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118 条记录 (耗时 0.034 秒)

    Graded photocatalytic coatings
    102.
    发明授权
    Graded photocatalytic coatings 有权
    分级光催化涂层

    公开(公告)号：US07294404B2

    公开(公告)日：2007-11-13

    申请号：US11021482

    申请日：2004-12-22

    申请人： Annette J. Krisko ,  Klaus Hartig

    发明人： Annette J. Krisko ,  Klaus Hartig

    IPC分类号： B32B17/06

    CPC分类号： C23C14/3464 ,  C03C17/3417 ,  C03C2217/71 ,  C03C2217/91 ,  C03C2218/154 ,  C03C2218/365 ,  C23C14/0084 ,  C23C14/024 ,  C23C14/027 ,  C23C14/083

    摘要： The invention provides graded photocatalytic coatings. In one aspect, the invention provides a substrate carrying a photocatalytic coating that includes a first graded film region and a second graded film region. The first graded film region has a substantially continuously decreasing concentration of a first transparent dielectric material and a substantially continuously increasing concentration of a second transparent dielectric material. The second graded film region has a substantially continuously decreasing concentration of the second transparent dielectric material and a substantially continuously increasing concentration of a third transparent dielectric material. In certain embodiments, the first transparent dielectric material comprises silicon dioxide, the second transparent dielectric material comprises zirconium oxide, and the third transparent dielectric material comprises titanium oxide. The invention also provides methods and equipment for depositing graded photocatalytic coatings.

    摘要翻译： 本发明提供渐变的光催化涂层。 在一个方面，本发明提供一种承载光催化涂层的基底，其包括第一渐变膜区域和第二渐变膜区域。 第一渐变膜区域具有基本上连续降低的第一透明电介质材料的浓度和第二透明介电材料的基本连续增加的浓度。 第二梯度膜区域具有基本上连续降低的第二透明介电材料的浓度和第三透明介电材料的基本连续增加的浓度。 在某些实施例中，第一透明介电材料包括二氧化硅，第二透明介电材料包括氧化锆，第三透明电介质材料包括氧化钛。 本发明还提供了用于沉积渐变光催化涂层的方法和设备。

    COATER HAVING SUBSTRATE CLEANING DEVICE AND COATING DEPOSITION METHODS EMPLOYING SUCH COATER
    104.
    发明申请
    COATER HAVING SUBSTRATE CLEANING DEVICE AND COATING DEPOSITION METHODS EMPLOYING SUCH COATER 有权
    具有衬底清洁装置的涂层和使用这种涂层的涂布沉积方法

    公开(公告)号：US20070234963A1

    公开(公告)日：2007-10-11

    申请号：US11750722

    申请日：2007-05-18

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/32

    CPC分类号： C23C14/562 ,  C03C17/002 ,  C03C23/0075 ,  C03C2218/31 ,  C23C14/022 ,  C23C14/568

    摘要： A coater having a substrate cleaning device is disclosed. The substrate cleaning device comprises an ion gun (i.e., an ion source) that is positioned beneath a path of substrate travel (e.g., beneath a substrate support) extending through the coater and that is adapted for treating a bottom major surface of a substrate. Certain embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device. In some embodiments of this nature, the upward coating apparatus is configured for depositing a photocatalytic coating upwardly onto the bottom major surface of the substrate. Certain embodiments of the invention involve a downward coating apparatus, wherein the substrate cleaning device is further along the path of substrate travel than the downward coating apparatus. Some embodiments involve an upward coating apparatus that is further along the path of substrate travel than the substrate cleaning device.

    摘要翻译： 公开了一种具有基板清洁装置的涂布机。 衬底清洁装置包括位于衬底行进路径（例如，衬底支撑件下方）下方的离子枪（即离子源），其延伸穿过涂布机，并适于处理衬底的底部主表面。 某些实施例涉及一种向上涂层装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。 在这种性质的一些实施例中，向上涂覆装置被配置用于将光催化涂层向上沉积到基底的底部主表面上。 本发明的某些实施例涉及一种向下涂覆装置，其中基底清洗装置进一步沿着基底行程的路径而不是向下涂覆装置。 一些实施例涉及一种向上的涂覆装置，其进一步沿着衬底移动的路径而不是衬底清洗装置。

    Reactive sputter deposition processes and equipment
    106.
    发明申请
    Reactive sputter deposition processes and equipment 有权
    反应溅射沉积工艺和设备

    公开(公告)号：US20070131536A1

    公开(公告)日：2007-06-14

    申请号：US11590438

    申请日：2006-10-31

    申请人： Klaus Hartig ,  Soren Berg ,  Tomas Nyberg

    发明人： Klaus Hartig ,  Soren Berg ,  Tomas Nyberg

    IPC分类号： C23C14/32

    CPC分类号： C23C14/3414 ,  C23C14/0036 ,  C23C14/0068 ,  C23C14/35 ,  H01J37/3426

    摘要： The invention is a method for obtaining a reactive sputtering process with a reduced or eliminated hysteresis behavior. This is achieved by employing a target made from a mixture of metal and compound materials. In the method according to the present invention, the fraction of compound material is large enough to eliminate or significantly reduce the hysteresis behavior of the reactive sputtering process and enable a stable deposition of compound films at a rate significantly higher than what is possible from a target completely made from compound material.

