公开(公告)号：US20250011650A1

公开(公告)日：2025-01-09

申请号：US18750176

申请日：2024-06-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol HAM ,  Byungjoon KANG ,  Sangwan KIM ,  Sungmin KIM ,  Insun PARK ,  Gayoung SONG ,  Jungmin OH ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

Abstract: Provided are an etching composition, a method of etching a metal-containing film using the same, and a method of manufacturing a semiconductor device by using the same. The etching composition includes an oxidizing agent, an acid, and a selective etching inhibitor, wherein the oxidizing agent is metal-free, the selective etching inhibitor includes a copolymer including a first repeating unit and a second repeating unit, the first repeating unit is different from the second repeating unit, and the first repeating unit is a nitrogen-containing repeating unit.

公开(公告)号：US20240318078A1

公开(公告)日：2024-09-26

申请号：US18586037

申请日：2024-02-23

Applicant: Samsung Electronics Co., Ltd.

Inventor： Byungjoon KANG ,  Sungmin KIM ,  Minjae SUNG ,  Gayoung SONG ,  Jungmin OH ,  Hyosan LEE ,  Byoungki CHOI ,  Cheol HAM ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

CPC classification number: C09K13/06 ,  H01L21/32134

Abstract: An etching composition for a titanium-containing layer may include an oxidant, an inorganic acid, and a selective etching inhibitor. The inorganic acid may include phosphorus-based inorganic acid, chlorine-based inorganic acid, or fluorine-based inorganic acid, or any combination thereof. The selective etching inhibitor may include a polymer having a nitrogen-containing repeating unit.

公开(公告)号：US20220102654A1

公开(公告)日：2022-03-31

申请号：US17229659

申请日：2021-04-13

Applicant: Samsung Electronics Co., Ltd.

Inventor： Jeoungin YI ,  Byungjoon KANG ,  Sangdong KIM ,  Hyungjun KIM ,  Yong Joo LEE ,  Byoungki CHOI ,  Youngki HONG ,  Kyuyoung HWANG

IPC: H01L51/00 ,  C07F15/00 ,  C09K11/06

Abstract: Provided are an organometallic compound, an organic light-emitting device including the organometallic compound, and an electronic apparatus including the organic light-emitting device, in which the organometallic compound may be represented by Formula 1-1: wherein Formula 1-1 may be understood by referring to the description of Formula 1-1 provided herein.

公开(公告)号：US20210198297A1

公开(公告)日：2021-07-01

申请号：US16895293

申请日：2020-06-08

Applicant: Samsung Electronics Co., Ltd.

Inventor： Aram JEON ,  Byungjoon KANG ,  Seungyeon KWAK ,  Kum Hee LEE ,  Kyuyoung HWANG ,  Ohyun KWON ,  Shingo ISHIHARA ,  Yuri CHO ,  Byoungki CHOI ,  Seokhwan HONG

IPC: C07F15/00 ,  H01L51/00

Abstract: Provided are an organometallic compound, an organic light-emitting device including the same, and a diagnostic composition including the same. The organometallic compound is represented by Formula 1 M(LA)n1(LB)n2 wherein, in Formula 1, M is a transition metal, LA is a ligand represented by Formula 2A, LB is a ligand represented by Formula 2B,

公开(公告)号：US20230407174A1

公开(公告)日：2023-12-21

申请号：US18194875

申请日：2023-04-03

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyuyoung HWANG ,  Byungjoon KANG ,  Daihyun KIM ,  Hwang Suk KIM ,  Mihyun PARK ,  Jingmin OH ,  Hyosan LEE ,  Byoungki CHOI ,  Ham CHEOL

IPC: C09K13/00 ,  H01L21/311 ,  H01L21/3213

CPC classification number: C09K13/00 ,  H01L21/32134 ,  H01L21/31111

Abstract: Provided are an etching composition including an oxidizing agent, an ammonium salt, an aqueous solvent, and an accelerator, a method of preparing a metal-containing film etching by using the same, and a method of manufacturing a semiconductor device by using the same.

公开(公告)号：US20220310940A1

公开(公告)日：2022-09-29

申请号：US17690280

申请日：2022-03-09

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyuyoung HWANG ,  Byungjoon KANG ,  Seungyeon KWAK ,  Hyungjun KIM ,  Yong Joo LEE ,  Jeoungin YI ,  Byoungki CHOI

IPC: H01L51/00 ,  C09K11/06 ,  C09K11/02 ,  C07F15/00

Abstract: Provided are an organometallic compound represented by Formula 1, an organic light-emitting device including the same, and an electronic apparatus including the organic light-emitting device. M(L1)n1(L2)n2  Formula 1 M, L1, L2, n1, and n2 in Formula 1 are the same as described in the present specification.

公开(公告)号：US20250129288A1

公开(公告)日：2025-04-24

申请号：US18916329

申请日：2024-10-15

Applicant: Samsung Electronics Co., Ltd.

Inventor： Cheol HAM ,  Byungjoon KANG ,  Giho KO ,  Sungmin KIM ,  Mihyun PARK ,  Insun PARK ,  Jinhye BAE ,  Kum Hee LEE ,  Minhyung CHO ,  Kyuyoung HWANG

IPC: C09K13/06 ,  H01L21/3213

Abstract: Provided are an etching composition, a method of etching a metal-containing film by using the same, and a method of manufacturing a semiconductor device by using the same. The etching composition may include an oxidizing agent, a buffer, and a selective etching inhibitor. The selective etching inhibitor may include a first compound represented by Formula 1 and a second compound different from the first compound. The second compound may include a ring. The ring may be a pyrazole group, an imidazole group, a triazole group, or a tetrazole group, or the ring may be a pyrazole group, an imidazole group, or a triazole group, each condensed with a benzene group, a pyridine group, a pyrimidine group, a pyrazine group, a pyridazine group, or any combination thereof. A description of Formula 1 is provided in the present specification.

公开(公告)号：US20240318077A1

公开(公告)日：2024-09-26

申请号：US18612457

申请日：2024-03-21

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kyuyoung HWANG ,  Byungjoon KANG ,  Daihyun KIM ,  Sungmin KIM ,  Mihyun PARK ,  Jungmin OH ,  Cheol HAM

IPC: C09K13/00 ,  H01L21/3213

CPC classification number: C09K13/00 ,  H01L21/32134

Abstract: An etching composition may include an oxidizer, an ammonium salt, an aqueous solvent, and an accelerator. A method of etching a metal-containing film may be performed using the etching composition, and a method of manufacturing a semiconductor device may be performed using the etching composition.