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29 条记录 (耗时 0.034 秒)

    Projection exposure device
    2.
    发明授权
    Projection exposure device 失效

    公开(公告)号：US06636367B2

    公开(公告)日：2003-10-21

    申请号：US09955921

    申请日：2001-09-19

    申请人： Ulrich Drodofsky ,  Nils Dieckmann ,  Martin Antoni ,  Hans-Joachim Miesner

    发明人： Ulrich Drodofsky ,  Nils Dieckmann ,  Martin Antoni ,  Hans-Joachim Miesner

    IPC分类号： G02B702

    CPC分类号： G03F7/70133 ,  G03F7/70141

    摘要： A projection exposure device (1), in particular for micro-lithography, serves to produce an image of an object (2) in an image plane (11) positioned in an object plane (10). For this reason the projection exposure device (1) has a radiation source (4) emitting projection radiation (5). Illumination optics (6) are positioned between the radiation source (4) and the object plane (10) and projection optics (8) are positioned between the object plane (10) and the image plane (11). A detection device (30) is provided to measure the illumination angle distribution of the projection radiation (5) in a field plane (10). This communicates via at least one control device (34, 18) with at least one manipulator (20, 45, 47). The latter serves to move at least one optical component (7, 41) within the projection ray path (5, 9). The illumination angle distribution changes as a result of the controlled movement of the optical component (7, 41). This can therefore be adjusted depending on the measurement result and for example adapted to the object structure.

    Illumination system of a microlithographic projection exposure apparatus
    3.
    发明授权
    Illumination system of a microlithographic projection exposure apparatus 有权
    微光刻投影曝光装置的照明系统

    公开(公告)号：US08081293B2

    公开(公告)日：2011-12-20

    申请号：US12191069

    申请日：2008-08-13

    申请人： Damian Fiolka ,  Nils Dieckmann

    发明人： Damian Fiolka ,  Nils Dieckmann

    IPC分类号： G03B27/54

    CPC分类号： G03F7/70966 ,  G02B5/001 ,  G03F7/70191

    摘要： The disclosure provides an illumination system of a microlithographic projection exposure apparatus, as well as related methods and components. In some embodiments, the illumination system includes an optical element configured so that, when a linearly polarized entry beam which has an angle spectrum is incident on the first optical element, a maximum aperture angle of the entry beam at the first optical element is not more than 35 mrad. A component, which is rotationally symmetric about an optical axis of the system, of a birefringence present in the illumination system can be at least partially compensated by the first optical element.

    摘要翻译： 本公开提供了微光刻投影曝光装置的照明系统以及相关的方法和组件。 在一些实施例中，照明系统包括光学元件，其被配置为使得当具有角度光谱的线偏振入射光束入射在第一光学元件上时，入射光束在第一光学元件处的最大孔径角度不更大 超过35 mrad。 可以通过第一光学元件至少部分地补偿存在于照明系统中的双折射的关于系统的光轴旋转对称的分量。

    System for setting and maintaining a gas atmosphere in an optical system
    5.
    发明申请
    System for setting and maintaining a gas atmosphere in an optical system 审中-公开
    用于在光学系统中设置和维持气体气氛的系统

    公开(公告)号：US20060061886A1

    公开(公告)日：2006-03-23

    申请号：US11247925

    申请日：2005-10-11

    申请人： Bernhard Gellrich ,  Nils Dieckmann

    发明人： Bernhard Gellrich ,  Nils Dieckmann

    IPC分类号： G02B7/02

    CPC分类号： G03F7/70916 ,  G03F7/70933

    摘要： Arranged in a system for setting and maintaining a gas atmosphere in an objective having at least one optical element is a first, inner gas compartment that is separated from a second, outer gas compartment by an inner casing. Both gas compartments are provided with gas inlet and gas outlet openings. At least one of the two gas compartments is under a pressure that is higher than the ambient pressure.

    摘要翻译： 布置在用于在具有至少一个光学元件的物镜中设置和维持气体气氛的系统中，是通过内壳与第二外部气体隔室分离的第一内部气体隔室。 两个气室都设有气体入口和气体出口。 两个气体室中的至少一个处于高于环境压力的压力下。

    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS
    8.
    发明申请
    ILLUMINATION SYSTEM OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPARATUS 有权
    微波投影曝光装置的照明系统

    公开(公告)号：US20090323043A1

    公开(公告)日：2009-12-31

    申请号：US12509738

    申请日：2009-07-27

    申请人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

    发明人： Nils Dieckmann ,  Manfred Maul ,  Christian Hettich ,  Oliver Natt

    IPC分类号： G03B27/72

    CPC分类号： G03F7/70191

    摘要： An illumination system of a microlithographic projection exposure apparatus can include at least one transmission filter which has a different transmittance at least at two positions and which is arranged between a pupil plane and a field plane). The transmittance distribution can be determined such that it has field dependent correcting effects on the ellipticity. In some embodiments the telecentricity and/or the irradiance uniformity is not affected by this correction.

