Abstract:
In an example, a method of implementing a circuit design for a programmable integrated circuit (IC) begins by identifying combinatorial logic functions of the circuit design. The method maps, according to a first constraint, a first threshold percentage of the combinatorial logic functions onto a first type of lookup tables (LUTs) of the programmable IC in favor of second type of LUTs of the programmable IC, the second type of LUTs being more susceptible to single event upsets than the first type of LUTs. The method generates a first physical implementation of the circuit design for the programmable IC based on the mapping.
Abstract:
An integrated circuit having improved radiation immunity is described. The integrated circuit comprises a substrate; a P-well formed on the substrate and having N-type transistors of a memory cell; and an N-well formed on the substrate and having P-type transistors of the memory cell; wherein the N-well has minimal dimensions for accommodating the P-type transistors.
Abstract:
Active-on-active microelectronic devices are described. For example, a first die is on a second die with a bottom surface of a first substrate facing a top surface of a second substrate, respectively, to provide a die stack. The first and second dies each have metal layers in ILD layers to provide a first stack structure and a second stack structure, respectively. The first stack structure is interconnected to an upper end of a TSV of the first die. A metal layer of the second stack structure near a bottom surface of the first substrate is interconnected to a lower end of the TSV. A power distribution network layer of the second stack structure is located between lower and upper layers of the metal layers thereof. A transistor located at least in part in the second substrate is interconnected to the power distribution network layer to receive supply voltage or ground.
Abstract:
Active-on-active microelectronic devices are described. For example, a first die is on a second die with a bottom surface of a first substrate facing a top surface of a second substrate, respectively, to provide a die stack. The first and second dies each have metal layers in ILD layers to provide a first stack structure and a second stack structure, respectively. The first stack structure is interconnected to an upper end of a TSV of the first die. A metal layer of the second stack structure near a bottom surface of the first substrate is interconnected to a lower end of the TSV. A power distribution network layer of the second stack structure is located between lower and upper layers of the metal layers thereof. A transistor located at least in part in the second substrate is interconnected to the power distribution network layer to receive supply voltage or ground.
Abstract:
Determining a circuit design-specific, failures in time rate for single event upsets for an integrated circuit (IC) includes determining, using a processor, a number of critical interconnect multiplexer bits for a circuit design for a target IC and determining a number of critical look-up table bits for the circuit design. Using the processor, a device vulnerability factor is estimated for the circuit design for the target IC using the number of critical interconnect multiplexer bits and the number of critical look-up table bits. The estimated device vulnerability factor can be stored, e.g., for subsequent comparison with other circuit designs.
Abstract:
Examples described herein provide a method for designing an integrated circuit (IC) for meeting different sets of criteria. In an example, different sets of criteria are identified for an IC design. The IC design is designed to meet the different sets of criteria based on expected manufacturing variation. The IC design is caused to be manufactured as IC products. At least some of the IC products are caused to be tested. The IC products are characterized as meeting respective ones of the different sets of criteria based on testing the at least some of the IC products.
Abstract:
An exemplary interconnect circuit for a programmable integrated circuit (IC) includes an input terminal coupled to receive from a node in the programmable IC, an output terminal coupled to transmit towards another node in the programmable IC, first and second control terminals coupled to receive from a memory cell of the programmable IC, and a complementary metal oxide semiconductor (CMOS) pass-gate coupled between the input terminal and the output terminal and to the first and second control terminals. The CMOS pass-gate includes a P-channel transistor configured with a low threshold voltage for a CMOS process used to fabricate the programmable IC.
Abstract:
A master-slave flip-flop implemented in an integrated circuit comprises a master latch coupled to receive data at an input; and a slave latch coupled to an output of the master latch, wherein the slave latch comprises an SEU-enhanced latch, and the master latch is not enhanced for SEU protection. A method of implementing a master-slave flip-flop in an integrated circuit is also described.
Abstract:
A circuit includes a complimentary metal-oxide semiconductor (CMOS) storage element implemented within a p-type substrate and an n-well implemented within the p-type substrate that is independent of the storage element. The n-well and the storage element are separated by a minimum distance in which the p-type substrate includes no n-well.
Abstract:
Examples described herein generally relate to forming and/or configuring a die stack in a multi-chip device. An example is a method of forming a multi-chip device. Dies are formed. At least two or more of the dies are interchangeable. Characteristics of the at least two or more of the dies that are interchangeable are determined. A die stack comprising the at least two or more of the dies that are interchangeable is formed. Respective placements within the die stack of the at least two or more of the dies that are interchangeable are based on the characteristics.