公开(公告)号：US20090108483A1

公开(公告)日：2009-04-30

申请号：US11719878

申请日：2007-04-18

申请人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

发明人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina ,  Koichi Sentoku

IPC分类号： G03F9/00 ,  G01B11/00

CPC分类号： G03F7/0002 ,  B82Y10/00 ,  B82Y40/00 ,  G03F9/00 ,  G03F9/703 ,  G03F9/7049 ,  G03F9/7088

摘要： In an alignment method for effecting alignment between two plate-like objects, a first plate-like object provided with a first alignment mark and a second plate-like object provide with a second alignment mark are disposed opposite to each other. A first area and a second area are provided at mutually nonoverlapping positions in an image pickup area for being observed through an image pickup device. Images of the first and second alignment marks are picked up by the image pickup device from a direction substantially perpendicular to an in-plane direction of the first and second plate-like objects. Alignment control is effected by using first information about a deviation of the first alignment mark from a predetermined position in the first area and second information about a deviation of the second alignment mark from a predetermined position in the second area.

摘要翻译： 在用于实现两个板状物体之间的对准的对准方法中，设置有第一对准标记的第一板状物体和提供有彼此相对设置的第二对准标记的第二板状物体。 第一区域和第二区域设置在图像拾取区域中的相互非重叠位置，以便通过图像拾取装置观察。 第一和第二对准标记的图像由图像拾取装置从基本上垂直于第一和第二板状物体的面内方向的方向拾取。 通过使用关于第一对准标记与第一区域中的预定位置的偏差的第一信息和关于第二对准标记与第二区域中的预定位置的偏差的第二信息来实现对准控制。

公开(公告)号：US07510388B2

公开(公告)日：2009-03-31

申请号：US11468876

申请日：2006-08-31

申请人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

发明人： Atsunori Terasaki ,  Junichi Seki ,  Nobuhito Suehira ,  Hideki Ina ,  Shingo Okushima

IPC分类号： B29C59/00

CPC分类号： B29C59/00 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/0017 ,  G03F9/7042

摘要： A mold capable of effecting alignment of the mold and the member to be processed with high accuracy even in such a state that a photocurable resin material is disposed between the mold and the member to be processed is constituted by a substrate 2010 formed of a first material and an alignment mark 2102 formed of a second material different from the first material. The first material and the second material have transmittivities to light in a part of an ultraviolet wavelength range of the ultraviolet light. The second material has a refractive index of not less than 1.7.

摘要翻译： 即使在光固化树脂材料配置在模具和待加工构件之间的状态下，能够高精度地进行模具和被处理部件的对准的模具由基板2010构成，基板2010由第一材料 以及由不同于第一材料的第二材料形成的对准标记2102。 第一材料和第二材料在紫外线的紫外线波长范围的一部分中具有透光性。 第二种材料的折射率不小于1.7。

公开(公告)号：US20080128945A1

公开(公告)日：2008-06-05

申请号：US12024354

申请日：2008-02-01

申请人： Junichi Seki ,  Tohru Den

发明人： Junichi Seki ,  Tohru Den

IPC分类号： B28B3/00

CPC分类号： G03F7/0002 ,  B29C35/02 ,  B29C43/003 ,  B29C43/021 ,  B29C59/002 ,  B29C59/022 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2059/023 ,  B81C99/0085 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00

摘要： A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.

摘要翻译： 用于图案化工件的成型装置包括具有要传送到工件的图案的模具，图案包括凹部，用于支撑模具的第一支撑构件和与第一支撑构件相对设置的第二支撑构件，用于 支撑工件。 按压机构使第一和第二支撑构件彼此靠近，将模具和工件一起压在一起，以将工件上的图案转印到模具上。 在第一支撑构件侧的模具的表面，第一支撑构件的区域和第二支撑构件的区域中的至少一个表面上设置嵌入部分。 凹部对应于模具图案中的凹部。

公开(公告)号：US20080099941A1

公开(公告)日：2008-05-01

申请号：US11719434

申请日：2006-10-18

申请人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

发明人： Nobuhito Suehira ,  Junichi Seki ,  Hideki Ina

IPC分类号： G01B11/14 ,  G03F7/00

CPC分类号： G03F7/0002 ,  B29C35/08 ,  B29C59/16 ,  B82Y10/00 ,  B82Y40/00 ,  G01B11/14 ,  G03F9/703 ,  G03F9/7042 ,  G03F9/7065

摘要： An imprint apparatus for imprinting a pattern provided to a mold onto a substrate or a member on the substrate includes a light source for irradiating a surface of the mold disposed opposite to the substrate and a surface of the substrate with light; an optical system for guiding the light from the light source to the surface of the mold and the surface of the substrate and guiding reflected lights from these surfaces to a spectroscope; a spectroscope for dispersing the reflected lights guided by the optical system into a spectrum; and an analyzer for analyzing a distance between the surface of the mold and the surface of the substrate. The analyzer calculates the distance between the surface of the mold and the surface of the substrate by measuring a distance between the surface of the mold and a surface formed at a position away from the surface of the mold.

