公开(公告)号：US08237918B2

公开(公告)日：2012-08-07

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03B27/72

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。

公开(公告)号：US08159648B2

公开(公告)日：2012-04-17

申请号：US12171394

申请日：2008-07-11

申请人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

发明人： Franz Sorg ,  Peter Deufel ,  Toralf Gruner

IPC分类号： G03B27/68 ,  G03B27/52

CPC分类号： G03F7/70308 ,  G03F7/70825 ,  G03F7/70933

摘要： The disclosure relates to a microlithography projection exposure system having optical corrective elements configured to modify the imaging characteristics, as well as related systems and components.

摘要翻译： 本公开涉及具有被配置为修改成像特性以及相关系统和组件的光学校正元件的微光刻投影曝光系统。

公开(公告)号：US20110228246A1

公开(公告)日：2011-09-22

申请号：US13115741

申请日：2011-05-25

申请人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

发明人： Bernhard Kneer ,  Norbert Wabra ,  Toralf Gruner ,  Alexander Epple ,  Susanne Beder ,  Wolfgang Singer

IPC分类号： G03F7/207 ,  G02B3/12 ,  G02B17/08 ,  G03B27/70

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： Another approach to decrease the resolution is to introduce an immersion liquid having high refractive index into the gap that remains between a final lens element on the image side of the projection objective and the photoresist or another photosensitive layer to be exposed. Projection objectives that are designed for immersion operation and are therefore also referred to as immersion objective may reach numerical apertures of more than 1, for example 1.3 or 1.4. The term “immersion liquid” shall, in the context of this application, relate also to what is commonly referred to as “solid immersion”. In the case of solid immersion, the immersion liquid is in fact a solid medium that, however, does not get in direct contact with the photoresist but is spaced apart from it by a distance that is only a fraction of the wavelength used. This ensures that the laws of geometrical optics do not apply such that no total reflection occurs.

摘要翻译： 降低分辨率的另一种方法是将具有高折射率的浸没液体引入保留在投影物镜的像侧上的最终透镜元件与待曝光的光致抗蚀剂或另一光敏层之间的间隙中。 为浸入式操作设计的投影物镜，因此也称为浸没物镜，可达到大于1，例如1.3或1.4的数值孔径。 在本申请的上下文中，术语“浸没液体”还涉及通常称为“固体浸没”的内容。 在固体浸渍的情况下，浸没液实际上是固体介质，然而，其不会与光致抗蚀剂直接接触，而是与其隔开距离，其仅是所使用波长的一部分。 这确保几何光学的定律不适用于不发生全反射。

公开(公告)号：US07982854B2

公开(公告)日：2011-07-19

申请号：US11911454

申请日：2006-04-12

申请人： Hans-Juergen Mann ,  Wolfgang Singer ,  Toralf Gruner ,  Olaf Dittmann ,  Michael Totzeck

发明人： Hans-Juergen Mann ,  Wolfgang Singer ,  Toralf Gruner ,  Olaf Dittmann ,  Michael Totzeck

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70566 ,  G03F7/70058

摘要： The invention relates to a projection exposure system, in particular for micro-lithography. The projection exposure system according to the invention comprises a light source for producing light in the EUV region. The projection exposure system further comprises a first optical system for illuminating a mask by the light of the light source and a second optical system for imaging the mask on a component. At least one polarization-optical element is disposed on the beam path between the light source and the component.

摘要翻译： 本发明涉及一种投影曝光系统，特别涉及微光刻技术。 根据本发明的投影曝光系统包括用于在EUV区域中产生光的光源。 投影曝光系统还包括用于通过光源的光照射掩模的第一光学系统和用于使部件上的掩模成像的第二光学系统。 至少一个偏振光学元件设置在光源和部件之间的光束路径上。

公开(公告)号：US20110080569A1

公开(公告)日：2011-04-07

申请号：US12966552

申请日：2010-12-13

申请人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

发明人： Eric Eva ,  Payam Tayebati ,  Michael Thier ,  Markus Hauf ,  Ulrich Schoenhoff ,  Ole Fluegge ,  Arif Kazi ,  Alexander Sauerhoefer ,  Gerhard Focht ,  Jochen Weber ,  Toralf Gruner

IPC分类号： G03B27/54 ,  G03B27/72

CPC分类号： G03F7/70891 ,  G02B7/028 ,  G02B27/0068 ,  G03F7/70266

摘要： The disclosure relates to an optical element configure to at least partial spatially resolve correction of a wavefront aberration of an optical system (e.g., a projection exposure apparatus for microlithography) to which optical radiation can be applied, as well as related systems and methods.

