公开(公告)号：US6050681A

公开(公告)日：2000-04-18

申请号：US6406

申请日：1998-01-13

申请人： Takeshi Yamashita ,  Hitoshi Kato ,  Tomoko Yamamoto

发明人： Takeshi Yamashita ,  Hitoshi Kato ,  Tomoko Yamamoto

IPC分类号： B41J2/175

CPC分类号： B41J2/17523 ,  B41J2/17513

摘要： In an ink cartridge, a holding section, containing a holding member for holding ink, is provided in the cartridge body; a supply port, for supplying the ink held in the holding member to the outside, and a cover member, for opening and closing the supply port, are provided in the holding section; and the cover member is urged by the holding member to close the supply port. Further, in an ink supplying apparatus, a guide pipe is provided in its apparatus body, and the guide pipe is inserted into the supply port to press the cover member into the holding section to open the supply port.

摘要翻译： 在墨盒中，在盒体中设置有容纳用于保持墨水的保持部件的保持部， 用于将保持在保持构件中的墨水供给到外部的供给口和用于打开和关闭供给口的盖构件设置在保持部中; 并且盖构件被保持构件推压以关闭供给口。 此外，在供墨装置中，在其设备主体中设置有引导管，并且将引导管插入供给口，将盖部件按压到保持部中以打开供给口。

公开(公告)号：US6010212A

公开(公告)日：2000-01-04

申请号：US874923

申请日：1997-06-13

申请人： Takeshi Yamashita ,  Tomoko Yamamoto ,  Hitoshi Kato

发明人： Takeshi Yamashita ,  Tomoko Yamamoto ,  Hitoshi Kato

IPC分类号： B41J2/175

CPC分类号： B41J2/17513

摘要： An ink cartridge for supplying ink to a recording head in the present invention is provided with an ink containing section containing the ink, an ink supply port for supplying the ink to the recording head, a vent hole for introducing air into the ink cartridge, a first holding member containing section containing an ink holding member for holding the ink between the ink containing section and the ink supply port, and a second holding member containing section containing the ink holding member for holding the ink between the ink containing section and the vent hole, the first holding member containing section and the second holding member containing section not communicating with each other.

摘要翻译： 在本发明中用于向记录头供墨的墨盒设置有容纳墨水的墨水容纳部分，用于将墨水供应到记录头的供墨口，用于将空气引入墨盒的通气孔， 第一保持构件容纳部分，其包含用于将墨水保持在墨水容纳部分和墨水供应口之间的墨水保持部件;以及第二保持部件容纳部分，其包含用于将墨水保持在墨水容纳部分和通气孔之间的墨水保持部件 第一保持构件容纳部和第二保持构件容纳部彼此不连通。

公开(公告)号：US06176572B1

公开(公告)日：2001-01-23

申请号：US08874918

申请日：1997-06-13

申请人： Hitoshi Kato ,  Takeshi Yamashita ,  Tomoko Yamamoto

发明人： Hitoshi Kato ,  Takeshi Yamashita ,  Tomoko Yamamoto

IPC分类号： B41J2175

CPC分类号： B41J2/17523 ,  B41J2/17513

摘要： An ink jet recorder according to the present invention comprises an ink cartridge having an ink supply port for supplying ink to a recording head and an ink holding member composed of a porous member for holding the ink, the ink holding member being so provided inside the ink cartridge as to cover the ink supply port, and a recording head communicating with the ink supply port of the ink cartridge and having a plurality of nozzle holes provided therein, wherein the following conditions are satisfied, letting S0 (mm2) be the cross-sectional area of an opening in the ink supply port, S1 (mm2) be the total sum of the cross-sectional areas of openings in the plurality of nozzle holes, and S2 (mm2) be the average of the cross-sectional areas of holes in the ink holding member: (1/S2)×(1/35)>S0≧S1×5

摘要翻译： 根据本发明的喷墨记录器包括具有用于向记录头供墨的供墨口的墨盒和由用于保持墨的多孔构件构成的墨保持构件，墨保持构件设置在墨内 墨盒用于覆盖供墨口，以及与墨盒的供墨口连通并具有设置在其中的多个喷嘴孔的记录头，其中满足以下条件，使S0（mm2）为横截面 供墨口中的开口面积S1（mm2）是多个喷嘴孔中的开口的横截面积的总和，S2（mm2）是孔的横截面积的平均值 油墨保持构件：