摘要翻译： 用于将提供给模具的图案压印到基板或基板上的部件上的印模装置包括用于照射与基板相对设置的模具的表面的光源和具有光的基板的表面; 用于将来自光源的光引导到模具的表面和基板的表面并将来自这些表面的反射光引导到分光器的光学系统; 用于将由光学系统引导的反射光分散到光谱中的分光镜; 以及分析器，用于分析模具表面与基板表面之间的距离。 分析器通过测量模具表面与形成在远离模具表面的位置的表面之间的距离来计算模具表面与基材表面之间的距离。

公开(公告)号：US07347683B2

公开(公告)日：2008-03-25

申请号：US11058195

申请日：2005-02-16

申请人： Junichi Seki ,  Tohru Den

发明人： Junichi Seki ,  Tohru Den

IPC分类号： B29C43/04

CPC分类号： G03F7/0002 ,  B29C35/02 ,  B29C43/003 ,  B29C43/021 ,  B29C59/002 ,  B29C59/022 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2059/023 ,  B81C99/0085 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00

摘要： A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.

摘要翻译： 用于图案化工件的成型装置包括具有要传送到工件的图案的模具，图案包括凹部，用于支撑模具的第一支撑构件和与第一支撑构件相对设置的第二支撑构件，用于 支撑工件。 按压机构使第一和第二支撑构件彼此靠近，将模具和工件一起压在一起，以将工件上的图案转印到模具上。 在第一支撑构件侧的模具的表面，第一支撑构件的区域和第二支撑构件的区域中的至少一个表面上设置嵌入部分。 凹部对应于模具图案中的凹部。

公开(公告)号：US20070267580A1

公开(公告)日：2007-11-22

申请号：US11747581

申请日：2007-05-11

申请人： Susumu Yasuda ,  Junichi Seki ,  Takao Kusaka ,  Nobuki Yoshimatsu

发明人： Susumu Yasuda ,  Junichi Seki ,  Takao Kusaka ,  Nobuki Yoshimatsu

IPC分类号： G21K5/10

CPC分类号： G01Q70/04 ,  G01Q10/04

摘要： A drive stage for a scanning probe apparatus includes a supporting member, a plurality of movable portions fixed to the supporting member, and a plurality of drive elements configured and positioned to drive the plurality of movable portions. The drive stage is driven in a direction in which inertial forces of the plurality of movable portions are mutually canceled during drive of the plurality of drive elements. The drive stage further includes an inertial force difference detection member configured and positioned to detect a difference in inertial force between the plurality of movable portions, and an inertial force adjustment member configured and positioned to effect inertial force adjustment so that the difference in inertial force between the plurality of movable portions is decreased on the basis of a detection output of the inertial force detection member.

摘要翻译： 用于扫描探针装置的驱动台包括支撑构件，固定到支撑构件的多个可移动部分，以及构造和定位以驱动多个可移动部分的多个驱动元件。 在多个驱动元件的驱动期间，驱动级被驱动在多个可动部的惯性力相互抵消的方向上。 驱动平台还包括惯性力差检测构件，其构造和定位成检测多个可移动部分之间的惯性力差，以及惯性力调节构件，其构造和定位成实现惯性力调节，使得惯性力差 多个可动部根据惯性力检测部件的检测输出而减少。

公开(公告)号：US20070144243A1

公开(公告)日：2007-06-28

申请号：US11612111

申请日：2006-12-18

申请人： Nobuki YOSHIMATSU ,  Takao Kusaka ,  Susumu YASUDA ,  Junichi Seki

发明人： Nobuki YOSHIMATSU ,  Takao Kusaka ,  Susumu YASUDA ,  Junichi Seki

IPC分类号： G12B21/24 ,  G01N13/10

CPC分类号： G01Q10/02 ,  G01Q70/04

摘要： A drive stage, for driving a sample or a probe, capable of ensuring a movable range of a movable portion as a counterweight and always effectively canceling an inertial force to suppress vibration of a supporting member leading to vibration of the sample or the probe includes a counter drive element for moving the probe or a sample holding table and a movable portion movable in a direction in which the inertial force generated during movement of the probe or the sample holding table. The movable portion surrounds the counter drive element outside the counter drive element.

