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    Method of manufacturing nanoelectrode lines using nanoimprint lithography process
    1.
    发明授权
    Method of manufacturing nanoelectrode lines using nanoimprint lithography process 有权
    使用纳米压印光刻工艺制造纳米电极线的方法

    公开(公告)号：US07811934B2

    公开(公告)日：2010-10-12

    申请号：US12045769

    申请日：2008-03-11

    申请人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

    发明人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

    IPC分类号： H01L21/033 ,  H01L21/311

    CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0331 ,  H01L51/0022 ,  Y10S977/889

    摘要： Provided are a method of manufacturing nanoelectrode lines. The method includes the steps of: sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate; disposing an imprint mold having a plurality of molding patterns over the second photoresist; applying pressure to the mold to allow the second photoresist to flow into the mold patterns; irradiating ultraviolet (UV) light onto the mold to cure the second photoresist; removing the mold from the cured second photoresist and patterning the second photoresist; patterning the first photoresist layer using the patterned second photoresist as a mask; patterning the insulating layer; and forming a metal layer between the patterned insulating layers. In this method, metal electrode lines are formed between insulating layers using an imprint lithography process, so that nanoelectronic devices can be freed from crosstalk between the metal electrode lines.

    摘要翻译： 提供一种制造纳米电极线的方法。 该方法包括以下步骤：在衬底上依次形成绝缘层，第一光致抗蚀剂层和滴形第二光致抗蚀剂; 在所述第二光致抗蚀剂上设置具有多个模制图案的压印模具; 向模具施加压力以允许第二光致抗蚀剂流入模具图案; 将UV（UV）光照射到模具上以固化第二光致抗蚀剂; 从固化的第二光致抗蚀剂移除模具并图案化第二光致抗蚀剂; 使用图案化的第二光致抗蚀剂作为掩模来图案化第一光致抗蚀剂层; 图案化绝缘层; 以及在图案化的绝缘层之间形成金属层。 在该方法中，使用压印光刻工艺在绝缘层之间形成金属电极线，使得纳米电子器件可以免除金属电极线之间的串扰。

    METHOD OF MANUFACTURING NANOELECTRODE LINES USING NANOIMPRINT LITHOGRAPHY PROCESS
    2.
    发明申请
    METHOD OF MANUFACTURING NANOELECTRODE LINES USING NANOIMPRINT LITHOGRAPHY PROCESS 有权
    使用纳米压印法制造纳米电子线的方法

    公开(公告)号：US20090023288A1

    公开(公告)日：2009-01-22

    申请号：US12045769

    申请日：2008-03-11

    申请人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

    发明人： Mi Hee Jeong ,  Hyo Young Lee ,  Nak Jin Choi ,  Kang Ho Park

    IPC分类号： H01L21/768

    CPC分类号： H01L21/31144 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/0331 ,  H01L51/0022 ,  Y10S977/889

    摘要： Provided are a method of manufacturing nanoelectrode lines. The method includes the steps of: sequentially forming an insulating layer, a first photoresist layer, and a drop-shaped second photoresist on a substrate; disposing an imprint mold having a plurality of molding patterns over the second photoresist; applying pressure to the mold to allow the second photoresist to flow into the mold patterns; irradiating ultraviolet (UV) light onto the mold to cure the second photoresist; removing the mold from the cured second photoresist and patterning the second photoresist; patterning the first photoresist layer using the patterned second photoresist as a mask; patterning the insulating layer; and forming a metal layer between the patterned insulating layers. In this method, metal electrode lines are formed between insulating layers using an imprint lithography process, so that nanoelectronic devices can be freed from crosstalk between the metal electrode lines.

    摘要翻译： 提供一种制造纳米电极线的方法。 该方法包括以下步骤：在衬底上依次形成绝缘层，第一光致抗蚀剂层和滴形第二光致抗蚀剂; 在所述第二光致抗蚀剂上设置具有多个模制图案的压印模具; 向模具施加压力以允许第二光致抗蚀剂流入模具图案; 将UV（UV）光照射到模具上以固化第二光致抗蚀剂; 从固化的第二光致抗蚀剂移除模具并图案化第二光致抗蚀剂; 使用图案化的第二光致抗蚀剂作为掩模来图案化第一光致抗蚀剂层; 图案化绝缘层; 以及在图案化的绝缘层之间形成金属层。 在该方法中，使用压印光刻工艺在绝缘层之间形成金属电极线，使得纳米电子器件可以免除金属电极线之间的串扰。

