公开(公告)号：US20100172570A1

公开(公告)日：2010-07-08

申请号：US12725040

申请日：2010-03-16

申请人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

发明人： Kaoru SAKAI ,  Shunji Maeda ,  Takafumi Okabe ,  Hiroshi Goto ,  Masayuki Kuwabara ,  Naoya Takeuchi

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G06T7/0002 ,  G06T7/32 ,  G06T7/33 ,  G06T2207/30148

摘要： A pattern inspection method including: sequentially imaging plural chip formed on a substrate; selecting at least one of pattern sections of each inspection image obtained by the imaging, while discarding other pattern sections, based on a recipe created in advance, the recipe including information for determining which pattern sections to be selected or discarded; calculating position gap between an inspection image of a chip obtained by the imaging and a reference image stored in a memory by using positional information of pattern images included in the inspection image and reference pattern images which are both corresponding to the at least one of pattern sections selected at the selecting; aligning the inspection image and the reference image by using information of the calculated position gap; and comparing the aligned inspection image with the reference image, and extracting a difference between the two images as a defect candidate.

摘要翻译： 一种图案检查方法，包括：顺序成像形成在基板上的多个芯片; 选择通过成像获得的每个检查图像的图案部分中的至少一个，同时基于预先创建的食谱来丢弃其他图案部分，所述配方包括用于确定要选择或丢弃的图案部分的信息; 通过使用包括在检查图像中的图案图像的位置信息和对应于图案部分中的至少一个的参考图案图像来计算通过成像获得的芯片的检查图像与存储在存储器中的参考图像之间的位置间隙 选择选择; 通过使用计算出的位置间隙的信息对准检查图像和参考图像; 以及将对准的检查图像与参考图像进行比较，并且将两个图像之间的差提取为缺陷候选。

公开(公告)号：US20100053319A1

公开(公告)日：2010-03-04

申请号：US12591179

申请日：2009-11-12

申请人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Kaoru Sakai ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G06K9/00 ,  H04N7/18

CPC分类号： G06T7/001 ,  G06T2207/30148

摘要： According to the present invention, for a pattern inspection apparatus that compares images in corresponding areas of two patterns that are identical and that determines an unmatched portion between the images is a defect, a plurality of detection systems and a plurality of corresponding image comparison methods are provided. With this configuration, the affect of uneven brightnesses for a pattern that occurs due to differences in film thicknesses can be reduced, a highly sensitive pattern inspection can be performed, a variety of defects can be revealed, and the pattern inspection apparatus can be applied for processing performed within a wide range. Furthermore, the pattern inspection apparatus also includes a unit for converting the tone of image signals of comparison images for a plurality of different processing units, and when a difference in brightness occurs in the same pattern of the images, a defect can be correctly detected.

摘要翻译： 根据本发明，对于对相同的两个图案的相应区域中的图像进行比较并且确定图像之间的不匹配部分的图像的图案检查装置是缺陷，多个检测系统和多个对应的图像比较方法是 提供。 利用这种结构，可以降低由于膜厚度差异而产生的图案的不均匀亮度的影响，可以进行高灵敏度图案检查，可以显示各种缺陷，并且图案检查装置可以应用于 在广泛的范围内进行处理。 此外，图案检查装置还包括用于转换多个不同处理单元的比较图像的图像信号的色调的单元，并且当在相同图案中出现亮度差时，可以正确地检测缺陷。

公开(公告)号：US20090141264A1

公开(公告)日：2009-06-04

申请号：US12363856

申请日：2009-02-02

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01N21/21 ,  G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US07499162B2

公开(公告)日：2009-03-03

申请号：US11475667

申请日：2006-06-26

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Kazuo Yamaguchi ,  Minoru Yoshida ,  Atsushi Yoshida ,  Kenji Oka ,  Kenji Watanabe

IPC分类号： G01J4/00

CPC分类号： G01N21/21 ,  G01N21/9501 ,  G01N21/956 ,  G01N21/95607 ,  G02B21/0016

摘要： A defect inspecting apparatus includes a sample mounting device for mounting a sample; lighting and detecting apparatus for illuminating a patterned sample mounted on a mount and detecting the optical image of the reflected light obtained therefrom. Also included is a display for displaying the optical image detected by this lighting and detecting apparatus; an optical parameter setting device for setting and displaying optical parameters for the lighting and detecting apparatus on the display; and optical parameter adjusting apparatus for adjusting optical parameters set for the lighting and detecting apparatus according to the optical parameters set by the optical parameter setting apparatus; a storage device for storing comparative image data; and a defect detecting device for detecting defects from patterns formed on the sample by comparing the optical image detected by the optical image detecting apparatus with the comparative image data stored in the storage.

