公开(公告)号：US20190224499A1

公开(公告)日：2019-07-25

申请号：US16373775

申请日：2019-04-03

Applicant: NEUBORON MEDTECH LTD.

Inventor： Yuan-hao LIU

IPC: A61N5/10 ,  G21G4/02 ,  H05H6/00 ,  G21K1/02 ,  G21K1/06 ,  H05H3/06

Abstract: The present disclosure provides a neutron capture therapy system. The neutron capture therapy system includes an accelerator, the accelerator generates a charged particle beam; a neutron generator, the neutron generator generates a neutron beam after being irradiated by the charged particle beam; a beam shaping assembly, the beam shaping assembly includes a moderator and a reflector surrounds around the outer periphery of the moderator, the moderator moderates the neutrons generated by the neutron generator to a preset spectrum, and the reflector leads the deflected neutrons back to increase the neutron intensity within the preset spectrum; and a collimator, the collimator concentrates the neutrons generated by the neutron generator; the spectrum of the neutron beam is changed by changing the spectrum of the charged particle beam.

公开(公告)号：US10359375B2

公开(公告)日：2019-07-23

申请号：US15031657

申请日：2014-10-23

Applicant: NANOVISION TECHNOLOGY (BEIJING) CO., LTD.

Inventor： Hongguang Cao ,  Yunxiang Li ,  Hailiang Zheng

IPC: G01N23/00 ,  G01N23/083 ,  G01T1/36 ,  G01T1/24 ,  G01N23/087 ,  A61B6/00 ,  A61B6/03 ,  G01N23/046 ,  G21K1/02 ,  G21K1/06 ,  H01J35/08 ,  H01J35/14

Abstract: A photon count-based radiation imaging system. The invention also relates to a method of implementing X-ray imaging in said system, and to key apparatus of said system. In the system, an x-ray source directs x-rays at a sample on a scanning platform. When the x-rays pass through said sample, photons carrying information about characteristics of the material at various spatial positions are produced. A photon count detector counts the photons on an imaging plane, obtains incident photon projection data and energy data, and transmits same to a 3D reconstruction system. The 3D reconstruction system reconstructs, on the basis of said projection data and energy data, the 3D structure and the matter composition inside the sample, then performs digital dyeing on the component parts of the sample, thereby differentiating the matter composition of the sample.

公开(公告)号：US20190212659A1

公开(公告)日：2019-07-11

申请号：US16241462

申请日：2019-01-07

Applicant: Carl Zeiss SMT GmbH

Inventor： Hartmut ENKISCH ,  Thomas SCHICKETANZ ,  Matus KALISKY ,  Oliver DIER

IPC: G03F7/20 ,  G21K1/06

Abstract: An optical system, in particular for a microlithographic projection exposure apparatus, with at least one mirror (200) which has an optically effective surface and, for electromagnetic radiation of a predefined operating wavelength impinging on the optically effective surface at an angle of incidence of at least 65° relative to the respective surface normal, has a reflectivity of at least 0.5. The mirror has a reflection layer (210) and a compensation layer (220) which is arranged above this reflection layer (210) in the direction of the optically effective surface. The compensation layer (220), for an intensity distribution generated in a pupil plane or a field plane of the optical system during operation thereof, reduces the difference between the maximum and the minimum intensity value by at least 20% compared to an analogous structure without the compensation layer.

公开(公告)号：US20190187078A1

公开(公告)日：2019-06-20

申请号：US16217337

申请日：2018-12-12

Applicant: HORIBA, Ltd.

Inventor： Tetsuya TAKIMOTO ,  Hideo UEDA

IPC: G01N23/223 ,  G01N23/2209 ,  H01J35/02 ,  G21K1/06

CPC classification number: G01N23/223 ,  G01N23/2209 ,  G01N2223/315 ,  G21K1/06 ,  H01J35/02

Abstract: An X-ray generation apparatus comprising: an X-ray generating unit; a dispersive crystal whose surface is irradiated with an X-ray generated from the X-ray generating unit in order to monochromatize the X-ray; and a detecting unit that detects an X-ray generated from a sample irradiated with the X-ray monochromatized by the dispersive crystal. The dispersive crystal has a single-bent shape containing the surface that is a concave surface formed by integrating concave curve lines continuously along an axis perpendicular to a plane including the concave curve line. A direction in which a position on the surface irradiated with the X-ray generated from the X-ray generating unit moves is the direction along the axis.

公开(公告)号：US10325692B2

公开(公告)日：2019-06-18

申请号：US15332420

申请日：2016-10-24

Applicant: CANON KABUSHIKI KAISHA

Inventor： Soichiro Handa

IPC: G21K1/06 ,  G01N23/20 ,  G01N23/04

Abstract: An X-ray diffractive grating includes a phase advance portion and a plurality of phase delay portions. The phase advance portion includes a grating material. In each of the phase delay portions, the thickness of the grating material is less than that in the phase advance portion, and the area occupancy of the phase delay portions in the corresponding two-dimensional grating pattern is 15% or more but less than 45%. The phase delay portions are arranged in a hexagonal lattice shape.

公开(公告)号：US10317802B2

公开(公告)日：2019-06-11

申请号：US16013687

申请日：2018-06-20

Applicant: Carl Zeiss SMT GmbH ,  ASML Netherlands B.V.