    摘要翻译： 微光刻投影曝光装置的照明系统可以包括至少一个至少在两个位置处具有不同透射率并且布置在瞳孔平面和场平面之间的透射滤光器。 可以确定透射率分布，使得其具有对椭圆率的场依赖校正效应。 在一些实施例中，远心度和/或辐照度均匀性不受该校正的影响。

    System for reducing the coherence of laser radiation
    9.
    发明申请
    System for reducing the coherence of laser radiation 有权
    减少激光辐射相干性的系统

    公开(公告)号：US20070206381A1

    公开(公告)日：2007-09-06

    申请号：US10590537

    申请日：2005-02-22

    申请人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

    发明人： Damian Fiolka ,  Manfred Maul ,  Nils Dieckmann

    IPC分类号： F21S8/00

    CPC分类号： G03F7/70583 ,  G03F7/70058

    摘要： The invention relates to a system for reducing the coherence of a wave front-emitting laser radiation, especially for a projection lens for use in semiconductor lithography, wherein a first partial beam of a laser beam incident on a surface of a resonator body is partially reflected. A second partial beam penetrates the resonator body and emerges from the resonator body at least approximately in the area of entry after a plurality of total internal reflections. The two partial beams are then passed on jointly to an illumination plane. The resonator body is adapted, in addition to splitting the laser beam into partial beams, to modulate the wave fronts of at least one partial beam during a laser pulse. The partial beams reflected on the resonator body and penetrating the resonator body are superimposed downstream of the resonator body. The resonator body is provided with a phase plate having different local phase distribution.

    摘要翻译： 本发明涉及一种用于减小波前发射激光辐射的相干性的系统，特别是对于用于半导体光刻的投影透镜，其中入射在谐振器体的表面上的激光束的第一部分光束被部分地反射 。 第二部分光束穿过谐振器本体并且在多次完全内部反射之后至少大致在进入区域中从谐振器本体出射。 然后将两个部分光束共同传递到照明平面。 除了将激光束分成部分光束之外，谐振器体还适于在激光脉冲期间调制至少一个部分光束的波前。 在谐振器本体上反射并穿透谐振器体的部分光束重叠在谐振器体的下游。 谐振器主体设置有具有不同局部相位分布的相位板。

    Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus
    10.
    发明授权
    Method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus 失效
    确定在投影曝光装置中照射物体的光的角度分布的特征的至少一个参数的方法

    公开(公告)号：US06985218B2

    公开(公告)日：2006-01-10

    申请号：US10855252

    申请日：2004-05-27

    申请人： Nils Dieckmann

    发明人： Nils Dieckmann

    IPC分类号： G01J1/00

    CPC分类号： G03F7/70058 ,  G03F7/70066 ,  G03F7/70075 ,  G03F7/70133 ,  G03F7/70141 ,  G03F7/70191 ,  G03F7/70591

    摘要： A method of determining at least one parameter that is characteristic of the angular distribution of light illuminating an object in a projection exposure apparatus is described. This parameter may be, for example, a pupil asymmetry. The method comprises the step of inserting a filter element in or in close proximity of a pupil plane of an illumination system that is arranged between a light source and the object. The filter element has a filter function that varies in an azimuthal direction with respect to the optical axis of the illumination system. Then the intensity of the light in a plane downstream of the pupil plane is measured. After rotating the filter element around the optical axis by an angle Φ, the measurement of the intensity is repeated. From the filter function, the angle Φ and the measured intensities the parameter is measured.

    摘要翻译： 描述了确定在投影曝光设备中照射物体的光的角度分布的特征的至少一个参数的方法。 该参数可以是例如瞳孔不对称。 该方法包括将滤光器元件插入在与光源和物体之间布置的照明系统的光瞳平面中或其附近的步骤。 滤光元件具有相对于照明系统的光轴在方位角方向上变化的滤光器功能。 然后测量瞳孔平面下游平面中光的强度。 在将滤光器元件围绕光轴旋转角度Phi之后，重复测量强度。 从滤波函数，测量角度Phi和测量的强度参数。