摘要翻译： 缺陷检查装置包括用于安装样品的样品安装装置; 照明和检测装置，用于照亮安装在安装件上的图案样品，并检测由其获得的反射光的光学图像。 还包括用于显示由该照明和检测装置检测的光学图像的显示器; 用于在显示器上设置和显示照明和检测装置的光学参数的光学参数设置装置; 以及光学参数调整装置，用于根据由所述光学参数设定装置设定的光学参数来调整对所述照明和检测装置设定的光学参数; 用于存储比较图像数据的存储装置; 以及缺陷检测装置，用于通过将由光学图像检测装置检测的光学图像与存储在存储器中的比较图像数据进行比较来检测在样本上形成的图案的缺陷。

公开(公告)号：US20080302964A1

公开(公告)日：2008-12-11

申请号：US12190388

申请日：2008-08-12

申请人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

发明人： Hiroyuki Shinada ,  Mari Nozoe ,  Haruo Yoda ,  Kimiaki Ando ,  Katsuhiro Kuroda ,  Yutaka Kaneko ,  Maki Tanaka ,  Shunji Maeda ,  Hitoshi Kubota ,  Aritoshi Sugimoto ,  Katsuya Sugiyama ,  Atsuko Takafuji ,  Yusuke Yajima ,  Hiroshi Tooyama ,  Tadao Ino ,  Takashi Hiroi ,  Kazushi Yoshimura ,  Yasutsugu Usami

IPC分类号： G01N23/00 ,  G01R31/305

CPC分类号： G01R31/305 ,  G01R31/307 ,  H01J37/28 ,  H01J2237/2817

摘要： A circuit pattern inspection method and an apparatus therefor, in which the whole of a portion to be inspected of a sample to be inspected is made to be in a predetermined changed state, the portion to be inspected is irradiated with an image-forming high-density electron beam while scanning the electron beam, secondary charged particles are detected at a portion irradiated with the electron beam after a predetermined period of time from an instance when the electron beam is irradiated, an image is formed on the basis of the thus detected secondary charged particle signal, and the portion to be inspected is inspected by using the thus formed image.

摘要翻译： 电路图案检查方法及其装置，其中待检查的样品的待检查部分的整体部分处于预定的改变状态，被检查的部分用成像高分辨率照射， 在扫描电子束时，在从电子束照射的时刻起经过规定的时间后，在照射电子束的部分检测到二次带电粒子，根据这样检测的次级 通过使用如此形成的图像来检查带电粒子信号，并检查待检查的部分。

公开(公告)号：US07463350B2

公开(公告)日：2008-12-09

申请号：US10981721

申请日：2004-11-05

申请人： Hidetoshi Nishiyama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Shunji Maeda

发明人： Hidetoshi Nishiyama ,  Minoru Yoshida ,  Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/00

CPC分类号： G01N21/95684

摘要： Disclosed is a method and apparatus for inspecting defects of patterns of a sample at high speed and with high sensitivity while damage of the sample arising from high-power pulsed light is reduced. Light emitted from a pulsed laser light source is transmitted through a pseudo continuous-wave forming optical system having an optical system capable of reducing energy per pulse and yet maintaining the entire amount of light of the pulsed light, a beam formation optical system, and a coherence reduction optical system, and a beam deflected by a deformation illumination optical system is made to reflect on a PBS to be irradiated on a wafer. The apparatus is configured so that the diffracted light from the wafer is focused by an objective lens, transmitted through light modulation units, focused to form a plurality of images on a plurality of image sensors in a visual-field divided parallel detection unit 12, and then defects are detected by a signal processing unit.

摘要翻译： 公开了一种用于在高功率脉冲光下产生的样品损坏的情况下高速且高灵敏度地检查样品的图案的缺陷的方法和装置。 从脉冲激光光源发出的光通过伪连续波形成光学系统传输，该光学系统具有能够减少每脉冲能量并且仍保持脉冲光的光量，光束形成光学系统和 相干降低光学系统和由变形照明光学系统偏转的光束在PBS上反射以照射在晶片上。 该装置被配置为使得来自晶片的衍射光被物镜聚焦，透镜通过光调制单元被聚焦以在视野分割并行检测单元12中的多个图像传感器上形成多个图像，以及 那么由信号处理单元检测到缺陷。

公开(公告)号：US20080292176A1

公开(公告)日：2008-11-27

申请号：US12153329

申请日：2008-05-16

申请人： Kaoru Sakai ,  Shunji Maeda

发明人： Kaoru Sakai ,  Shunji Maeda

IPC分类号： G06K9/64

CPC分类号： G06T7/001 ,  G06T2207/10061 ,  G06T2207/30148

摘要： In a pattern inspection apparatus for comparing images of areas corresponding to patterns each formed so as to be the same pattern and determining a non-coincident portion of the image as a defect, an image comparison processing unit configured with a processing system mounting a plurality of CPUs operating in parallel is provided, whereby an effect of brightness irregularity between the comparison images generated from a difference of a film thickness, a difference of a pattern thickness, and the like can be reduced, and a highly sensitive pattern inspection can be performed without setting parameters. Further, a feature amount of each pixel is calculated between the comparison images, and a plurality of feature amounts are compared, so that distinction between a defect and a noise, which is impossible by a luminance value, can be performed with high accuracy.

