Deflection system in an electron beam exposure device
    101.
    发明授权
    Deflection system in an electron beam exposure device 失效
    电子束曝光装置中的偏转系统

    公开(公告)号:US4583077A

    公开(公告)日:1986-04-15

    申请号:US536467

    申请日:1983-09-27

    CPC分类号: H01L21/30 H03M1/74

    摘要: In a D/A converter in a deflection system of an electron beam exposure device, the most significant bits (m bits) of input digital data consisting of n bits are input into a decoder circuit, and 2.sup.m D/A converters which correspond to the m bits are provided. The data consisting of the least significant bits (n-m bits) is input into the 2.sup.m D/A converters via 2.sup.m gates, respectively. The decoder circuit is constructed so as to control the 2.sup.m gates so that when the content of the data of the m bits is S, the first to S-th data of the 2.sup.m D/A converters is all rendered to be "1", the data of the (S+1)-th D/A converter remains the same as the data of the n-m bits, and the data of the (S+2)-th and subsequent D/A converters is all rendered to be "0", the sum of the outputs of the 2.sup.m D/A converters being applied to a coil which deflects the electron beam.

    摘要翻译: 在电子束曝光装置的偏转系统中的D / A转换器中,由n位组成的输入数字数据的最高有效位(m位)被输入到解码器电路中,对应于2m的D / A转换器 提供m位。 由最低有效位(n-m位)组成的数据分别通过2m个门输入到2m D / A转换器。 解码器电路被构造成控制2m个门,使得当m位的数据的内容为S时,2m D / A转换器的第一至第S数据全部变为“1” 第(S + 1)个D / A转换器的数据与nm位的数据保持相同,并且第(S + 2)和随后的D / A转换器的数据全部变为“ 0“,2m D / A转换器的输出之和被施加到偏转电子束的线圈上。

    Electron beam lithographic system
    102.
    发明授权
    Electron beam lithographic system 失效
    电子束光刻系统

    公开(公告)号:US4145597A

    公开(公告)日:1979-03-20

    申请号:US752989

    申请日:1976-12-21

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    CPC分类号: H01J37/3007 H01J37/3045

    摘要: An electron beam lithographic system which exposes a desired area of an electron beam resist so as to form a desired pattern to be used for manufacturing large scale integrated circuits. This electron beam lithographic system provides a first and a second slit plate, respectively providing a rectangular slit so as to form an electron beam having a rectangular cross section, and a deflection means which deflects the electron beam passing the first slit so as to vary the cross section of the electron beam which passes the second slit. Therefore, electron beams having various cross sections can be obtained, so that the electron beam resist is exposed by the beam having various cross sections and the desired pattern can be formed within a short time on a wafer.

    摘要翻译: 一种电子束光刻系统,其暴露电子束抗蚀剂的期望区域,以形成用于制造大规模集成电路的期望图案。 该电子束光刻系统提供分别提供矩形狭缝以形成具有矩形横截面的电子束的第一和第二狭缝板以及偏转通过第一狭缝的电子束的偏转装置,以便改变 通过第二狭缝的电子束的横截面。 因此,可以获得具有各种横截面的电子束,使得电子束抗蚀剂被具有各种截面的光束曝光,并且可以在短时间内在晶片上形成期望的图案。

    Process for the production of polyester fiber
    103.
    发明授权
    Process for the production of polyester fiber 失效
    聚酯纤维生产工艺

    公开(公告)号:US4105740A

    公开(公告)日:1978-08-08

    申请号:US536644

    申请日:1974-12-26

    IPC分类号: D01F6/62 D02J1/22

    CPC分类号: D01F6/62 D02J1/22

    摘要: Stretching polyester tows at a speed greater than 150 m/min., wherein more than 85 mol percent of the recurring units are units of ethylene terephthalate, is carried out at a stretch ratio satisfying the formula-1.58log(.DELTA.n .times. 10.sup.3) + 4.18 .ltoreq. DR .ltoreq. -2.32log(.DELTA.n .times. 10.sup.3) + 5.93Wherein .DELTA. n represents the birefringence of the unstretched filaments and is a value of from 0.020 to 0.100, and DR is the stretch ratio in times.

    摘要翻译: 以大于150m / min的速度拉伸聚酯丝束,其中大于85mol%的重复单元是对苯二甲酸乙二醇酯的单元,以满足式-1.58LOG(DELTA N×103)+ 4.18

    Microphone apparatus
    106.
    发明授权
    Microphone apparatus 失效
    麦克风设备

    公开(公告)号:US4010335A

    公开(公告)日:1977-03-01

    申请号:US625504

    申请日:1975-10-24

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    CPC分类号: H04R5/027 H04R1/08

    摘要: A microphone assembly or apparatus comprises a perforated capsule having a microphone unit supported therein and a tubular projection communicating with the interior of the capsule. The projection is arranged to be inserted into the auditory canal of a human or dummy head. The microphone unit is located near the opening of the auditory canal.

