrate carrying device that carries a substrate such as a reticle, a substrate carrying method thereof, and an exposure device thereof. An object of the present invention is to securely suck a substrate onto a lower surface of a chuck.The present invention is a substrate carrying device including a movable stage having a chuck and being movable in a horizontal direction, the chuck having a sucking surface which faces downward and sucking a substrate on the sucking surface; and a fixed blind disposed below the movable stage. The movable stage moves to a position apart from the fixed blind in a horizontal direction and attaches and detaches the substrate. In addition, the substrate carrying device also includes a lifting portion having a lifting table which is movable in a movable range of the movable stage and is capable of being positioned below the movable stage; and a carrying portion having a carrying arm which carries the substrate to the lifting portion.

    摘要翻译: 本发明涉及承载诸如掩模版的基板,其基板承载方法及其曝光装置的基板承载装置。 本发明的目的是将基板牢固地吸附到卡盘的下表面上。 本发明是一种基板承载装置,其具有:具有卡盘的可移动台,其能够在水平方向上移动;卡盘具有朝向下方的吸附面并将基板吸附在吸入面上; 以及设置在可动台下方的固定的盲板。 可移动台沿水平方向移动到与固定帘子分离的位置并且附接和分离基板。 此外,基板承载装置还包括具有升降台的提升部分,其可在可移动台的可移动范围内移动并且能够定位在可移动台的下方; 以及具有承载臂的承载部分,该承载臂将基板运送到提升部分。

    DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM
    5.
    发明申请
    DEVELOPING TREATMENT METHOD AND COMPUTER-READABLE STORAGE MEDIUM 审中-公开
    开发处理方法和计算机可读存储介质

    公开(公告)号:US20110143290A1

    公开(公告)日:2011-06-16

    申请号:US12963832

    申请日:2010-12-09

    IPC分类号: G03C5/00

    CPC分类号: G03F7/3021

    摘要: An extreme ultra violet (EUV) resist film is formed on a wafer W, and then a EUV light is radiated onto the EUV resist film formed on the wafer W so that a predetermined pattern is selectively exposed on the EUV resist film. Thereafter, a developing solution with a concentration of less than 2.38% by weight, whose temperature is adjusted to be 5° C. or higher and less than 23° C. in a supplying equipment group 138, is dispensed from a developing solution supply nozzle 133 to the EUV resist film formed on the wafer W so that the EUV resist film is subject to development. In such a case, a time period during which the developing treatment is performed using the developing solution may be set to fall within the range of 10 seconds or higher to less than 30 seconds. And then, pure water is supplied from a pure water supply nozzle 140 onto the wafer W to clean the wafer. The time period during which the pure water is supplied is set to fall within the range of 30 seconds or below.

    摘要翻译: 在晶片W上形成极紫外(EUV)抗蚀剂膜,然后将EUV光照射到形成在晶片W上的EUV抗蚀剂膜上,使得在EUV抗蚀剂膜上选择性地暴露预定图案。 此后,从供给设备组138中将温度调节为5℃以上且小于23℃的浓度小于2.38重量%的显影液从显影液供给喷嘴 133到形成在晶片W上的EUV抗蚀剂膜,使得EUV抗蚀剂膜被显影。 在这种情况下,使用显影液进行显影处理的时间段可以设定在10秒以上至小于30秒的范围内。 然后,纯水从纯水供应喷嘴140供应到晶片W上以清洁晶片。 将纯水供给的时间设定为30秒以下的范围。

    SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM
    6.
    发明申请
    SUBSTRATE PROCESSING METHOD, COMPUTER-READABLE STORAGE MEDIUM AND SUBSTRATE PROCESSING SYSTEM 有权
    基板处理方法,计算机可读存储介质和基板处理系统

    公开(公告)号:US20110143289A1

    公开(公告)日:2011-06-16

    申请号:US12957442

    申请日:2010-12-01

    IPC分类号: G03F7/00 G03B27/52

    CPC分类号: G03F7/38

    摘要: A PEB unit has a first heat plate and a second heat plate. After an exposure process for a resist film for EUV on a wafer and before a development process, the PEB unit heats the wafer through the first heat plate at a first heating temperature. A heating time through the first heat plate is not less than 10 seconds and not more than 30 seconds. Thereafter, the PEB unit heats the wafer through the second heat plate at a second heating temperature lower than the first heating temperature. A temperature difference between the first heating temperature and the second heating temperature is not less than 20° C. and not more than 60° C.

