公开(公告)号：US20160139501A1

公开(公告)日：2016-05-19

申请号：US14755693

申请日：2015-06-30

Applicant: Samsung Electronics Co., Ltd.

Inventor： Mun Ja Kim ,  Byunggook KIM ,  Jongju Park ,  Jaehyuck Choi

IPC: G03F1/62

CPC classification number: G03F1/62

Abstract: Provided is a mask. The mask may include a mask substrate, mask patterns on the mask substrate, frames disposed on an edge of the mask substrate outside the mask patterns, and a pellicle spaced apart from the mask patterns, the pellicle being disposed on the frames, wherein the pellicle includes protection layers each of which has a nanometer thickness.

Abstract translation: 提供一个面具。 掩模可以包括掩模基板，掩模基板上的掩模图案，设置在掩模图案外部的掩模基板的边缘上的框架，以及与掩模图案间隔开的防护薄膜组件，防护薄膜组件设置在框架上，其中防护薄膜组件 包括各自具有纳米厚度的保护层。

公开(公告)号：US20180203346A1

公开(公告)日：2018-07-19

申请号：US15919653

申请日：2018-03-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Hwanchul JEON ,  Munja KIM ,  Sungwon KWON ,  Byunggook KIM ,  Roman CHALYKH ,  Yongseok JUNG ,  Jaehyuck CHOI

IPC: G03F1/64 ,  G03F1/62

CPC classification number: G03F1/64 ,  G03F1/62

Abstract: A pellicle for lithography processes, including extreme ultraviolet (EUV) lithography may mitigate thermal accumulation in a membrane of the pellicle. The pellicle includes a membrane and at least one thermal buffer layer on at least one surface of the membrane. An emissivity of the thermal buffer layer may be greater than an emissivity of the membrane. A carbon content of the thermal buffer layer may be greater than a carbon content of the membrane. Multiple thermal buffer layers may be on separate surfaces of the membrane, and the thermal buffer layers may have different properties. A capping layer may be on at least one thermal buffer layer, and the capping layer may include a hydrogen resistant material. A thermal buffer layer may extend over some or all of a surface of the membrane. A thermal buffer layer may be between at least two membranes.

公开(公告)号：US20220225358A1

公开(公告)日：2022-07-14

申请号：US17609228

申请日：2020-05-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Sungnam HONG ,  Byunggook KIM ,  Okyoung CHOI ,  Hojoong KWON ,  Myungkwang BYUN ,  Jiyun SEOL ,  Kiseob HONG

IPC: H04W72/12 ,  H04W72/04

Abstract: The present disclosure relates to a 5th (5G) generation or pre-5G communication system for supporting a higher data transmission rate beyond a 4th (4G) generation communication system such as long term evolution (LTE). An operating method of a base station in a wireless communication system may include identifying a resource for transmitting at least one sequence for interference measurement of another base station, based on information received from a management device, and transmitting the at least one sequence through the resource, the information received from the management device may include information of the at least one sequence and the resource, and the information of the at least one sequence and the resource may be generated based on a grouping result of base stations based on an operating frequency.

公开(公告)号：US20160139500A1

公开(公告)日：2016-05-19

申请号：US14736706

申请日：2015-06-11

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Munja KIM ,  Byunggook KIM ,  Jaehyuck CHOI

IPC: G03F1/62

CPC classification number: G03F1/62 ,  G03F1/64

Abstract: Provided is a method of manufacturing a pellicle. The method includes preparing a substrate, forming a membrane on the substrate by performing a chemical vapor deposition (CVD) process, separating the membrane from the substrate in a first solvent, rinsing the separated membrane in a second solvent, and transferring the separated membrane to a frame in a third solvent.

Abstract translation: 提供一种制造防护薄膜组件的方法。 该方法包括制备基材，通过进行化学气相沉积（CVD）工艺在基板上形成膜，在第一溶剂中将膜与基板分离，在第二溶剂中冲洗分离的膜，并将分离的膜转移到 在第三溶剂中的框架。

公开(公告)号：US20210022151A1

公开(公告)日：2021-01-21

申请号：US17043637

申请日：2019-04-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jaewon KANG ,  Hojoong KWON ,  Soomin KO ,  Byunggook KIM ,  Myungkwang BYUN ,  Jaehee CHO

IPC: H04W72/08

Abstract: The present disclosure relates to a communication technique for converging a 5G communication system for supporting a higher data transfer rate beyond a 4G system with loT technology, and a system therefor. The present disclosure may be applied to intelligent services (for example, smart homes, smart buildings, smart cities, smart cars or connected cars, health care, digital education, retail business, security and safety-related services, etc.) on the basis of 5G communication technology and IoT-related technology. The present disclosure relates to a method for assigning transmission resources including an uplink (UL)-dedicated region and a downlink (DL)-dedicated region, the method comprising: a step for identifying a ratio of the DL-dedicated region to the UL-dedicated region; a step for changing the ratio of the DL-dedicated region to the UL-dedicated region by using at least one of a utilization rate and electric field characteristic information of the transmission resources; and a step for assigning the UL-dedicated region and the DL-dedicated region according to the changed ratio of the DL-dedicated region to the UL-dedicated region.

公开(公告)号：US20170031142A1

公开(公告)日：2017-02-02

申请号：US15183015

申请日：2016-06-15

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Eokbong KIM ,  Mun Ja KIM ,  Jongju PARK ,  Donggun LEE ,  Byunggook KIM

IPC: G02B19/00 ,  G03F7/20 ,  H05G2/00

CPC classification number: G02B19/0095 ,  G02B5/003 ,  G02B19/0023 ,  G03F7/70033 ,  G03F7/70916 ,  G21K1/062 ,  G21K1/10 ,  H05G2/001

Abstract: An extreme ultraviolet (EUV) light generation apparatus includes a source supplying unit in a chamber, the source supplying unit including a source material for generation of extreme ultraviolet light, a plasma generator to generate plasma from the source material, an optical unit in the chamber, and at least one protection film adjacent to the optical unit, the at least one protection film including at least one of graphite or graphene.

Abstract translation: 一种极紫外（EUV）光产生装置包括：室中的源供给单元，源供给单元，包括用于产生极紫外光的源材料;等离子体发生器，用于从源材料产生等离子体;室中的光学单元; 以及与光学单元相邻的至少一个保护膜，所述至少一个保护膜包括石墨或石墨烯中的至少一个。