公开(公告)号：US20070007491A1

公开(公告)日：2007-01-11

申请号：US11414692

申请日：2006-04-28

申请人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

发明人： Ralf Mueller ,  Olaf Dittmann ,  Michael Totzeck ,  Daniel Kraehmer ,  Christoph Zaczek ,  Karl-Heinz Schuster

IPC分类号： C09K19/52

CPC分类号： G02B5/3083 ,  G02B1/02 ,  G02B27/281 ,  G03F7/70966

摘要： The invention concerns an optical element, in particular for an objective or an illumination system of a microlithographic projection exposure apparatus, including a substrate which for light of a predetermined working wavelength which passes through the substrate causes a first retardation between mutually perpendicular polarization states, and a layer which is epitaxially grown on the substrate and which is made from a material with non-cubic crystal structure, which by virtue of natural birefringence causes a second retardation between mutually perpendicular polarization states, which at least partially compensates for the first retardation caused in the substrate.

摘要翻译： 本发明涉及一种光学元件，特别是用于微光刻投影曝光设备的物镜或照明系统，该微光刻投影曝光设备包括用于通过基板的预定工作波长的光的基板，引起相互垂直的偏振状态之间的第一延迟，以及 在衬底上外延生长并且由具有非立方晶体结构的材料制成的层，其由于天然双折射引起相互垂直的极化状态之间的第二延迟，其至少部分地补偿在 底物。

公开(公告)号：US20090284831A1

公开(公告)日：2009-11-19

申请号：US12330980

申请日：2008-12-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G02B13/14 ,  G02B27/28 ,  G02B3/00

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element (L3) with an index of refraction greater than 1.6. This element (L3) has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume (L3′) which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件（L3）。 该元件（L3）具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积（L3'）中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US08325426B2

公开(公告)日：2012-12-04

申请号：US13156819

申请日：2011-06-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G02B15/14

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US20110235013A1

公开(公告)日：2011-09-29

申请号：US13156819

申请日：2011-06-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G03B27/72 ,  G02B13/24

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US07982969B2

公开(公告)日：2011-07-19

申请号：US12330980

申请日：2008-12-09

申请人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

发明人： Karl-Heinz Schuster ,  Heiko Feldmann ,  Toralf Gruner ,  Michael Totzeck ,  Wilfried Clauss ,  Susanne Beder ,  Daniel Kraehmer ,  Olaf Dittmann

IPC分类号： G02B15/14

CPC分类号： G03F7/70341 ,  G02B5/3091 ,  G02B27/0025 ,  G03F7/70308

摘要： A projection objective of a microlithographic projection exposure apparatus has a high index refractive optical element with an index of refraction greater than 1.6. This element has a volume and a material related optical property which varies over the volume. Variations of this optical property cause an aberration of the objective. In one embodiment at least 4 optical surfaces are provided that are arranged in at least one volume which is optically conjugate with the volume of the refractive optical element. Each optical surface comprises at least one correction means, for example a surface deformation or a birefringent layer with locally varying properties, which at least partially corrects the aberration caused by the variation of the optical property.

摘要翻译： 微光刻投影曝光装置的投影物镜具有折射率大于1.6的高折射率折射光学元件。 该元件具有在体积上变化的体积和材料相关的光学性质。 该光学特性的变化导致物镜的像差。 在一个实施例中，提供至少4个光学表面，其布置在与折射光学元件的体积光学共轭的至少一个体积中。 每个光学表面包括至少一个校正装置，例如具有局部变化特性的表面变形或双折射层，其至少部分地校正由光学性质的变化引起的像差。

公开(公告)号：US07474469B2

公开(公告)日：2009-01-06

申请号：US11232606

申请日：2005-09-22

申请人： Michael Totzeck ,  Gerhart Fuerter ,  Olaf Dittmann ,  Karl-Heinz Schuster ,  David Shafer ,  Susanne Beder ,  Wolfgang Singer

发明人： Michael Totzeck ,  Gerhart Fuerter ,  Olaf Dittmann ,  Karl-Heinz Schuster ,  David Shafer ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G02B3/12 ,  G02B3/00

CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

摘要翻译： 本发明涉及微光刻投影曝光装置中的光学元件的布置，特别是在微光刻投影曝光装置的投影物镜中。 该装置包括刚性第一光学元件，具有第一光学表面的刚性第二光学元件和在相对侧上的第二光学表面和第一液体。 第一光学元件具有凹面光学表面。 第二光学元件的第一面面对第一光学元件的凹面光学表面。 第一液体至少部分地填充第一光学元件和第二光学元件之间的空间。

