公开(公告)号：US11977332B2

公开(公告)日：2024-05-07

申请号：US17017786

申请日：2020-09-11

Applicant: SEMES CO., LTD. ,  RESEARCH & BUSINESS FOUNDATION SUNGKYUNKWAN UNIVERSITY

Inventor： Hae-Won Choi ,  Yerim Yeon ,  Anton Koriakin ,  Kihoon Choi ,  Youngran Ko ,  Jeong Ho Cho ,  Hyungseok Kang ,  Hong Gi Min

IPC: G03F7/16 ,  G03F7/039 ,  G03F7/32 ,  H01L21/67

CPC classification number: G03F7/162 ,  G03F7/168 ,  H01L21/67225 ,  G03F7/039 ,  G03F7/322

Abstract: A substrate treating apparatus and a substrate treating method are provided. The substrate treating apparatus includes a first process chamber to apply an organic solvent to a substrate applied with a developer and introduced, and a second process chamber to treat the substrate applied with the organic solvent and introduced, through a supercritical fluid.

公开(公告)号：US12046466B2

公开(公告)日：2024-07-23

申请号：US17965911

申请日：2022-10-14

Applicant: SEMES CO., LTD.

Inventor： Yong-Jun Seo ,  Hyun Yoon ,  Jungsuk Goh ,  Byeong Geun Kim ,  Yoonki Sa ,  Doyeon Kim ,  Yerim Yeon ,  Choonghyun Lee ,  Pil Kyun Heo ,  Youngje Um ,  Jaeseong Lee ,  Dongok Ahn

IPC: H01L21/02 ,  H01L21/67

CPC classification number: H01L21/02101 ,  H01L21/6715

Abstract: The inventive concept provides a method for treating a substrate. In an embodiment, the substrate treating method includes a treatment step of treating a residue on the substrate with a first fluid in a supercritical state and a second fluid in a supercritical state in a process space of a chamber, and the first fluid in the supercritical state and the second fluid in the supercritical state have different densities.

公开(公告)号：US10711228B2

公开(公告)日：2020-07-14

申请号：US16028720

申请日：2018-07-06

Applicant: SEMES CO., LTD.

Inventor： Mong-Ryong Lee ,  Miyoung Jo ,  Yerim Yeon ,  Anton Koriakin

IPC: C11D11/00 ,  C11D17/00 ,  C11D3/43 ,  C11D3/37

Abstract: Disclosed are a substrate treating apparatus and a substrate treating method. The substrate treating apparatus includes a support member which supports a substrate; a treatment liquid discharging member which discharges a treatment liquid containing a monomeric substance to the substrate located in the support member; and a light irradiator which irradiates light to the treatment liquid discharged to the substrate.