摘要翻译： 用于驱动样本或探针的驱动台能够确保可移动部分作为配重的可移动范围并且总是有效地抵消惯性力以抑制导致样品或探针的振动的支撑构件的振动，包括： 用于移动探针或样品保持台的可逆驱动元件和可在探头或样品保持台移动期间产生的惯性力的方向上移动的可动部分。 可动部分围绕计数器驱动元件围绕计数器驱动元件。

公开(公告)号：US20070128850A1

公开(公告)日：2007-06-07

申请号：US11606874

申请日：2006-12-01

申请人： Atsunori Terasaki ,  Junichi Seki ,  Ichiro Tanaka

发明人： Atsunori Terasaki ,  Junichi Seki ,  Ichiro Tanaka

IPC分类号： H01L21/4763

CPC分类号： H01L21/76835 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  H01L21/76807 ,  H01L21/76808 ,  H01L21/76817

摘要： A method for manufacturing a semiconductor device is provided, in which the lengths of a wiring trench and a via hole in a depth direction are easily controlled. A component having a first insulating film is prepared on a substrate, and a layer is disposed on the above-described first insulating film. A mold having a pattern is imprinted on the above-described layer so as to form a second insulating film having a wiring trench and a first via, the pattern corresponding to the wiring trench and the first via. Thereafter, the above-described first insulating film is etched by using the above-described second insulating film as a mask so as to form a second via, which is connected to the first via, in the first insulating film.

摘要翻译： 提供一种制造半导体器件的方法，其中容易控制布线沟槽和通孔在深度方向上的长度。 在基板上制备具有第一绝缘膜的部件，在上述第一绝缘膜上设置有层。 具有图案的模具被印刷在上述层上，以形成具有布线沟槽和第一通孔的第二绝缘膜，该图案对应于布线沟槽和第一通孔。 此后，通过使用上述第二绝缘膜作为掩模来蚀刻上述第一绝缘膜，以便在第一绝缘膜中形成连接到第一通孔的第二通孔。

公开(公告)号：US20050208171A1

公开(公告)日：2005-09-22

申请号：US11058195

申请日：2005-02-16

申请人： Junichi Seki ,  Tohru Den

发明人： Junichi Seki ,  Tohru Den

IPC分类号： B81C99/00 ,  B29C35/00 ,  B29C59/02 ,  G03F7/00 ,  H01L21/027

CPC分类号： G03F7/0002 ,  B29C35/02 ,  B29C43/003 ,  B29C43/021 ,  B29C59/002 ,  B29C59/022 ,  B29C2043/025 ,  B29C2043/3634 ,  B29C2059/023 ,  B81C99/0085 ,  B81C2201/034 ,  B82Y10/00 ,  B82Y40/00

摘要： A molding apparatus for patterning a workpiece includes a mold having a pattern to be transferred to the workpiece, with the pattern including recesses, a first support member for supporting the mold, and a second support member, arranged opposite to the first support member, for supporting the workpiece. A pressing mechanism brings the first and second support members close to each other and presses the mold and the workpiece together so as to transfer, to the workpiece, the pattern on the mold. Recessed portions are provided on at least one of a surface of the mold on the first support member side, a region of the first support member, and a region of the second support member. The recessed portions correspond to recesses in the pattern of the mold.

摘要翻译： 用于图案化工件的成型装置包括具有要传送到工件的图案的模具，图案包括凹部，用于支撑模具的第一支撑构件和与第一支撑构件相对设置的第二支撑构件，用于 支撑工件。 按压机构使第一和第二支撑构件彼此靠近，将模具和工件一起压在一起，以将工件上的图案转印到模具上。 在第一支撑构件侧的模具的表面，第一支撑构件的区域和第二支撑构件的区域中的至少一个表面上设置嵌入部分。 凹部对应于模具图案中的凹部。

公开(公告)号：US06737790B2

公开(公告)日：2004-05-18

申请号：US09311885

申请日：1999-05-14

申请人： Junichi Seki

发明人： Junichi Seki

IPC分类号： H01J724

CPC分类号： G02F1/133385 ,  H01J17/28 ,  H01J29/006 ,  H01J2329/00

摘要： An image forming apparatus includes an envelope formed by first and second substrates disposed at a predetermined distance therebetween and an image forming member disposed in the envelope. A heat insulating member is disposed on a surface of the envelope in an area excepting partial surface areas of the first and second substrates.

摘要翻译： 图像形成装置包括由设置在预定距离处的第一和第二基板形成的封套和设置在封套中的图像形成部件。 绝热构件设置在除了第一和第二基板的局部表面区域之外的区域的外壳的表面上。