Processing apparatus
    1.
    发明授权
    Processing apparatus 有权
    处理装置

    公开(公告)号:US09150965B2

    公开(公告)日:2015-10-06

    申请号:US13262005

    申请日:2010-03-30

    摘要: A processing apparatus includes a gas supply passage for supplying a corrosive gas having a halogen, a part of the passage being made of a metal; a stabilization reaction unit which has an energy generator for supplying light energy or heat energy to the corrosive gas that has passed through the metallic part of the gas supply passage and/or has an obstacle configured to apply a collision energy to the corrosive gas that has passed through the metallic part of the gas supply passage, the collision energy being generated from a collision between the obstacle and said corrosive gas. A reaction for stabilizing a compound containing the metal and the halogen contained in the corrosive gas takes place by means of at least one of the light energy, heat energy, and collision energy; and a trapping unit which traps the compound stabilized in the stabilization reaction unit.

    摘要翻译: 一种处理装置,包括用于供给具有卤素的腐蚀性气体的气体供给通道,所述通道的一部分由金属制成; 稳定化反应单元,其具有能量发生器,用于向已经通过气体供给通道的金属部分的腐蚀性气体提供光能或热能,和/或具有构造成将碰撞能量施加到具有 通过供气通道的金属部分,碰撞能量是由障碍物和腐蚀性气体之间的碰撞产生的。 通过光能,热能和碰撞能量中的至少一种,使包含在腐蚀性气体中的金属和卤素的化合物稳定化的反应; 以及捕获稳定化反应单元中稳定化合物的捕集单元。

    PROCESSING APPARATUS
    2.
    发明申请
    PROCESSING APPARATUS 有权
    加工设备

    公开(公告)号:US20120055402A1

    公开(公告)日:2012-03-08

    申请号:US13262005

    申请日:2010-03-30

    IPC分类号: C23C16/455 C23C16/48

    摘要: A processing apparatus includes a gas supply passage for supplying a corrosive gas having a halogen, a part of the passage being made of a metal; a stabilization reaction unit which has an energy generator for supplying light energy or heat energy to the corrosive gas that has passed through the metallic part of the gas supply passage and/or has an obstacle configured to apply a collision energy to the corrosive gas that has passed through the metallic part of the gas supply passage, the collision energy being generated from a collision between the obstacle and said corrosive gas. A reaction for stabilizing a compound containing the metal and the halogen contained in the corrosive gas takes place by means of at least one of the light energy, heat energy, and collision energy; and a trapping unit which traps the compound stabilized in the stabilization reaction unit.

    摘要翻译: 一种处理装置,包括用于供给具有卤素的腐蚀性气体的气体供给通道,所述通道的一部分由金属制成; 稳定化反应单元,其具有能量发生器,用于向已经通过气体供给通道的金属部分的腐蚀性气体提供光能或热能,和/或具有构造成将碰撞能量施加到具有 通过供气通道的金属部分,碰撞能量是由障碍物和腐蚀性气体之间的碰撞产生的。 通过光能,热能和碰撞能量中的至少一种,使包含在腐蚀性气体中的金属和卤素的化合物稳定化的反应; 以及捕获稳定化反应单元中稳定化合物的捕集单元。

    Device and method for driving jetting head
    3.
    发明授权
    Device and method for driving jetting head 失效
    驱动喷头的装置及方法

    公开(公告)号:US07625056B2

    公开(公告)日:2009-12-01

    申请号:US11382859

    申请日:2006-05-11

    IPC分类号: B41J29/38

    摘要: There is disclosed a head driving device which drives a plurality of pressure generating elements for generating pressure fluctuation in a jetted object contained in each of associated pressure chambers formed in a jetting head of a jetting apparatus to eject the jetted object from each of nozzles communicated with the associated pressure chambers. In the device, a head driver generates a drive signal which is selectively applied to at least one of the pressure generating elements to be driven. A bias potential provider selectively applies a bias potential to at least one of the pressure generating elements not to be driven.

    摘要翻译: 公开了一种头驱动装置,其驱动多个压力发生元件,用于在喷射装置的喷射头中形成的每个相关联的压力室中包含的喷射物体中产生压力波动,以从与每个喷嘴连通的喷嘴喷射喷射物体 相关压力室。 在该装置中,头驱动器产生驱动信号,该驱动信号被选择性地施加到待驱动的至少一个压力产生元件。 偏置电位提供器选择性地将偏压电位施加到不被驱动的压力产生元件中的至少一个。

    Piezo-electric substrate and manufacturing method of the same
    4.
    发明授权
    Piezo-electric substrate and manufacturing method of the same 有权
    压电基板及其制造方法相同

    公开(公告)号:US07569976B2

    公开(公告)日:2009-08-04

    申请号:US11880168

    申请日:2007-07-20

    IPC分类号: H01L41/08

    摘要: A piezo-electric substrate is mainly comprised of a base material and a film formed on one main surface of the base material. In the base material, the main surface on which the film is formed is a roughed main surface. The piezo-electric substrate is obtained by forming the film comprised of a material with a coefficient of linear expansion smaller than a coefficient of linear expansion of the base material on the roughened main surface using a thermal spraying method.

