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    Grazing order metrology
    91.
    发明授权
    Grazing order metrology 有权

    公开(公告)号：US09618448B2

    公开(公告)日：2017-04-11

    申请号：US14706343

    申请日：2015-05-07

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen

    IPC: G02B5/18 ,  G01N21/41 ,  G06F17/50 ,  G03F7/20

    CPC classification number: G01N21/41 ,  G01N2201/061 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/50

    Abstract: Metrology targets, optical systems and methods are provided, which enable metrology measurements of very small features, using resonance of illuminated radiation within periodical structures of the target, under appropriate illumination. Metrology targets comprise periodical structure(s) configured to resonate incident radiation and having a pitch defined by the grating equation with respect to configured parameters such as the selected diffraction order, refractive indices and the illumination's wavelength(s) and incidence angles. Possibly, the target may further comprise substructure(s) which are optically coupled with the resonating incident radiation in the periodical structure(s). The spatial organization of the periodic structures and the substructures, as well as the optical organization of illuminated and scattered radiation provide collecting phase signals from the targets at a range of parameters, such as different wavelengths, spatial angles and polarizations to enhance the metrology signal and achieve a very high sensitivity to very small target features.

    Overlay measurement based on moire effect between structured illumination and overlay target
    92.
    发明授权
    Overlay measurement based on moire effect between structured illumination and overlay target 有权
    基于结构照明和覆盖目标之间的莫尔效应的叠加测量

    公开(公告)号：US09182219B1

    公开(公告)日：2015-11-10

    申请号：US14160279

    申请日：2014-01-21

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen ,  Barry Loevsky ,  Zeev Bomzon

    IPC: G01B11/14 ,  H01L23/544 ,  G03F7/20

    CPC classification number: G03F7/70633 ,  G01B11/02 ,  G01B11/14 ,  G06K9/00 ,  G06K9/3216 ,  G06T7/0004 ,  H01L22/30 ,  H01L23/544 ,  H01L2924/0002 ,  H01L2924/00

    Abstract: A method and system for overly measurement is disclosed. The overlay measurement is performed based on moiré effect observed between structured illumination grids and overlay targets. A structured illumination is used to illuminate a first overlay target and a second overlay target. Upon obtaining an image of the first overlay target illuminated by the structured illumination and an image of the second overlay target illuminated by the structured illumination, relative displacement between the first overlay target and the structured illumination and relative displacement between the second overlay target and the structured illumination are measured. The overlay between the first overlay target and the second overlay target is then measured based on their relative displacements with respect to the structured illumination.

    Abstract translation: 公开了一种用于过度测量的方法和系统。 基于在结构化照明网格和覆盖目标之间观察到的莫尔效应来进行覆盖测量。 结构照明用于照亮第一覆盖目标和第二覆盖目标。 在获得由结构化照明照明的第一覆盖目标的图像和由结构化照明照明的第二覆盖目标的图像时，第一覆盖目标和结构化照明之间的相对位移以及第二覆盖目标与结构化照明之间的相对位移 测量照度。 然后基于它们相对于结构化照明的相对位移来测量第一覆盖目标和第二覆盖目标之间的覆盖。

    Apodization for Pupil Imaging Scatterometry
    93.
    发明申请
    Apodization for Pupil Imaging Scatterometry 有权
    瞳孔影像散斑测量法

    公开(公告)号：US20150316783A1

    公开(公告)日：2015-11-05

    申请号：US14799132

    申请日：2015-07-14

    Applicant: KLA-Tencor Corporation

    Inventor： Andrew V. Hill ,  Amnon Manassen ,  Barak Bringoltz ,  Ohad Bachar ,  Mark Ghinovker ,  Zeev Bomzon ,  Daniel Kandel

    IPC: G02B27/58 ,  G01B11/00 ,  G01N21/47

    CPC classification number: G02B27/58 ,  G01B11/00 ,  G01N21/47 ,  G01N21/55 ,  G01N2201/06113 ,  G01N2201/068 ,  G03F7/70625 ,  G03F7/70633

    Abstract: The disclosure is directed to various apodization schemes for pupil imaging scatterometry. In some embodiments, the system includes an apodizer disposed within a pupil plane of the illumination path. In some embodiments, the system further includes an illumination scanner configured to scan a surface of the sample with at least a portion of apodized illumination. In some embodiments, the system includes an apodized pupil configured to provide a quadrupole illumination function. In some embodiments, the system further includes an apodized collection field stop. The various embodiments described herein may be combined to achieve certain advantages.

