Pulverulent adhesive composition
    1.
    发明授权
    Pulverulent adhesive composition 失效
    粉煤灰组合物

    公开(公告)号:US5994438A

    公开(公告)日:1999-11-30

    申请号:US825951

    申请日:1997-04-03

    摘要: A pulverulent adhesive composition which comprises (a) at least one polymer selected from the group consisting of vinyl ester polymers, (meth)acrylate polymers and styrene(meth)acrylate polymers, (b) at least one tackifying resin (tackifier) and, optionally, (c) one or more protective colloids, and, optionally, (d) one or more anticaking agents. The present composition is suitable for use in formulations used for the adhesive bonding of porous and/or semiporous substrates.

    摘要翻译: 一种粉状粘合剂组合物,其包含(a)至少一种选自乙烯基酯聚合物,(甲基)丙烯酸酯聚合物和苯乙烯(甲基)丙烯酸酯聚合物的聚合物,(b)至少一种增粘树脂(增粘剂)和任选地 ,(c)一种或多种保护性胶体,和(d)一种或多种防结块剂。 本发明的组合物适合用于多孔和/或半孔基材的粘合剂的制剂中。

    Radiation-polymerizable mixture with crosslinkable binder
    2.
    发明授权
    Radiation-polymerizable mixture with crosslinkable binder 失效
    具有可交联粘合剂的可辐射聚合的混合物

    公开(公告)号:US4572887A

    公开(公告)日:1986-02-25

    申请号:US640139

    申请日:1984-08-13

    申请人: Ulrich Geissler

    发明人: Ulrich Geissler

    CPC分类号: G03F7/033

    摘要: Disclosed is a radiation-polymerizable mixture which includes a polymerizable compound, a radiation-activatable polymerization initiator and a polymeric binder with lateral cross-linking groups of the formula--CH.sub.2 OR,wherein R denotes a hydrogen atom or a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group. The mixture is cured by heating after development. Also disclosed is a polymerizable copying material which includes a layer comprising the mixture and a process for producing a solder mask including a laminating step for laminating a photoresist layer which includes the layer.

    摘要翻译: 公开了一种可辐射聚合的混合物,其包括可聚合化合物,可辐射激活的聚合引发剂和具有式-CH 2OR侧向交联基团的聚合物粘合剂,其中R表示氢原子或低级烷基,低级酰基 基团或低级羟烷基。 混合物在显影后通过加热固化。 还公开了一种可聚合复制材料,其包括包含该混合物的层和用于制造焊接掩模的方法,该方法包括层压包括该层的光致抗蚀剂层的层压步骤。

    Process for the preparation of synthetic resin dispersions
    4.
    发明授权
    Process for the preparation of synthetic resin dispersions 失效
    合成树脂分散体的制备方法

    公开(公告)号:US5679735A

    公开(公告)日:1997-10-21

    申请号:US577551

    申请日:1995-12-22

    CPC分类号: C08F20/12

    摘要: A process for the preparation of a synthetic resin dispersion stabilized by a protective colloid employing at least one initiator and based on a polymer of (a) a first monomer of at least one ester of acrylic acid or methacrylic acid and an alcohol containing 1 to 22 carbon atoms; and optionally, (b) a second monomer which can be copolymerized with the first monomers. The process comprises introducing at least 50% of the monomers based on the total weight of the monomers, at least 50% of the protective colloid based on the total weight of the protective colloid, and up to 50% of the initiator based on the total weight of the initiator into a reaction vessel to form an aqueous emulsion. Any remaining monomers and protective colloid and at least 50% of the initiator based on the total weight of the initiator are then added to the reaction vessel at a temperature of 30.degree. to 100.degree. C.

    摘要翻译: 一种制备由保护胶体稳定的合成树脂分散体的方法,所述合成树脂分散体使用至少一种引发剂,并且基于(a)至少一种丙烯酸或甲基丙烯酸酯的第一单体和含有1至22的醇的聚合物 碳原子 和(b)可与第一单体共聚的第二单体。 该方法包括基于单体的总重量引入至少50%的单体,基于保护胶体的总重量,至少50%的保护胶体和基于总量的至多50%的引发剂 引发剂的重量加入到反应容器中以形成水乳液。 然后将任何剩余的单体和保护胶体和基于引发剂总重量的至少50%的引发剂在30至100℃的温度下加入到反应容器中。

    Process for stripping light-hardened photoresist layers
    5.
    发明授权
    Process for stripping light-hardened photoresist layers 失效
    剥离光硬化光致抗蚀剂层的方法

    公开(公告)号:US4776892A

    公开(公告)日:1988-10-11

    申请号:US899993

    申请日:1986-08-22

    CPC分类号: G03F7/425

    摘要: Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.

    摘要翻译: 通过用有机季铵碱和任选的强无机碱的水溶液处理该层来剥离光硬化的光致抗蚀剂层。 所得到的层残留物分散成相对较小的薄片,其不会在导电路径之间变窄。

    Photosensitive transfer material having a support of defined roughness
    6.
    发明授权
    Photosensitive transfer material having a support of defined roughness 失效
    感光转印材料具有规定的粗糙度的支撑

    公开(公告)号:US4559292A

    公开(公告)日:1985-12-17

    申请号:US537000

    申请日:1983-09-29

    CPC分类号: G03F7/115 G03F7/346

    摘要: The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.

