-
公开(公告)号：US20080090155A1
公开(公告)日：2008-04-17
申请号：US11548975
申请日：2006-10-12
申请人： Duncan R. Stewart , Robert Walmsley , Peter G. Hartwell , Wei Wu
发明人： Duncan R. Stewart , Robert Walmsley , Peter G. Hartwell , Wei Wu
IPC分类号： G03F1/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03F1/38 , G03F1/50
摘要： One or more of a contact lithography module, a pattern tool and a substrate include a strain control region to prevent deformation-related misalignment.
摘要翻译： 接触光刻模块，图案工具和基板中的一个或多个包括用于防止变形相关的未对准的应变控制区域。
-
102.发明申请公开(公告)号：US20080084006A1
公开(公告)日：2008-04-10
申请号：US11548216
申请日：2006-10-10
申请人： Jun Gao , Wei Wu , Carl Picciotto
发明人： Jun Gao , Wei Wu , Carl Picciotto
IPC分类号： B29C59/00
CPC分类号： G03F7/2014 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： A contact lithography apparatus, system and method use a hydraulic deformation to facilitate pattern transfer. The apparatus, system and method include a spacer that provides a spaced apart proximal orientation of lithographic elements, and a hydraulic force member that provides the hydraulic deformation. One or more of the lithographic elements and the spacer is deformable, such that hydraulic deformation thereof facilitates the pattern transfer.
摘要翻译： 接触式光刻设备，系统和方法使用液压变形来促进图案转印。 装置，系统和方法包括提供光刻元件的间隔开的近端取向的间隔件，以及提供液压变形的液压力构件。 一个或多个光刻元件和间隔件是可变形的，使得其液压变形有利于图案转印。
-
103.发明申请Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points 有权横线阵列设计和线寻址方法，可以容忍电线重叠点处的电气元件的未对准公开(公告)号：US20080032233A1
公开(公告)日：2008-02-07
申请号：US11906886
申请日：2007-10-03
申请人： Wei Wu , Philip Kuekes , R. Williams
发明人： Wei Wu , Philip Kuekes , R. Williams
IPC分类号： G03C5/00
CPC分类号： G11C13/025 , B82Y10/00 , B82Y30/00 , G11C2213/16 , G11C2213/17 , H01L21/76838 , H01L23/53271 , H01L2221/1094 , H01L2924/0002 , Y10S977/721 , Y10S977/742 , H01L2924/00
摘要： Various embodiments of the present invention are directed to crossbar array designs that interfaces wires to address wires, despite misalignments between electrical components and wires. In one embodiment, a nanoscale device may be composed of a first layer of two or more wires and a second layer of two or more address wires that overlays the first layer. The nanoscale device may also include an intermediate layer positioned between the first layer and the second layer. Two or more redundant electrical component patterns may be fabricated within the intermediate layer so that one or more of the electrical component patterns is aligned with the first and second layers.
摘要翻译： 尽管本发明的各种实施例涉及将电线接合到地址线的交叉列阵列设计，尽管电气部件和电线之间未对准。 在一个实施例中，纳米级器件可以由两条或更多条线的第一层和覆盖第一层的两条或更多条地址线的第二层组成。 纳米级器件还可以包括位于第一层和第二层之间的中间层。 可以在中间层内制造两个或更多个冗余电组件图案，使得一个或多个电组件图案与第一层和第二层对准。
-
104.发明申请公开(公告)号：US20080026305A1
公开(公告)日：2008-01-31
申请号：US11492838
申请日：2006-07-26
申请人： Wei Wu , William M. Tong , Jun Gao , Carl Picciotto
发明人： Wei Wu , William M. Tong , Jun Gao , Carl Picciotto
CPC分类号： G03F9/7069 , G03F9/7065 , G03F9/7088
摘要： A method and system are disclosed for aligning a lithography template having a pattern with a substrate in preparation for transferring the pattern to a surface of the substrate. The system includes an optical imaging system adapted to image a first alignment structure formed on a top surface of the template using light of a first wavelength and a second alignment structure formed on a top surface of the substrate using light of a second wavelength.
