公开(公告)号：US07536493B2

公开(公告)日：2009-05-19

申请号：US11279436

申请日：2006-04-12

Applicant: Gary Dean Anderson ,  Joseph Donald Armstrong ,  Brent William Jacobs ,  Ajay Kumar Mahajan

Inventor： Gary Dean Anderson ,  Joseph Donald Armstrong ,  Brent William Jacobs ,  Ajay Kumar Mahajan

IPC: G06F13/14

CPC classification number: G06F21/31 ,  G06F21/71 ,  G06F21/73 ,  G06F2221/2129

Abstract: The aspects of the present invention provide a computer implemented method, an apparatus, and a computer usable program code for identifying a service processor with current setting information. First stored information for a service processor is retrieved from a first memory in the first service processor. Second stored information for the service processor is retrieved from a second memory in a data processing system to which the service processor is connected. The first stored information is compared with the second stored information to form a comparison as to whether the service processor was previously connected to the data processing system and to determine whether the service processor was a last service processor to fully communicate with system firmware in the data processing system. The service processor has current setting information if the service processor was previously connected to the data processing system and was the last service processor to fully communicate with the system firmware.

Abstract translation: 本发明的方面提供了一种计算机实现的方法，装置和用于使用当前设置信息识别服务处理器的计算机可用程序代码。 从第一服务处理器中的第一存储器检索用于服务处理器的第一存储信息。 从与服务处理器连接的数据处理系统中的第二存储器检索用于服务处理器的第二存储信息。 将第一存储信息与第二存储信息进行比较以形成关于服务处理器是否先前连接到数据处理系统并且确定服务处理器是否是最后服务处理器以与数据中的系统固件完全通信的比较 处理系统。 如果服务处理器先前连接到数据处理系统，并且是与系统固件完全通信的最后一个服务处理器，则服务处理器具有当前设置信息。

公开(公告)号：US07520999B2

公开(公告)日：2009-04-21

申请号：US11416744

申请日：2006-05-03

Applicant: Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Ajay Kumar ,  Ibrahim M. Ibrahim ,  Michael N. Grimbergen ,  Renee Koch ,  Sheeba J. Panayil

Inventor： Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Ajay Kumar ,  Ibrahim M. Ibrahim ,  Michael N. Grimbergen ,  Renee Koch ,  Sheeba J. Panayil

IPC: B44C1/22 ,  H01L21/00

CPC classification number: H01J37/32568 ,  H01J37/321

Abstract: A method for processing a workpiece in a plasma reactor chamber by applying RF source power to inner and outer source power applicators, and introducing a process gas into the reactor while rotating at least one of (a) the workpiece, (b) the outer source power applicator, about a radial tilt axis to a position at which the plasma distribution is nearly symmetrical, and translating the inner source power applicator relative to the outer source power applicator along the axis of symmetry to a location at which the spatial distribution is nearly uniform.

Abstract translation: 一种通过将RF源功率施加到内源功率施加器和外源功率施加器来处理等离子体反应器室中的工件的方法，以及在（a）工件，（b）外部源 电源施加器，围绕径向倾斜轴线到等离子体分布近似对称的位置，以及将内源功率施加器相对于外源功率施加器沿着对称轴线平移到空间分布几乎均匀的位置 。

公开(公告)号：US20080294537A1

公开(公告)日：2008-11-27

申请号：US11751521

申请日：2007-05-21

Applicant: Rajeev Mishra ,  Kavitha Ramalingam ,  Lance Warren Russell ,  Ajay Kumar Sami

Inventor： Rajeev Mishra ,  Kavitha Ramalingam ,  Lance Warren Russell ,  Ajay Kumar Sami

IPC: G06Q10/00 ,  G06F17/40

CPC classification number: G06F11/3409 ,  G06F3/0653 ,  G06F2201/815 ,  G06Q40/12

Abstract: A data processing system includes: a plurality of resources including a processor, a memory, and an operating system; a mechanism for generating one or more software partitions in addition to an administrative partition; and a global accounting engine which enables monitoring and recording of resource usage at both a global-level and a partition-level. Partition-level accounting data is returned for selected resources being utilized within a software partition. The data processing system also includes a first software partition, which utilizes one or more of the first plurality of resources and which includes a first partition-level accounting engine. The partition-level accounting engine provides monitoring and recording of resource usage within the first software partition and stores first partition usage data within a first partition accounting buffer.