    摘要翻译: 本发明涉及一种感光转印材料,其包括优选透明的柔性临时支撑膜,热敏感光层,可选地在感光层的自由侧上的柔性覆盖膜,以及可选地,在支撑体 胶片和感光层。 感光转印材料适用于制造光刻胶模板和焊接掩模。 临时支撑膜具有分别在感光层和中间层的表面上施加压花效果的粗糙表面。 中间层的表面处理防止了该层在潮湿空气中的不规则变形,而感光层的光洁度则排除了不希望的反射。

    Radiation polymerizable mixture and copying material produced therefrom
    7.
    发明授权
    Radiation polymerizable mixture and copying material produced therefrom 失效
    由其制造的可辐照聚合混合物和复印材料

    公开(公告)号:US4495271A

    公开(公告)日:1985-01-22

    申请号:US379865

    申请日:1982-05-19

    摘要: A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: ##STR1## wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.

    摘要翻译: 一种可辐射聚合的混合物,其包含不溶于水但在碱性水溶液中可溶或至少可溶胀的粘合剂; 辐射可激活的聚合引发剂; 和具有对应于下式的丙烯酸或甲基丙烯酸的可聚合的聚丙二醇二酯:其中R表示氢原子或甲基,n表示2至13的数; 以及包含载体和包含前述类型的混合物的感光层的感光复印材料。 本发明的可辐射聚合的混合物产生对气氛氧的低敏感性的非粘性层,并且可用作干或液体光致抗蚀剂。

    Radiation-polymerizable composition and recording material prepared from
this composition
    9.
    发明授权
    Radiation-polymerizable composition and recording material prepared from this composition 失效
    由该组合物制备的可辐射聚合组合物和记录材料

    公开(公告)号:US5182187A

    公开(公告)日:1993-01-26

    申请号:US617378

    申请日:1990-11-26

    IPC分类号: G03F7/033

    CPC分类号: G03F7/033 Y10S430/111

    摘要: Radiation-polymerizable composition which comprisesa) a constituent that can be polymerized by free radicals and has a boiling point above 100.degree. C.,b) a photoinitiator, andc) a copolymer comprising units ofc1) an .alpha., .beta.-unsaturated aliphatic carboxylic acid,c2) an alkyl, cycloalkyl or cycloalkenyl methacrylate, andc3) an alkyl, cycloalkyl or cycloalkenyl acrylateand has an acid number of 78 to 176 and a glass transition temperature of 290 to 340 K. The composition is characterized by its ready developability at a low acid number and its good resistance to alkaline etching solutions.

    摘要翻译: 可辐射聚合组合物,其包含:a)可以通过自由基聚合并且沸点高于100℃的组分,b)光引发剂,和c)包含c1)α,β-不饱和脂族 羧酸,c2)烷基,环烷基或环烯基甲基丙烯酸酯,和c3)烷基,环烷基或环烯基丙烯酸酯,其酸值为78至176,玻璃化转变温度为290至340K。该组合物的特征在于其即将 低酸值的显影性和良好的抗碱蚀刻溶液。

    Radiation-sensitive positive working composition and material with
aqueous-alkaline soluble acryamide or methacryamide copolymer having
hydroxyl or carboxyl groups
    10.
    发明授权
    Radiation-sensitive positive working composition and material with aqueous-alkaline soluble acryamide or methacryamide copolymer having hydroxyl or carboxyl groups 失效
    辐射敏感的正性工作组合物和具有羟基或羧基的含水碱性可溶性丙烯酰胺或甲基丙烯酰胺共聚物的材料

    公开(公告)号:US4699867A

    公开(公告)日:1987-10-13

    申请号:US800965

    申请日:1985-11-22

    CPC分类号: G03F7/0233 G03F7/0045

    摘要: Disclosed is a radiation-sensitive composition, a recording material prepared therewith, and process therefor. The invention is suitable for the production of printing plates and photoresists. The composition contains a 1,2-quinonediazide or a combination of (1) a compound which, under the action of actinic radiation, forms a strong acid, and (2) a compound which possesses at least one acid-cleavable C--O--C bond, the solubility of which in a liquid developer is increased by the action of acid and, as the binder, a polymer having lateral crosslinking groups of the formula --CH.sub.2 OR, in which R is a hydrogen atom, a lower alkyl group, acyl group or hydroxyalkyl group. After being exposed and developed, the composition can be thermally cured and results in an image stencil exhibiting a clean background.

    摘要翻译: 公开了辐射敏感组合物,由其制备的记录材料及其工艺。 本发明适用于生产印版和光致抗蚀剂。 该组合物包含1,2-醌二叠氮化物或(1)在光化辐射的作用下形成强酸的化合物,和(2)具有至少一个可酸切割的COC键的化合物, 通过酸的作用,其在液体显影剂中的溶解度增加,并且作为粘合剂,具有式-CH 2OR侧链交联基团的聚合物,其中R是氢原子,低级烷基,酰基或羟基烷基 。 曝光和显影后,组合物可以热固化并产生具有干净背景的图像模板。