公开(公告)号：US08049609B2

公开(公告)日：2011-11-01

申请号：US12320776

申请日：2009-02-04

申请人： Nobuyuki Takahashi ,  Kunimitsu Aoki ,  Masahiro Takamatsu

发明人： Nobuyuki Takahashi ,  Kunimitsu Aoki ,  Masahiro Takamatsu

IPC分类号： B60Q1/00 ,  G09G5/00 ,  G06K9/00 ,  G03B21/56

CPC分类号： G02B27/01 ,  B60K35/00 ,  B60Q3/78 ,  G02B2027/0127 ,  G02B2027/0138

摘要： An in-vehicle display device includes (a) a display unit provided on a surface of an instrument panel of a vehicle, opposed to a windshield of the vehicle, and configured to indicate a plurality of information dots V in a row or in a rectangular array on the windshield such that the necessary information dots are selectably displayed from among the plurality of the information dots and superposed upon a real image viewed through the windshield, (b) a target information acquisition unit that obtains target information of which a driver of the vehicle is to be notified, and (c) a display control unit that controls the display unit and makes the display unit indicate the predetermined information dots V that correspond to the target information that has been obtained by the target information acquisition unit.

摘要翻译： 车载显示装置包括：（a）显示单元，其设置在与车辆的挡风玻璃相对的车辆的仪表板的表面上，并且被配置为指示多个信息点V成行或矩形 阵列，使得从多个信息点中可选择地显示必要的信息点，并叠加在通过挡风玻璃观察的实际图像上;（b）目标信息获取单元，其获取目标信息，其中， 要通知车辆，以及（c）显示控制单元，其控制显示单元并使显示单元指示与由目标信息获取单元获得的目标信息相对应的预定信息点V.

公开(公告)号：US07886808B2

公开(公告)日：2011-02-15

申请号：US11637925

申请日：2006-12-13

申请人： Toshiaki Koguchi ,  Kazuhito Watanabe ,  Nobuyuki Takahashi

发明人： Toshiaki Koguchi ,  Kazuhito Watanabe ,  Nobuyuki Takahashi

IPC分类号： F25B29/00 ,  F28F7/00 ,  C23C16/00

CPC分类号： H01L21/67161 ,  H01L21/67109 ,  H01L21/67115 ,  H01L21/67178

摘要： A substrate heating chamber and a substrate cooling chamber each capable of simultaneously holding a plurality of substrates are provided in a thermally separated state in a heating and cooling apparatus with a single vacuum processing chamber. The substrate heating chamber is equipped with a plurality of communicating or non-communicating substrate holding spaces. The substrate cooling chamber is also equipped with a plurality of communicating or non-communicating substrate holding spaces. The communicating substrate holding spaces allow the batch heat treatment of substrates, while the non-communicating substrate holding spaces allow the batch or individual processing of substrates.

摘要翻译： 在具有单个真空处理室的加热和冷却装置中，以热分离的状态提供各自同时保持多个基板的基板加热室和基板冷却室。 基板加热室配备有多个连通或不连通的基板保持空间。 基板冷却室还配备有多个连通或不连通的基板保持空间。 连通基板保持空间允许对基板进行批量热处理，而不连通的基板保持空间允许基板的批量或单独处理。

公开(公告)号：US20100258425A1

公开(公告)日：2010-10-14

申请号：US12758202

申请日：2010-04-12

申请人： Nobuyuki Takahashi ,  Hiroaki Masuda

发明人： Nobuyuki Takahashi ,  Hiroaki Masuda

IPC分类号： H01H1/10 ,  H01H13/14

CPC分类号： A63F13/24 ,  A63F2300/1043 ,  H01H1/10 ,  H01H2221/018 ,  H01H2227/022

摘要： Disclosed herein is a manipulating apparatus (mobile terminal) including a chassis provided with a manipulating portion (directional manipulating portion) with which an input manipulation is carried out. The manipulating portion includes: a key top exposed to an outside of the chassis through an opening portion, which the chassis has, and a key main body having a base portion on which the key top is formed within the chassis; a circuit board in which a detecting portion (switches) is disposed in a position corresponding to the key top,; and a flat plate-shaped elastic body (elastic body) interposed between the key main body and the detecting portion; in which the elastic body is provided integrally with the base portion. According to the manipulating apparatus, not only the soft click feeling can be obtained from the elastic body, but also the manipulating apparatus can be thinned as compared with the case where the existing elastic body (contact rubber) is adopted by adjusting the thickness size each of the elastic body.