摘要翻译： 在图案检查装置中，对与各图形形成的图案相对应的图像的图像进行比较，并且将图像的非重合部分确定为缺陷，图像比较处理单元配置有安装了多个 提供了并行操作的CPU，由此可以减少从膜厚度差异，图案厚度差等产生的比较图像之间的亮度不均匀性的影响，并且可以不进行高灵敏度的图案检查而没有 设置参数。 此外，在比较图像之间计算每个像素的特征量，并且比较多个特征量，从而可以以高精度执行由亮度值不可能的缺陷和噪声之间的区别。

公开(公告)号：US07440092B2

公开(公告)日：2008-10-21

申请号：US11602247

申请日：2006-11-21

申请人： Yukihiro Shibata ,  Shunji Maeda

发明人： Yukihiro Shibata ,  Shunji Maeda

IPC分类号： G01N21/00 ,  G06K9/00

CPC分类号： G01N21/9501 ,  G01N21/21

摘要： A method and apparatus for detecting a defect in which image signals of a same area of a sample are obtained by imaging the sample under different optical conditions, and the obtained image signals are analyzed and optical conditions are selected which modify a contrast in the image signal. Image signals of the sample under the selected optical conditions are obtained by imaging the sample with an inspection system, and the images under the selected optical conditions are evaluated to adjust optical conditions for inspection including an inspection threshold, which is greater than a maximum contrast difference among false defects detected at the step of obtaining and with which a maximum number of actual defects can be detected. A defect of the sample is detected by processing the image signals of the sample obtained through the inspection system under the adjusted optical conditions.

摘要翻译： 一种检测缺陷的方法和装置，其中通过在不同光学条件下对样本进行成像而获得样品的相同区域的图像信号，并且分析所获得的图像信号，并且选择修改图像信号中的对比度的光学条件 。 通过用检查系统对样品进行成像获得样品的图像信号，并且在所选择的光学条件下评估图像以调整检查的光学条件，包括大于最大对比差的检查阈值 在获取步骤中检测到的虚假缺陷中，可以检测到最大数量的实际缺陷。 通过在调整光学条件下处理通过检查系统获得的样品的图像信号来检测样品的缺陷。

公开(公告)号：US20080232674A1

公开(公告)日：2008-09-25

申请号：US12123160

申请日：2008-05-19

申请人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

发明人： Kaoru Sakai ,  Shunji Maeda ,  Takafumi Okabe

IPC分类号： G06K9/00

CPC分类号： G06T7/001 ,  G01N21/9501 ,  G01N21/95607 ,  G06T2207/30148

摘要： An apparatus for inspecting pattern defects, the apparatus including: a defect candidate extraction unit configured to perform a defect candidate extraction process by comparing a detected image signal with a reference image signal; and a defect detection unit configured to perform a defect detection process and a defect classification process based on a partial image containing a defect candidate that is extracted by the defect candidate extraction unit, wherein the processes performed by the defect candidate extraction unit and/or the defect detection unit are performed asynchronously with an image acquisition process.

摘要翻译： 一种用于检查图案缺陷的装置，所述装置包括：缺陷候选提取单元，被配置为通过将检测到的图像信号与参考图像信号进行比较来执行缺陷候选提取处理; 以及缺陷检测单元，被配置为基于包含由缺陷候选提取单元提取的缺陷候选的部分图像执行缺陷检测处理和缺陷分类处理，其中由缺陷候选提取单元执行的处理和/或 缺陷检测单元与图像获取处理异步地执行。

公开(公告)号：US07400393B2

公开(公告)日：2008-07-15

申请号：US11478617

申请日：2006-07-03

申请人： Yukihiro Shibata ,  Shunji Maeda ,  Hidetoshi Nishiyama

发明人： Yukihiro Shibata ,  Shunji Maeda ,  Hidetoshi Nishiyama

IPC分类号： G01N21/88

CPC分类号： G01N21/95607 ,  G01N2021/8822

摘要： This invention provides a defect inspection method and apparatus that can easily and quickly determine, from among a plurality of inspection conditions, a condition that allows for an inspection with high sensitivity. The inspection apparatus has a variety of optical functions to cover a variety of kinds of defects to be inspected (shape, material, nearby pattern, etc.). For each optical function, grayscale depths of defects that the operator wants detected and of pseudo defects that he or she wants undetected are accumulated for future use, so that conditions conducive to a higher sensitivity and a lower pseudo defect detection rate can be selected efficiently. Conditions that can be selected for optical systems include a bright-field illumination, a dark-field illumination and a bright-/dark-field composite illumination, illumination wavelength bands, polarization filters and spatial filters.

摘要翻译： 本发明提供一种能够从多个检查条件中容易且快速地确定能够以高灵敏度进行检查的条件的缺陷检查方法和装置。 检查装置具有各种光学功能，可以覆盖要检查的各种缺陷（形状，材料，附近图案等）。 对于每个光学功能，操作者想要检测到的缺陷的灰度深度和他或她想要未检测到的伪缺陷被累积以供将来使用，使得可以有效地选择有利于更高灵敏度和更低伪缺陷检测率的条件。 可以选择用于光学系统的条件包括亮场照明，暗场照明和亮/暗场复合照明，照明波长带，偏振滤光器和空间滤光器。