SUBSTRATE CLEANING APPARATUS AND SUBSTRATE CLEANING METHOD USING THE SAME

    公开(公告)号:US20210020462A1

    公开(公告)日:2021-01-21

    申请号:US16739409

    申请日:2020-01-10

    Abstract: A substrate cleaning apparatus includes a support inside a chamber to hold a substrate, a first supply source inside the chamber that includes a first nozzle along a first direction and facing an upper surface of the support, the first nozzle to spray polymer and solvent onto the substrate to form a coating, and a second nozzle at an oblique angle to the first direction and facing an edge of the support to inject a hot gas toward the coating to volatilize the solvent, a second supply source inside the chamber and having a third nozzle facing the upper surface of the support to inject a peeling treatment to the coating to peel the coating from the substrate, and a third supply source inside the chamber and facing a lower surface of the support to inject the hot gas to heat a second surface of the substrate.

    SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE
    10.
    发明申请
    SUBSTRATE TREATING APPARATUS AND METHOD OF TREATING SUBSTRATE 有权
    基板处理装置和处理基板的方法

    公开(公告)号:US20170062287A1

    公开(公告)日:2017-03-02

    申请号:US15175062

    申请日:2016-06-07

    Abstract: A substrate treating apparatus and a method of treating a substrate, the apparatus including a substrate treater that treats a substrate using a chemical solution, the chemical solution including a phosphoric acid aqueous solution and a silicon compound; and a chemical solution supplier that supplies the chemical solution to the substrate treating unit, wherein the chemical solution supplier includes a concentration measurer that measures concentrations of the chemical solutions, the concentration measurer including a first concentration measurer that measures a water concentration of the chemical solution; and a second concentration measurer that measures a silicon concentration of the chemical solution.

    Abstract translation: 一种基板处理装置及其处理方法,其特征在于,具备使用化学溶液处理基板的基板处理装置,所述化学溶液含有磷酸水溶液和硅化合物; 以及向所述基板处理单元供给所述化学溶液的化学溶液供给体,所述化学溶液供给体包含测定所述化学溶液浓度的浓度测定器,所述浓度测定器包括测定所述化学溶液的水浓度的第一浓度测定器 ; 以及测量化学溶液的硅浓度的第二浓度测量器。

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