摘要翻译： 本公开涉及一种光学元件，其被配置为至少部分空间地解决可以应用光辐射的光学系统（例如，用于微光刻的投影曝光设备）的波前像差的校正，以及相关的系统和方法。

公开(公告)号：US07920275B2

公开(公告)日：2011-04-05

申请号：US12765285

申请日：2010-04-22

申请人： Joerge Tschischgale ,  Toralf Gruner

发明人： Joerge Tschischgale ,  Toralf Gruner

IPC分类号： G01B11/02

CPC分类号： G03F7/70591 ,  G03B13/00 ,  G03F7/70266

摘要： In a method for improving imaging properties of an illumination system or a projection objective of a microlithographic projection exposure apparatus, which comprises an optical element having a surface, the shape of the surface is measured directly at various points. To this end, a measuring beam is directed on the points, and the reflected or refracted beam is measured, e.g. using an interferometer. Based on deviations of the measured shape from a target shape, corrective measures are derived so that the imaging errors of the optical system are improved. The corrective measures may comprise a change in the position or the shape of the optical element being analyzed, or another optical element of the optical system. The target shape of the surface may, for example, be determined so that the optical element at least partially corrects imaging errors caused by other optical elements.

摘要翻译： 在用于改善包括具有表面的光学元件的微光刻投影曝光装置的照明系统或投影物镜的成像特性的方法中，直接在各个点测量表面的形状。 为此，测量光束被引导到这些点上，并且测量反射或折射的光束。 使用干涉仪。 基于测量形状与目标形状的偏差，导出校正措施，使得光学系统的成像误差得到改善。 校正措施可以包括被分析的光学元件的位置或形状的改变，或光学系统的另一个光学元件的变化。 例如，可以确定表面的目标形状，使得光学元件至少部分地校正由其它光学元件引起的成像误差。

公开(公告)号：US07847921B2

公开(公告)日：2010-12-07

申请号：US12177715

申请日：2008-07-22

申请人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

发明人： Toralf Gruner ,  Daniel Kraehmer ,  Michael Totzeck ,  Johannes Wangler ,  Markus Brotsack ,  Nils Dieckmann ,  Aksel Goehnermeier ,  Markus Schwab ,  Damian Fiolka ,  Markus Zenzinger

IPC分类号： G03B27/72 ,  G03B27/54

CPC分类号： G03F7/70566 ,  G03F7/70108 ,  G03F7/70225 ,  G03F7/70308

摘要： In an exposure method for exposing a substrate which is arranged in the area of an image plane of a projection objective as well as in a projection exposure system for performing that method, output radiation directed at the substrate and having an output polarization state is produced. Through variable adjustment of the output polarization state with the aid of at least one polarization manipulation device, the output polarization state can be formed to approach a nominal output polarization state. The polarization manipulation can be performed in a control loop on the basis of polarization-optical measuring data.

摘要翻译： 在用于曝光布置在投影物镜的像面的区域中的基板以及用于执行该方法的投影曝光系统中的曝光方法中，产生了指向基板并具有输出偏振态的输出辐射。 通过借助于至少一个偏振操纵装置对输出偏振状态的可变调节，输出偏振状态可以形成为接近标称输出偏振状态。 可以在基于偏振光学测量数据的控制回路中进行极化处理。

公开(公告)号：US20100208225A1

公开(公告)日：2010-08-19

申请号：US12723456

申请日：2010-03-12

申请人： Daniel Kraehmer ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  Toralf Gruner

发明人： Daniel Kraehmer ,  Aurelian Dodoc ,  Hans-Juergen Mann ,  Toralf Gruner

IPC分类号： G03B27/54 ,  G02B9/00

CPC分类号： G02B5/003 ,  G02B5/005 ,  G02B17/0657 ,  G02B27/0018 ,  G03F7/70233

摘要： A projection objective with obscurated pupil for microlithography has a first optical surface, which has a first region provided for application of useful light, and at least one second optical surface, which has a second region provided for application of useful light. A beam envelope of the useful light extends between the first region and the second region. At least one tube open on the input side and on the output side in the light propagation direction severs to screen scattered light. The at least one tube is between the first optical surface and the second optical surface. The wall of the tube is opaque in the wavelength range of the useful light. The tube extends in the propagation direction of the useful light over at least a partial length of the beam envelope and circumferentially surrounds the beam envelope.