Abstract translation: 数据处理系统包括：包括处理器，存储器和操作系统的多个资源; 用于除管理分区之外生成一个或多个软件分区的机制; 以及全局计费引擎，可在全局级别和分区级别监视和记录资源使用情况。 对于在软件分区中使用的所选资源，返回分区级会计数据。 数据处理系统还包括利用第一多个资源中的一个或多个并且包括第一分区级计费引擎的第一软件分区。 分区级计费引擎提供在第一软件分区内的资源使用的监视和记录，并将第一分区使用数据存储在第一分区计费缓冲器内。

公开(公告)号：US20080268817A1

公开(公告)日：2008-10-30

申请号：US12056300

申请日：2008-03-27

Applicant: Ewald C. Anderl ,  Ajay Kumar Thapar ,  Chinna Marudhu Pandian Chockalingam

Inventor： Ewald C. Anderl ,  Ajay Kumar Thapar ,  Chinna Marudhu Pandian Chockalingam

IPC: H04Q7/22

CPC classification number: H04W4/12 ,  H04M1/7255 ,  H04M1/72552

Abstract: Disclosed herein is a method and system for allowing voice short message service (SMS) messaging using methods of recipient addressing as used by text SMS messaging. A user creates a text SMS message and addresses the message to a recipient. The address of the recipient may be obtained from the address book stored locally on the user's mobile device. A client application intercepts the text SMS message and prompts whether the user wants to include a voice SMS message. If the user wants to include the voice SMS message, the user's voice message is recorded on a server. The text message along with a notification of the voice message is transmitted to the recipient. The recipient may use the information in the voice message notification to access and listen to the user's recorded voice message.

Abstract translation: 这里公开了一种用于通过文本SMS消息传送所使用的接收方寻址方法来允许语音短消息服务（SMS）消息的方法和系统。 用户创建文本SMS消息，并将消息发送给收件人。 收件人的地址可以从用户移动设备上本地存储的地址簿中获得。 客户端应用程序拦截文本SMS消息，并提示用户是否要包括语音短信。 如果用户想要包括语音SMS消息，则用户的语音消息被记录在服务器上。 文本消息连同语音消息的通知被发送到接收者。 接收者可以使用语音消息通知中的信息来访问和收听用户记录的语音消息。

公开(公告)号：US07419551B2

公开(公告)日：2008-09-02

申请号：US11416547

申请日：2006-05-03

Applicant: Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Ajay Kumar ,  Ibrahim M. Ibrahim ,  Michael N. Grimbergen ,  Renee Koch ,  Sheeba J. Panayil

Inventor： Madhavi R. Chandrachood ,  Richard Lewington ,  Darin Bivens ,  Ajay Kumar ,  Ibrahim M. Ibrahim ,  Michael N. Grimbergen ,  Renee Koch ,  Sheeba J. Panayil

IPC: C23C16/00 ,  H01L21/306

CPC classification number: H01J37/321 ,  H01L21/68764

Abstract: A plasma reactor for processing a workpiece includes a process chamber comprising an enclosure including a ceiling and having a vertical axis of symmetry generally perpendicular to said ceiling, a workpiece support pedestal inside the chamber and generally facing the ceiling, process gas injection apparatus coupled to the chamber and a vacuum pump coupled to the chamber. The reactor further includes a plasma source power applicator overlying the ceiling and comprising a radially inner applicator portion and a radially outer applicator portion, and RF power apparatus coupled to said inner and outer applicator portions, and tilt apparatus capable of tilting either the workpiece support pedestal or the outer applicator portion about a radial axis perpendicular to said axis of symmetry and capable of rotating said workpiece support pedestal about said axis of symmetry. In a preferred embodiment, the reactor further includes apparatus for effecting axially symmetrical adjustments of plasma distribution, which may be either (or both) elevation apparatus for changing the location of said inner and outer portions relative to one another along said vertical axis of symmetry, or apparatus for apportioning the RF power levels applied to the inner and outer applicator portions.