公开(公告)号：US6116725A

公开(公告)日：2000-09-12

申请号：US056270

申请日：1998-04-07

申请人： Hitoshi Kato ,  Takeshi Yamashita

发明人： Hitoshi Kato ,  Takeshi Yamashita

IPC分类号： B41J2/175

CPC分类号： B41J2/17523

摘要： An ink cartridge has an ink holding chamber, an ink holding member that is placed inside the ink holding chamber and that holds ink, an ink supply outlet that connects the ink holding chamber and the outside; and a protruding member that is placed on the wall of the ink holding chamber in which the ink supply outlet is formed and that protrudes into the ink holding chamber. In the ink cartridge, the protruding member that protrudes into the cartridge presses onto the ink holding member from the area around the ink supply outlet. Consequently, the ink holding member becomes compressed by means of the protruding member, so that the ink held in the ink holding member flows out easily from the ink holding member. Further, in the ink cartridge, it is preferred that the protruding member be located such that it surrounds the supply outlet and that an ink pathway where the protruding member does not exist be created in at least part of the area around the ink supply outlet. This construction permits the ink to be sent smoothly to the ink supply outlet via the ink pathway. When the ink is sent smoothly to the ink supply outlet in this way, even shortly after the ink is supplied to the ink holding member or when a large amount of ink is supplied to the print head via the ink supply outlet for the purpose of continuous printing or purging, a sufficient amount of ink is stably led to the print head via the ink supply outlet.

摘要翻译： 墨盒具有墨水容纳室，墨水保持部件，其放置在墨水容纳室的内部并保持墨水;连接墨水容纳室和外部的墨水供给口; 以及突出构件，其设置在形成有供墨口的墨水容纳室的壁上并突出到墨水容纳室中。 在墨盒中，突出到墨盒中的突出构件从供墨口周围的区域压入墨水保持构件。 因此，油墨保持构件通过突出构件被压缩，使得保持在油墨保持构件中的油墨容易地从油墨保持构件流出。 此外，在墨盒中，优选地，突出构件被定位成使得其围绕供应出口并且在墨供应出口周围的至少一部分区域中产生不存在突出构件的墨通道。 这种结构允许油墨通过油墨通道顺利地送到油墨供应出口。 当油墨以这种方式平稳地送到油墨供给口时，即使在油墨供应到油墨保持部件之后不久，或者当为了连续的目的而经由供墨口供给大量的油墨到打印头时 打印或清洗，足够量的墨通过供墨口稳定地导向打印头。

公开(公告)号：US06224004B1

公开(公告)日：2001-05-01

申请号：US09339882

申请日：1999-06-25

申请人： Hitoshi Kato ,  Takeshi Yamashita ,  Toshihito Shimoda ,  Hideyuki Yoshida

发明人： Hitoshi Kato ,  Takeshi Yamashita ,  Toshihito Shimoda ,  Hideyuki Yoshida

IPC分类号： B02C1906

CPC分类号： B02C19/066 ,  B02C19/065 ,  B02C23/16

摘要： A mill offers superior milling efficiency by being provided with a partition to divide a milling chamber into a first guide path and a second guide path. Particles of a milling material that have been ground at a milling area in the milling chamber are guided into a particle classifier through the first guide path, and the ground particles of the milling material that were classified by the particle classifier as requiring further milling are guided back into the milling area through the second guide path.

摘要翻译： 研磨机通过设置有将研磨室分成第一引导路径和第二引导路径的隔板来提供优异的铣削效率。 已经在研磨室中的研磨区域研磨的研磨材料的颗粒通过第一引导路径被引导到颗粒分级器中，并且通过颗粒分级器被分类为需要进一步研磨的研磨材料的研磨颗粒被引导 通过第二引导路径回到铣削区域。