公开(公告)号：US20060066962A1

公开(公告)日：2006-03-30

申请号：US11232606

申请日：2005-09-22

申请人： Michael Totzeck ,  Gerhart Fuerter ,  Olaf Dittmann ,  Karl-Heinz Schuster ,  David Shafer ,  Susanne Beder

发明人： Michael Totzeck ,  Gerhart Fuerter ,  Olaf Dittmann ,  Karl-Heinz Schuster ,  David Shafer ,  Susanne Beder

IPC分类号： G02B7/02

CPC分类号： G02B3/12 ,  G02B17/0812 ,  G02B17/0856 ,  G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： The invention relates to an arrangement of optical elements in a microlithographic projection exposure apparatus, particularly in a projection objective of a microlithographic projection exposure apparatus. The arrangement comprises a rigid first optical element, a rigid second optical element with a first optical surface and a second optical surface on opposite sides and a first liquid. The first optical element has a concave optical surface. The first side of the second optical element is facing the concave optical surface of the first optical element. The first liquid is at least partially filling the space between the first optical element and the second optical element.

公开(公告)号：US20080291419A1

公开(公告)日：2008-11-27

申请号：US12187116

申请日：2008-08-06

申请人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

发明人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Guenter Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Sigrid Scheible

IPC分类号： G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

公开(公告)号：US20050225737A1

公开(公告)日：2005-10-13

申请号：US11015553

申请日：2004-12-20

申请人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Guenter Scheible

发明人： Karl-Stefan Weissenrieder ,  Alexander Hirnet ,  Alexandra Pazidis ,  Karl-Heinz Schuster ,  Christoph Zaczek ,  Michael Lill ,  Patrick Scheible ,  Harald Schink ,  Markus Brotsack ,  Ulrich Loering ,  Toralf Gruner ,  Guenter Scheible

IPC分类号： G03B27/42 ,  G03F7/20

CPC分类号： G03F7/70983 ,  G03F7/70341

摘要： In a projection objective provided for imaging a pattern arranged in an object plane of the projection objective into an image plane of the projection objective with the aid of an immersion medium arranged between a last optical element of the projection objective in the light path and the image plane, the last optical element has a transparent substrate and a protective layer system that is fitted to the substrate, is provided for contact with the immersion medium and serves for increasing the resistance of the last optical element to degradation caused by the immersion medium.

摘要翻译： 在投影物镜中，借助于设置在光路中的投影物镜的最后一个光学元件与图像之间的浸没介质，将布置在投影物镜的物平面中的图案成像到投影物镜的像平面中 平面，最后一个光学元件具有透明基板和与基板相配合的保护层系统，用于与浸没介质接触，用于增加最后一个光学元件对浸入介质引起的劣化的电阻。

公开(公告)号：US06806942B2

公开(公告)日：2004-10-19

申请号：US10434952

申请日：2003-05-08

申请人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

发明人： Karl-Heinz Schuster ,  Wilhelm Ulrich ,  Toralf Gruner ,  Daniel Kraehmer ,  Wolfgang Singer ,  Alexander Epple ,  Helmut Beierl ,  Reiner Garreis

IPC分类号： G03B2754

CPC分类号： G03F7/70241 ,  G02B13/143 ,  G02B13/24

摘要： A projection exposure system is proposed which is positionable between a first object and a second object for imaging the first object in a region of the second object with light of a wavelength band having a width &dgr;&lgr; about a central working wavelength &lgr;, wherein a relative width &dgr;&lgr;/&lgr; of the wavelength band is larger than 0.002, in particular, larger than 0.005, for example, of the Hg-I-line. The projection exposure system is a so-called three-bulge system comprising three bulges having, as a whole, a positive refractive power and two waists having, as a whole, a negative refractive power. By applying suitable measures, in particular, by suitably selecting the material for the lenses forming the projection exposure system, the long-term stability of the system is increased.

摘要翻译： 提出了一种投影曝光系统，其可定位在第一物体和第二物体之间，用于在具有围绕中心工作波长λ的宽度偏差的波长带的光的第二物体的区域内成像第一物体，其中相对宽度 波长带的偏差λ/λ大于0.002，特别是大于0.005，例如Hg-I线。 投影曝光系统是所谓的三凸起系统，其包括总体上具有正屈光力的三个凸起，以及整体上具有负屈光力的两个凸起。 通过适当的措施，特别是通过适当选择形成投影曝光系统的透镜的材料，可以提高系统的长期稳定性。