Method for manufacturing electrophotographic photosensitive member
    94.
    发明授权
    Method for manufacturing electrophotographic photosensitive member 有权
    电子照相感光构件的制造方法

    公开(公告)号:US09372416B2

    公开(公告)日:2016-06-21

    申请号:US13608843

    申请日:2012-09-10

    摘要: A method for manufacturing an electrophotographic photosensitive member using plasma CVD includes steps of placing a cylindrical base member in a reactor which can be evacuated, the reactor having an electrode therein, so as to be spaced apart from the electrode, introducing a raw material gas for deposited film formation into the reactor, and applying an alternating voltage of a rectangular wave having a frequency in the range of 3 kHz to 300 kHz between the electrode and the cylindrical base member so that a potential at one of the electrode and the cylindrical base member with respect to a potential at the other becomes alternately positive and negative, to decompose the raw material gas, and forming a deposited film on the cylindrical base member. The magnitude of the potential difference between the electrode and the cylindrical base member is selectively controlled.

    摘要翻译: 使用等离子体CVD制造电子照相感光构件的方法包括以下步骤:将圆筒形基底构件放置在可被抽真空的反应器中,反应器具有电极,以与电极间隔开,将原料气体引入 将沉积的膜形成到反应器中,并且在电极和圆筒形基底构件之间施加频率在3kHz至300kHz范围内的矩形波的交流电压,使得电极和圆柱形基底构件中的一个电位 相对于另一方的电位交替地为正负,分解原料气体,并在圆筒状基材上形成沉积膜。 选择性地控制电极和圆筒形基体之间的电位差的大小。

    ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS
    97.
    发明申请
    ELECTROPHOTOGRAPHIC PHOTOSENSITIVE MEMBER AND ELECTROPHOTOGRAPHIC APPARATUS 审中-公开
    电子照相感光元件和电子照相设备

    公开(公告)号:US20120201570A1

    公开(公告)日:2012-08-09

    申请号:US13501163

    申请日:2010-12-16

    IPC分类号: G03G15/00

    CPC分类号: G03G5/08235 G03G5/08214

    摘要: The present invention provides an electrophotographic photosensitive member having an a-SiC upper charge injection inhibition layer and an a-SiC surface layer, which is superior in adhesiveness, suppresses the surface deterioration, is superior in sensitivity characteristics and charging characteristics, and can keep an adequate image-forming capability for a long period of time. The upper charge injection inhibition layer contains 10 atom ppm or more and 30,000 atom ppm or less of the Group 13 atoms or the Group 15 atoms of the Periodic Table with respect to silicon atoms in the upper charge injection inhibition layer, and the ratio (C/(Si+C)) of the number of carbon atoms in the upper charge injection inhibition layer with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the upper charge injection inhibition layer is 0.10 or more and 0.60 or less; and the sum of the atom density of the silicon atoms and the atom density of the carbon atoms in the surface layer is 6.60×1022 atoms/cm3 or more, and the ratio (C/(Si+C)) of the number of carbon atoms with respect to the sum of the number of silicon atoms and the number of the carbon atoms in the surface layer is 0.61 or more and 0.75 or less.

    摘要翻译: 本发明提供一种电子照相感光构件,其具有优异的粘合性,抑制表面变质的a-SiC上电荷注入抑制层和a-SiC表面层,具有优异的灵敏度特性和充电特性,并且可以保持 足够的成像能力长时间。 上电荷注入抑制层含有上电荷注入抑制层中相对于硅原子的10原子ppm以上且30,000原子ppm以下的元素周期表中的第13族原子或15族原子, 上电荷注入抑制层中的碳原子数相对于上电荷注入抑制层中的硅原子数和碳原子数之和的/(Si + C))为0.10以上, 0.60以下; 并且表面层中的硅原子的原子密度和碳原子的原子密度之和为6.60×1022原子/ cm3以上,碳数为C /(Si + C)的比例 相对于硅原子数和表面层中碳原子数之和的原子为0.61以上且0.75以下。

    LUMINESCENT SUBSTRATE FOR LICIFERASE
    98.
    发明申请
    LUMINESCENT SUBSTRATE FOR LICIFERASE 有权
    LICIFERASE的发光基材

    公开(公告)号:US20110033878A1

    公开(公告)日:2011-02-10

    申请号:US12865328

    申请日:2009-02-02

    IPC分类号: C12Q1/66 C07D277/12

    CPC分类号: C07D277/56 C09K11/07

    摘要: The present invention relates to a compound having a structure analogous to firefly luciferin. In particular, the invention relates to a heterocycle compound which produces a luminescence at a light wavelength different from that of firefly luciferin in nature. The present invention provides a heterocycle compound of following general formula I. In the above general formula, R1, R2 and R3 can be each independently H or C1-4-alky. In the above general formula, X and Y can be each independently C, N, S or O. In the above general formula, the olefin chain part expressed as “n” can be changed to desired length.

    摘要翻译: 本发明涉及具有类似于萤火虫荧光素的结构的化合物。 特别地,本发明涉及在本质上产生与萤火虫萤光素不同的光波长的发光的杂环化合物。 本发明提供以下通式I的杂环化合物。在上述通式中,R 1,R 2和R 3各自独立地为H或C 1-4 - 烷基。 在上述通式中,X和Y可以各自独立地为C,N,S或O.在上述通式中,表示为“n”的烯烃链部分可以改变为所需的长度。

    HARD-COATED FILM, METHOD FOR PRODUCTION THEREOF AND ANTIREFLECTION FILM
    99.
    发明申请
    HARD-COATED FILM, METHOD FOR PRODUCTION THEREOF AND ANTIREFLECTION FILM 有权
    硬涂膜,其生产方法和抗反射膜

    公开(公告)号:US20100028600A1

    公开(公告)日:2010-02-04

    申请号:US12444497

    申请日:2007-08-31

    IPC分类号: B32B3/00 B05D3/12

    摘要: There is provided a hard-coated film that includes a thermoplastic film and a hard coat layer placed thereon, has high surface hardness, is prevented from forming interference iris patterns, does not reduce image sharpness when used for antireflection films, and is prevented from causing screen glittering, external light reflection, or coloration irregularity of reflected light. The hard-coated film includes a polyester film and a hard coat layer placed on at least one side of the polyester film, wherein the hard coat layer has a surface with irregularities, an interface between the polyester film and the hard coat layer has irregularities, and the surface of the hard coat layer has 3D surface roughness parameters including an arithmetical mean deviation of surface Sa of from 15 nm to less than 150 nm and a kurtosis of surface height distribution Sku of from 1.5 to 5.

    摘要翻译: 提供了一种硬涂层,其包括热塑性膜和置于其上的硬涂层,具有高的表面硬度,防止形成干涉虹膜图案,当用于防反射膜时不会降低图像清晰度,并且防止引起 屏幕闪烁,外部光反射或反射光的着色不规则。 所述硬涂膜包括聚酯膜和设置在所述聚酯膜的至少一面上的硬涂层,其中所述硬涂层具有不规则的表面,所述聚酯膜和所述硬涂层之间的界面具有不规则性, 并且硬涂层的表面具有3D表面粗糙度参数,包括表面Sa的从15nm到小于150nm的算术平均偏差,以及1.5至5的表面高度分布Sku的峰度。