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公开(公告)号：US08634053B2
公开(公告)日：2014-01-21
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Jozef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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公开(公告)号：US20080212046A1
公开(公告)日：2008-09-04
申请号：US11987569
申请日：2007-11-30
申请人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
发明人： Michel Riepen , Christiaan Alexander Hoogendam , Paulus Martinus Maria Liebregts , Ronald Van Der Ham , Wilhelmus Franciscus Johannes Simons , Daniel Josef Maria Direcks , Paul Petrus Joannes Berkvens , Eva Mondt , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Han Henricus Aldegonda Lempens , Mathieus Anna Karel Van Lierop , Christophe De Metsenaere , Marcio Alexandre Cano Miranda , Patrick Johannes Wilhelmus Spruytenburg , Joris Johan Anne-Marie Verstraete
IPC分类号： G03B27/52
CPC分类号： G03F7/70866 , G03F7/70341
摘要： A liquid confinement system for use in immersion lithography is disclosed in which the meniscus of liquid between the liquid confinement system and the substrate is pinned substantially in place by a meniscus pinning feature. The meniscus pinning feature comprises a plurality of discrete outlets arranged in a polygonal shape.
摘要翻译： 公开了一种用于浸没式光刻术的液体限制系统，其中液体限制系统和衬底之间的液体弯液面通过弯液面钉扎特征基本上固定就位。 弯液面钉扎特征包括以多边形形式布置的多个分立出口。
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3.发明申请公开(公告)号：US20100214543A1
公开(公告)日：2010-08-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
IPC分类号： G03B27/52
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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4.发明授权Lithographic apparatus, a method of controlling the apparatus and a device manufacturing method 有权平版印刷装置，装置的控制方法和装置的制造方法公开(公告)号：US08405817B2
公开(公告)日：2013-03-26
申请号：US12697583
申请日：2010-02-01
申请人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
发明人： Marco Koert Stavenga , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Johannes Catharinus Hubertus Mulkens , Erik Henricus Egidius Catharina Eummelen , Richard Moerman , Michel Riepen , Sergei Shulepov , Gert-Jan Gerardus Johannes Thomas Brands , Koen Steffens , Jan Willem Cromwijk , Ralph Joseph Meijers , Fabrizio Evangelista , David Bessems , Hua Li , Marinus Jochemsen , Pieter Lein Joseph Gunter , Franciscus Wilhelmus Bell , Erik Witberg , Marcus Agnes Johannes Smits , Zhenhua Ma
CPC分类号： G03F7/70341
摘要： A method of operating a lithographic apparatus is disclosed. The method includes moving a substrate table supporting a substrate relative to a projection system and adjusting the scanning speed between the substrate table and the projection system during imaging of a target within a predefined area at or near an edge of the substrate, or adjusting the stepping speed between adjacent target positions in a predefined area at or near the edge of the substrate, or both. The adjusting the scanning and/or stepping speed may comprise lowering the speed. The projection system is configured to project a patterned beam of radiation on to a target portion of the substrate.
摘要翻译： 公开了一种操作光刻设备的方法。 该方法包括移动支撑衬底的衬底台相对于投影系统，并且在衬底的边缘或附近的预定区域内的靶成像期间调整衬底台和投影系统之间的扫描速度，或者调整步进 在基板的边缘处或附近的预定区域中的相邻目标位置之间的速度，或两者。 调整扫描和/或步进速度可以包括降低速度。 投影系统被配置为将图案化的辐射束投影到基板的目标部分上。
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公开(公告)号：US08860924B2
公开(公告)日：2014-10-14
申请号：US13589841
申请日：2012-08-20
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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公开(公告)号：US08248577B2
公开(公告)日：2012-08-21
申请号：US11120186
申请日：2005-05-03
申请人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
发明人： Bob Streefkerk , Sjoerd Nicolaas Lambertus Donders , Roelof Frederik De Graaf , Christiaan Alexander Hoogendam , Hans Jansen , Martinus Hendrikus Antonius Leenders , Paulus Martinus Maria Liebregts , Jeroen Johannes Sophia M. Mertens , Jan-Gerard Cornelis Van Der Toorn , Michel Riepen
CPC分类号： G03F7/2041 , G03F7/3085 , G03F7/70058 , G03F7/70341 , G03F7/70825 , G03F7/70875 , G03F7/70916 , G03F2007/2067 , H01L21/0274 , H01L21/67098
摘要： An immersion lithographic apparatus is provided with a liquid confinement structure which defines at least in part a space configured to contain liquid between the projection system and the substrate. In order to reduce the crossing of the edge of the substrate which is being imaged (which can lead to inclusion of bubbles in the immersion liquid), the cross-sectional area of the space in a plane parallel to the substrate is made as small as possible. The smallest theoretical size is the size of the target portion which is imaged by the projection system. In an embodiment, the shape of a final element of the projection system is also changed to have a similar size and/or shape in a cross-section parallel to the substrate to that of the target portion.
