摘要:
An ellipsometer, polarimeter, reflectometer, spectrophotometer or scatterometer system for use in the UV and infrared range of wavelengths, characterized by the combination of a fiber optic capable of transmitting wavelengths from below 2.2 micron up to at least 3.5 microns, and a beam collimator formed from a combination of two off-axis concave astigmatism reducing spherical mirrors capable of operating between about 190 nm up to 5.5 microns.
摘要:
Control of the angle-of-incidence of a beam of electromagnetic radiation provided by a horizontally oriented arc-lamp in ellipsometer, polarimeter, spectrophotometer, reflectometer, Mueller matrix measuring, or the like systems.
摘要:
The present invention relates to ellipsometer and polarimeter systems, and more particularly is an ellipsometer or polarimeter or the like system which operates in a frequency range between 300 GHz or lower and extending to higher than at least 1 Tera-hertz (THz), and preferably through the Infra-red (IR) range up to, and higher than 100 THz, including: a source such as a backward wave oscillator; a Smith-Purcell cell; a free electron laser, or an FTIR source and a solid state device; and a detector such as a Golay cell; a bolometer or a solid state detector; and preferably including at least one odd-bounce polarization state image rotating system, and optionally including a polarizer, at least one compensator and/or modulator, in addition to an analyzer.
摘要:
Application of digital light processor (DLP) systems in monochromator, spectrophotometer or the like systems to mediate selection of individual wavelengths, and/or to image elected regions of a sample in an imaging ellipsometer, imaging polarimeter, imaging reflectometer, imaging spectrophotometer, and/or to provide chopped beams.
摘要:
Disclosed is a system comprising a stage with “X”, “Y” and “Z” translation and “X”, “Y” and optionally “Z” axes rotation capability, in combination with interrogation and monitoring means which act in functional combination to orient the surface of a sample so as to set an intended oblique approach of an electromagnetic beam with respect to a sample surface at a monitored location thereon.
摘要:
An imaging system, and method of its use, for viewing a sample surface at an inclined angle, preferably in functional combination with a sample investigating reflectometer, spectrophotometer, ellipsometer or polarimeter system; wherein the imaging system provides that a sample surface and multi-element imaging detector surface are oriented with respect to one another to meet the Scheimpflug condition, and wherein a telecentric lens system is simultaneously positioned between the sample surface and the input surface of the multi-element imaging detector such that an image of the sample surface produced by said multi-element imaging detector is both substantially in focus over the extent thereof, and such that substantially no keystone error is demonstrated in said image.
摘要:
A sample positioning system having two rotation elements with offset therebetween, to the second of which rotation elements is affixed a sample supporting stage. The rotation axes of the two rotation element are parallel, or substantially so. The sample positioning system finds application in the mapping of samples by Metrology systems such as Reflectometer, Spectrophotometer and Ellipsometer systems.
摘要:
An approach to characterizing beams of electromagnetic radiation such as are applied in ellipsometer and the like systems, involving considering the beam to be comprised of a number of spatially distributed beam rays, each of which is represented mathematically as an effectively independent source.
摘要:
In the context of an ellipsometer or the like, positioning a camera other than directly above a sample being investigated by an electromagnetic beam, while said camera provides an optical view of a surface of said sample which is in focus over the entire viewed extent of the sample, and wherein a contrast improving system involving two beams provided by a beam splitting system is utilized.