BIPOLAR TRANSISTORS
    93.
    发明申请

    公开(公告)号:US20230087058A1

    公开(公告)日:2023-03-23

    申请号:US17549013

    申请日:2021-12-13

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to bipolar transistors and methods of manufacture. The structure includes: a base region composed of a semiconductor on insulator material; an emitter region above the base region; and a collector region under the base region and within a cavity of a buried insulator layer.

    Photodetectors with a lateral composition gradient

    公开(公告)号:US11569405B2

    公开(公告)日:2023-01-31

    申请号:US16686973

    申请日:2019-11-18

    Abstract: Structures including a photodetector and methods of fabricating such structures. The photodetector is positioned over the top surface of the substrate. The photodetector includes a portion of a semiconductor layer comprised of a semiconductor alloy, a p-type doped region in the portion of the semiconductor layer, and an n-type doped region in the portion of the semiconductor layer. The p-type doped region and the n-type doped region converge along a p-n junction. The portion of the semiconductor layer has a first side and a second side opposite from the first side. The semiconductor alloy has a composition that is laterally graded from the first side to the second side of the portion of the semiconductor layer.

    FIELD EFFECT TRANSISTOR (FET) STACK AND METHODS TO FORM SAME

    公开(公告)号:US20220223688A1

    公开(公告)日:2022-07-14

    申请号:US17684498

    申请日:2022-03-02

    Abstract: The disclosure provides a field effect transistor (FET) stack with methods to form the same. The FET stack includes a first transistor over a substrate. The first transistor includes a first active semiconductor material including a first channel region between a first set of source/drain terminals, and a first gate structure over the first channel region. The first gate structure includes a first gate insulator of a first thickness above the first channel region. A second transistor is over the substrate and horizontally separated from the first transistor. A second gate structure of the second transistor may include a second gate insulator of a second thickness above a second channel region, the second thickness being greater than the first thickness. A shared gate node may be coupled to each of the first gate structure and the second gate structure.

    Double mesa heterojunction bipolar transistor

    公开(公告)号:US11171210B2

    公开(公告)日:2021-11-09

    申请号:US16804435

    申请日:2020-02-28

    Abstract: The present disclosure relates to semiconductor structures and, more particularly, to a heterojunction bipolar transistor and methods of manufacture. The structure includes: a sub-collector region; a collector region above the sub-collector region; an intrinsic base region composed of intrinsic base material located above the collector region; an emitter located above and separated from the intrinsic base material; and a raised extrinsic base having a stepped configuration and separated from and self-aligned to the emitter.

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