摘要翻译： 具有用于微光刻的遮蔽光瞳的投影物镜具有第一光学表面，其具有提供用于施加有用光的第一区域和至少一个第二光学表面，该第二光学表面具有用于施加有用光的第二区域。 有用光的束包络在第一区域和第二区域之间延伸。 在光传播方向上的至少一个在输入侧和输出侧开口的管切断以屏蔽散射光。 所述至少一个管在所述第一光学表面和所述第二光学表面之间。 管的壁在有用光的波长范围内是不透明的。 管在有用光的传播方向上延伸到束包络的至少一部分长度上并且周向地包围光束包络。

公开(公告)号：US07719658B2

公开(公告)日：2010-05-18

申请号：US10597776

申请日：2005-01-13

申请人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

发明人： Andreas Dorsel ,  Toralf Gruner ,  Bernhard Kneer ,  Susanne Beder ,  Alexander Epple ,  Norbert Wabra

IPC分类号： G03B27/52 ,  G03B27/42 ,  G03B27/54 ,  G03B27/32

CPC分类号： G03F7/70225 ,  G03F7/70241 ,  G03F7/70341 ,  G03F7/70958 ,  G03F7/70966

摘要： Imaging system of a microlithographic projection exposure apparatus, with a projection objective (200, 300, 500, 600) that serves to project an image of a mask which can be set into position in an object plane onto a light-sensitive coating layer which can be set into position in an image plane, and with a liquid-delivery device (205) serving to fill immersion liquid (202, 310, 507) into an interstitial space between the image plane and a last optical element (201, 309, 506) on the image-plane side of the projection objective; wherein the last optical element on the image-plane side of the projection objective is arranged so that, seen in the direction of gravity, it follows the image plane; and wherein the projection objective is configured in such a way that when the system is operating with immersion, the immersion liquid has at least in some areas a convex-curved surface facing in the direction away from the image plane. It is also proposed for the last optical element (201, 309, 506) on the image-plane side of the projection objective to be arranged below the image plane in such a way that the immersion liquid (202, 310, 507, 601) is held at least in part in a substantially tub-shaped area on the last optical element on the image-plane side. Also, a rotator can be provided which serves to rotate a substrate carrying the light-sensitive coating (401) between a transport orientation in which the light-sensitive coating lies on a substrate surface that faces against the direction of gravity and an exposure orientation in which the light-sensitive coating (401) lies on a substrate surface that faces in the direction of gravity.

摘要翻译： 一种具有投影物镜（200,300,500,600）的投影物镜（200,300,500,600）的成像系统，该投影物镜用于投影能够将物镜平面中的位置的掩模图像投影到感光涂层上，该光敏涂层可以 被设置在图像平面中的位置，并且具有用于将浸没液体（202,310,507a）填充到图像平面和最后光学元件（201,309,506）之间的间隙空间中的液体输送装置（205） ）在投影物镜的像平面侧; 其特征在于，所述投影物镜的像面侧的最后一个光学元件被布置为使得从重力方向看，所述光学元件遵循所述图像平面; 并且其中所述投影物镜被配置成使得当所述系统在浸没时操作时，所述浸没液体至少在一些区域中具有面向远离所述图像平面的方向的凸曲面。 还提出将投影物镜的像面侧上的最后一个光学元件（201,309,506）布置在图像平面下方，使浸液（202,310,507,601） 至少部分地保持在图像平面侧的最后一个光学元件上的基本上为盆形的区域中。 此外，可以提供一种旋转器，其用于使承载感光涂层（401）的基板在其中感光涂层位于与重力方向相对的基板表面上的传送方向和曝光方向之间旋转， 感光涂层（401）位于面向重力方向的基板表面上。

公开(公告)号：US20090323042A1

公开(公告)日：2009-12-31

申请号：US12498475

申请日：2009-07-07

申请人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

发明人： Michael Totzeck ,  Toralf Gruner ,  Damian Fiolka

IPC分类号： G03F7/20 ,  G03B27/72 ,  G02B27/28

CPC分类号： G03F7/70566

摘要： An optical system, such as an illumination device or a projection objective of a microlithographic projection exposure apparatus, is disclosed. The optical system can include a polarization compensator which has at least one polarization-modifying partial element. The optical system can also include a manipulator by which the position of the at least one partial element can be altered. At least one operating mode of the optical system can be set in which the intensity, over a region which belongs to a plane perpendicular to the optical axis and which can be illuminated with light from the light source, does not exceed 20% of the maximum intensity in the plane, and the manipulator is arranged in the region.

摘要翻译： 公开了一种光学系统，例如微光刻投影曝光装置的照明装置或投影物镜。 光学系统可以包括具有至少一个偏振修正部分元件的偏振补偿器。 光学系统还可以包括操纵器，通过该操纵器可以改变至少一个部分元件的位置。 可以设置光学系统的至少一种操作模式，其中在属于垂直于光轴并且可以用来自光源的光照射的平面的区域上的强度不超过最大值的20％ 平面内的强度，机械手配置在该区域。