公开(公告)号：US09297072B2

公开(公告)日：2016-03-29

申请号：US12620750

申请日：2009-11-18

申请人： Hitoshi Kato ,  Manabu Honma

发明人： Hitoshi Kato ,  Manabu Honma

IPC分类号： C23C16/455 ,  H01L21/677 ,  H01L21/67 ,  C23C16/40

CPC分类号： C23C16/4551 ,  C23C16/402 ,  C23C16/45551 ,  C23C16/45578 ,  H01L21/6719 ,  H01L21/67703

摘要： A film deposition apparatus includes a rotary table having a substrate placement area to support a substrate, a vacuum container including a container and a top panel, an open-and-close mechanism configured to open and close the top panel, reactant gas nozzles disposed through and supported by an outer wall of the container to be situated at different angular positions with respect to a rotation center of the rotary table to face areas in which the substrate placement area passes, the reactant gas nozzles having gas discharge ports arranged in radial directions to supply respective reactant gases to the wafer thereby to form respective process areas, a discharge gas supply unit situated at an angular position between the process areas to supply purge gas to form an isolation area that isolates atmospheres of the process areas from each other, and an exhaustion unit configured to exhaust atmosphere inside the vacuum container.

摘要翻译： 一种成膜装置，包括具有用于支撑基板的基板放置区域的旋转台，包括容器和顶板的真空容器，构造成打开和关闭顶板的开闭机构，布置成穿过的反应气体喷嘴 并且由所述容器的外壁支撑，以相对于所述旋转台的旋转中心位于不同的角度位置，以面对所述基板放置区域通过的区域，所述反应气体喷嘴具有沿径向布置的气体排出口， 将相应的反应气体供应到晶片，从而形成相应的处理区域，放电气体供应单元位于处理区域之间的角位置处，以供应净化气体，以形成隔离区域，隔离区域将过程区域的气氛彼此隔离;以及 排气单元构造成排出真空容器内的气氛。

公开(公告)号：US09103030B2

公开(公告)日：2015-08-11

申请号：US12627144

申请日：2009-11-30

申请人： Hitoshi Kato ,  Manabu Honma

发明人： Hitoshi Kato ,  Manabu Honma

IPC分类号： C23C16/00 ,  C23C16/455 ,  C23C16/44 ,  C23C16/40

CPC分类号： C23C16/45551 ,  C23C16/402 ,  C23C16/4412 ,  C23C16/45578

摘要： In a film deposition apparatus, a first separation gas is discharged from a separation gas supplying portion to a separation area between a first process area to which a first reaction gas is supplied and a second process area to which a second reaction gas is supplied. A heater is provided to heat the turntable by radiation heat. An outer sidewall member is provided in a bottom part of a vacuum chamber to surround the turntable in an area where the heater is provided. A space forming member is provided between the separation areas adjacent to each other in a rotating direction of the turntable and extending from the outer sidewall member to form a narrow space between the turntable. A purge gas flows from a lower side of the turntable to an area outside the turntable in a radial direction through the narrow space.

摘要翻译： 在成膜装置中，第一分离气体从分离气体供给部排出到供给第一反应气体的第一处理区域和供给第二反应气体的第二处理区域之间的分离区域。 提供加热器以通过辐射热来加热转台。 外侧壁构件设置在真空室的底部，以在设置加热器的区域中围绕转台。 空间形成构件设置在转台的旋转方向上彼此相邻的分隔区域之间并且从外侧壁构件延伸以在转台之间形成狭窄的空间。 吹扫气体从转台的下侧流过转台的外侧，通过狭窄的空间沿径向流动。

公开(公告)号：US09093490B2

公开(公告)日：2015-07-28

申请号：US12713317

申请日：2010-02-26

申请人： Hitoshi Kato ,  Manabu Honma ,  Hiroyuki Kikuchi

发明人： Hitoshi Kato ,  Manabu Honma ,  Hiroyuki Kikuchi

IPC分类号： C23C16/455 ,  C23C16/40 ,  H01L21/677 ,  H01L21/687

CPC分类号： H01L21/68764 ,  C23C16/402 ,  C23C16/45551 ,  C23C16/45578 ,  C23C16/45589 ,  H01L21/68771

摘要： A disclosed film deposition apparatus for depositing a film on a substrate by supplying a reaction gas to an upper surface of the substrate in a vacuum chamber includes a susceptor provided in the vacuum chamber, wherein substrate receiving areas are formed along a circle whose center lies in a center portion of the susceptor; a main gas supplying portion provided opposing the susceptor in order to supply the reaction gas to the substrate receiving areas of the susceptor; a compensation gas supplying portion configured to supply the reaction gas to an upper surface of the susceptor in order to compensate for concentration of the reaction gas supplied from the main gas supplying portion along a radius direction of the susceptor; and a rotation mechanism configured to rotate the susceptor relative to the main gas supplying portion and the compensation gas supplying portion around the center portion of the susceptor.

