摘要:
An object of the invention is to provide such an oriented polyester film that has a constant thickness, and is excellent in dimensional stability at a high temperature and dimensional stability to temperature change in a working temperature range. The invention relates to an oriented polyester film containing as a major component of a substrate layer polyethylene-2,6-naphthalene dicarboxylate, being stretched at least in one direction, and having a film thickness of from 12 to 250 μm, wherein (1) a coefficient of linear thermal expansion αt at a temperature of from 30 to 100° C. is from 0 to 15 ppm/° C. in both longitudinal and width directions of the film, and (2) a thermal shrinkage rate at 100° C. for 10 minutes is 0.5% or less in both longitudinal and width directions of the film.
摘要:
A seat weight measuring apparatus capable of securely withstanding large force due to large load, such as force in the event of a vehicle collision, applied to a vehicle seat. Normally, a small force is applied to a rear pin bracket and the sleeves through which a pivot bolt is inserted do not substantially collide with the inner peripheries of holes. As a large force is applied to the rear pin bracket, a stopper bolt collides with a base frame and the rear pin bracket collides with the pivot bolt. The large force exerted on the rear pin bracket is shared and borne by portions of the frame thereby reducing the localized stresses in the frame.
摘要:
A vacuum processing apparatus includes a transfer chamber filled with a gas to have an upper limit of a target pressure range, a gas supply system connected to a gas supply source to supply the gas into the transfer chamber, a gas exhaust system for releasing the gas from within the transfer chamber, first and second vacuum chambers connected to the transfer chamber, first and second gate valves interposed between the transfer chamber and the vacuum chambers, which selectively permit the transfer chamber and the vacuum chambers to communicate with each other and a transfer mechanism for transferring a target object from the first vacuum chamber to the transfer chamber via the first gate valve and for transferring the target object from the transfer chamber to the second vacuum chamber via the second gate valve. An opening/closing valve is provided in the gas supply system for selectively supplying the gas from the gas supply source into the transfer chamber, a gas loading space being defined upstream of the opening/closing valve to permit the gas having a volume and pressure set in accordance with the upper limit of a target pressure range to be stored in the gas loading space when the opening/closing valve is closed.
摘要:
A biaxially oriented polyester film: (A) which comprises a composition comprising at least two thermoplastic polyesters; (B) which has at least two melting peaks which satisfy difference between being in range of 5 to 20° C. and average of the both melting peak temperature being in range of 200 to 230° C. when measured by DSC at a temperature elevation rate of 2° C./min by superimposing a periodic temperature variation of ±1° C./min; the highest melting peak temperature (° C.) and the lowest melting peak temperature (° C.); (C) which has on the film plane two crossing directions having a thermal shrinkage factor at 100° C. for 10 minutes of 16 to 25%; and (D) which has a thickness of 0.2 to 7 &mgr;m. This film is suitable for use in a thermosensitive stencil printing base sheet which enables clear character printing and solid printing, is free from nonuniformity in printing thickness, nonuniformity in printing density and wrinkles, and excellent in durability, and has high perforation sensitivity.
摘要:
A photoresist layer supporting film is (A) formed from a polymer composition comprising (i) 55 to 100% by weight of a copolyester containing ethylene terephthalate units as a main recurring unit and having a melting point of 210 to 250.degree. C. and (ii) 0 to 45% by weight of polybutylene terephthalate or a copolyester containing butylene terephthalate units as a main recurring unit and having a melting point of not lower than 180.degree. C. and (B) has a plane orientation coefficient of 0.08 to 0.16. Since this supporting film is excellent in substrate shape follow-up properties and resolution, it is suitable for the preparation of a photoresist film laminate by laminating a protective film and a photoresist layer on the surface thereof.
摘要:
A silver halide photographic material is disclosed, comprising a support having provided thereon at least one silver halide emulsion layer, at least one layer of the emulsion layer and other hydrophilic colloid layers containing at least one hydrazine-type nucleating agent having, in the vicinity of the hydrazine group, an anionic group or a nonionic group which forms an intramolecular hydrogen bond with a hydrogen atom of the hydrazine, and also containing at least one of the onium salt compounds represented by formulae (a), (b) and (c), or at least one of the amine compounds represented by formulae (d), (e), (f), (g), (h), (i) and (j). Also disclosed is a method for processing, after exposure, the silver halide photographic material described above with a developer containing a reductone-type developing agent and having a pH of 12 or less.
摘要:
Disclosed is Compound GEX1 of formula (I), having excellent antitumor activity: ##STR1## wherein R.sup.1 represents hydroxy or ##STR2## R.sup.2, R.sup.3 and R.sup.4 independently represent hydrogen or hydroxy; R.sup.5 represents hydroxyl or lower alkoxy; provided that when R.sup.1 is hydroxy and R.sup.5 is methoxy, then at least one of R.sup.2, R.sup.3 and R.sup.4 is the group except for hydrogen, and pharmaceutically acceptable salts thereof.
摘要:
A silver halide photographic photosensitive material comprises a silver halide photographic emulsion layer and a compound represented by general formula (I): ##STR1## wherein V.sub.1 and V.sub.2 each represents a hydrogen atom, an alkyl group or an alkoxy group; at least one of V.sub.1 and V.sub.2 is an alkyl group or an alkoxy group; Z.sub.1 represents a group of atoms which is required to form a five- or six-membered nitrogen-containing heterocyclic ring; Z.sub.2 represents a group of atoms which is required to form a five- or six-membered nitrogen-containing heterocyclic ring; Z.sub.3 represents an oxygen atom, a sulfur atom or a selenium atom; R.sub.1 and R.sub.3 each represents an alkyl group; R.sub.2 represents an alkyl group, an aryl group or a heterocyclic group; L.sub.1, L.sub.2 and L.sub.3 each represents a methine group; M.sub.1 represents a charge neutralizing counter-ion; and m.sub.1 is a number having a value zero or above which is required to neutralize the charge within the molecule.
摘要:
A silver halide photographic material has on a support at least one light-sensitive silver halide emulsion layer which comprises silver halide emulsion grains having a chloride content: of at least 50 mol % and containing a metal selected from rhodium, ruthenium and rhenium in an amount of at least 10.sup.-8 mole per mole of silver, said silver halide emulsion being spectrally sensitized with a compound of general formula (I) and being chemically sensitized with a selenium or tellurium compound: ##STR1## wherein Z and Z.sub.1 each represents a group of nonmetallic atoms necessary to complete a 5- or 6-membered nitrogen-containing heterocyclic nucleus; R and R.sub.1 each represents an unsubstituted or substituted alkyl group, or an unsubstituted aryl group; Q and Q.sub.1 each represents a group of atoms necessary to complete a 4-thiazolidinone, 5-thiazolidinone or 4-imidazolidinone nucleus; L, L.sub.1 and L.sub.2 each represents an unsubstituted or substituted methine group; n.sub.1 and n.sub.2 each represents 0 or 1; X represents an anion; and m represents 0 or 1, wherein m=0 indicates that the dye forms an inner salt. The photographic material provides high sensitivity to He--Ne laser light and ensures high contrast in the photographic images.
摘要:
An epoxy resin composition comprising an epoxy resin, a curing agent, a substantially pure alpha-alumina filler, and a silicone-modified epoxy or phenol resin is useful in encapsulating semiconductor devices. The composition can be molded and cured into a product having improved thermal conductivity and moisture resistance.