摘要翻译： 公开了一种方法和系统，用于将具有图案的光刻模板与衬底对准以准备将图案转移到衬底的表面。 该系统包括光学成像系统，其适于使用第二波长的光形成在基板的顶表面上的第一波长的光和形成在第二对准结构上的形成在模板的顶表面上的第一对准结构。
-
公开(公告)号：US20070284779A1
公开(公告)日：2007-12-13
申请号：US11451993
申请日：2006-06-13
申请人： Wei Wu , Shih-Yuan Wang , Zhaoning Yu , R. Stanley Williams
发明人： Wei Wu , Shih-Yuan Wang , Zhaoning Yu , R. Stanley Williams
CPC分类号： B29C37/005 , B29C2035/0827 , B29C2059/023 , B82Y10/00 , B82Y40/00 , G03F7/0002
摘要： An apparatus for forming a pattern in a curable material carried on a substrate having one or more components with coefficients of thermal expansion that are substantially equal to the coefficient of thermal expansion of the substrate.
摘要翻译： 一种在具有一个或多个热膨胀系数基本上等于基板热膨胀系数的一个或多个部件的基板上形成可固化材料的图案的装置。
-
106.发明授权Crossbar-array designs and wire addressing methods that tolerate misalignment of electrical components at wire overlap points 有权横线阵列设计和线寻址方法，可以容忍电线重叠点处的电气元件的未对准公开(公告)号：US07307345B2
公开(公告)日：2007-12-11
申请号：US11264464
申请日：2005-11-01
申请人： Wei Wu , Philip J. Kuekes , R. Stanley Williams
发明人： Wei Wu , Philip J. Kuekes , R. Stanley Williams
IPC分类号： H01L23/528
CPC分类号： G11C13/02 , B82Y10/00 , G11C8/10 , G11C11/54 , G11C13/0023 , G11C2213/77 , G11C2213/81 , H01L27/10 , H01L27/285 , Y10S977/762 , Y10S977/932
摘要： Various embodiments of the present invention are directed to crossbar array designs that interfaces wires to address wires, despite misalignments between electrical components and wires. In one embodiment, a nanoscale device may be composed of a first layer of two or more wires and a second layer of two or more address wires that overlays the first layer. The nanoscale device may also include an intermediate layer positioned between the first layer and the second layer. Two or more redundant electrical component patterns may be fabricated within the intermediate layer so that one or more of the electrical component patterns is aligned with the first and second layers.
摘要翻译： 尽管本发明的各种实施例涉及将电线接合到地址线的交叉列阵列设计，尽管电气部件和电线之间未对准。 在一个实施例中，纳米级器件可以由两条或更多条线的第一层和覆盖第一层的两条或更多条地址线的第二层组成。 纳米级器件还可以包括位于第一层和第二层之间的中间层。 可以在中间层内制造两个或更多个冗余电组件图案，使得一个或多个电组件图案与第一层和第二层对准。
-
公开(公告)号：US20070252982A1
公开(公告)日：2007-11-01
申请号：US11413910
申请日：2006-04-28
申请人： Shih-Yuan Wang , R. Williams , Raymond Beausoleil , Theodore Kamins , Zhiyong Li , Wei Wu
发明人： Shih-Yuan Wang , R. Williams , Raymond Beausoleil , Theodore Kamins , Zhiyong Li , Wei Wu
CPC分类号： G01N21/658 , G01J3/44
摘要： Raman systems include a radiation source, a radiation detector, and a Raman device or signal-enhancing structure. Raman devices include a tunable resonant cavity and a Raman signal-enhancing structure coupled to the cavity. The cavity includes a first reflective member, a second reflective member, and an electro-optic material disposed between the reflective members. The electro-optic material exhibits a refractive index that varies in response to an applied electrical field. Raman signal-enhancing structures include a substantially planar layer of Raman signal-enhancing material having a major surface, a support structure extending from the major surface, and a substantially planar member comprising a Raman signal-enhancing material disposed on an end of the support structure opposite the layer of Raman signal-enhancing material. The support structure separates at least a portion of the planar member from the layer of Raman signal-enhancing material by a selected distance of less than about fifty nanometers.
摘要翻译： 拉曼系统包括辐射源，辐射检测器和拉曼器件或信号增强结构。 拉曼器件包括耦合到空腔的可调谐谐振腔和拉曼信号增强结构。 空腔包括第一反射构件，第二反射构件和设置在反射构件之间的电光材料。 电光材料表现出响应于所施加的电场而变化的折射率。 拉曼信号增强结构包括具有主表面的基本平坦的拉曼信号增强材料层，从主表面延伸的支撑结构和包括设置在支撑结构的端部上的拉曼信号增强材料的基本上平面的构件 与拉曼信号增强材料层相对。 支撑结构将平面构件的至少一部分与拉曼信号增强材料层分开小于约五十纳米的选定距离。
-
-
-
-
-
-
-
搜索结果
740 条记录 (耗时 0.047 秒)