Abstract translation: 一种用于处理工件的等离子体反应器包括处理室，该处理室包括包括天花板并且具有大致垂直于所述天花板的对称垂直轴线的外壳，所述室内的工件支撑基座和大体上面对天花板，处理气体注入装置 腔室和耦合到腔室的真空泵。 反应器还包括覆盖天花板并包括径向内部施加器部分和径向外部施加器部分的等离子体源功率施加器，以及耦合到所述内部和外部施加器部分的RF电力设备，以及能够使工件支撑基座 或外部施加器部分围绕垂直于所述对称轴线的径向轴线，并且能够围绕所述对称轴线旋转所述工件支撑基座。 在优选实施例中，反应器还包括用于实现等离子体分布的轴对称调节的装置，其可以是（或两个）升降装置，用于沿所述垂直对称轴线相对于彼此改变所述内部和外部部分的位置， 或用于分配施加到内部和外部施加器部分的RF功率电平的装置。

公开(公告)号：US07389073B2

公开(公告)日：2008-06-17

申请号：US11391837

申请日：2006-03-29

Applicant: Ajay Kumar ,  Keith Allan Nau ,  David Antwone Reed ,  Hirotsugu Oba

Inventor： Ajay Kumar ,  Keith Allan Nau ,  David Antwone Reed ,  Hirotsugu Oba

IPC: G03G15/09

CPC classification number: G03G15/0928 ,  G03G2215/0648 ,  G03G2215/0861

Abstract: A development station in an electrostatographic imaging machine supports longer operational life without undue variation in the mass of developer on roll parameter. The development station includes a developer housing, for retaining a quantity of developer having semi-conductive carrier particles and toner particles, a first magnetic roll having a stationary core with at least one magnet and a sleeve having longitudinal grooves that rotates about the stationary core of the first magnetic roll to transport developer to a photoreceptor, a second magnetic roll having a stationary core with at least one magnet and a sleeve having longitudinal grooves that rotates about the stationary core of the second magnetic roll to receive developer from the first magnetic roll and present the developer to the photoreceptor, the sleeve of the second magnetic roll being fabricated from a material that is softer than the sleeve of the first magnetic roll.

Abstract translation: 静电成像机中的一个开发站支持更长的使用寿命，而且在滚动参数下显影剂质量不会有太大变化。 显影台包括用于保持一定量的具有半导体载体颗粒和调色剂颗粒的显影剂的显影剂外壳，具有至少一个磁体的固定芯的第一磁性辊和具有围绕静止磁芯旋转的纵向槽的套筒 将显影剂输送到感光体的第一磁性辊，具有至少一个磁体的固定磁芯的第二磁性辊和具有围绕第二磁性辊的固定磁芯旋转以从第一磁性辊接收显影剂的纵向凹槽的套筒，以及 将显影剂呈现在感光体上，第二磁性辊的套筒由比第一磁性辊的套筒更柔软的材料制成。

公开(公告)号：US20080100223A1

公开(公告)日：2008-05-01

申请号：US11589596

申请日：2006-10-30

Applicant: Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

Inventor： Richard Lewington ,  Michael N. Grimbergen ,  Khiem K. Nguyen ,  Darin Bivens ,  Madhavi R. Chandrachood ,  Ajay Kumar

IPC: H01L21/3065

CPC classification number: H01J37/32082 ,  H01J37/32009 ,  H01J37/32568

Abstract: A plasma reactor is provided for processing a workpiece such as a transparent mask or a semiconductor wafer. The reactor includes a vacuum chamber having a ceiling and a sidewall. A workpiece support pedestal within the chamber includes a metal cathode having a support surface facing the ceiling and defining a support plane for supporting a workpiece. The cathode has a hollow space formed within its interior. The reactor further includes a movable metal element within the hollow space and a mechanism for controlling a distance between the metal element and the support plane.