    METHOD FOR FORMING A CATALYST PATTERN USING NANO IMPRINT LITHOGRAPHY
    3.
    发明申请
    METHOD FOR FORMING A CATALYST PATTERN USING NANO IMPRINT LITHOGRAPHY 有权
    使用纳米印刷图形形成催化剂图案的方法

    公开(公告)号：US20090148607A1

    公开(公告)日：2009-06-11

    申请号：US12195295

    申请日：2008-08-20

    申请人： Mi Hee JEONG ,  Hyo Young Lee

    发明人： Mi Hee JEONG ,  Hyo Young Lee

    IPC分类号： B05D3/12

    CPC分类号： G03F7/0002 ,  B01J23/007 ,  B01J23/80 ,  B01J37/0215 ,  B01J37/03 ,  B82Y10/00 ,  B82Y40/00

    摘要： Provided is a method of patterning a catalyst using nano imprint lithography. The method includes slurrying a catalyst, preparing a stamp for forming a catalyst pattern, forming the catalyst pattern by coating a substrate with the catalyst slurry, imprinting the stamp on the catalyst slurry and performing patterning simultaneously with calcination through nano imprint lithography, and drying the patterned catalyst. As the catalyst pattern is formed through the nano imprint lithography, a surface area of the catalyst increases and it is easy to pattern the catalyst according to the shape of the stamp.

    摘要翻译： 提供了使用纳米压印光刻图案化催化剂的方法。 该方法包括使催化剂浆化，制备用于形成催化剂图案的印模，通过用催化剂浆料涂布基材形成催化剂图案，将印模印在催化剂浆料上，并通过纳米压印光刻法同时进行煅烧，并干燥 图案化催化剂。 当通过纳米压印光刻法形成催化剂图案时，催化剂的表面积增加，并且容易根据印模的形状图案化催化剂。

    Method for forming a catalyst pattern using nano imprint lithography
    4.
    发明授权
    Method for forming a catalyst pattern using nano imprint lithography 有权
    使用纳米压印光刻法形成催化剂图案的方法

    公开(公告)号：US08399048B2

    公开(公告)日：2013-03-19

    申请号：US12195295

    申请日：2008-08-20

    申请人： Mi Hee Jeong ,  Hyo Young Lee

    发明人： Mi Hee Jeong ,  Hyo Young Lee

    IPC分类号： B05D5/12 ,  B05D3/02 ,  B05D3/12

    CPC分类号： G03F7/0002 ,  B01J23/007 ,  B01J23/80 ,  B01J37/0215 ,  B01J37/03 ,  B82Y10/00 ,  B82Y40/00

    摘要： Provided is a method of patterning a catalyst using nano imprint lithography. The method includes slurrying a catalyst, preparing a stamp for forming a catalyst pattern, forming the catalyst pattern by coating a substrate with the catalyst slurry, imprinting the stamp on the catalyst slurry and performing patterning simultaneously with calcination through nano imprint lithography, and drying the patterned catalyst. As the catalyst pattern is formed through the nano imprint lithography, a surface area of the catalyst increases and it is easy to pattern the catalyst according to the shape of the stamp.

    摘要翻译： 提供了使用纳米压印光刻图案化催化剂的方法。 该方法包括使催化剂浆化，制备用于形成催化剂图案的印模，通过用催化剂浆料涂布基材形成催化剂图案，将印模印在催化剂浆料上，并通过纳米压印光刻法同时进行煅烧，并干燥 图案化催化剂。 当通过纳米压印光刻法形成催化剂图案时，催化剂的表面积增加，并且容易根据印模的形状图案化催化剂。

    Non-powered constant-temperature cell transfer device
    6.
    发明授权
    Non-powered constant-temperature cell transfer device 有权

    公开(公告)号：US10787636B2

    公开(公告)日：2020-09-29

    申请号：US15706355

    申请日：2017-09-15

    申请人： Hyo Young Lee

    发明人： Hyo Young Lee

    IPC分类号： C12M1/00 ,  C12M1/26 ,  C12M1/34

    摘要： The present invention relates to a non-powered constant-temperature cell transfer device, in which a first container, which accommodates living animal cells and a culture solution, is accommodated in a second container having a heat generating unit that emits heat generated by oxidation and reduction reactions of metal by introducing oxygen in the atmosphere in order to continuously provide an optimum culture temperature to a culture container even without being supplied with electric power, thereby maintaining activity and viability of the cells by maintaining a culture environment optimal for proliferation of the cells accommodated in the first container.