    摘要翻译: 压电基材主要由基材和形成在基材的一个主表面上的膜构成。 在基材中,形成有膜的主表面是粗糙的主表面。 通过使用热喷涂法将由包括粗糙化主表面上的基材的线膨胀系数的线性膨胀系数的材料构成的膜形成为压电基板。

    IMAGE FORMING APPARATUS, DATA PROCESSING METHOD THEREOF, AND COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAM OF THE METHOD
    6.
    发明申请
    IMAGE FORMING APPARATUS, DATA PROCESSING METHOD THEREOF, AND COMPUTER-READABLE RECORDING MEDIUM STORING PROGRAM OF THE METHOD 审中-公开
    图像形成装置,其数据处理方法和方法的计算机可读记录介质存储程序

    公开(公告)号:US20070177919A1

    公开(公告)日:2007-08-02

    申请号:US11668793

    申请日:2007-01-30

    IPC分类号: B41J5/30

    摘要: An image forming apparatus is disclosed. The image forming apparatus includes a data receiving section connected to a computer via a network for receiving a command from the computer, a command processing section for processing the command received by the data receiving section, a command interpreting section for interpreting the command and a data transmitting section for transmitting device information obtained by the command processing section. The command processing section requests the command interpreting section to interpret the command before completing a start-up of a device from which the command processing section obtains the device information.

    摘要翻译: 公开了一种图像形成装置。 图像形成装置包括经由网络连接到计算机的数据接收部分,用于从计算机接收命令,用于处理由数据接收部分接收的命令的命令处理部分,用于解释命令的命令解释部分和数据 发送部分,用于发送由命令处理部分获得的设备信息。 命令处理部分在完成命令处理部分从其获取设备信息的设备的启动之前请求命令解释部分解释该命令。

    Liquid ejection apparatus, drive signal application method, and liquid ejection method

    公开(公告)号:US20060071961A1

    公开(公告)日:2006-04-06

    申请号:US11238052

    申请日:2005-09-29

    申请人: Noboru Tamura

    发明人: Noboru Tamura

    IPC分类号: B41J29/38

    摘要: The liquid ejection apparatus includes: (A) a drive signal generation section generating first and second drive signals to be applied to an element that can execute a liquid-ejection operation; (B) a data output section outputting first selection data for setting an application state of the first drive signal to the element, and second selection data for setting an application state of the second drive signal to the element; (C) a data inspection section inspecting the first and second selection data having been output from the data output section, and outputting inspected first selection data and inspected second selection data, wherein if the first and second selection data indicate that the first and second drive signals are to be applied to the element simultaneously, then the data inspection section continues to output the inspected first- and inspected second selection data that had been output up to then; and (D) a switch section including a first switch that controls application of the first drive signal to the element based on the inspected first selection data, and a second switch that controls application of the second drive signal to the element based on the inspected second selection data. Accordingly, it is possible to prevent a plurality of switches from entering the ON state simultaneously.

    Capacitive-load driving circuit and recording head driving circuit
    9.
    发明授权
    Capacitive-load driving circuit and recording head driving circuit 有权
    电容负载驱动电路和记录头驱动电路

    公开(公告)号:US6046613A

    公开(公告)日:2000-04-04

    申请号:US168903

    申请日:1998-10-09

    申请人: Noboru Tamura

    发明人: Noboru Tamura

    CPC分类号: H03K17/667 H01L41/042

    摘要: An electric charge is supplied to or received from capacitors (C1, C2) when a piezoelectric element (C3) is charged or discharged by controlling transistors (Q17, Q18, Q15, Q10) which are in a first charging path (CL1) for charging from a power supply to the piezoelectric element (C3), a second charging path (CL2) for charging from the capacitors (C1, C2) to the piezoelectric element (C3), a first discharging path (DL1) for discharging from the piezoelectric element (C3) to ground (G) and a second discharging path (DL2) for discharging from the piezoelectric element (C3) to the capacitors (C1, C2), respectively.

    摘要翻译: 当通过控制用于充电的第一充电路径(CL1)的晶体管(Q17,Q18,Q15,Q10)对压电元件(C3)进行充电或放电时,向电容器(C1,C2)供电或接收电荷 从电源向所述压电元件(C3)施加用于从所述电容器(C1,C2)向所述压电元件(C3)充电的第二充电路径(CL2),从所述压电元件(C3)排出的第一放电路径(DL1) (C3)到地(G)的第二放电路径(DL2)和用于从压电元件(C3)向电容器(C1,C2)放电的第二放电路径(DL2)。