摘要翻译： 本文公开了一种操纵装置（移动终端），其包括设置有执行输入操作的操纵部分（方向操纵部分）的底架。 操作部包括：通过底座所具有的开口部暴露于底盘外侧的键顶，以及具有基座部的键主体，键顶部形成于底座内的键主体; 将检测部（开关）配置在与键顶对应的位置的电路​​基板; 以及插入在所述键主体和所述检测部之间的平板状的弹性体（弹性体） 其中弹性体与基部一体设置。 根据操作装置，不仅可以从弹性体获得柔软的点击感，而且与采用现有的弹性体（接触橡胶）的情况相比，也可以使操作装置变薄 的弹性体。

公开(公告)号：USD622183S1

公开(公告)日：2010-08-24

申请号：US29356514

申请日：2010-02-26

申请人： Naoya Ishikura ,  Yutaka Saito ,  Nobuyuki Takahashi

设计人： Naoya Ishikura ,  Yutaka Saito ,  Nobuyuki Takahashi

公开(公告)号：US20090247057A1

公开(公告)日：2009-10-01

申请号：US11990848

申请日：2006-09-12

申请人： Takuji Kobayashi ,  Hideo Aizawa ,  Masao Umemoto ,  Tadakazu Sone ,  Hiroomi Torii ,  Nobuyuki Takahashi ,  Takashi Tsuzuki

发明人： Takuji Kobayashi ,  Hideo Aizawa ,  Masao Umemoto ,  Tadakazu Sone ,  Hiroomi Torii ,  Nobuyuki Takahashi ,  Takashi Tsuzuki

IPC分类号： B24B37/04 ,  B24B41/00

CPC分类号： B24B37/16

摘要： The present invention provides a polishing platen which does not require a large force for removing a polishing pad from an upper surface of the polishing platen and can thus make it relatively easy to remove the polishing pad therefrom. The present invention also provides a polishing apparatus having such polishing platen. The polishing platen (12) according to the present invention includes a surface to which a polishing pad is attached. The surface of the polishing platen (12) includes a combination of a first surface (20) and a second surface (21) having a surface roughness which is different from that of the first surface (20).

摘要翻译： 本发明提供一种研磨台板，其不需要大的力来从研磨台板的上表面去除抛光垫，因此能够相对容易地从其上去除抛光垫。 本发明还提供一种具有这种研磨台板的抛光装置。 根据本发明的抛光台板（12）包括安装有抛光垫的表面。 研磨台板（12）的表面包括具有不同于第一表面（20）表面粗糙度的第一表面（20）和第二表面（21）的组合。

公开(公告)号：US20090228130A1

公开(公告)日：2009-09-10

申请号：US11792340

申请日：2006-08-01

申请人： Daisuke Fujino ,  Kenji Iriguchi ,  Nobuyuki Takahashi ,  Katsunori Tanaka ,  Yuka Mitani

发明人： Daisuke Fujino ,  Kenji Iriguchi ,  Nobuyuki Takahashi ,  Katsunori Tanaka ,  Yuka Mitani

IPC分类号： G05B19/402 ,  G06F17/00

CPC分类号： G05B19/4097 ,  G05B2219/35114 ,  G05B2219/36263 ,  G05B2219/36265 ,  G05B2219/36282 ,  Y02P90/265

摘要： A programming device programs a machining control program to be used on a numerical control device for machining an object. A setting unit sets an axial direction of the tool with respect to the data on the machining-target area and sets a deepest position of a tip of the tool with respect to the data on the machining-target area. An extracting unit extracts a surface-machining-target area of the object from the data on the machining-target area based on the set axial direction of the tool, the set deepest position of the tip, and the data on the machining-target area.

