摘要:
The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.
摘要:
A radiation-polymerizable mixture is described comprising (a) a compound which has at least two terminal ethylenically unsaturated groups and which can form a crosslinked polymer by means of free radical initiated chain addition polymerization, (b) a polymeric binder, (c) a radiation-activatable polymerization initiator which can be activated by radiation, and (d) a compound which is thermally crosslinkable with the polymeric binder (b), with the polymerization product of compound (a) and/or with itself and which, if its crosslinking groups are epoxy groups, has at least three epoxy groups. A photopolymerizable copying material is also disclosed having a flexible transparent temporary support and a transferable thermoplastic photopolymerizable layer comprising the foregoing radiation-polymerizable mixture. The photopolymerizable layer, after photocrosslinking, can be additionally cured by thermal crosslinking and is therefore suitable for the manufacture of solder resists and high performance printing plates.
摘要:
A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: ##STR1## wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.
摘要:
A radiation-polymerizable mixture, recording material and process for using the recording material in relief recordings. The radiation-polymerizable mixture contains:(a) a polymeric binder,(b) a compound of the formula: ##STR1## `in which A is O, NH or N-alkyl,Q is --CO--C.sub.p H.sub.2p -Z-- or --C.sub.k H.sub.2k O--,Z is O or NH,R.sup.1 is H or alkyl,R.sup.2 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or SO.sub.2 R.sup.3,R.sup.3 is alkyl, alkenyl, cycloalkyl, aryl, aralkyl or aryloxy,k is a number from 3 to 20,l is a number from 0 to 20,m is a number from 2 to 20,n is a number from 1 to 20 andp is a number from 2 to 10, and(c) a compound or a combination of compounds, which is capable of initiating the polymerization of the compound (b) under the action of actinic radiation.The mixture is especially suitable for the preparation of dry photoresist materials and is distinguished by good flexibility and adhesion to copper and by easy strippability in the light-cured state.
摘要:
A radiation-polymerizable mixture comprising a polymeric binder, a radiation-activatable polymerization initiator and a polymerizable acrylate or methacrylate ester having at least two urethane groups in the molecule, said ester being a reaction product of glycerol dimethacrylate or glycerol diacrylate and a polyisocyanate obtained by reacting a polyhydroxy compound having from two to six hydroxyl groups with a diisocyanate or a reaction product of glycerol dimethacrylate or glycerol diacrylate and a diisocyanate. The new polymerizable urethanes provide the mixture with a high light-sensitivity, good reciprocity and a low tendency to crystallize.
摘要:
Disclosed is a radiation-polymerizable mixture which includes a polymerizable compound, a radiation-activatable polymerization initiator and a polymeric binder with lateral cross-linking groups of the formula--CH.sub.2 OR,wherein R denotes a hydrogen atom or a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group. The mixture is cured by heating after development. Also disclosed is a polymerizable copying material which includes a layer comprising the mixture and a process for producing a solder mask including a laminating step for laminating a photoresist layer which includes the layer.
摘要:
Dispersion powders with a reduced tendency to autoignition are obtained by adding antioxidants to dispersions before spray drying or to dispersion powders after spray drying.
摘要:
A pulverulent adhesive composition which comprises (a) at least one polymer selected from the group consisting of vinyl ester polymers, (meth)acrylate polymers and styrene(meth)acrylate polymers, (b) at least one tackifying resin (tackifier) and, optionally, (c) one or more protective colloids, and, optionally, (d) one or more anticaking agents. The present composition is suitable for use in formulations used for the adhesive bonding of porous and/or semiporous substrates.
摘要:
A process for the preparation of a synthetic resin dispersion stabilized by a protective colloid employing at least one initiator and based on a polymer of (a) a first monomer of at least one ester of acrylic acid or methacrylic acid and an alcohol containing 1 to 22 carbon atoms; and optionally, (b) a second monomer which can be copolymerized with the first monomers. The process comprises introducing at least 50% of the monomers based on the total weight of the monomers, at least 50% of the protective colloid based on the total weight of the protective colloid, and up to 50% of the initiator based on the total weight of the initiator into a reaction vessel to form an aqueous emulsion. Any remaining monomers and protective colloid and at least 50% of the initiator based on the total weight of the initiator are then added to the reaction vessel at a temperature of 30.degree. to 100.degree. C.
摘要:
Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.