    摘要翻译： 本发明是用于获得具有减小或消除的滞后行为的反应溅射工艺的方法。 这是通过使用由金属和复合材料的混合物制成的靶来实现的。 在根据本发明的方法中，化合物材料的分数足够大以消除或显着降低反应性溅射工艺的滞后性能，并能够使化合物膜的稳定沉积速度明显高于目标可能的速率 完全由复合材料制成。

    Oscillating shielded cylindrical target assemblies and their methods of use
    107.
    发明申请
    Oscillating shielded cylindrical target assemblies and their methods of use 审中-公开
    振荡屏蔽圆柱形目标组件及其使用方法

    公开(公告)号：US20060137968A1

    公开(公告)日：2006-06-29

    申请号：US11311526

    申请日：2005-12-19

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： C23C14/32 ,  C23C14/00

    CPC分类号： H01J37/3429 ,  C23C14/35 ,  H01J37/3405 ,  H01J37/3447 ,  H01J37/3455

    摘要： The present invention relates to an oscillating shielded cylindrical target assembly comprising a cylindrical target, a motor assembly adapted to oscillate the cylindrical target, a shield, and a magnet assembly. Embodiments of the present invention also include a cylindrical target that has an outer surface containing a plurality of divided sections; the sections being disposed lengthwise around the target to form strips running lengthwise across the target. Each section includes a single sputtering material, such as silver, titanium, or niobium, that is intended to be applied as a separate coating on a substrate, such as glass.

    摘要翻译： 本发明涉及一种振荡屏蔽圆柱形目标组件，其包括圆柱形靶，适于摆动圆柱形目标的电机组件，屏蔽件和磁体组件。 本发明的实施例还包括具有包含多个分割部分的外表面的圆柱形靶; 所述部分围绕所述目标纵向设置以形成横跨所述目标纵向延伸的条带。 每个部分包括单个溅射材料，例如银，钛或铌，其旨在作为在诸如玻璃的基底上的单独涂层施加。

    Vertical-offset coater and methods of use
    110.
    发明申请
    Vertical-offset coater and methods of use 有权
    垂直胶印机和使用方法

    公开(公告)号：US20060035021A1

    公开(公告)日：2006-02-16

    申请号：US11197651

    申请日：2005-08-04

    申请人： Klaus Hartig

    发明人： Klaus Hartig

    IPC分类号： B05D1/00 ,  C23C14/00 ,  C23C16/00 ,  B05D5/00

    CPC分类号： C23C14/50 ,  B65G49/063 ,  B65G2249/02 ,  C03C17/002 ,  C03C2218/365 ,  C23C14/56 ,  C23C16/4587 ,  C23C16/54

    摘要： The invention provides a coater, and methods of using the coater, for depositing thin films onto generally-opposed major surfaces of a sheet-like substrate. The coater has a substrate transport system adapted for supporting the substrate in a vertical-offset configuration wherein the substrate is not in a perfectly vertical position but rather is offset from vertical by an acute angle. The transport system defines a path of substrate travel extending through the coater. The transport system is adapted for conveying the substrate along the path of substrate travel. Preferably, the transport system includes a side support for supporting a rear major surface of the substrate. The preferred side support bounds at least one passage through which coating material passes when such coating material is deposited onto the substrate's rear major surface. Preferably, the coater includes at least one coating apparatus (e.g., which is adapted for delivering coating material) on each of two sides of the path of substrate travel. The coating apparatuses preferably are adapted for depositing coatings onto both of the generally-opposed major surfaces of the substrate in a single pass of the substrate along the path of substrate travel.

    摘要翻译： 本发明提供一种涂布机，以及使用涂布机的方法，用于将薄膜沉积在片状基底的大致相对的主表面上。 该涂布机具有适于以垂直偏移配置来支撑基底的基底输送系统，其中基底不处于完全垂直的位置，而是以垂直方向偏斜锐角。 输送系统定义了延伸穿过涂布机的基板行程的路径。 传送系统适于沿着基板移动的路径输送基板。 优选地，输送系统包括用于支撑基底的后主表面的侧支撑件。 当这种涂层材料沉积到基底的后主表面上时，优选的侧支撑物限定涂层材料通过的至少一个通道。 优选地，涂布机包括至少一个涂布装置（例如适于输送涂料的涂布装置）在基板移动路径的两侧的每一侧上。 涂覆设备优选地适于在衬底行进路径的单次通过中将衬底沉积在衬底的两个大致相对的主表面上。