摘要翻译： 编程装置对用于加工物体的数控装置中使用的加工控制程序进行编程。 设定单元相对于加工对象区域上的数据设定刀具的轴向，并且相对于加工对象区域上的数据设定刀具的尖端的最深位置。 提取单元基于设定的刀具轴方向，刀尖的设定最深位置和加工对象区域上的数据，从加工对象区域的数据中提取物体的表面加工对象区域 。

公开(公告)号：US20090067959A1

公开(公告)日：2009-03-12

申请号：US11665963

申请日：2007-02-21

申请人： Nobuyuki Takahashi ,  Hiroaki Nishida ,  Hiroomi Torii ,  Soichi Isobe ,  Tadakazu Sone ,  Ryuichi Kosuge ,  Hiroyuki Kaneko ,  Hiroshi Sotozaki ,  Takao Mitsukura ,  Takahiro Ogawa ,  Kenichi Sugita

发明人： Nobuyuki Takahashi ,  Hiroaki Nishida ,  Hiroomi Torii ,  Soichi Isobe ,  Tadakazu Sone ,  Ryuichi Kosuge ,  Hiroyuki Kaneko ,  Hiroshi Sotozaki ,  Takao Mitsukura ,  Takahiro Ogawa ,  Kenichi Sugita

IPC分类号： H01L21/67

CPC分类号： H01L21/67219 ,  B24B37/345 ,  H01L21/6719 ,  H01L21/67742 ,  H01L21/67745 ,  H01L21/67748 ,  H01L21/67751 ,  H01L21/67766 ,  H01L21/68707

摘要： The present invention relates to a substrate processing apparatus which can improve a tact time of substrate processing. A polishing apparatus as the substrate processing apparatus includes plural polishing sections (3a, 3b) each for polishing a semiconductor wafer (W), and a swing transporter (7) for transferring the wafer (W). The swing transporter (7) includes a wafer clamp mechanism (112) adapted to clamp the wafer (W), a vertically moving mechanism (104, 106) for vertically moving the wafer clamp mechanism (112) along a frame (102) of a casing of the polishing section (3a), and a swing mechanism (108, 110) for swinging the wafer clamp mechanism (112) about a shaft adjacent to the frame (102).

摘要翻译： 本发明涉及能够提高基板处理的节拍时间的基板处理装置。 作为基板处理装置的研磨装置包括：用于研磨半导体晶片（W）的多个研磨部（3a，3b）和用于转印晶片（W）的摆动传送装置（7）。 摆动传送器（7）包括适于夹紧晶片（W）的晶片夹紧机构（112），用于沿着晶片夹持机构（102）的框架（102）垂直移动的垂直移动机构（104,106） 抛光部分（3a）的外壳和用于使晶片夹紧机构（112）围绕与框架（102）相邻的轴摆动的摆动机构（108,110）。

公开(公告)号：US20070247047A1

公开(公告)日：2007-10-25

申请号：US11551869

申请日：2006-10-23

申请人： Kenji Niibori ,  Yasushi Shioya ,  Nobuyuki Takahashi ,  Kazuyuki Ueda

发明人： Kenji Niibori ,  Yasushi Shioya ,  Nobuyuki Takahashi ,  Kazuyuki Ueda

IPC分类号： H01J1/88

CPC分类号： H01J31/127 ,  H01J29/864 ,  H01J2211/36 ,  H01J2329/8625 ,  H01J2329/8665

摘要： An image display apparatus includes an air-tight container, and an image display member and a spacer provided in the air-tight container. The spacer has a first electroconductive member fixed to the spacer and is fixed to a second electroconductive member provided outside an image display area by a weld joining in the air-tight container. The second electroconductive member is defined with a predetermined potential.

摘要翻译： 图像显示装置包括气密容器和设置在气密容器中的图像显示部件和间隔件。 间隔件具有固定到间隔件的第一导电构件，并且通过焊接在气密容器中的方式固定到设置在图像显示区域外部的第二导电构件。 第二导电构件被限定为预定电位。

公开(公告)号：US20070210689A1

公开(公告)日：2007-09-13

申请号：US11751274

申请日：2007-05-21

申请人： Kenji Niibori ,  Nobuyuki Takahashi ,  Kazuyuki Ueda ,  Ryoji Tanaka

发明人： Kenji Niibori ,  Nobuyuki Takahashi ,  Kazuyuki Ueda ,  Ryoji Tanaka

IPC分类号： H01J1/88

CPC分类号： H01J29/028 ,  H01J9/185 ,  H01J9/242 ,  H01J29/864 ,  H01J2329/8625 ,  H01J2329/864 ,  H01J2329/8645 ,  H01J2329/8655 ,  H01J2329/866 ,  H01J2329/8665