摘要翻译： 浸没式光刻设备设置有液体限制结构，其限定至少部分地被配置为在投影系统和衬底之间容纳液体的空间。 为了减少正在成像的衬底的边缘（其可能导致在浸没液体中包含气泡）的交叉，使得平行于衬底的平面中的空间的横截面积小至 可能。 最小的理论尺寸是由投影系统成像的目标部分的尺寸。 在一个实施例中，投影系统的最终元件的形状也被改变为在平行于基底的截面与目标部分的横截面上具有相似的尺寸和/或形状。
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7.发明授权Fluid extraction system, lithographic apparatus and device manufacturing method 有权流体萃取系统，光刻设备和装置制造方法公开(公告)号：US08654309B2
公开(公告)日：2014-02-18
申请号：US12634242
申请日：2009-12-09
申请人： Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
发明人： Nicolaas Rudolf Kemper , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
CPC分类号： G03F7/70341 , F01N1/023 , G03F7/709
摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。
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8.发明申请FLUID EXTRACTION SYSTEM, LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权流体萃取系统，光刻装置和装置制造方法公开(公告)号：US20100149501A1
公开(公告)日：2010-06-17
申请号：US12634242
申请日：2009-12-09
申请人： Nicolaas Rudolf KEMPER , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
发明人： Nicolaas Rudolf KEMPER , Robertus Nicodemus Jacobus Van Ballegoij , Marcus Martinus Petrus Adrianus Vermeulen , Michel Riepen , Martinus Wilhelmus Van Den Heuvel , Paul Petrus Joannes Berkvens , Christophe De Metsenaere , Jimmy Matheus Wilhelmus Van De Winkel , Cornelius Maria Rops
CPC分类号： G03F7/70341 , F01N1/023 , G03F7/709
摘要： An immersion lithographic apparatus typically includes a fluid handling system. The fluid handling system generally has a two-phase fluid extraction system configured to remove a mixture of gas and liquid from a given location. Because the extraction fluid comprises two phases, the pressure in the extraction system can vary. This pressure variation can be passed through the immersion liquid and cause inaccuracy in the exposure. To reduce the pressure fluctuation in the extraction system, a buffer chamber may be used. This buffer chamber may be connected to the fluid extraction system in order to provide a volume of gas which reduces pressure fluctuation. Alternatively or additionally, a flexible wall may be provided somewhere in the fluid extraction system. The flexible wall may change shape in response to a pressure change in the fluid extraction system. By changing shape, the flexible wall can help to reduce, or eliminate, the pressure fluctuation.
摘要翻译： 浸没式光刻设备通常包括流体处理系统。 流体处理系统通常具有配置成从给定位置去除气体和液体的混合物的两相流体萃取系统。 因为提取液包含两相，所以提取系统中的压力可以变化。 该压力变化可以通过浸没液体并导致曝光不准确。 为了减少提取系统中的压力波动，可以使用缓冲室。 该缓冲室可以连接到流体提取系统，以便提供减小压力波动的一定体积的气体。 或者或另外，柔性壁可以设置在流体提取系统的某处。 响应于流体提取系统中的压力变化，柔性壁可以改变形状。 通过改变形状，柔性壁可以帮助减少或消除压力波动。
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9.发明申请FLUID HANDLING STRUCTURE, A LITHOGRAPHIC APPARATUS AND A DEVICE MANUFACTURING METHOD 失效流体处理结构，平面设备和设备制造方法公开(公告)号：US20110292357A1
公开(公告)日：2011-12-01
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
IPC分类号： G03B27/52
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板的台面或两者。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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10.发明授权Fluid handling structure, a lithographic apparatus and a device manufacturing method 失效流体处理结构，光刻设备和装置制造方法公开(公告)号：US08711326B2
公开(公告)日：2014-04-29
申请号：US13098830
申请日：2011-05-02
申请人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
发明人： Ronald Van Der Ham , Martinus Hendrikus Antonius Leenders , Johannes Catharinus Hubertus Mulkens , Richard Moerman , Michel Riepen , Sergei Shulepov , Koen Steffens , Jan Willem Cromwijk , Johanna Antoinette Maria Sondag-Huethorst , Marco Baragona , Robertus Leonardus Maria In 'T Groen , Ralph Theodorus Hubertus Maessen , Jacob Marinus Jan Den Toonder , Milica Kovacevic-Milivojevic
CPC分类号： G03F7/70925 , G03F7/70 , G03F7/70341
摘要： A fluid handling structure to confine immersion liquid in a space between a projection system and a facing surface of a substrate, of a table to support the substrate, or both, is disclosed. The fluid handling structure includes a transponder to dissolve at least some of the gas in a bubble in the immersion liquid or to control a bubble in the immersion liquid so that it avoids entering an optical path of a beam from the projection system.
摘要翻译： 公开了一种用于将浸没液体限制在投影系统和基板的面对表面之间的空间中的流体处理结构，用于支撑基板或两者的台。 流体处理结构包括一个应答器，用于溶解浸入液体中的气泡中的至少一些气体或控制浸没液体中的气泡，使得其避免进入来自投影系统的光束的光路。
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