    Abstract translation: 本公开涉及用于瞳孔成像散射测量的各种变迹方案。 在一些实施例中，该系统包括设置在照明路径的光瞳平面内的变迹器。 在一些实施例中，系统还包括照明扫描器，其构造成用至少一部分变迹照明来扫描样品的表面。 在一些实施例中，系统包括配置成提供四极照明功能的变迹瞳孔。 在一些实施例中，系统还包括变迹集合区域停止。 可以组合这里描述的各种实施例以实现某些优点。

    GRAZING ORDER METROLOGY
    94.
    发明申请
    GRAZING ORDER METROLOGY 有权

    公开(公告)号：US20150233818A1

    公开(公告)日：2015-08-20

    申请号：US14706343

    申请日：2015-05-07

    Applicant: KLA-Tencor Corporation

    Inventor： Amnon Manassen

    IPC: G01N21/41 ,  G06F17/50

    CPC classification number: G01N21/41 ,  G01N2201/061 ,  G03F7/70633 ,  G03F7/70683 ,  G06F17/50

    Abstract: Metrology targets, optical systems and methods are provided, which enable metrology measurements of very small features, using resonance of illuminated radiation within periodical structures of the target, under appropriate illumination. Metrology targets comprise periodical structure(s) configured to resonate incident radiation and having a pitch defined by the grating equation with respect to configured parameters such as the selected diffraction order, refractive indices and the illumination's wavelength(s) and incidence angles. Possibly, the target may further comprise substructure(s) which are optically coupled with the resonating incident radiation in the periodical structure(s). The spatial organization of the periodic structures and the substructures, as well as the optical organization of illuminated and scattered radiation provide collecting phase signals from the targets at a range of parameters, such as different wavelengths, spatial angles and polarizations to enhance the metrology signal and achieve a very high sensitivity to very small target features.

    Abstract translation: 提供了计量目标，光学系统和方法，其使得能够在适当照明下使用目标周期结构内的照明辐射的共振来测量非常小的特征。 计量目标包括配置成谐振入射辐射并且相对于诸如所选择的衍射级，折射率和照明的波长和入射角的配置参数由光栅方程定义的间距的周期性结构。 可能地，目标还可以包括与周期性结构中的谐振入射辐射光学耦合的子结构。 周期性结构和子结构的空间组织以及照明和散射辐射的光学组织在一系列参数（例如不同波长，空间角度和极化）上提供来自目标的收集相位信号，以增强测量信号，以及 对非常小的目标特征实现非常高的灵敏度。

    NEAR FIELD METROLOGY
    95.
    发明申请
    NEAR FIELD METROLOGY 审中-公开
    近场计量学

    公开(公告)号：US20150198524A1

    公开(公告)日：2015-07-16

    申请号：US14583447

    申请日：2014-12-26

    Applicant: KLA-Tencor Corporation

    Inventor： Noam Sapiens ,  Joel Seligson ,  Vladimir Levinski ,  Daniel Kandel ,  Yoel Feler ,  Barak Bringoltz ,  Amnon Manassen ,  Eliav Benisty

    IPC: G01N21/47

    CPC classification number: G01N21/4788 ,  G01N2201/06113 ,  G02B27/56 ,  G02B27/58

    Abstract: Metrology systems and methods are provided herein, which comprise an optical element that is positioned between an objective lens of the system and a target. The optical element is arranged to enhance evanescent modes of radiation reflected by the target. Various configurations are disclosed: the optical element may comprise a solid immersion lens, a combination of Moiré-elements and solid immersion optics, dielectric-metal-dielectric stacks of different designs, and resonating elements to amplify the evanescent modes of illuminating radiation. The metrology systems and methods are configurable to various metrology types, including imaging and scatterometry methods.

    Abstract translation: 本文提供的计量系统和方法包括位于系统的物镜和目标之间的光学元件。 光学元件布置成增强目标反射的辐射消散模式。 公开了各种配置：光学元件可以包括固体浸没透镜，莫尔元件和固体浸没光学元件的组合，不同设计的介电金属 - 电介质叠层以及用于放大照明辐射的渐逝模式的谐振元件。 计量系统和方法可配置为各种计量类型，包括成像和散射方法。

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