    GO-Gd-DTPA complex, preparation method thereof, and MRI contrast agent comprising the same
    8.
    发明授权
    GO-Gd-DTPA complex, preparation method thereof, and MRI contrast agent comprising the same 有权
    GO-Gd-DTPA复合物及其制备方法和包含其的MRI造影剂

    公开(公告)号：US08987429B2

    公开(公告)日：2015-03-24

    申请号：US13607961

    申请日：2012-09-10

    申请人： Hyo Young Lee ,  Luyang Wang

    发明人： Hyo Young Lee ,  Luyang Wang

    IPC分类号： C07F5/00 ,  C02F1/28 ,  C07F7/10 ,  C07D493/22

    CPC分类号： C07F5/00 ,  A61K49/105 ,  C07D493/22 ,  C07F5/003

    摘要： Disclosed herein is a GO-Gd-DTPA (gadolinium-diethylenetriamine pentaacetic-graphene oxide) complex, which is formed by an ester bond of graphene oxide (GO) and gadopentetic acid (Gd-DTPA). Since the GO-Gd-DTPA can stably exist in the body because it has high stability in water, it is expected that it can be effectively used as an MRI contrast agent.

    摘要翻译： 本文公开了由氧化石墨烯（GO）和钆特酸（Gd-DTPA）的酯键形成的GO-Gd-DTPA（钆 - 二亚乙基三胺五乙酸 - 氧化石墨烯氧化物）络合物。 由于GO-Gd-DTPA由于在水中的稳定性高而能够稳定地存在于体内，因此可以有效地将其用作MRI造影剂。

    METHOD FOR PREPARING POLYMER ACTUATORS WITH HIGH STABILITY AND POLYMER ACTUATORS PREPARED BY THE METHOD
    9.
    发明申请
    METHOD FOR PREPARING POLYMER ACTUATORS WITH HIGH STABILITY AND POLYMER ACTUATORS PREPARED BY THE METHOD 审中-公开
    制备具有高稳定性的聚合物致动器的方法和由该方法制备的聚合物致动器

    公开(公告)号：US20080107906A1

    公开(公告)日：2008-05-08

    申请号：US11856484

    申请日：2007-09-17

    申请人： Nak Jin Choi ,  Jung Hyun Lee ,  Kang Ho Park ,  Hyo Young Lee ,  Hyung Kun Lee ,  Jong Dae Kim

    发明人： Nak Jin Choi ,  Jung Hyun Lee ,  Kang Ho Park ,  Hyo Young Lee ,  Hyung Kun Lee ,  Jong Dae Kim

    IPC分类号： B32B27/06 ,  B05D5/12 ,  B32B15/08

    CPC分类号： B32B15/08 ,  Y10T428/31544 ,  Y10T428/31678

    摘要： Provided are a method for preparing polymer actuators with high stability and polymer actuators prepared by the method, and more specifically, to a method for preparing polymer actuators with high stability that use low power, are extremely thin, and can be substituted in a motor of a camera module, and polymer actuators prepared by the method. The method includes the steps of: preparing an Ionic Polymer Metal Composite (IPMC) in which metal electrodes are plated on both surfaces of a ionic polymer film; removing water from the ionic polymer film of the IPMC; and expanding the IPMC in a polar solvent that has a higher boiling point and a lower freezing point than water.

    摘要翻译： 提供一种制备具有高稳定性的聚合物致动器和通过该方法制备的聚合物致动器的方法，更具体地说，涉及一种制备具有高功率，非常薄的高稳定性的聚合物致动器的方法，并且可以在 相机模块和通过该方法制备的聚合物致动器。 该方法包括以下步骤：制备在离子聚合物膜的两个表面上镀金属电极的离子聚合物金属复合物（IPMC）; 从IPMC的离子聚合物膜中除去水分; 并在具有比水更高的沸点和更低的凝固点的极性溶剂中扩展IPMC。