摘要翻译： 公开的一种用于在真空室中将反应气体提供给基板的上表面的基板上沉积薄膜的薄膜沉积装置包括设置在真空室中的基座，其中基板接收区域沿着中心位于 基座的中心部分; 主气体供给部，其与所述基座相对设置，以将所述反应气体供应到所述基座的所述基板接收区域; 补偿气体供给部，其构造成将反应气体供给到所述基座的上表面，以补偿从所述主气体供给部沿着所述基座的半径方向供给的反应气体的浓度; 以及旋转机构，其构造成使所述基座相对于所述主气体供给部和所述补偿气体供给部围绕所述基座的中心部旋转。

公开(公告)号：US08951347B2

公开(公告)日：2015-02-10

申请号：US13128908

申请日：2009-11-13

申请人： Hitoshi Kato ,  Yasushi Takeuchi

发明人： Hitoshi Kato ,  Yasushi Takeuchi

IPC分类号： C23C16/455 ,  C23C16/458 ,  H01L21/306 ,  C23F1/00 ,  C23C16/06 ,  C23C16/22

CPC分类号： C23C16/45551 ,  C23C16/45519 ,  C23C16/45578 ,  C23C16/45591

摘要： A film deposition apparatus is provided with a gas nozzle in which ejection holes that eject a reaction gas are formed along a longitudinal direction of the gas nozzle, and a flow regulation member that protrudes from the gas nozzle in either one of upstream and downstream directions of a rotation direction of a turntable. In such a configuration, a separation gas flowing from an upstream side of the rotation direction to the gas nozzle is restricted from flowing between the gas nozzle and the turntable on which a substrate is placed, and the reaction gas flowing upward from the turntable is restricted by the separation gas, thereby impeding a reaction gas concentration in a process area from being lowered.

摘要翻译： 一种成膜装置设置有气体喷嘴，其中沿着气体喷嘴的纵向方向形成喷射反应气体的喷射孔，以及流量调节构件，其从上游和下游方向中的任一个中的气体喷嘴突出 转台的旋转方向。 在这种构造中，从旋转方向的上游侧流向气体喷嘴的分离气体被限制在气体喷嘴与放置基板的转盘之间的流动，并且从转台向上流动的反应气体受到限制 通过分离气体，从而阻止处理区域中的反应气体浓度降低。

公开(公告)号：US08808456B2

公开(公告)日：2014-08-19

申请号：US12539642

申请日：2009-08-12

申请人： Hitoshi Kato ,  Manabu Honma

发明人： Hitoshi Kato ,  Manabu Honma

IPC分类号： C23C16/455 ,  H01L21/677 ,  C23C16/40 ,  H01L21/67

CPC分类号： C23C16/401 ,  C23C16/45502 ,  C23C16/45508 ,  C23C16/45551 ,  H01L21/67161 ,  H01L21/67703

摘要： A disclosed film deposition apparatus has a separation gas supplying nozzle between reaction gas nozzles arranged away from each other in a rotation direction of a turntable on which a substrate is placed, and a ceiling member providing a lower ceiling surface on both sides of the separation gas supplying nozzle. In this film deposition apparatus, the separation gas supplying nozzle and the reaction gas nozzles are removably arranged along a circumferential direction of a chamber, and the ceiling member is removably attached on a ceiling plate of the chamber.

摘要翻译： 所公开的薄膜沉积装置具有在其上放置基板的转台的旋转方向上彼此远离配置的反应气体喷嘴之间的分离气体供给喷嘴，以及在分离气体的两侧设置有下部顶面的顶板部件 供应喷嘴。 在该成膜装置中，分离气体供给喷嘴和反应气体喷嘴沿着室的圆周方向可拆卸地配置，顶棚部件可移除地安装在室的顶板上。