摘要:
A pulverulent adhesive composition which comprises (a) at least one polymer selected from the group consisting of vinyl ester polymers, (meth)acrylate polymers and styrene(meth)acrylate polymers, (b) at least one tackifying resin (tackifier) and, optionally, (c) one or more protective colloids, and, optionally, (d) one or more anticaking agents. The present composition is suitable for use in formulations used for the adhesive bonding of porous and/or semiporous substrates.
摘要:
Disclosed is a radiation-polymerizable mixture which includes a polymerizable compound, a radiation-activatable polymerization initiator and a polymeric binder with lateral cross-linking groups of the formula--CH.sub.2 OR,wherein R denotes a hydrogen atom or a lower alkyl group, a lower acyl group or a lower hydroxyalkyl group. The mixture is cured by heating after development. Also disclosed is a polymerizable copying material which includes a layer comprising the mixture and a process for producing a solder mask including a laminating step for laminating a photoresist layer which includes the layer.
摘要:
Dispersion powders with a reduced tendency to autoignition are obtained by adding antioxidants to dispersions before spray drying or to dispersion powders after spray drying.
摘要:
A process for the preparation of a synthetic resin dispersion stabilized by a protective colloid employing at least one initiator and based on a polymer of (a) a first monomer of at least one ester of acrylic acid or methacrylic acid and an alcohol containing 1 to 22 carbon atoms; and optionally, (b) a second monomer which can be copolymerized with the first monomers. The process comprises introducing at least 50% of the monomers based on the total weight of the monomers, at least 50% of the protective colloid based on the total weight of the protective colloid, and up to 50% of the initiator based on the total weight of the initiator into a reaction vessel to form an aqueous emulsion. Any remaining monomers and protective colloid and at least 50% of the initiator based on the total weight of the initiator are then added to the reaction vessel at a temperature of 30.degree. to 100.degree. C.
摘要:
Light-hardened photoresist layers are stripped by treating the layer with an aqueous solution of an organic quaternary ammonium base and, optionally a strong inorganic base. The resulting layer residues are dispersed as relatively small flakes which do not become lodged between conducting paths.
摘要:
The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.
摘要:
A radiation-polymerizable mixture comprising a binder which is insoluble in water, but soluble or at least swellable in aqueous alkaline solutions; a radiation-activatable polymerization initiator; and a polymerizable polypropylene glycol diester with acrylic or methacrylic acid corresponding to the formula: ##STR1## wherein R represents a hydrogen atom or a methyl group and n represents a number from 2 to 13; and a light-sensitive copying material comprising a support and a light-sensitive layer comprising a mixture of the foregoing type. The radiation-polymerizable mixture of the invention produces non-tacky layers which exhibit a low sensitivity to atmospheric oxygen and are useful as dry or liquid photoresists.
摘要:
A photopolymerizable composition, which contains a polymeric binder, a compound which can be polymerized by free radicals and has at least one terminal ethylenic double bond and a photoinitiator combination comprising an N-heterocyclic compound, a thioxanthone derivative and a dialkylamino compound, is highly photosensitive and produces photoresist stencils with vertical side walls.
摘要:
Radiation-polymerizable composition which comprisesa) a constituent that can be polymerized by free radicals and has a boiling point above 100.degree. C.,b) a photoinitiator, andc) a copolymer comprising units ofc1) an .alpha., .beta.-unsaturated aliphatic carboxylic acid,c2) an alkyl, cycloalkyl or cycloalkenyl methacrylate, andc3) an alkyl, cycloalkyl or cycloalkenyl acrylateand has an acid number of 78 to 176 and a glass transition temperature of 290 to 340 K. The composition is characterized by its ready developability at a low acid number and its good resistance to alkaline etching solutions.
摘要:
Disclosed is a radiation-sensitive composition, a recording material prepared therewith, and process therefor. The invention is suitable for the production of printing plates and photoresists. The composition contains a 1,2-quinonediazide or a combination of (1) a compound which, under the action of actinic radiation, forms a strong acid, and (2) a compound which possesses at least one acid-cleavable C--O--C bond, the solubility of which in a liquid developer is increased by the action of acid and, as the binder, a polymer having lateral crosslinking groups of the formula --CH.sub.2 OR, in which R is a hydrogen atom, a lower alkyl group, acyl group or hydroxyalkyl group. After being exposed and developed, the composition can be thermally cured and results in an image stencil exhibiting a clean background.