Inventor： Norman Baer ,  Ulrich Loering ,  Oliver Natt ,  Gero Wittich ,  Timo Laufer ,  Peter Kuerz ,  Guido Limbach ,  Stefan Hembacher ,  Holger Walter ,  Yim-Bun-Patrick Kwan ,  Markus Hauf ,  Franz-Josef Stickel ,  Jan Van Schoot

IPC: G03F7/20 ,  B82Y10/00 ,  G02B5/08 ,  G02B7/18 ,  G02B17/06 ,  G02B27/00 ,  G21K1/06 ,  G02B3/00 ,  G03B27/54 ,  G02B5/00

Abstract: A projection lens of an EUV-lithographic projection exposure system with at least two reflective optical elements each comprising a body and a reflective surface for projecting an object field on a reticle onto an image field on a substrate if the projection lens is exposed with an exposure power of EUV light, wherein the bodies of at least two reflective optical elements comprise a material with a temperature dependent coefficient of thermal expansion which is zero at respective zero cross temperatures, and wherein the absolute value of the difference between the zero cross temperatures is more than 6K.

公开(公告)号：US20190171118A1

公开(公告)日：2019-06-06

申请号：US16269942

申请日：2019-02-07

Applicant: Carl Zeiss SMT GmbH

Inventor： Joachim Hartjes ,  Alexander Wolf ,  Toralf Gruner

IPC: G03F7/20 ,  F16F15/03 ,  G02B7/182 ,  G21K1/06

Abstract: The disclosure relates to an optical module with first and second components, a supporting structure and an anticollision device. The first component is supported by the supporting structure and is arranged adjacent to and at a distance from the second component to form a gap. The supporting structure defines a path of relative movement, on which the first and second components move in relation to one another under the influence of a disturbance, a collision between collision regions of the first and second components occurring if the anticollision device is inactive. The anticollision device includes a first anticollision unit on the first component, which produces a first field, and a second anticollision unit on the second component, which is assigned to the first anticollision unit and produces a second field.

公开(公告)号：US20190170670A1

公开(公告)日：2019-06-06

申请号：US15829068

申请日：2017-12-01

Applicant: Bruker AXS GmbH

Inventor： Roger D. DURST ,  Christoph OLLINGER

IPC: G01N23/223 ,  H01J35/06 ,  H01J35/22 ,  G21K1/06 ,  H05G1/04 ,  H05G1/30

CPC classification number: G01N23/223 ,  G21K1/06 ,  H01J35/06 ,  H01J35/08 ,  H01J35/22 ,  H01J2235/082 ,  H01J2235/086 ,  H05G1/04 ,  H05G1/30 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006

Abstract: An X-ray source uses excitation of a liquid metal beam of ions or ionized droplets to produce an X-ray output with higher brightness than conventional sources. The beam may be accelerated from a liquid metal source using an extraction electrode. The source may have an emitter tip, and the acceleration of the liquid metal may include field emission from a Taylor cone. An electrostatic or electromagnetic focusing electrode may be used to reduce a cross-sectional diameter of the beam. The liquid metal beam has a relatively high velocity as it does not suffer from flow turbulence, thus allowing for a more energetic excitation and a correspondingly higher brightness. A beam dump may also be used to collect the liquid metal beam after excitation, and may be concave with no direct sight lines to either an electron beam cathode or to X-ray windows of an enclosure for the source.

公开(公告)号：US10310382B2

公开(公告)日：2019-06-04

申请号：US15018316

申请日：2016-02-08

Applicant: Carl Zeiss SMT GmbH

Inventor： Martin Hermann

IPC: G02B5/08 ,  G02B5/20 ,  F21V9/04 ,  F21V9/06 ,  G03F7/20 ,  G21K1/06

Abstract: A mirror (10, 20, 30, 40), more particularly for a microlithographic projection exposure apparatus, has an optical effective surface (10a, 20a, 30a, 40a), a mirror substrate (11, 21, 31, 41) and a reflection layer stack (14, 24, 34, 44) for reflecting electromagnetic radiation impinging on the optical effective surface (10a, 20a, 30a, 40a), wherein a layer (13, 23, 33, 43) composed of a group III nitride is arranged between the mirror substrate (11, 21, 31, 41) and the reflection layer stack (14, 24, 34, 44), wherein the group III nitride is selected from the group containing gallium nitride (GaN), aluminum nitride (AlN) and aluminum gallium nitride (AlGaN).

公开(公告)号：US20190154892A1

公开(公告)日：2019-05-23

申请号：US16204446

申请日：2018-11-29

Applicant: ALCORIX CO.

Inventor： Nicolaie A. Moldovan

IPC: G02B5/18 ,  H01L21/321 ,  H01L21/768 ,  G02B3/08 ,  G21K1/06 ,  C23C16/455

Abstract: A batch processing method for fabrication of diffractive optics is disclosed, having applicability to high resolution ultra-high aspect ratio Fresnel Zone Plates for focusing of X-rays or gamma-rays having energies up to hundreds of keV. An array of precursor forms comprising columns is etched into a planar substrate. After sidewall smoothing, a nanolaminate, comprising a sequence of alternating layers of different complex refractive index, is deposited on the sidewall of each column by atomic layer deposition (ALD), to define a specified diffractive line pattern around each column, to form a binary or higher order diffractive optic. After front surface planarization and thinning of the substrate to expose first and second surfaces of the diffractive line pattern of each diffractive optic, the height h in the propagation direction provides a designed absorption difference and/or phase shift difference between adjacent diffractive lines. Optionally, post-processing enhances mechanical, thermal, electrical and optical properties.