    ELECTRON GUN AND ELECTRON BEAM DEVICE
    107.
    发明申请
    ELECTRON GUN AND ELECTRON BEAM DEVICE 有权
    电子枪和电子束装置

    公开(公告)号:US20140055025A1

    公开(公告)日:2014-02-27

    申请号:US14000988

    申请日:2011-02-25

    申请人: Hiroshi Yasuda

    发明人: Hiroshi Yasuda

    IPC分类号: H01J29/48

    摘要: An electron gun cathode (104) is column shaped, and emits electrons by being heated. A holder (103), which covers the bottom and sides of the electron gun cathode, has electrical conductivity and holds the electron gun cathode, and is composed of a material that does not easily react with the electron gun cathode when in a heated state, is provided. The tip of the electron gun cathode (104) protrudes from the holder (103) so as to be exposed, and electrons are emitted from the tip toward the front by applying an electric field to the tip.

    摘要翻译: 电子枪阴极(104)为柱状,通过加热发射电子。 覆盖电子枪阴极的底部和侧面的保持器(103)具有导电性并保持电子枪阴极,并且由处于加热状态时不易与电子枪阴极反应的材料构成, 被提供。 电子枪阴极(104)的尖端从保持器(103)突出以露出,并且通过向尖端施加电场,从尖端向前方发射电子。

    VEHICLE CONTROL APPARATUS, VEHICLE, AND VEHICLE CONTROL METHOD
    108.
    发明申请
    VEHICLE CONTROL APPARATUS, VEHICLE, AND VEHICLE CONTROL METHOD 有权
    车辆控制装置,车辆和车辆控制方法

    公开(公告)号:US20120116665A1

    公开(公告)日:2012-05-10

    申请号:US13375023

    申请日:2010-05-26

    IPC分类号: G05D1/00

    摘要: A perceived relative distance (Ds) that shows a relative distance between a host vehicle and a perception object (TA) perceived by a driver of the host vehicle is calculated on the basis of an actual relative distance (Dr) therebetween. A perceived relative velocity (Vs) that shows a relative velocity between the host vehicle and the perception object (TA) perceived by the driver is calculated on the basis of an actual relative velocity (Vr) therebetween (step ST2). A perceived relative ratio (X) that is a ratio between the perceived relative distance (Ds) and the perceived relative velocity (Vs) is calculated (step ST3). If the perceived relative ratio (X) exceeds a threshold value (XO), a vehicle control is performed (steps ST4 and ST5).

    摘要翻译: 基于其间的实际相对距离(Dr),计算显示本车辆与本车辆驾驶员感知到的主体车辆与感知物体(TA)之间的相对距离的感知相对距离(Ds)。 基于其间的实际相对速度(Vr)计算显示驾驶员感知到的主车辆与感知物体(TA)之间的相对速度的感知相对速度(Vs)(步骤ST2)。 计算感知的相对距离(Ds)与感知的相对速度(Vs)之间的比值的感知相对比(X)(步骤ST3)。 如果感知到的相对比(X)超过阈值(XO),则执行车辆控制(步骤ST4和ST5)。

    Machine tool
    110.
    发明授权
    Machine tool 有权
    机床

    公开(公告)号:US07987567B2

    公开(公告)日:2011-08-02

    申请号:US12265138

    申请日:2008-11-05

    IPC分类号: B23P23/00 B23B3/00

    摘要: A machine tool has a pair of guide rails and a pair of upper and lower ball screws. No forces are transferred between a beam of a double column frame and a movable unit. The guide rails are spaced from each other and disposed on a bed, and the movable unit is horizontally movably supported on the guide rails. The upper and lower ball screws are mounted respectively on upper and lower portions of the double column frame for moving the movable unit horizontally. Even when the beam is deformed by flexing downwardly by gravity, the movable unit moves stably and smoothly at a high speed to machine a workpiece highly accurately without being adversely affected by the deformation of the beam.

    摘要翻译: 机床有一对导轨和一对上,下滚珠丝杠。 在双列框架梁和可移动单元之间没有力传递力。 导轨彼此间隔开并设置在床上,并且可移动单元水平地可移动地支撑在导轨上。 上下滚珠丝杠分别安装在双列框架的上部和下部,用于水平移动可移动单元。 即使当梁通过重力向下弯曲而变形时,可移动单元高速平稳地平稳运动,高度准确地加工工件,而不受梁的变形的不利影响。