Abstract translation: 提供等离子体反应器用于处理诸如透明掩模或半导体晶片的工件。 反应器包括具有天花板和侧壁的真空室。 腔室内的工件支撑基座包括金属阴极，金属阴极具有面向天花板的支撑表面并且限定用于支撑工件的支撑平面。 阴极在其内部形成有中空空间。 反应器还包括在中空空间内的可移动金属元件和用于控制金属元件和支撑平面之间的距离的机构。

公开(公告)号：US20080099450A1

公开(公告)日：2008-05-01

申请号：US11589343

申请日：2006-10-30

Applicant: Richard Lewington ,  Alexander Paterson ,  Michael N. Grimbergen ,  Ajay Kumar

Inventor： Richard Lewington ,  Alexander Paterson ,  Michael N. Grimbergen ,  Ajay Kumar

IPC: H01L21/3065

CPC classification number: H01J37/32935 ,  H01J37/32091 ,  H01J37/321 ,  H01J37/32165 ,  H01J37/3299

Abstract: A plasma reactor is provided having multiple frequency control of etch parameters. The reactor includes a reactor chamber and a workpiece support within the chamber, the chamber having a ceiling facing the workpiece support, and an inductively coupled source power applicator and a capacitively coupled plasma source power applicator. An array of optical fibers extends through the support surface of the workpiece support to view the workpiece through its bottom surface. Optical sensors are coupled to the output ends of the optical fibers. The reactor further includes a controller responsive to the optical sensors for adjusting the relative amounts of power simultaneously coupled to plasma in the chamber by the inductively coupled plasma source power applicator and the capacitively coupled plasma source power applicator.

Abstract translation: 提供具有对蚀刻参数进行多次频率控制的等离子体反应器。 反应器包括反应室和腔室内的工件支撑件，腔室具有面向工件支撑件的天花板，以及电感耦合源功率施加器和电容耦合等离子体源功率施加器。 光纤阵列延伸穿过工件支撑件的支撑表面，以通过其底部表面观察工件。 光学传感器耦合到光纤的输出端。 反应器还包括响应于光学传感器的控制器，用于通过电感耦合等离子体源功率施加器和电容耦合的等离子体源功率施加器来调节同时耦合到腔室中的等离子体的功率的相对量。

公开(公告)号：US20080087468A1

公开(公告)日：2008-04-17

申请号：US11953434

申请日：2007-12-10

Applicant: Arnold Law ,  Ajay Kumar

Inventor： Arnold Law ,  Ajay Kumar

IPC: E21B7/02

CPC classification number: E21B7/024

Abstract: A drilling machine includes a frame, a tower that is supported by the frame, two tracks for movement over the ground, at least three yokes that interconnect the frame and the two tracks, at least three hydraulic cylinders, an inclinometer that senses the inclination of the frame and produces an output signal that is indicative of the inclination of the frame, and a controller that receives the output signal from the inclinometer. The tower includes a drill string. Each yoke is connected to the frame and one of the tracks. Each hydraulic cylinder is extendible and retractable in response to an associated control signal and connected to the frame and an associated yoke. The controller generates control signals for the hydraulic cylinders such that the hydraulic cylinders are controlled to extend or retract to maintain the frame in a level position.

Abstract translation: 钻机包括框架，由框架支撑的塔架，用于在地面上移动的两个轨道，至少三个将框架和两个轨道相互连接的轭架，至少三个液压缸，一个感测倾斜度 并且产生表示帧的倾斜度的输出信号，以及接收来自倾斜仪的输出信号的控制器。 该塔包括钻柱。 每个轭连接到框架和轨道之一。 每个液压缸响应于相关联的控制信号而可延伸和缩回，并连接到框架和相关联的轭。 控制器产生用于液压缸的控制信号，使得液压缸被控制以延伸或缩回以将框架保持在水平位置。

公开(公告)号：US07354866B2

公开(公告)日：2008-04-08

申请号：US11531634

申请日：2006-09-13

Applicant: Ajay Kumar ,  Ramesh Krishnamurthy

Inventor： Ajay Kumar ,  Ramesh Krishnamurthy

IPC: H01L21/302

CPC classification number: H01L21/67167 ,  H01L21/02071 ,  H01L21/31116 ,  H01L21/31122 ,  H01L21/31138 ,  H01L21/32136 ,  H01L21/32137 ,  H01L21/32139 ,  H01L21/67253

Abstract: A method and apparatus for process integration in manufacture of a gate structure of a field effect transistor are disclosed. The method includes assembling an integrated substrate processing system having a metrology module and a vacuumed processing platform to perform controlled and adaptive plasma processes without exposing the substrate to a non-vacuumed environment.