    摘要翻译: PEB单元具有第一加热板和第二加热板。 在晶片上并且在显影处理之前用于EUV的抗蚀剂膜的曝光处理之后,PEB单元在第一加热温度下通过第一加热板加热晶片。 通过第一加热板的加热时间不小于10秒且不超过30秒。 此后,PEB单元在低于第一加热温度的第二加热温度下通过第二加热板加热晶片。 第一加热温度和第二加热温度之间的温差不小于20℃且不大于60℃。

    LIGHT SHIELDING UNIT, VARIABLE SLIT APPARATUS, AND EXPOSURE APPARATUS
    8.
    发明申请
    LIGHT SHIELDING UNIT, VARIABLE SLIT APPARATUS, AND EXPOSURE APPARATUS 有权
    轻型屏蔽单元,可变缝隙装置和曝光装置

    公开(公告)号:US20100002220A1

    公开(公告)日:2010-01-07

    申请号:US12488361

    申请日:2009-06-19

    申请人: Keiichi TANAKA

    发明人: Keiichi TANAKA

    IPC分类号: G03B27/72 G02B26/02

    摘要: A light shielding unit, which shields a part of an exposure light with a light shielding member, includes a sensor which detects displacement of the light shielding member, a driving device which drives the light shielding member based on a detection result obtained by the sensor, a case which accommodates the sensor and the driving device, and a bellows mechanism which gas-seals the case with respect to the light shielding member. When the illumination area of the illumination light is defined, it is possible to mitigate the influence of the foreign matters and/or the heat generated from the driving mechanism.

    摘要翻译: 一种屏蔽遮光部件的曝光用光的遮光部,具备检测遮光部件的位移的传感器,基于由该传感器得到的检测结果来驱动遮光部件的驱动装置, 容纳传感器和驱动装置的壳体,以及相对于遮光部件对壳体进行气密封的波纹管机构。 当照明光的照明区域被限定时,可以减轻异物的影响和/或由驱动机构产生的热量。

    SEALING STRUCTURE OF VACUUM DEVICE
    9.
    发明申请
    SEALING STRUCTURE OF VACUUM DEVICE 失效
    密封装置的密封结构

    公开(公告)号:US20080088097A1

    公开(公告)日:2008-04-17

    申请号:US11951635

    申请日:2007-12-06

    申请人: Keiichi TANAKA

    发明人: Keiichi TANAKA

    IPC分类号: F16J15/02

    摘要: A sealing structure for sealing a gap between a vacuum container 2 and a lid 3 contacted to an opening of the vacuum container 2 to close it. A cavity 66 is formed in an elastomer O-ring 64 interposed between the vacuum container 2 and the lid 3, and a cooling pipe 65 is inserted in the cavity 66. The O-ring is cooled by circulating coolant in the cooling pipe 65. Since permeability of gas in a solid depends on a temperature, the amount of gas permeating the O-ring 64, especially oxygen, can be reduced by cooling the O-ring 64, thus maintaining a vacuum level in the vacuum container 2 at a high level. Since the O-ring 64 is cooled from its inside, only the O-ring 64 can be cooled locally without influencing temperature controls at other parts of the vacuum device.

    摘要翻译: 用于密封真空容器2和与真空容器2的开口接触的盖3之间的间隙的密封结构,以将其封闭。 空腔66形成在介于真空容器2和盖3之间的弹性体O形环64中,并且冷却管65插入空腔66中。 通过在冷却管65中循环冷却剂来冷却O形环。 由于固体中气体的渗透性取决于温度,所以通过冷却O形环64可以减少渗透O形环64,特别是氧气的气体量,从而将真空容器2中的真空度维持在高 水平。 由于O形环64从内部冷却,所以只有O形环64可以局部冷却而不影响真空装置的其它部分的温度控制。

    PRESSURING MODULE, PRESSURING APPARATUS, SUBSTRATE BONDING APPARATUS, SUBSTRATE BONDING METHOD, AND BONDED SUBSTRATE
    10.
    发明申请
    PRESSURING MODULE, PRESSURING APPARATUS, SUBSTRATE BONDING APPARATUS, SUBSTRATE BONDING METHOD, AND BONDED SUBSTRATE 审中-公开
    压力模块,压力装置,基板结合装置,基板结合方法和粘结基板

    公开(公告)号:US20120251789A1

    公开(公告)日:2012-10-04

    申请号:US13431764

    申请日:2012-03-27

    IPC分类号: B32B37/10 B32B3/30

    摘要: A pressuring module includes a stage having a mounting surface on which an object to be pressured is mounted; a plurality of pressure detecting sections that detect a pressure applied on the mounting surface; and a pressure varying section that varies a pressure distribution across a plane of the mounting surface, by differing a pressing force against the object to be pressured between a periphery and a central portion of the mounting surface in a plane direction of the mounting surface based on the pressure detected by the plurality of pressure detecting sections.

    摘要翻译: 加压模块包括具有安装表面的台架,待加压的物体被安装在该台面上; 多个压力检测部,其检测施加在所述安装面上的压力; 以及压力变化部,其通过在安装面的平面方向上在安装面的周缘部与中央部之间相对于被加压物的压力不同而改变安装面的平面上的压力分布,基于 由多个压力检测部检测出的压力。