Imprint lithography apparatus and method employing an effective pressure
    1.
    发明授权
    Imprint lithography apparatus and method employing an effective pressure 有权
    压印光刻设备和采用有效压力的方法

    公开(公告)号:US07641468B2

    公开(公告)日:2010-01-05

    申请号:US10931672

    申请日:2004-09-01

    IPC分类号: B29D17/00

    摘要: An imprint apparatus and method employ an effective pressure in imprint lithography. The imprint apparatus includes a compressible chamber that encloses an imprint mold having a mold pattern and a sample to be imprinted. The chamber is compressed to imprint the mold pattern on the sample. The mold is pressed against the sample with the effective pressure. The effective pressure is controlled by a selected ratio of a cavity area of the chamber to a contact area between the mold and the sample.

    摘要翻译: 压印设备和方法在压印光刻中采用有效压力。 压印装置包括可压缩室,其包围具有模具图案和要印刷的样品的压印模具。 压缩室以将模具图案压印在样品上。 模具以有效的压力压在样品上。 有效压力通过腔室的空腔面积与模具和样品之间的接触面积的选定比例来控制。

    Apparatus and method for alignment using multiple wavelengths of light
    2.
    发明申请
    Apparatus and method for alignment using multiple wavelengths of light 审中-公开
    使用多个波长的光进行对准的装置和方法

    公开(公告)号:US20080026305A1

    公开(公告)日:2008-01-31

    申请号:US11492838

    申请日:2006-07-26

    IPC分类号: G03F9/00 G03B27/42 G03C5/00

    摘要: A method and system are disclosed for aligning a lithography template having a pattern with a substrate in preparation for transferring the pattern to a surface of the substrate. The system includes an optical imaging system adapted to image a first alignment structure formed on a top surface of the template using light of a first wavelength and a second alignment structure formed on a top surface of the substrate using light of a second wavelength.

    摘要翻译: 公开了一种方法和系统,用于将具有图案的光刻模板与衬底对准以准备将图案转移到衬底的表面。 该系统包括光学成像系统,其适于使用第二波长的光形成在基板的顶表面上的第一波长的光和形成在第二对准结构上的形成在模板的顶表面上的第一对准结构。

    Sensing alignment of multiple layers
    3.
    发明授权
    Sensing alignment of multiple layers 失效
    感应多层的对齐

    公开(公告)号:US07226797B2

    公开(公告)日:2007-06-05

    申请号:US10995837

    申请日:2004-11-23

    IPC分类号: H01L21/00

    CPC分类号: G06T7/0004

    摘要: Using an imaging system in relation to a plurality of material layers in an initial alignment state is provided, a first of the plurality of material layers at least partially obscuring a second of the plurality of material layers in the initial alignment state. The first material layer is moved from a first position corresponding to the initial alignment state to a second position out of a field of view of the imaging system, and a first image of the second material layer is stored. The first material layer is moved back the first position to restore the initial alignment state. A second image of the first material layer is acquired. The second image and the stored first image are processed to determine the initial alignment state.

    摘要翻译: 提供了在初始对准状态下相对于多个材料层使用成像系统,多个材料层中的第一个在初始对准状态下至少部分地遮蔽多个材料层中的第二个材料层。 第一材料层从对应于初始取向状态的第一位置移动到成像系统的视野外的第二位置,并且存储第二材料层的第一图像。 第一材料层被移回第一位置以恢复初始对准状态。 获取第一材料层的第二图像。 处理第二图像和存储的第一图像以确定初始对准状态。

    Determining a dimensional change in a surface using images acquired before and after the dimensional change
    4.
    发明授权
    Determining a dimensional change in a surface using images acquired before and after the dimensional change 失效
    使用在尺寸变化之前和之后获取的图像来确定表面中的尺寸变化

    公开(公告)号:US07796800B2

    公开(公告)日:2010-09-14

    申请号:US11046146

    申请日:2005-01-28

    IPC分类号: G06K9/00

    摘要: Determining a dimensional change in a surface of an object is described. At a first time, a first image of the surface is acquired at a first spatial window thereon having a first known position relative to a frame of reference. At a second time, a second image of the surface is acquired at a second spatial window thereon having a second known position relative to the frame of reference. The first image and the second image are processed according to an image displacement sensing algorithm to determine a relative translation of a first point on the surface between the first and second times. The relative translation of the first point, the first known position, and the second known position are used to determine the dimensional change in the surface between the first and second times.

    摘要翻译: 描述确定物体表面中的尺寸变化。 在第一时间,在其上具有相对于参照系的第一已知位置的第一空间窗口处获取表面的第一图像。 在第二时间,在其上具有相对于参考框架的第二已知位置的第二空间窗口处获取表面的第二图像。 根据图像位移检测算法处理第一图像和第二图像,以确定第一次和第二次之间表面上的第一点的相对平移。 使用第一点,第一已知位置和第二已知位置的相对平移来确定第一次和第二次之间的表面中的尺寸变化。

    Metallic quantum dots fabricated by a superlattice structure

    公开(公告)号:US07309642B2

    公开(公告)日:2007-12-18

    申请号:US11271354

    申请日:2005-11-09

    IPC分类号: H01L21/30 H01L21/46

    摘要: A method for forming quantum dots includes forming a superlattice structure that includes at least one nanostrip protruding from the superlattice structure, providing a quantum dot substrate, transferring the at least one nanostrip to the quantum dot substrate, and removing at least a portion of the at least one nanostrip from the substrate. The superlattice structure is formed by providing a superlattice substrate, forming alternating layers of first and second materials on the substrate to form a stack, cleaving the stack to expose the alternating layers, and etching the exposed alternating layers with an etchant that etches the second material at a greater rate than the first to form the at least one nanostrip.