公开(公告)号：US20240279494A1

公开(公告)日：2024-08-22

申请号：US18560366

申请日：2022-03-28

Applicant: STELLA CHEMIFA CORPORATION

Inventor： Hiroya YAMAMOTO ,  Rui HASEBE ,  Megumi TOMISAKI ,  Masanori URAYA ,  Tetsuo NISHIDA ,  Keiichi NII ,  Keigo FUJIWARA

IPC: C09D7/61 ,  C09D5/00 ,  C09D5/02 ,  C09D7/20 ,  C09D7/40 ,  C09D7/45 ,  G02B1/11

CPC classification number: C09D7/61 ,  C09D5/006 ,  C09D5/027 ,  C09D7/20 ,  C09D7/45 ,  C09D7/67 ,  G02B1/11

Abstract: Provided are a liquid dispersion of fluoride particles having a refractive index lower than that of, for example, magnesium fluoride, the liquid dispersion being excellent in dispersibility and suitable for production of an optical film such as an antireflection film; a composition for forming an optical film; and an optical film. A liquid dispersion of fluoride particles according to the present invention contains: fluoride particles; an anionic surfactant as a dispersant for the fluoride particles; and an organic solvent, wherein the fluoride particles contain at least aluminum, an alkali metal, and an alkaline earth metal as an optional element in a composition of the fluoride particles, and the fluoride particles are dispersed in the organic solvent.

公开(公告)号：US20240240084A1

公开(公告)日：2024-07-18

申请号：US18559459

申请日：2021-06-11

Applicant: STELLA CHEMIFA CORPORATION

Inventor： Yosuke YAMAZAKI ,  Kenta HORIGAMI ,  Kazuya DATE ,  Rui HASEBE ,  Keiichi NII ,  Tetsuo NISHIDA

IPC: C09K13/08 ,  H01L21/311

CPC classification number: C09K13/08 ,  H01L21/31111

Abstract: Provided are a micromachining processing agent and a micromachining processing method that enable favorable micromachining while suppressing remaining of fine particles on an object to be processed having at least a silicon-containing insulating film. The micromachining processing agent according to the present invention is a micromachining processing agent for micromachining an object to be processed having at least a silicon-containing insulating film, the micromachining processing agent containing: a compound represented by a chemical formula (1) below; hydrogen fluoride; ammonium fluoride; and water,




wherein Rf represents perfluoroalkyl group having 1 to 4 carbon atoms, and M+ represents a hydrogen ion or an ammonium ion, wherein a content of the compound is 0.001 mass % or more and 0.5 mass % or less with respect to a total mass of the micromachining processing agent, a content of the hydrogen fluoride is 0.05 mass % or more and 25 mass % or less with respect to a total mass of the micromachining processing agent, a content of the ammonium fluoride is 0.5 mass % or more and 40 mass % or less with respect to a total mass of the micromachining processing agent, and the content of the hydrogen fluoride and the content of the ammonium fluoride satisfy a relational expression (1) below:







Y
≦



-

0
.
8


⁢
X

+

4
⁢
0






(
1
)







wherein X represents a concentration (mass %) of hydrogen fluoride and Y represents a concentration (mass %) of ammonium fluoride.

公开(公告)号：US20240060024A1

公开(公告)日：2024-02-22

申请号：US18259250

申请日：2021-12-23

Applicant: SHINSHU UNIVERSITY ,  STELLA CHEMIFA CORPORATION

Inventor： Naoto SAITO ,  Takeshi UEMURA ,  Kazutoshi HISANO ,  Yoshinori SATO ,  Masashi YAMAMOTO ,  Keiichi NII ,  Tetsuo NISHIDA

IPC: C12M1/00 ,  C08J7/12

CPC classification number: C12M23/20 ,  C08J7/123

Abstract: Provided are a cell culture member having excellent cell culture performance and its long-term stability, and a method for modifying the surface thereof. The cell culture member according to the present invention is a cell culture member having at least a holding region that holds an adherent cell and contains a polymer compound, wherein at least a part of the holding region is a surface-modified region in which a functional group containing a nitrogen atom is directly chemically bonded to a part of carbon atoms and/or silicon atoms constituting the polymer compound, and the present invention can provide a cell culture member that improves adhesiveness of the adherent cell to the surface-modified region, suppresses deterioration over time of adhesiveness, and is excellent in cell culture performance and its long-term stability.

公开(公告)号：US20240052299A1

公开(公告)日：2024-02-15

申请号：US18259237

申请日：2021-12-23

Applicant: SHINSHU UNIVERSITY ,  STELLA CHEMIFA CORPORATION

Inventor： Naoto SAITO ,  Takeshi UEMURA ,  Kazutoshi HISANO ,  Yoshinori SATO ,  Masashi YAMAMOTO ,  Keiichi NII ,  Tetsuo NISHIDA

IPC: C12N5/00 ,  C12M1/12 ,  C08J7/12

CPC classification number: C12N5/0068 ,  C12M25/04 ,  C08J7/12 ,  C12N2509/00 ,  C12N2533/30 ,  C12N2537/00 ,  C08J2325/06

Abstract: Provided are a cell culture member having excellent cell culture performance and its long-term stability, and a method for modifying the surface thereof. The cell culture member according to the present invention is a cell culture member having at least a holding region that holds an adherent cell and contains a polymer compound, wherein at least a part of the holding region is a surface-modified region in which a fluorine atom is directly chemically bonded to a part of carbon atoms and/or silicon atoms constituting the polymer compound, and the present invention can provide a cell culture member that improves adhesiveness of the adherent cell to the surface-modified region, suppresses deterioration over time of adhesiveness, and is excellent in cell culture performance and its long-term stability.

公开(公告)号：US20230407178A1

公开(公告)日：2023-12-21

申请号：US18251334

申请日：2021-10-27

Applicant: STELLA CHEMIFA CORPORATION

Inventor： Kazuya DATE ,  Nodoka NAKATA ,  Rui HASEBE ,  Keiichi NII

IPC: C09K13/08 ,  H01L21/311

CPC classification number: C09K13/08 ,  H01L21/31111

Abstract: A micromachining processing agent and a micromachining processing method capable of selectively micromachining a silicon oxide film when a laminated film including at least a silicon nitride film, a silicon oxide film, and a silicon alloy film is micromachined. The micromachining processing agent is used for micromachining of a laminated film including at least a silicon oxide film, a silicon nitride film, and a silicon alloy film. The micromachining processing agent contains: (a) 0.01 to 50 mass % of hydrogen fluoride; (b) 0.1 to 40 mass % of ammonium fluoride; (c) 0.001 to 10 mass % of a water-soluble polymer; (d) 0.001 to 1 mass % of an organic compound having a carboxyl group; and (e) water as an optional component, in which the water-soluble polymer is at least one selected from a group consisting of acrylic acid, ammonium acrylate, acrylamide, styrenesulfonic acid, ammonium styrenesulfonate, and styrenesulfonic acid ester.