公开(公告)号：US20240145263A1

公开(公告)日：2024-05-02

申请号：US18099856

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ki Bong KIM ,  Jong Doo LEE ,  Young Hun LEE ,  Mi So PARK ,  Jin Se PARK ,  Yong Sun KO

IPC: H01L21/67

CPC classification number: H01L21/67034

Abstract: According to an aspect of the present disclosure, there is provided a substrate treating apparatus comprising: a vessel part having a substrate treatment region formed therein and including a supply port through which a treating fluid is supplied to the substrate treatment region and an exhaust port through which the treating fluid is exhausted from the substrate treatment region; a fluid supply unit configured to supply the treating fluid to the substrate treatment region; an exhaust unit configured to exhaust the treating fluid from the vessel part. The exhaust unit comprises: a main line connected to the exhaust port; an extension line branched from at least one of first and second nodes of the main line and including at least one of a first orifice or a first check valve to control an exhaust speed; and an auxiliary line branched from a third node of the main line, where an orifice and a check valve are not formed. During a first process time, the treating fluid is discharged through the extension line, and the treating fluid is not discharged through the auxiliary line, and during a second process time, the treating fluid is discharged through the auxiliary line.

公开(公告)号：US20220384216A1

公开(公告)日：2022-12-01

申请号：US17714999

申请日：2022-04-06

Applicant: SEMES CO., LTD.

Inventor： Jin Se PARK ,  Ki Bong KIM ,  Myung Seok CHA ,  Do Hyeon YOON

IPC: H01L21/67

Abstract: The present invention discloses an exhausting device and an exhausting method in substrate processing equipment, and more particularly, a technique for controlling a processing process environment by providing a buffer space for storing chemical fumes outside a ventilation unit of the substrate processing equipment, and discharging the chemical fumes into the buffer space in accordance with a processing process in a chamber interior space.

公开(公告)号：US20230111149A1

公开(公告)日：2023-04-13

申请号：US17957428

申请日：2022-09-30

Applicant: SEMES CO., LTD.

Inventor： Sang Min LEE ,  Jin Se PARK ,  Ki Hoon CHOI

IPC: H01L21/67 ,  G01N1/10

Abstract: Provided is a concentration measuring apparatus, which measures a concentration of a fluid under a high-pressure environment, such as an environment in which a supercritical fluid is provided. The concentration measuring apparatus includes: a concentration meter for measuring a concentration of a first fluid contained in a fluid in the measurement line; a sampling line for transferring a process fluid of a processing space in which a substrate is treated in a high-pressure environment to the measurement line; a control valve for opening and closing the sampling line; a fluid pressure regulator installed downstream the control valve in the sampling line and configured to adjust the passing fluid to a set pressure; and a decompression tank installed between the sampling line and the measurement line.

公开(公告)号：US20230136985A1

公开(公告)日：2023-05-04

申请号：US17973495

申请日：2022-10-25

Applicant: SEMES CO., LTD.

Inventor： Jin Se PARK ,  Ki Bong Kim ,  Myung Seok Cha

IPC: F16K31/122

Abstract: The present disclosure provides a valve apparatus that prevents defects in the valve apparatus and prevents damage to the heat insulating material due to a cryogenic liquid fluid, and a semiconductor processing device including the same and a manufacturing method thereof.

公开(公告)号：US20210013064A1

公开(公告)日：2021-01-14

申请号：US16925449

申请日：2020-07-10

Applicant: SEMES CO., LTD.

Inventor： Dohyeon YOON ,  Joo Jib PARK ,  Jin Se PARK

IPC: H01L21/67 ,  H01L21/02 ,  B08B7/00

Abstract: An apparatus for treating a substrate includes a light treatment chamber having an interior space, a support unit that supports the substrate in the interior space, and an irradiation unit that irradiates light to the substrate in the interior space to remove organic matter remaining on the substrate, in which the irradiation unit includes a first light source that irradiates first light to the substrate and a second light source that irradiates, to the substrate, second light having a different wavelength range from the first light.

公开(公告)号：US20240142171A1

公开(公告)日：2024-05-02

申请号：US18099388

申请日：2023-01-20

Applicant: SEMES CO., LTD.

Inventor： Seung Hoon OH ,  Ji Hyeong LEE ,  Jin Se PARK ,  Yong Joon IM ,  Young Hun LEE ,  Yong Sun KO

IPC: F26B5/00 ,  F26B21/10 ,  F26B25/00 ,  F26B25/16 ,  G03F7/16

CPC classification number: F26B5/005 ,  F26B21/10 ,  F26B25/003 ,  F26B25/16 ,  G03F7/168

Abstract: A substrate treating apparatus of the present disclosure comprises: a chamber member having an accommodation space configured to accommodate a vessel part where a substrate treatment region constituting a supercritical treatment space are formed, and an opening configured to move the substrate inside or outside; a shutter configured to open or close the chamber member; and a first exhaust part configured to discharge an internal air from the accommodation space to the outside, wherein the temperature of the substrate treatment region is increased.

公开(公告)号：US20220381509A1

公开(公告)日：2022-12-01

申请号：US17825275

申请日：2022-05-26

Applicant: SEMES CO., LTD.

Inventor： Yong Joon IM ,  Sang Min LEE ,  Jong Doo LEE ,  Jin Se PARK

IPC: F26B5/00

Abstract: The present invention provides a substrate treating apparatus, including: a housing including a first body and a second body which are combined with each other to provide a treatment space in which a substrate is treated; an actuator which moves the second body in a vertical direction with respect to the first body to seal or open the treatment space; and a pipe which is coupled with the second body and in which a fluid flows, in which the pipe is a stretchable pipe that is stretchable and contractible according to the vertical movement of the second body.