摘要： The present invention relates to a vacuum container having a first substrate and a second substrate arranged so as to face each other as components including, within the low-pressure container, a spacer disposed at the first substrate or the second substrate so as to maintain an interval between the first substrate and the second substrate. The spacer is fixed within the vacuum container via a supporting member provided at the spacer without contacting the substrate where the spacer is disposed. The invention also relates to a method for manufacturing vacuum container, an image display apparatus using the vacuum container, and a method for manufacturing the image display apparatus.

摘要翻译： 本发明涉及具有第一基板和第二基板的真空容器，该第一基板和第二基板被布置成彼此面对，作为在低压容器内包括在第一基板或第二基板上设置的间隔件的部件， 第一基板和第二基板之间的间隔。 间隔件经由设置在间隔件处的支撑构件固定在真空容器内，而不与​​设置有间隔件的基板接触。 本发明还涉及真空容器的制造方法，使用真空容器的图像显示装置以及图像显示装置的制造方法。

公开(公告)号：US20070197551A1

公开(公告)日：2007-08-23

申请号：US10590707

申请日：2005-02-25

申请人： Michitaka Sato ,  Teruaki Matsui ,  Akira Asagarasu ,  Hiroyuki Hayashi ,  Sei-ichi Araki ,  Satoru Tamaoki ,  Nobuyuki Takahashi ,  Yukinao Yamauchi ,  Yoshiko Yamamoto ,  Norio Yamamoto ,  Chisato Ogawa

发明人： Michitaka Sato ,  Teruaki Matsui ,  Akira Asagarasu ,  Hiroyuki Hayashi ,  Sei-ichi Araki ,  Satoru Tamaoki ,  Nobuyuki Takahashi ,  Yukinao Yamauchi ,  Yoshiko Yamamoto ,  Norio Yamamoto ,  Chisato Ogawa

IPC分类号： A61K31/497 ,  C07D239/06

CPC分类号： C07D495/14 ,  A61K31/496 ,  A61K31/4985 ,  A61K31/517 ,  A61K31/519 ,  A61K31/5395 ,  A61K45/06 ,  C07D401/12 ,  C07D417/12 ,  C07D471/04 ,  C07D487/04 ,  C07D495/04 ,  A61K2300/00

摘要： This invention provides pyrimidine derivatives represented by a formula, in the formula, ring A stands for carbocyclic group or heterocyclic group, X1 stands for hydrogen, lower alkyl, amino, etc., X2 stands for hydrogen or lower alkyl, Y stands for a direct bond or sulfur or nitrogen, n stands for an integer of 0-4, and Ar stands for a group of the following formula, or a salt thereof, which concurrently exhibit 5-HT1A agonistic activity and 5-HT3 antagonistic activity and are useful for therapy and treatments of diseases such as IBS. The invention furthermore provides a therapeutic method of IBS, characterized by having 5-HT1A agonistic activity and 5-HT3 antagonistic activity work simultaneously and cooperatively in vivo, which comprises either administering 5-HT3 antagonistic agent which concurrently exhibits 5-HT1A agonistic activity, or administering 5-HT1A agonistic agent and 5-HT3 antagonistic agent simultaneously, in sequence or at an interval.

摘要翻译： 本发明提供由下式表示的嘧啶衍生物，式中，环A代表碳环基或杂环基，X 1代表氢，低级烷基，氨基等，X 2 代表氢或低级烷基，Y表示直接键或硫或氮，n表示0-4的整数，Ar表示下式的基团或其盐，其同时 表现出5-HT 1A激动活性和5-HT 3拮抗活性，并且可用于治疗和治疗诸如IBS的疾病。 本发明还提供IBS的治疗方法，其特征在于具有5-HT 1A激动活性和5-HT 3拮抗活性同时并且在体内协同作用，其包括 施用同时具有5-HT 1A激动活性的5-HT 3拮抗剂，或施用5-HT 1A激动剂和5-HT 同时按照或间隔进行。